Patents Assigned to Carl Zeiss SMT GmbH
  • Patent number: 10928734
    Abstract: An optical assembly guides an output beam of a free electron laser to a downstream illumination-optical assembly of an EUV projection exposure apparatus. The optical assembly has first and a second GI mirrors, each with a structured reflection surface to be impinged upon by the output beam. A first angle of incidence on the first GI mirror is between one mrd and 10 mrad. A maximum first scattering angle is produced, amounting to between 50% and 100% of the first angle of incidence. A second angle of incidence on the second GI mirror is at least twice as large as the first angle of incidence. A maximum second scattering angle of the output beam amounts to between 30% and 100% of the second angle of incidence. The two planes of incidence on the two GI mirrors include an angle with respect to one another that is greater than 45°.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: February 23, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Michael Patra
  • Patent number: 10928733
    Abstract: An illumination optical unit for projection lithography illuminates an object field with illumination light along an illumination beam path. The arrangement of field facets of a field facet mirror and also of pupil facets of a pupil facet mirror is such that an illumination channel is guided over each of them. The field facet mirror images a light source image along in each case one illumination channel onto one of the pupil facets. The pupil facet mirror superimposedly images of the field facets into the object field. The illumination optical unit is designed for the settable specification of a spatial resolution of an illumination light illumination of an entrance pupil of a projection optical unit arranged downstream of the object field in the illumination light beam path. The result of this is an illumination optical unit with which illumination light can be used efficiently for high-contrast imaging of the structures to be projected.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: February 23, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Michael Patra
  • Patent number: 10928332
    Abstract: The invention relates to an inspection device for masks for semiconductor lithography, comprising an imaging device for imaging a mask, and an image recording device, wherein one or more correction bodies which exhibit a dispersive behavior for at least one subrange of the illumination radiation used for the imaging are arranged in the light path between the mask and the image recording device. The invention furthermore relates to a method for taking account of longitudinal chromatic aberrations in inspection devices for masks, comprising the following steps: recording a specific number of images having differently defocused positions, and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: February 23, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Holger Seitz, Thomas Zeuner, Heiko Feldmann
  • Publication number: 20210041793
    Abstract: A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.
    Type: Application
    Filed: February 14, 2019
    Publication date: February 11, 2021
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Maarten Hartger KIMMAN, Jasper WESSELINGH
  • Patent number: 10916356
    Abstract: For a working wavelength in the range from 1 nm to 12 nm, a reflective optical element has, on a substrate, a multilayer system that includes at least two alternating materials having a different real part of the refractive index at the working wavelength. The multilayer system includes a first alternating material from the group formed from thorium, uranium, barium, nitrides thereof, carbides thereof, borides thereof, lanthanum carbide, lanthanum nitride, lanthanum boride, and a second alternating material from the group formed from carbon, boron, boron carbide, or lanthanum as first alternating material and carbon or boron as second alternating material. It has, on the side of the multilayer system remote from the substrate, a protective layer system including a nitride, an oxide and/or a platinum metal.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: February 9, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dmitry Kuznetsov, Andrey E. Yakshin, Hartmut Enkisch, Viacheslav Medvedev, Frederik Bijkerk
  • Patent number: 10908508
    Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: February 2, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
  • Patent number: 10908509
    Abstract: A mirror, in particular for a microlithographic projection exposure apparatus, has an optical effective surface and includes a substrate (11, 61, 71, 81, 91), a reflection layer system (16, 66, 76, 86, 96) for reflecting electromagnetic radiation impinging on the optical effective surface (10a, 60a, 70a, 80a, 90a), an electrode arrangement (13, 63, 73, 83) composed of a first material having a first electrical conductivity, the electrode arrangement being provided on the substrate, and a mediator layer (12, 62, 72, 82, 92) composed of a second material having a second electrical conductivity. The ratio between the first electrical conductivity and the second electrical conductivity is at least 100. The mirror also includes at least one compensation layer (88) which at least partly compensates for the influence of a thermal expansion of the electrode arrangement (83) on the deformation of the optical effective surface (80a).
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: February 2, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Johannes Lippert, Toralf Gruner, Kerstin Hild
  • Patent number: 10901391
    Abstract: A method includes controlling a multi-scanning electron microscope, mSEM, to capture a first image of a wafer attached to a motorized handling stage while the motorized handling stage is in a first position. The first image includes at least a part of a notch of the wafer. The method also includes determining a radial axis of the wafer based on the first image, and controlling the motorized handling stage to shift the wafer along the radial axis by half a diameter of the wafer so that the motorized handling stage is in a second position. The method further includes controlling the mSEM to capture a second image of the wafer while the motorized handling stage is in the second position. The second image includes wafer structures.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: January 26, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jagdish Chandra Saraswatula, Jens Timo Neumann, Philipp Huethwohl, Thomas Korb, Raghavendra Hanumantha Nayak
  • Patent number: 10890850
    Abstract: An optical imaging arrangement includes an optical projection system, a support structure system and a control device. The optical projection system includes a group of optical elements supported by the support structure system and configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask onto a substrate. The group of optical elements includes a first optical element and a second optical element and the control device includes a sensor device and an active device. The sensor device is functionally associated to the first optical element and is configured to capture mechanical disturbance information representative of a mechanical disturbance acting on the first optical element in at least one degree of freedom up to all six degrees of freedom.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: January 12, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Hembacher, Bernhard Geuppert, Jens Kugler
  • Patent number: 10877379
    Abstract: An illumination intensity correction device can specify an illumination intensity over an illumination field of a lithographic projection exposure apparatus. The correction device has a plurality of rod-shaped individual stops arranged next to one another. A displacement drive can displace at least some of the individual stops at least along their respective rod axis. Free ends of the individual stops are individually displaceable using the displacement drive into a specified displacement position to specify an intensity correction of an illumination of the illumination field. The intensity correction acts along a correction dimension transverse with respect to the rod axes.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: December 29, 2020
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Ramon Van Gorkom, Martin Endres
  • Patent number: 10871717
    Abstract: An optical system for a microlithographic projection exposure apparatus for operation in the EUV includes a polarization-influencing arrangement having first and one second double reflection surface units, each having first and second reflection surfaces, in each case arranged directly adjacent at a distance d1 and at an angle of 0°±10° relative to one another. The first reflection surface of the first double reflection surface unit and the second reflection surface of the second double reflection surface unit are arranged directly adjacent at a distance d2 and at an angle of 0°±10° relative to one another, with d2>5*d1. Light incident on the first reflection surfaces forms an angle of 43°±10° with the first reflection surfaces. Light incident on the first reflection surface of the first double reflection surface unit is reflected toward the second reflection surface of the second double reflection surface unit.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: December 22, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Michael Patra
  • Patent number: 10866528
    Abstract: A component for a projection exposure apparatus includes a printed circuit board arranged in an encapsulated housing and having electronic component parts, and a heat conducting structure for dissipating heat from the electronic component parts to an outer side of the housing.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: December 15, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Wolfsteiner, Stefan Krone, Volker Wieczorek, Lars Berger
  • Patent number: 10859819
    Abstract: A method for changing a shape of a surface of an optical element by particle irradiation includes: modelling the problem of determining a resulting change of the surface shape of the optical element from a control variable; determining a predefinition for the control variable of the particle irradiation from a predefined desired change of a surface shape of the optical element by ascertaining an extremum of a merit function; and radiating particles onto the surface of the optical element with a locally resolved effect distribution corresponding to the determined predefinition for the control variable, for the purpose of producing local surface changes at the surface of the optical element. Ascertaining the extremum corresponds to the solution of an Euler equation. The Euler equation defines an integral operator. The eigenvalues of the integral operator are determined, and the predefinition is a linear combination of a finite number of eigenfunctions of the integral operator.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: December 8, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Walter Pauls, Christoph Petri, Sebastian Vauth, Udo Kubon
  • Patent number: 10852640
    Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: December 1, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
  • Patent number: 10852642
    Abstract: A control apparatus controls at least one manipulator for modifying a parameter of a microlithographic projection exposure apparatus by generating a target for a travel variable, which defines a modification of the parameter to be undertaken via the manipulator. The control apparatus is configured to generate the target from a state characterization of the projection exposure apparatus by optimizing a merit function. A merit function includes at least one penalty term for taking account of a limit for a property of the projection exposure apparatus as an implicit constraint and the penalty term is formulated in such a way that the function value thereof tends to “infinity” as the property approaches the limit.
    Type: Grant
    Filed: January 3, 2020
    Date of Patent: December 1, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Bjoern Butscher, Christian Wald
  • Patent number: 10852643
    Abstract: An optical system for a lithography machine includes: a main mirror element and a manipulator device for positioning and/or orienting said main mirror element. The optical system also includes an optically active surface for reflecting radiation. The optical system further includes an actuator matrix positioned between the main mirror element and the optically active surface. The actuator matrix is configured to deform the optically active surface to influence the reflective properties of the optically active surface. A gap is present between the actuator matrix and a front side of the main mirror element so that the actuator matrix is spaced apart from the main mirror element.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: December 1, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dirk Juergens, Kerstin Hild, Bernd Geh
  • Patent number: 10838306
    Abstract: A microlithographic projection exposure apparatus optical 22 system includes a first reflective surface and at least one second reflective surface, each in the optical beam path. The first reflective surface is movable for the correction of an aberration that occurs during the operation of the optical system. The optical system is configured in so that, during the travel movement of the first reflective surface, the relative position of the first reflective surface and of the second reflective surface is maintainable in a stable manner. Either the first reflective surface and the second reflective surface directly succeed one another in the optical beam path, or there are only reflective optical elements between the first reflective surface and the second reflective surface.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: November 17, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Ulrich Schoenhoff
  • Patent number: 10838307
    Abstract: An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices.
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: November 17, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Holz, Ulrich Bihr
  • Patent number: 10831114
    Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: November 10, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Björn Liebaug, Franz-Josef Stickel, Jürgen Hofmann, Dietmar Dürr
  • Patent number: 10809636
    Abstract: An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: October 20, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Bernhard Gellrich, Ralf Zweering, Charles Seviour, Michael Erath, Jens Prochnau, Marwène Nefzi, Viktor Kulitzki, Axel Lorenz, Stefan Schaff