Abstract: A method of manufacturing a spectacle lens having a lens substrate a lens substrate and at least one coating is disclosed. The method includes at least the following steps in the given order: providing a lens substrate having an uncoated or pre-coated front surface and an uncoated or pre-coated back surface, coating at least one surface with at least one coating, the surface of the at least one coating being modifiable when contacted with at least one medium being able to modify the surface of the coating, completely or partially contacting the surface of the coating with the at least one medium, applying at least one single electromagnetic pulse to at least one of the surfaces of the spectacle lens having the lens substrate, the coating and the medium and obtaining the spectacle lens having the at least one coating with a completely or partially modified surface.

Abstract: The present application relates to a method for removing a particle from a photolithographic mask, including the following steps: (a) positioning a manipulator, which is movable relative to the mask, in the vicinity of the particle to be removed; (b) connecting the manipulator to the particle by depositing a connecting material on the manipulator and/or the particle from the vapor phase; (c) removing the particle by moving the manipulator relative to the photolithographic mask; and (d) separating the removed particle from the manipulator by carrying out a particle-beam-induced etching process which removes at least a portion of the manipulator.

Abstract: The invention relates to a method for measuring a photomask for semiconductor lithography, including the following steps: recording an aerial image of at least one region of the photomask, defining at least one region of interest, ascertaining structure edges in at least one region of interest, providing desired structures to be produced by the photomask, adapting the ascertained structure edges to the desired structures, and displacing the adapted structure edges by means of the results of a separate registration measurement.

Abstract: A modulation device includes: a signal splitter configured to generate: i) an M-bit wide partial signal comprising M more significant bits of an N-bit wide input signal; and ii) an L-bit wide partial signal comprising L less significant bits of the N-bit wide input signal, where L=N?M; a first modulation unit configured to generate a 1-bit wide pulse density modulation signal on the basis of the L-bit wide partial signal; a summation unit configured to generate an M-bit wide summation signal on the basis of the M-bit wide partial signal and the 1-bit wide pulse density modulation signal; and a second modulation unit configured to generate a 1-bit wide pulse width modulation signal on the basis of the M-bit wide summation signal.

Abstract: A measurement apparatus (10) for interferometrically determining a surface shape of a test object (14). A radiation source provides an input wave (42), a multiply-encoded diffractive optical element (60), which is configured to produce by diffraction from the input wave a test wave (66) that is directed at the test object and has a wavefront in the form of a free-form surface and at least one calibration wave (70), and a capture device (46). The calibration wave has a wavefront with a non-rotationally symmetric shape (68f), wherein cross sections through the wavefront of the calibration wave along cross-sectional surfaces each aligned transversely to one another have a curved shape. The curved shapes in the different cross-sectional surfaces differ in terms of an opening parameter. The capture device (46) captures a calibration interferogram formed by superimposing a reference wave (40) with the calibration wave after interaction with a calibration object (74).

Abstract: A progressive spectacle lens has a front face and a rear face and a uniform substrate with a locally varying refractive index. The front face and/or the rear face of the substrate is formed as a free-form surface and carries only functional coatings, if any. The refractive index varies (a) only in a first spatial dimension and in a second spatial dimension and is constant in a third spatial dimension, a distribution of the refractive being neither point-symmetrical nor axis symmetrical, or (b) in a first spatial dimension and in a second spatial dimension and in a third spatial dimension, a distribution of the refractive index being neither point-symmetrical nor axis symmetrical, or (c) in a first spatial dimension and in a second spatial dimension and in a third spatial dimension, a distribution of the refractive index not being point-symmetrical or axis symmetrical at all.

Abstract: When detecting an object structure, at least one portion of the object is initially illuminated with illumination light of an at least partly coherent light source from at least one preferred illumination direction. At least one diffraction image of the illuminated portion is recorded by spatially resolved detection of the diffraction intensity of the illumination light, diffracted by the illuminated portion, in a detection plane. At least one portion of the object structure is reconstructed from the at least one recorded diffraction image using an iterative method. Here, the iteration diffraction image of a raw object structure is calculated starting from an iteration start value and said raw object structure is compared to the recorded diffraction image in each iteration step.

Abstract: A light beam shaping arrangement for a light microscope has a first and a second liquid crystal region or lifting micromirror region, each of which has a plurality of independently switchable liquid crystal elements or mirrors with which a phase of incident light is changeable in a settable manner, an input-/output-coupling polarization beam splitter, a polarization beam splitter arranged between the input-/output-coupling polarization beam splitter and the liquid crystal regions or lifting micromirror regions such that the polarization beam splitter separates the light coming from the input-/output-coupling polarization beam splitter in a polarization-dependent manner into a first partial beam.

Abstract: A method, a computer program product, and a system for determining an optical parameter of an optical lens as well as a related method for producing the optical lens by adjusting the optical parameter are disclosed. The method includes: capturing an image picturing the optical lens by using a camera; and determining an optical parameter of the optical lens by processing the image, wherein the camera generates a signal related to a position of a focus, and the optical parameter of the optical lens is determined by using the signal related to the position of focus. The method and the system allow determining the optical parameter of the optical lens in a direct fashion by applying the signal related to the position of the focus as generated by the camera as a measured value for the optical parameter of the optical lens.

Abstract: Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.

Abstract: The invention relates to a method for fastening an object to a manipulator in a particle beam apparatus and for moving the object in the particle beam apparatus. The invention further relates to a computer program product and a particle beam apparatus, which are provided to carry out the method according to the invention. The method according to the invention includes the following steps: generating a first surface on the manipulator using a particle beam of the particle beam apparatus; generating a second surface on the object using the particle beam, in such a way that the second surface corresponds to the first surface; arranging the first surface at the second surface such that the manipulator is arranged at the object; fastening the object to the manipulator in a boundary region between the first surface and the second surface using the particle beam; and moving the object fastened to the manipulator using the manipulator and/or a mobile object stage, on which the object is arranged.

Abstract: Imaging, processing and/or analyzing an object using a particle beam device includes guiding a first particle beam over the object, processing the object using the first particle beam or detecting first interaction particles and/or a first interaction radiation, where the first interaction particles and/or the first interaction radiation results/result from an interaction of the first particle beam with the object, controlling a second deflection device for guiding the second particle beam over the object even while the first particle beam is being guided over the object, and deflecting the first particle beam from the object. Only when the first particle beam has been deflected, the object is processed using the second particle beam or detecting second interaction particles and/or a second interaction radiation that results/result from an interaction of the second particle beam with the object.

Abstract: Fastening an object to a movable manipulator and/or an object holder in a particle beam apparatus and moving the object in the particle beam apparatus includes fastening a material unit, configured to hold an object, to the manipulator using a particle beam, fastening the object to the material unit using the particle beam, and, using the manipulator and/or an object stage, moving the object fastened to the material unit. A computer program product has program code which can be loaded into a processor and which, when executed, controls a particle beam apparatus to fasten a material unit, configured to hold an object, to the manipulator using a particle beam, fasten the object to the material unit using the particle beam, and, using the manipulator and/or an object stage, move the object fastened to the material unit.

Abstract: A lab-on-a-chip system (100) comprises an optical detection waveguide (122) that has an at least partially periodic structure (123, 501, 502, 503, 504) that is configured to couple light (152) from surroundings of the optical detection waveguide (122) into the optical detection waveguide (122). The lab-on-a-chip system (100) furthermore also comprises a microfluidic network (212), wherein the microfluidic network (212) has multiple lines and at least one reaction chamber (211, 211-1, 211-2, 211-3).

Abstract: A testing device for detecting defects of transparent test specimens, in particular of ophthalmological lenses, has an illumination device for transilluminating test specimens to be examined and with an image acquisition device for imaging the test specimen transilluminated by the illumination device. The illumination device includes a plurality of linearly adjustable light sources for generating a stripe pattern. To capture the stripe pattern, the acquisition duration of the image acquisition device can be adjusted in such a way that the light emitted by each of the light sources is detected as a light stripe. Further, the disclosure relates to a testing method for detecting a defect of a transparent specimen.

Abstract: A functionalized waveguide for a detector system includes an incoupling region of a main body that deflects only part of the radiation coming from an object to be detected and impinges on the front face such that the deflected part propagates as coupled-in radiation in the main body by reflections up to the decoupling region and impinges on the decoupling region. A decoupling region deflects at least part of the coupled-in radiation impinging thereon such that the deflected part exits the main body via the front or rear face to impinge on the detector system. The extent of the incoupling region in a second direction transverse to the first direction is greater than the extent of the decoupling region in the second direction. In the second direction, the incoupling region has at least two different diffractive incoupling structures which have a different deflection component in the second direction.

Abstract: A device and a method for determining an ocular aberration of at least one eye of a user are disclosed. The device contains a wavefront sensing unit for measuring at least one optical wavefront with at least one light beam, from which an ocular aberration of the at least one eye of the user is determined. The device further contains at least one diffractive element for generating multiple diffraction orders in the light beam in two meridians in a manner that the multiple diffraction orders are spatially separated on the wavefront sensing unit and in the eye of the user. The device and the method allow generating an ocular defocus map in a one-shot assessment in real-time, especially by employing an automated measurement of the ocular aberrations with regard to different eccentricities of the eye of the user in two meridians.

Abstract: Various methods for reducing artifacts in OCT images of an eye are described. In one exemplary method, three dimensional OCT image data of the eye is collected. Motion contrast information is calculated in the OCT image data. A first image and a second image are created from the motion contrast information. The first and the second images depict vasculature information regarding one or more upper portions and one or more deeper portions, respectively. The second image contains artifacts. Using an inverse calculation, a third image is determined that can be mixed with the first image to generate the second image. The third image depicts vasculature regarding the same one or more deeper portions as the second image but has reduced artifacts. A depth dependent correction method is also described that can be used in combination with the inverse problem based method to further reduce artifacts in OCT angiography images.

Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.

Abstract: A method for measuring a substrate for semiconductor lithography using a measuring device, wherein the measuring device comprises a recording device for capturing at least a partial region of the substrate and, wherein the distance between the substrate and an imaging optical unit of the recording device is varied while the partial region is captured by the recording device.