Abstract: A method for the tracking and identification of components of lithography systems, for example of projection exposure apparatuses for semiconductor lithography is provided. The components are each provided with at least one transponder. The transponder has a data memory, on which data relating to the respective component are stored. The transponder is configured to pick up wirelessly arriving signals of a reader and to respond with data from the data memory. The data are stored on the data memory during the production of the component and/or during the production of the lithography system and/or after the start-up of the lithography system.

Abstract: The invention relates to a treatment apparatus having a modular intraocular lens, which comprises a first part having a haptic and a marking, visible in optical coherence tomography, with known dimensions of said marking and a second part having an optics body and which has a convergence state, in which the second part is in contact with the first part, and a spaced- apart state, in which the second part is spaced apart from the first part, having an optical coherence tomography device, which is configured to record, by means of optical coherence tomography, an OCT cross-sectional image which shows the first part arranged in a capsular bag of an eye and which shows dimensions of the marking in the OCT cross-sectional image, and having an evaluation unit which is configured to create a corrected OCT cross-sectional image by transforming coordinates of the OCT cross-sectional image in such a way that dimensions of the marking in the corrected OCT cross-sectional image are closer to the known dimensions of the m

Abstract: A spectacle lens includes proceeding from a front face on the object side of the spectacle lens to an opposite reverse face of the spectacle lens, at least components A, B, and C. The component A includes an ultrathin lens, the component B includes at least one of a polymeric material or a mineral glass, and the component C includes at least one of a functional layer or an ultrathin lens. The spectacle lens has no damage after impact of a steel ball with a diameter of 15.87 mm and a weight of 16.36 g from a height of 1.27 m.

Abstract: It is an object of the invention to improve processes, apparatuses and systems for measuring a measured variable. To this end, a measured variable is measured in a measuring process on the basis of an NV center as a quantum sensor. The NV center has a plurality of quantum states and is optically excitable on the basis of an occupancy of one of the quantum states into at least one excited state of the quantum states by means of an excitation light. The at least one excited state can decay at least with emission of emission light of the NV center. In the measuring process, the NV center is irradiated by the excitation light, the excitation light having a time periodic modulation, and a respective occupancy probability and/or a respective lifetime of the quantum states depending on the measured variable and the excitation light.

Abstract: Detecting emission light, in a laser scanning microscope, wherein the emission light emanating from a sample is guided onto a two-dimensional matrix sensor having a plurality of pixels and being located on an image plane, and a detection point distribution function is detected by the matrix sensor in a spatially oversam pled manner. The emission light emanating from the sample is spectrally separated in a dispersion device; the spectrally separated emission light is detected by the matrix sensor in a spectrally resolved manner; and during the analysis of the intensities measured by the pixels of a pixel region, the spectral separation is cancelled at least for some of said pixels. Additional aspects relate to a detection device for the spectrally resolved detection of emission light in a laser scanning microscope and to a laser scanning microscope.

Abstract: A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.

Abstract: The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source which emits coherent light, an illumination optical unit which produces a diffraction-limited light spot on the mask from the coherent light of the at least one light source, a scanning device, by use of which it is possible to implement a scanning movement of the diffraction-limited light spot relative to the mask, a sensor unit, and an evaluation unit for evaluating the light that is incident on the sensor unit and has come from the mask, an output coupling element for coupling out a portion of the coherent light emitted by the at least one light source, and an intensity sensor for capturing the intensity of this output coupled portion.

Abstract: A method for virtual spectacle adjustment and a corresponding computer program and computing device are disclosed. First measurement points are defined on a 3D model of a person's head, and a model of a frame is adjusted on the basis of the first measurement points. Defining the first measurement points includes defining second measurement points on a parametric head model, adjusting the parametric head model to the 3D model of the person's head, and determining the first measurement points on the basis of the second measurement points and the adjustment. In this way, the second measurement points only have to be defined once on the parametric model so that the first measurement points can be defined for a plurality of different 3D models of different heads.

Abstract: A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.

Abstract: A medical ophthalmic system uses a patient-specific face mask to establish a predefined alignment between the ophthalmic system and an eye of a patient. The patient-specific face mask may optionally provide a light proof enclosure for the eye. The face mask may be coupled directly to an ophthalmic device, or its housing/enclosure, of the ophthalmic system. The face mask may be 3D printed based on a 3D model of the patient's face.

Abstract: The present invention relates to a method for measuring a sample with a microscope, the method comprising the steps of: measuring a tilt of the sample, correcting an orientation of the sample based on the tilt, and scanning the sample.

Abstract: The present invention refers to a method for determining an effect of one or more of pixels to be introduced into a substrate of a photolithographic mask, the photolithographic mask having one or more pattern elements, wherein the one or more pixels serve to at least partly correct one or more errors of the photolithographic mask, the method comprising: determining the effect of the one or more introduced pixels by determining a change in birefringence of the substrate of the photolithographic mask having the one or more pattern elements.

Abstract: The invention relates to an FCS method in which a sample that is to be measured and has fluorescent markers is illuminated with excitation radiation over a bleaching time in order to bleach selected fluorescent markers; and after bleaching has been carried out over at least one measurement period, FCS measurement data of the sample are acquired by illuminating the sample with excitation radiation and by detecting detection radiation brought about by the excitation radiation. The invention is characterized in that during the bleaching time, intensity values of fluorescence radiation that has been brought about by the excitation radiation which is directed at the sample for bleaching purposes are continuously or repeatedly acquired and compared with a threshold value, and the acquisition of the FCS measurement data is started when the threshold value has been reached.

Abstract: A method can be used for correcting background signals in captured measurement values of analog detectors, wherein measurement values of an object captured over a reference time period are analyzed and characteristic values of captured background signals are determined. What is characteristic of this is that a threshold value is determined on the basis of at least one characteristic value and by applying a calculation specification; the threshold value is applied to captured measurement values of an analog detector, and only those measurement values which are greater than the threshold value are used for a subsequent signal evaluation. A microscope for carrying out the method according to the invention is also provided.

Abstract: A microscopy method involves directing a focused beam of excitation radiation at an examination location of an object to be examined, to create an excitation volume in the object. An overview image is used to identify at least one structure of the object and define at least one of the identified structures as a reference structure. A spatial relationship is defined between the positions of the examination location and the reference structure. Detection radiation coming from the excitation volume is acquired as measurement values over an overall measurement duration, the overall measurement duration being subdivided into a plurality of measurement intervals. At least every second measurement interval is preceded by a comparison of the current position of the focused beam with a current position of the examination location. The positioning of the focused beam is corrected in the case of an inadmissible deviation of the current positions.

Abstract: An optical system, in particular for microlithography, includes a beam splitter, which has at least one light entry surface. The beam splitter is arranged in the optical system so that the angles of incidence with respect to the surface normal which occur at the light entry surface during operation of the optical system lie in the range of 45°±5°. The beam splitter is produced in [110] the crystal cut.

Abstract: A spectacle lens for at least one eye of a user, a method for producing a spectacle lens, and a computer program product having executable instructions for performing the method for producing the spectacle lens are disclosed. The spectacle lens has a permanent marking which is or contains a diffractive structure, wherein a diffractive pattern generated by illumination of the diffractive structure is configured to be invisible upon a first kind of illumination and configured to be visible only upon a second kind of illumination. The permanent markings on the spectacle lens are, on one hand, invisible to the user or to a spectator looking at the user wearing the spectacle lens without utilizing specially selected optical aids but, on the other hand, enables continued control of the spectacle lens in front of the eye of the user by an optician or a specifically designated optical sensor.

Abstract: A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength ? that was provided by an illumination system.

Abstract: The invention relates to a method for operating a visualization system in a surgical application, wherein a registration device of the visualization system provides a video data stream with a first image size as an output, wherein an image excerpt of the video data stream with a second image size that has been reduced in relation to the first image size is transmitted to a head-mounted visualization device via a communications link and is displayed on a display device of the visualization device, wherein a viewing direction of a user is registered by means of a sensor system, and wherein the image excerpt of the video data stream is defined on the basis of the registered viewing direction. Further, the invention relates to a visualization system.

Abstract: The invention relates to a method and device for generating an overview contrast image of a sample carrier in a microscope, which images a sample arranged on the sample carrier. The sample carrier on which the sample is located is illuminated in transmitted light from a two-dimensional illumination array, which has individually switchable single light sources and illuminates the sample volume in transmitted light, and a processing unit, which activates and reads out the camera in order to record multiple different raw overview images of the sample carrier.