Abstract: The present application is directed to an optical scanning system for medical applications, preferably in ophthalmology, which can be used for a large range of diagnostic and therapeutic applications. The optical scanning system comprises at least one controllable reflector which has an actuator and which is arranged in a first imaging beam path for deflecting at least one therapy beam and/or diagnosis beam over a work field in a scanning manner, a second imaging beam path for a fixation beam which is imaged on the work field in a spatially fixed manner with respect to the optical axis of the system, and a central control unit. The moving reflector is used to unify the two imaging beam paths and has dichroic characteristics so that it is transmissive for the fixation beam and reflective for the therapy beam and/or diagnosis beam(s). The second radiation source which serves to generate the fixation beam is controlled so as to be synchronized to the position of the moving reflector.

Abstract: The use of one or more wavefront modulators in the observation beam path and/or illumination beam path of a microscope provide various advantageous results. Such modulators may be adapted to change the phase and/or the amplitude of light in such a way to carry out displacement and shaping of the focus in the object space and correction of possible aberrations. The possible areas of use include confocal microscopy, laser-assisted microscopy, conventional light microscopy and analytic microscopy.

Abstract: The disclosure concerns an optical system of a microlithographic projection exposure apparatus. To permit comparatively flexible and fast influencing of intensity distribution and/or the polarization state, an optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (?m), and a manipulator for manipulation of the thickness profile of the layer portion.

Abstract: In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.

Abstract: An apparatus for material processing by laser radiation, including a laser source which emits a processing beam, and a beam path for focusing and scanning, the beam path focusing the processing beam into a processing volume and shifting the position of the focus therein. A beam splitting device generates several foci in the processing volume and the beam splitting device splits the processing beam up into a primary beam and at least one secondary beam and leaves the cross section of the beam in a pupil plane of the beam path unchanged during said division and introduces an angle of separation between the primary and secondary beams, so that these beams expand in the beam path in directions which differ by the angle of separation.

Abstract: The disclosure relates to a projection exposure system for microlithography, which includes at least one optical system that has at least one optical element with at least two aspherical surfaces essentially arranged rigidly relative to each other.

Abstract: A display unit for binocular representation of a multicolor image including a control unit triggering an imaging element such that the imaging element generates in a temporal successive manner the image to be displayed for a first beam path and a second beam path as a first image and second image, respectively. The images are generated in a pre-distorted manner, opposite of the chromatic aberration of the respective beam path, such that the chromatic aberration generated in the respective beam path is compensated when the first and second image is displayed. The display unit includes a switching module which operates in temporal synchrony with the first and second image being generated, such that a user can see the first image only via the first beam path and the second image only via the second beam path.

Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

Abstract: For the pre-operative calculation of the power of an intraocular lens, three input parameters are needed: the axial length of the eye (AL), the refractive power of the cornea, and the distance between the front of the cornea and the back focal plane of the intraocular lens, the so-called effective lens position (ELP). The invention shows a novel approach to the determination of the ELP.

Abstract: The disclosure relates to a projection objective for imaging an object field in an object plane having a field aspect ration (x/y) of at least 1.5 into an image field in an image plane. In general, the projection objective has at least two optically effective surfaces for guiding imaging light in a beam path between the object field and the image field. The projection objective can take up an installed space having a cuboid envelope that is spanned by a length dimension and two transverse dimensions.

Abstract: Charged particle sources, systems and methods are disclosed.

Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.

Abstract: An optical element unit including an optical element and an optical element holder is disclosed. The optical element holder includes a holding element and coupling elements. The holding element holds the optical element and is made of a ceramic material. The elastic coupling elements are attached to the holding element and contact the optical element. The elastic coupling elements provide deformation decoupling between the holding element and the optical element.

Abstract: A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.

Abstract: A microscopy method is provided for generating an image of an image field passing in a predetermined depth of a sample to be examined, comprising a plurality of illumination steps, in which a part of the image field is in each case illuminated with a focused illumination beam bundle, which effects the generation of sample radiation on account of an interaction with the sample, detection steps, in which the sample radiation generated is detected, and an evaluation step, in which the image is generated on the basis of the sample radiation detected, wherein a first and second detection step are carried out during each illumination step, wherein sample radiation generated at the focus and outside the focus is detected in the first detection step and a smaller proportion of the sample radiation generated at the focus than in the first detection step and also sample radiation generated outside the focus are detected in the second detection step, and wherein the sample radiation detected in the second detection step

Abstract: The invention relates to a device for observing the ocular fundus, in particular to a fundus camera. Said device comprises a light source (1b) for the provision of illumination radiation, an illumination optical path for directing the illumination radiation onto the ocular fundus and observation optics for reproducing the illuminated ocular fundus, the observation optics comprising a module (16b), whose refractive power can be electrically adjusted.

Abstract: In a method for describing, evaluating and improving optical polarization properties of a projection objective of a microlithographic projection exposure apparatus, the Jones or Stokes vectors are firstly determined at one or more points in the exit pupil of the projection objective. These are then described at least approximately as a linear superposition of predetermined vector modes with scalar superposition coefficients. The optical polarization properties can subsequently be evaluated on the basis of the superposition coefficients.

Abstract: A method and an apparatus for making visible a mark on a spectacle lens are disclosed. An illumination light beam is directed to the spectacle lens. The illumination light beam runs through the spectacle lens and, after having run through the spectacle lens, is reflected on a reflector configured as a retroreflector, then runs again through the spectacle lens, and is finally fed to a camera as an observation light beam. The reflector is moved. Further, a measurement light beam is directed to said spectacle lens and fed to a sensor for measuring a physical property of the spectacle lens. The measurement light beam is generated by a first light source and the illumination light beam is generated by a second light source. The first and the second light sources are physically distinct units.

Abstract: A method and an apparatus for displaying a part of a brain of a patient is provided. Laser Doppler images are acquired before and after a stimulation. The laser Doppler images comprise information about a blood motion or about a perfusion at the acquired part. Then, the blood motion images acquired before and after the stimulation are compared to identify areas in the brain of the patient which are related to the stimulation. The identified areas are displayed in dependence of topography data representing a topography of the brain.

Abstract: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.