Abstract: The invention relates to a projection lens (5) for microlithography, in particular, for immersion lithography, designed to operate at a wavelength of more than 190 nm and comprising an optical element made from quartz glass with an OH content of less than 50 ppm, in particular between 10 ppm and 50 ppm, and a water content of between 1.5×1016 and 2×1018 molecules/cm3, preferably between 2×1016 and 1×1018 molecules/cm3, in particular between 5×1016 and 2×1017 molecules/cm3. The optical element is preferably a terminal element (14) for the projection lens (5) in a microlithography projection illumination unit (1) for immersion lithography.

Abstract: Illumination devices of a microlithographic projection exposure apparatus, include a deflection device with which at least two light beams impinging on the deflection device can be variably deflected independently of one another by variation of the deflection angle in each case in such a way that each of the light beams can be directed onto at least one location in a pupil plane of the illumination device via at least two different beam paths; wherein, on the beam paths, at least one optical property of the respective light beam is influenced differently.

Abstract: The invention relates to a positioning unit for an optical element in a microlithographic projection exposure installation. Said unit comprises a first connection region (A, 22) for connecting to the optical elements, and a second connection region (B, 20) for connecting to an object in the vicinity of the optical elements. At least two levers are connected to the second connection region by means of the respective lever bearing thereof, and the respective load arm thereof is connected to the first connection region by an articulation by means of an intermediate element (31, 33, 36) applied to said articulations. Regulating devices (28, 29) or actuators are arranged on the respective power arms of the levers.

Abstract: A method of manufacturing an optical element involves an interferometric test of the optical element using an interferometer system of a Fizeau type combined with principles of white-light interferometry. The optical element is disposed in a cavity between a Fizeau surface and a mirror, and an optical path difference between a back surface of the optical element and the mirror is determined for determining parameters of the optical element, such as a thickness thereof. Measuring light from an optical delay apparatus can be supplied to the Fizeau interferometer through an optical fiber.

Abstract: An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.

Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.

Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

Abstract: A coagulation system for the coagulation of organic tissue includes a laser configured to emit a working beam; an interrupter configured to at least partially interrupt the working beam; a controller configured to activate the interrupter; and a detector configured to detect a signal corresponding to a degree of coagulation or alteration of the tissue and to transmit a detection of the signal to the controller, the detector including a dimension meter.

Abstract: A load suspension stand includes a first stand member, a second stand member, a joint pivotably connecting the first with the second stand member, a cam plate rotatably fixed to the first stand member, a load transmission lever, an abutment pivotably supporting the load transmission lever at the second stand member, a load reservoir, acting on the second stand member and on the load transmission lever in order to exert a force F1 on the cam plate by means of the load transmission lever, and a drive for displacing the abutment relative to the load transmission lever.

Abstract: The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.

Abstract: In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

Abstract: In a coordinate measuring machine or any other kind of machine having at least one translational movement axis, correction values are determined by moving the mobile head of the machine along a defined path of movement. First and second position data are recorded by means of first and second position measuring devices. The first position data originate from position measuring devices of the machine. The second position data result from a reference measurement. The correction values are determined as a function of the first and second position data. A defined number of correction values is determined for each section of the path of movement, with the defined number varying in the sections as a function of the error profile defined by the correction values.

Abstract: The present application is directed to an optical scanning system for medical applications, preferably in ophthalmology, which can be used for a large range of diagnostic and therapeutic applications. The optical scanning system comprises at least one controllable reflector which has an actuator and which is arranged in a first imaging beam path for deflecting at least one therapy beam and/or diagnosis beam over a work field in a scanning manner, a second imaging beam path for a fixation beam which is imaged on the work field in a spatially fixed manner with respect to the optical axis of the system, and a central control unit. The moving reflector is used to unify the two imaging beam paths and has dichroic characteristics so that it is transmissive for the fixation beam and reflective for the therapy beam and/or diagnosis beam(s). The second radiation source which serves to generate the fixation beam is controlled so as to be synchronized to the position of the moving reflector.

Abstract: The use of one or more wavefront modulators in the observation beam path and/or illumination beam path of a microscope provide various advantageous results. Such modulators may be adapted to change the phase and/or the amplitude of light in such a way to carry out displacement and shaping of the focus in the object space and correction of possible aberrations. The possible areas of use include confocal microscopy, laser-assisted microscopy, conventional light microscopy and analytic microscopy.

Abstract: The disclosure concerns an optical system of a microlithographic projection exposure apparatus. To permit comparatively flexible and fast influencing of intensity distribution and/or the polarization state, an optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (?m), and a manipulator for manipulation of the thickness profile of the layer portion.

Abstract: In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.

Abstract: An apparatus for material processing by laser radiation, including a laser source which emits a processing beam, and a beam path for focusing and scanning, the beam path focusing the processing beam into a processing volume and shifting the position of the focus therein. A beam splitting device generates several foci in the processing volume and the beam splitting device splits the processing beam up into a primary beam and at least one secondary beam and leaves the cross section of the beam in a pupil plane of the beam path unchanged during said division and introduces an angle of separation between the primary and secondary beams, so that these beams expand in the beam path in directions which differ by the angle of separation.

Abstract: The disclosure relates to a projection exposure system for microlithography, which includes at least one optical system that has at least one optical element with at least two aspherical surfaces essentially arranged rigidly relative to each other.

Abstract: A display unit for binocular representation of a multicolor image including a control unit triggering an imaging element such that the imaging element generates in a temporal successive manner the image to be displayed for a first beam path and a second beam path as a first image and second image, respectively. The images are generated in a pre-distorted manner, opposite of the chromatic aberration of the respective beam path, such that the chromatic aberration generated in the respective beam path is compensated when the first and second image is displayed. The display unit includes a switching module which operates in temporal synchrony with the first and second image being generated, such that a user can see the first image only via the first beam path and the second image only via the second beam path.

Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.