Patents Assigned to Carl Zeiss SMT GmbH
  • Patent number: 11415892
    Abstract: A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.
    Type: Grant
    Filed: January 12, 2021
    Date of Patent: August 16, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Matthias Kaes, Steffen Bezold, Matthias Manger, Christoph Petri, Pavel Alexeev, Walter Pauls
  • Patent number: 11415895
    Abstract: An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports at least one optical element of the imaging device via an active relative situation control device of a control device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device of the control device. The measuring device is connected to the relative situation control device. The measuring device outputs to the relative situation control device measurement information representative for the position and/or the orientation of the at least one optical element in relation to a reference in at least one degree of freedom in space.
    Type: Grant
    Filed: June 22, 2021
    Date of Patent: August 16, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Marwène Nefzi, Ralf Zweering, Toralf Gruner
  • Patent number: 11415894
    Abstract: A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: August 16, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Judith Fingerhuth, Norbert Wabra, Sonja Schneider, Ferdinand Djuric-Rissner, Peter Graf, Reimar Finken
  • Patent number: 11402760
    Abstract: An optical arrangement for a lithography apparatus has a microsystem with a mirror array. A respective mirror of the mirror array is set up to reflect working light of the lithography apparatus on its front side and also a measuring beam on its rear side. One or more radiation sources, which are provided outside the microsystem, are set up to provide the respective measuring beam. One or more sensor units are set up to sense a tilting angle of a respective mirror in dependence on the respectively reflected measuring beam.
    Type: Grant
    Filed: September 21, 2021
    Date of Patent: August 2, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jan Horn, Stefan Richter
  • Patent number: 11391643
    Abstract: The disclosed method involves: recording, under illumination of a diffractive measurement structure via an illumination device, a plurality of diffraction images which differ from one another in terms of the region of the measurement structure that contributes to the respective diffraction image, and ascertaining transmission properties and/or reflection properties of the diffractive measurement structure based on the plurality of diffraction images, wherein the steps of recording a plurality of diffraction images and of ascertaining transmission properties and/or reflection properties of the diffractive measurement structure in a plurality of recording sequences are carried out repeatedly in a plurality of recording sequences, wherein these recording sequences differ from one another with respect to the illumination angles that are respectively set during the illumination of the diffractive measurement structure and at which the diffractive measurement structure is illuminated.
    Type: Grant
    Filed: May 22, 2020
    Date of Patent: July 19, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Michael Samaniego
  • Patent number: 11385540
    Abstract: The present application relates to an apparatus for determining a position of at least one element on a photolithographic mask, said apparatus comprising: (a) at least one scanning particle microscope comprising a first reference object, wherein the first reference object is disposed on the scanning particle microscope in such a way that the scanning particle microscope can be used to determine a relative position of the at least one element on the photolithographic mask relative to the first reference object; and (b) at least one distance measuring device, which is embodied to determine a distance between the first reference object and a second reference object, wherein there is a relationship between the second reference object and the photolithographic mask.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: July 12, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Budach, Nicole Auth
  • Patent number: 11378887
    Abstract: In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation of the illuminating optical unit.
    Type: Grant
    Filed: May 10, 2021
    Date of Patent: July 5, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Markus Deguenther
  • Patent number: 11378532
    Abstract: An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: July 5, 2022
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss Microscopy, LLC
    Inventors: Brett Lewis, Wilhelm Kuehn, Deying Xia, Shawn McVey, Ulrich Mantz
  • Patent number: 11372341
    Abstract: A method for temperature control of a component that is transferable between a first system and a second system includes: ascertaining a temperature drift of a temperature of the component that is to be expected after transfer of the component from the first system into the second system; and modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system such that the temperature drift that is actually occurring after transfer of the component from the first system into the second system is reduced with respect to the expected temperature drift.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: June 28, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joeri Lof, Harmen Krediet, Timo Laufer
  • Patent number: 11372335
    Abstract: An optical arrangement for EUV lithography, including: at least one component (23) having a main body (32) with at least one surface region (30) which is exposed to activated hydrogen (H+, H*) during operation of the optical arrangement. The main body (32) contains at least one material which forms at least one volatile hydride upon contact of the surface region (30) with the activated hydrogen (H+, H*). At the surface region, noble metal ions (38) are implanted into the main body (32) in order to prevent the formation of the volatile hydride.
    Type: Grant
    Filed: September 21, 2020
    Date of Patent: June 28, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Anastasia Gonchar
  • Patent number: 11372334
    Abstract: The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: June 28, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Bauer, Ulrich Bingel, Willi Anderl
  • Patent number: 11366393
    Abstract: An optical arrangement of an imaging device for microlithography, particularly for using light in the extreme UV range, includes an optical element and a holding device for holding the optical element. The optical element includes an optical surface and defines a plane of main extension, in which the optical element defines a radial direction and a circumferential direction. The holding device includes a base element and more than three separate holding units. The holding units are connected to the base element and arranged in a manner distributed along the circumferential direction and spaced apart from one another. The holding units hold the optical element with respect to the base element. Each of the holding units establishes a clamping connection between the optical element and the base element. The clamping connection for each holding unit is separate from the clamping connections of the other holding units.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: June 21, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Eugen Anselm, Karl Fenkl, Christoph Müller, Ralf Moser
  • Patent number: 11366382
    Abstract: The present invention refers to a method for performing an aerial image simulation of a photolithographic mask which comprises the following steps: (a) modifying an optical radiation distribution at a patterned surface of the photolithographic mask, depending on at least one first arrangement of pixels to be generated in the photolithographic mask; and (b) performing the aerial image simulation of the photolithographic mask by using the generated modified optical radiation distribution.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: June 21, 2022
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd
    Inventors: Vladimir Dmitriev, Joachim Welte, Bernd Geh, Paul Graeupner, Anja Schauer
  • Patent number: 11366395
    Abstract: A mirror that has a mirror substrate (12), a reflection layer stack (21) reflecting electromagnetic radiation incident on the optical effective surface (11), and at least one piezoelectric layer (16) arranged between the mirror substrate and the reflection layer stack and to which an electric field for producing a locally variable deformation is applied by way of a first electrode arrangement and a second electrode arrangement situated on alternate sides of the piezoelectric layer. In one aspect, both the first and the second electrode arrangements have a plurality of electrodes (20a, 20b), to each of which an electrical voltage relative to the respective other electrode arrangement can be applied via leads (19a, 19b). Separate mediator layers (17a, 17b) set continuous electrical potential profiles along the respective electrode arrangement, and where said mediator layers differ from one another in their average electrical resistance by a factor of at least 1.5.
    Type: Grant
    Filed: November 8, 2020
    Date of Patent: June 21, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Kerstin Hild, Toralf Gruner, Vitaliy Shklover
  • Patent number: 11360393
    Abstract: A mirror having a mirror substrate (12, 32, 52), a reflection layer stack (21, 41, 61) reflecting electromagnetic radiation having an operating wavelength that is incident on the optical effective surface (11, 31, 51), and at least one piezoelectric layer (16, 36, 56), arranged between the substrate and the reflection layer stack and to which an electric field producing a locally variable deformation is applied. A first electrode arrangement (20, 40, 60) situated on the side of the piezoelectric layer faces the reflection layer stack, and a second electrode arrangement (14, 34, 54) is situated on the side of the piezoelectric layer facing the mirror substrate. Optionally, a bracing layer (98) is provided, which limits sinking of the piezoelectric layer (96) into the mirror substrate (92) when an electric field is applied, in comparison with an analogous construction lacking the bracing layer, thereby increasing the piezoelectric layer's effective deflection.
    Type: Grant
    Filed: February 10, 2020
    Date of Patent: June 14, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Ben Wylie-Van Eerd, Frederik Bijkerk, Kerstin Hild, Toralf Gruner, Stefan Schulte, Simone Weyler
  • Patent number: 11360293
    Abstract: A catadioptric projection lens images a pattern of a mask in an effective object field of the projection lens into an effective image field of the projection lens with electromagnetic radiation with an operating wavelength ?<260 nm. The projection lens includes a multiplicity of lens elements and a multiplicity of mirrors including at least one concave mirror. The lens elements and mirrors define a projection beam path that extends from the object plane to the image plane and contains at least one pupil plane. The mirrors include a first mirror having a first mirror surface in the projection beam path between the object and pupil planes in the optical vicinity of a first field plane optically conjugate to the object plane. The mirrors also include a second mirror having a second mirror surface in the projection beam path between the pupil and image planes in the optical vicinity of a second field plane that is optically conjugate to the first field plane.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: June 14, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Martin Rocktaeschel, Michael Grupp, Hendrik Wagner
  • Patent number: 11353478
    Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: June 7, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Gabriel Baralia, Rainer Becker, Kinga Kornilov, Christof Baur, Hans Hermann Pieper
  • Patent number: 11355311
    Abstract: The present application relates to a method and an apparatus for determining a wavefront of a massive particle beam, including the steps of: (a) recording two or more images of a reference structure using the massive particle beam under different recording conditions; (b) generating point spread functions for the two or more recorded images with a modified reference image of the reference structure; and (c) performing a phase reconstruction of the massive particle beam on the basis of the generated point spread functions and the different recording conditions, for the purposes of determining the wavefront.
    Type: Grant
    Filed: March 27, 2020
    Date of Patent: June 7, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joachim Welte, Markus Bauer
  • Patent number: 11350513
    Abstract: A stop is configured to be arranged in a constriction of an EUV illumination light beam between an EUV light source for EUV illumination light and an EUV illumination optical unit. The stop has a beam entrance section, a beam exit section and an intervening beam tube section. The entrance section has a cross section that decreases in the propagation direction of the EUV illumination light beam. The cross section of the exit section increases in the propagation direction. The cross section of the tube section is constant. An inner wall of the beam tube section is embodied as reflective for the EUV illumination light. The result is a stop that can have a defined predetermination of the illumination light beam in conjunction with a good thermal loading capacity of the stop.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: May 31, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Michael Patra
  • Patent number: 11326872
    Abstract: A method and a device for characterizing the surface shape of an optical element. In the method, in at least one interferogram measurement carried out by an interferometric test arrangement, a test wave reflected at the optical element is caused to be superimposed with a reference wave not reflected at the optical element. In this case, the figure of the optical element is determined on the basis of at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization, wherein the input polarizations for the two interferogram measurements differ from one another.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: May 10, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Steffen Siegler, Thomas Schicketanz