Patents Assigned to EMD Corporation
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Patent number: 8247701Abstract: This invention provides an electroconductive particle placement sheet comprising electroconductive particles and an insulating resin sheet. The thickness of the insulating resin sheet is smaller than the average particle diameter of the electroconductive particles. Electroconductive particles are protruded from the reference plane (P1) on at least one side of the insulating resin sheet. The electroconductive particle in is part protruded from the reference plane (P1) is covered with a layer formed of the same resin as in the insulating resin sheet.Type: GrantFiled: April 26, 2007Date of Patent: August 21, 2012Assignee: Asahi Kasei EMD CorporationInventors: Taketoshi Usui, Hitoshi Shimada
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Patent number: 8241436Abstract: There is provided a conductive filler with high heat resistance which can be melt-bonded under reflow heat treatment conditions for a lead-free solder and, after the bonding, does not melt under the same heat treatment conditions. The conductive filler is characterized in that, as measured by differential scanning calorimetry, it has at least one metastable metal alloy phase observed as an exothermic peak and has at least one melting point observed as an endothermic peak in each of the 210 to 240° C. range and the 300 to 450° C. range, and that the filler, upon heat treatment at 246° C., gives a bonded object which has, as measured by differential scanning calorimetry, no melting point observed as an endothermic peak in the 210 to 240° C. range or has a melting endotherm calculated from an endothermic peak area in the 210 to 240° C. range, the melting endotherm being 90% or less of the melting endotherm of the filler before bonding calculated from an endothermic peak area in the 210 to 240° C. range.Type: GrantFiled: March 29, 2006Date of Patent: August 14, 2012Assignee: Asahi Kasei EMD CorporationInventors: Norihito Tanaka, Yasuki Shimamura
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Patent number: 8169215Abstract: The present invention relates to a magnetic sensor with which magnetic characteristics are made extremely stable by consideration of an area of contact of a base layer of a magnetic substance and a semiconductor substrate. On a semiconductor substrate (111) a plurality of Hall elements (112a, 112b) are embedded so as to be coplanar to a top surface of the semiconductor substrate while being mutually spaced apart by a predetermined distance, and above the Hall elements and the semiconductor substrate, a base layer (114), having coefficient of thermal expansion differing from that of the Hall elements and partially covers a region of each Hall elements, is formed via a protective layer (113), and a magnetic flux concentrator (115), having an area larger than the base layer and with magnetic amplification, is formed on the base layer. An area of contact of the base layer of the magnetic substance and the semiconductor substrate is made small to lessen the generation of an offset voltage.Type: GrantFiled: March 28, 2007Date of Patent: May 1, 2012Assignee: Asahi Kasei EMD CorporationInventors: Makoto Kataoka, Katsumi Kakuta, Yo Yamagata, Yuichi Kanayama
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Patent number: 8150657Abstract: The present invention relates to a physical quantity measuring instrument and signal processing method thereof capable of reducing noise components and improving reliability without increasing size or cost of the circuit. A physical quantity detecting unit (11) has signal detecting components for detecting a plurality of signals based on a desired physical quantity and detects the desired physical quantity. A signal processing unit (12) executes signal processing of the signals detected on the individual detecting axes by the physical quantity detecting unit (11) for linearly combining the signals in different combinations with time. An arithmetic processing unit (13) combines and calculates a plurality of signals based on the physical quantity associated with the physical quantity detecting unit (11) from the signal data output by the signal processing unit (12).Type: GrantFiled: September 12, 2007Date of Patent: April 3, 2012Assignee: Asahi Kasei EMD CorporationInventors: Masaya Yamashita, Toru Kitamura, Munehiro Kitaura
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Patent number: 8143343Abstract: A microphase-separated structure comprising a block copolymer, which contains at least a block chain A consisting of a monomer A as a repeating unit and a block chain B consisting of a monomer B as a repeating unit, and a solvent, wherein the solvent has a temperature zone 1 where the block chain A and the block chain B are soluble and a temperature zone 2 where the block chain A is insoluble but the block chain B is soluble, and a structural period thereof varies by changing temperature between the temperature zone 1 and the temperature zone 2.Type: GrantFiled: August 30, 2007Date of Patent: March 27, 2012Assignees: Nagoya Instiute of Technology, Japan Aerospace Exploration Agency, Hamamatsu Photonics K.K., Asahi Kasei EMD CorporationInventors: Shigeru Okamoto, Katsuhiro Yamamoto, Tatsuhiro Iwama, Mayu Okada, Shigeo Hara, Yoshihiro Takiguchi, Masahiro Mouri, Katsushi Watanabe
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Publication number: 20120031562Abstract: The present invention provides a plasma processing device capable of inducing a strong radio-frequency electric field within a vacuum container while preventing sputtering of the antenna conductor, an increase in the temperature of the antenna conductor and the formation of particles. A plasma processing device according to the present invention includes a vacuum container, a radio-frequency antenna placed between an inner surface and an outer surface of a wall of the vacuum container, and a dielectric separating member for separating the radio-frequency antenna from an internal space of the vacuum container. As compared to a device using an external antenna, the present device can induce a stronger magnetic field in the vacuum container. The separating member has the effects of preventing the radio-frequency antenna from undergoing sputtering by the plasma produced in the vacuum container, suppressing an increase in the temperature of the radio-frequency antenna, and preventing the formation of particles.Type: ApplicationFiled: March 10, 2010Publication date: February 9, 2012Applicant: EMD CORPORATIONInventors: Yuichi Setsuhara, Akinori Ebe
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Publication number: 20120031563Abstract: An inductively coupled plasma processing device using a radio-frequency electric discharge, including: a vacuum container; an antenna-placing section provided between an inner surface and an outer surface of a wall of the vacuum container; a radio-frequency antenna placed in the antenna-placing section, the radio-frequency antenna being terminated without completing one turn; and a dielectric separating member separating the antenna-placing section and an internal space of the vacuum container, wherein the radio-frequency antenna has a length equal to or shorter than one quarter of a wavelength of the radio-frequency waves.Type: ApplicationFiled: March 10, 2010Publication date: February 9, 2012Applicants: TOKYO ELECTRON LIMITED, EMD CORPORATIONInventors: Yuichi Setsuhara, Eiichi Nishimura, Akinori Ebe
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Patent number: 8084083Abstract: A method for manufacturing an anisotropic conductive adhesive sheet is disclosed. The sheet comprises at least a curing agent, a curable insulating resin, and conductive particles. The method comprises providing an adhesive layer on a biaxially stretchable film to form a laminate, densely packing conductive particles having an average particle size of 1 to 8 ?m on the laminate to form a conductive particle-attached film, biaxially stretching and holding the conductive particle-attached film so that the average particle distance between adjacent conductive particles is at least one to five times or less the average particle size of the conductive particles and not greater than 20 ?m. The conductive particles are transferred to an adhesive sheet containing at least a curing agent and a curable insulating resin and having a thickness of at least 1.5 times the average particle distance between the conductive particles but not greater than 40 ?m.Type: GrantFiled: January 18, 2011Date of Patent: December 27, 2011Assignee: Asahi Kasei EMD CorporationInventors: Akira Otani, Koya Matsuura
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Patent number: 8085035Abstract: A Hall element is provided which has a high sensitivity and contributes to an improvement in S/N ratio per current by using a low-concentration n-well within a suitable range. The Hall element includes a p-type semiconductor substrate layer of p-type silicon, and an n-type impurity region located in a surface of the p-type semiconductor substrate layer, the n-type impurity region functioning as a magnetic sensing part. A p-type impurity region is located in a surface of the n-type impurity region, and n-type regions are located laterally of the p-type impurity region. A p-type substrate region having a resistivity equal to that of the p-type semiconductor substrate layer is located to extend around the n-type impurity region. An impurity concentration N in the n-type impurity region functioning as the magnetic sensing part is preferably from 1×1016 to 3×1016(atoms/cm3) and a distribution depth of the impurity concentration is preferably from 3.0 ?m to 5.0 ?m.Type: GrantFiled: March 30, 2007Date of Patent: December 27, 2011Assignee: Asahi Kasei EMD CorporationInventors: Takayuki Namai, Katsumi Kakuta
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Patent number: 8054291Abstract: A pointing device is provided which can reduce its size and height, reduce leakage magnetic flux density to the outside. Magnetic sensors are disposed symmetrically two by two on X and Y axes on a printed circuit board. A silicone resin is placed on the printed circuit board, and an internally and externally unipolarly magnetized ring-like magnet is placed near the center of the magnetic sensors. The printed circuit board and silicone resin are not bonded. The silicone resin is easily deformed by applying external force, and returns to its initial state without the external force as soon as the external force is removed. The ring-like magnet is configured to move approximately in parallel to the surface of the printed circuit board. The variations in the ambient magnetic flux density produced by the movement of the ring-like magnet are detected by the magnetic sensors.Type: GrantFiled: January 16, 2004Date of Patent: November 8, 2011Assignee: Asahi Kasei EMD CorporationInventor: Toshinori Takatsuka
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Patent number: 8027803Abstract: The present invention relates to a traveling direction measuring apparatus usable as a pedestrian navigation system in locations where it is difficult to obtain high positioning accuracy such as inside buildings or around multistory buildings where a GPS cannot be used. An acceleration detecting section (1) detects 3-axes acceleration of the traveling direction measuring apparatus, which varies with the walking of the pedestrian. An acceleration data acquiring section (2) obtains 3-axes acceleration data repeatedly by the number of prescribed times or more, said 3-axes acceleration data varies with the walking of the pedestrian. A first gravity acceleration calculating section (3) calculates, when the pedestrian is walking with holding the traveling direction measuring apparatus in a generally fixed attitude, gravity acceleration by averaging acceleration data sets during several steps obtained by the acceleration data acquiring section (2).Type: GrantFiled: February 26, 2010Date of Patent: September 27, 2011Assignee: Asahi Kasei EMD CorporationInventors: Toru Kitamura, Masaya Yamashita
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Publication number: 20110203922Abstract: A thin-film forming sputtering system capable of a sputtering process at a high rate. A thin-film forming sputtering system includes: a vacuum container; a target holder located inside the vacuum container; a target holder located inside the vacuum container; a substrate holder opposed to the target holder; a power source for applying a voltage between the target holder and the substrate holder: a magnetron-sputtering magnet provided behind the target holder, for generating a magnetic field having a component parallel to a target; and radio-frequency antennae for generating radio-frequency inductively-coupled plasma within a space in the vicinity of the target where the magnetic field generated by the magnetron sputtering magnet has a strength equal to or higher than a predetermined level.Type: ApplicationFiled: August 25, 2009Publication date: August 25, 2011Applicant: EMD CorporationInventors: Yuichi Setsuhara, Akinori Ebe, Jeong Han
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Patent number: 7988835Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.Type: GrantFiled: September 12, 2006Date of Patent: August 2, 2011Assignees: Nissin Electric Co., Ltd., EMD CorporationInventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata, Yuichi Setsuhara
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Patent number: 7948412Abstract: The present invention provides a continuous-time delta-sigma modulator which is configured with an SC (SCR) feedback DA (103) for improving tolerance to jitter for a clock signal and operates stably by maintaining a certain feedback amount without being influenced by a change in a production process thereof or an operating temperature condition thereof. By adjusting a reference voltage Vref that determines an output voltage of the SC feedback DA (103), it is possible to feed back a certain amount of charge from the SC feedback DA (103) to a loop filter (101). Thereby, operation of the delta-sigma modulator is stabilized.Type: GrantFiled: August 21, 2007Date of Patent: May 24, 2011Assignee: Asahi Kasei EMD CorporationInventor: Yusuke Aiba
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Publication number: 20110115380Abstract: A flange, which forms a portion of a vacuum container, has a rectangular opening surrounded by an insulating frame. A plate-shaped radio-frequency antenna conductor 13 is provided so as to cover the opening, with the insulating frame clamped thereby. In this structure, a radio-frequency power source is connected via a matching box to one end along the length of the radio-frequency antenna conductor, the other end is connected to ground, and electric power is supplied so that a radio-frequency current flows from one end of the radio-frequency antenna conductor to the other. By this method, the impedance of the radio-frequency antenna conductor can be lowered, and high-density plasma with a low electron temperature can be efficiently generated.Type: ApplicationFiled: May 21, 2009Publication date: May 19, 2011Applicants: EMD CORPORATIONInventors: Akinori Ebe, Yasunori Ando, Masanori Watanabe
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Publication number: 20110114256Abstract: An anisotropic conductive adhesive sheet comprising at least a curing agent, a curable insulating resin and conductive particles, wherein in a region extending from a one-side surface of the anisotropic conductive adhesive sheet along the thickness direction to a position of not greater than 2.0 times the average diameter of the conductive particles, 90% or more of the sum of conductive particles are present, the 90% or more of the sum of conductive particles being present without contact with other conductive particles, and wherein the average diameter of conductive particles is in the range of 1 to 8 ?m, the average particle distance between adjacent conductive particles being in the range of 1 to 5 times the average particle diameter and not greater than 20 ?m, and wherein the thickness of the anisotropic conductive adhesive sheet is at least 1.5 times the average particle distance but not greater than 40 ?m.Type: ApplicationFiled: January 18, 2011Publication date: May 19, 2011Applicant: ASAHI KASEI EMD CORPORATIONInventors: Akira OTANI, Koya MATSUURA
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Publication number: 20110080094Abstract: The present invention aims at providing a radio-frequency antenna unit capable of generating a high-density discharge plasma in a vacuum chamber. The radio-frequency antenna unit according to the present invention includes: a radio-frequency antenna through which a radio-frequency electric current can flow; a protective tube made of an insulator provided around the portion of the radio-frequency antenna that is in the vacuum chamber; and a buffer area provided between the radio-frequency antenna and the protective tube. The “buffer area” refers to an area where an acceleration of electrons is suppressed, and it can be formed, for example, with a vacuum or an insulator. Such a configuration can suppress an occurrence of an electric discharge between the antenna and the protective tube, enabling the generation of a high-density discharge plasma in the vacuum chamber.Type: ApplicationFiled: March 3, 2009Publication date: April 7, 2011Applicant: EMD CORPORATIONInventors: Yuichi Setsuhara, Akinori Ebe
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Patent number: 7898240Abstract: The present invention provides a current measuring apparatus having an improved structure to inhibit the possible adverse effect of a current in a different phase and the possible generation of an induced electromotive force caused by a measurement target current, enabling the measurement target current to be accurately detected even with the small size of the apparatus.Type: GrantFiled: February 23, 2006Date of Patent: March 1, 2011Assignee: Asahi Kasei EMD CorporationInventors: Koji Shibahara, Osamu Matsumoto
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Patent number: 7880392Abstract: Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.Type: GrantFiled: October 26, 2006Date of Patent: February 1, 2011Assignees: Nissin Electric Co., Ltd., EMD CorporationInventors: Kenji Kato, Hiroshige Deguchi, Hitoshi Yoneda, Kiyoshi Kubota, Akinori Ebe, Yuichi Setsuhara
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Patent number: 7881900Abstract: A reference point defined on a two dimensional or three dimensional orthogonal coordinate space and scale reference of respective axes are estimated based on a distribution on the three dimensional orthogonal coordinate space at the time when respective axial components of an acceleration data group comprised of plural acceleration data including multi-axial components and a importance group pertaining to the acceleration data group, and the respective acceleration data are corrected based on the estimated reference point and scale reference of the respective axes.Type: GrantFiled: December 27, 2006Date of Patent: February 1, 2011Assignee: Asahi Kasei Emd CorporationInventors: Toru Kitamura, Masaya Yamashita