Patents Assigned to Entegris, Inc.
  • Alloys of Co to reduce stress
    Patent number: 10793947
    Abstract: A deposited cobalt composition is described, including cobalt and one or more alloy component that is effective in combination with cobalt to enhance adhesion to a substrate when exposed on the substrate to variable temperature and/or delaminative force conditions, as compared to corresponding elemental cobalt, wherein the one or more alloy component is selected from the group consisting of boron, phosphorous, tin, antimony, indium, and gold. Such deposited cobalt composition may be employed for metallization in semiconductor devices and device precursor structures, flat-panel displays, and solar panels, and provides highly adherent metallization when the metallized substrate is subjected to thermal cycling and/or chemical mechanical planarization operations in the manufacturing of the semiconductor, flat-panel display, or solar panel product.
    Type: Grant
    Filed: August 10, 2017
    Date of Patent: October 6, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Philip S. H. Chen, Bryan C. Hendrix, Thomas H. Baum
  • Nodule ratios for targeted enhanced cleaning performance
    Patent number: 10790167
    Abstract: A foam brush that has nodules on an outer diameter surface of the brush that have a pitch to diameter ratio (P/D) of between 1.2 and 1.5 and a nodule height to nodule diameter ratio of 0.2 to 0.5 can be used to achieve improved small particle and organic residue removal from substrates following CMP processing. CMP cleaning brushes of the disclosure may also be prepared with foams that are relatively soft and have a compression strength of less than 90 grams/cm2. CMP cleaning brushes with such P/D and H/D ratios, and optionally a compression strength of less than 90 grams/cm2 can be used in a variety of CMP cleaning processes including post copper CMP processes.
    Type: Grant
    Filed: February 20, 2015
    Date of Patent: September 29, 2020
    Assignee: ENTEGRIS, INC.
    Inventor: Chintan Patel
  • High purity gas purifier
    Patent number: 10786776
    Abstract: High-purity gas purifiers for purification of corrosive gases, such as halogen gases or halide gases, and noncorrosive gases, such as hydrogen and inert gases, methods of making and methods of using the gas purifiers, are described. The gas purifier includes a housing made of nickel or stainless steel. Within the housing, the gas purifier includes a purifier resin, including a modifi-er coated onto a substrate. The gas purifier further includes porous nickel membranes located at the inlets and outlets of the device. The inlets and outlets are capable of fluid communication with external fixtures.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: September 29, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Stenio da Costa Pereira, Peter K. Shogren, Rocky D. Gipson
  • Post-etch residue removal for advanced node beol processing
    Patent number: 10790187
    Abstract: The disclosure relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing material, e.g., aluminum oxide, in the production of semiconductors that utilize an aluminum-containing etch stop layer. The compositions have a high selectivity for post-etch residue and aluminum-containing materials relative to low-k dielectric materials, cobalt-containing materials and other metals on the microelectronic device.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: September 29, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Emanuel I. Cooper, Makonnen Payne, WonLae Kim, Eric Hong, Sheng-Hung Tu, Chieh Ju Wang, Chia-Jung Hsu
  • Substrate container with improved substrate retainer and door latch assist mechanism
    Patent number: 10784135
    Abstract: A substrate container with a substrate retainer mounted to a biased actuation linkage, and a door assembly with latch assist. Various configurations for biasing the substrate retainer in a substrate non-engagement position are disclosed. The biasing helps prevent the substrate retainer from hanging up due to friction that might otherwise counter the gravitational force that is otherwise relied upon for disengagement. The assembly may also include retention clips that positively secure the substrate retainer to the actuation linkage. The latch assist provides springs that deliver stored energy to assist in latching and unlatching the door assembly from the substrate carrier. The latch assist further provides off-center forces that bias the latching mechanism in either an unlatched or a fully latched configuration.
    Type: Grant
    Filed: September 12, 2016
    Date of Patent: September 22, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Anthony Mathius Tieben, Christopher Strickhouser
  • Wafer contact surface protrusion profile with improved particle performance
    Patent number: 10770330
    Abstract: An electrostatic chuck with a generally non-arcuate top surface shaped protrusions that has edge surfaces similar to a portion of a ellipse. The structure of the protrusions leads to the reduction of particulate material generated by interaction between the supported substrate and chuck. Reduced levels of scratching, abrasion, wear and particulate generation are achieved by improved smoothing and flattening of the protrusion surface.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: September 8, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John Michael Glasko, I-Kuan Lin, Carlo Waldfried
  • Wafer container with external passive getter module
    Patent number: 10734264
    Abstract: A semiconductor wafer container assembly includes a container defining an exterior and defining an interior having a wafer storage area adapted to support one or more semiconductor wafers. The container also defines an opening in the container between the exterior and the interior. The container has a door and a latching mechanism to sealingly secure the door closed, and the door is openable for access to the wafer storage area. A passive getter module is removably secured with respect to the exterior of the container by substantially rigid connection structure that is a part of or extends from substantially rigid getter module housing. Getter material is disposed within the housing to decrease concentration of contaminants within the wafer storage area of the container via the access opening and the opening in the container.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: August 4, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Jeffrey J. King, Matthew A. Fuller, John Burns, Martin Forbes
  • Vacuum chuck with polymeric embossments
    Patent number: 10734270
    Abstract: A vacuum chuck with polymeric embossments is disclosed. The polymeric embossments are formed on the surface of a base substrate and are lapped to a flatness such that a wafer substrate clamped by the vacuum chuck has a peak to valley flatness that is less than a peak to valley flatness across the base substrate. Lapping of the polymeric embossments accommodates for variations in the flatness of the base substrate so long as the embossments are tall enough to stand over the peak to valley height variations in the base substrate.
    Type: Grant
    Filed: February 11, 2014
    Date of Patent: August 4, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John Glasko, Richard A. Cooke, I-Kuan Lin
  • Post chemical mechanical polishing formulations and method of use
    Patent number: 10731109
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material. In addition, the cleaning compositions are compatible with ruthenium-containing materials.
    Type: Grant
    Filed: April 11, 2018
    Date of Patent: August 4, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Donald Frye, Jun Liu, Daniela White, Michael White
  • Wafer container with latching mechanism for large diameter wafers
    Patent number: 10723525
    Abstract: A wafer container with a latch mechanism that provides sealing for large wafer containers, such as for 450 mm wafers, accomplishes secure door closing and latching with reduced torque requirements for rotating the central rotatable cam plate. In various embodiments, a camming slot formed in the rotatable cammed plate is arcuate and defined by opposing cam surfaces which are selectively engaged by a cam follower, such as a roller, attached to a proximal end of a latch arm. The roller can include unitary axle portions that snap into the proximal end of the latch arm and is supported at both axial ends of the roller. The proximal end of the latch arm can include parallel extensions separated by a gap, and have guide in surfaces to deflect the extensions as the axle portions of the roller are forced into position thereby seating the roller at both axial ends.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: July 28, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Barry Gregerson, Matthew A. Fuller
  • Carbon electrode and lithium ion hybrid capacitor comprising same
    Patent number: 10707488
    Abstract: A carbon material is described, having utility for fabricating an electrode of an electrochemical energy device, wherein the carbon material includes a particulate carbon having a particle size d50 in a range of from 1 to 15 ?m, a bulk density in a range of from 0.3 g/cc to 1.2 g/cc, a surface area as measured by nitrogen BET surface area determination at 25° C. that does not exceed 10 m2/g, and an impurity content of less than 3000 ppm by weight, based on weight of the carbon material. Such carbon material may be utilized in amorphous or graphitic form in an electrode of an electrochemical energy device, such as a negative electrode of a lithium-ion battery or a lithium-ion hybrid capacitor.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: July 7, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Troy Scoggins, Mackenzie King, Rex Gerald Sheppard
  • Liquid dispensing systems with gas removal and sensing capabilities
    Patent number: 10676341
    Abstract: A dispensing assembly for a pressure dispense package includes a connector having separate and distinct liquid and extraction conduits, and having a pressurization gas conduit. A liner fitment adapter may include a longitudinal bore to receive a probe portion of a connector defining a liquid extraction conduit, and may include a lateral bore to enable removal of gas. Insertion of a connector into a dispensing assembly simultaneously makes fluidic connections between (a) a gas extraction conduit and a dispensing volume; (b) a liquid extraction conduit and the dispensing volume, and (c) a pressurization gas conduit and a space to be pressurized within a pressure dispense vessel.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: June 9, 2020
    Assignee: Entegris, Inc.
    Inventors: Glenn M. Tom, Joseph Patrick Menning, Matthew Kusz, Amy Koland, Donald D. Ware, Richard D. Chism
  • Internal purge diffuser with offset manifold
    Patent number: 10672637
    Abstract: A purge tower assembly for a substrate container. The assembly may include a purge interface body, including a base portion and a top portion, for mounting to a bottom plate of a substrate container. The base portion may include a substantially tubular base sidewall and the top portion may have a top sidewall positioned on the top edge of the base portion. The top portion may include an inlet nozzle for mounting through a rearward inlet in the bottom plate. The inlet nozzle may have a substantially tubular sidewall extending upwardly from the top sidewall and defining an interior of the inlet nozzle. The base portion and the top sidewall may define an offset conduit portion disposed connected to the base portion and the inlet nozzle, the base portion and the inlet nozzle in fluid communication via the offset conduit portion.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: June 2, 2020
    Assignee: Entegris, Inc.
    Inventors: Kyle Glavan, Jeffery J. King, Matthew Fuller
  • Depth filtration media with multiple organic and/or inorganic materials
    Patent number: 10668411
    Abstract: A method of making depth filtration media, such as for use in a depth filter, are described. The resulting depth filtration media includes a core tube having two or more different layers. The layers can be fibers, such as polymeric or inorganic fibers, wrapped layers of a filter material, or pleated and folded layers of a filter material.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: June 2, 2020
    Assignee: Entegris, Inc.
    Inventors: Henry Wang, Dean Tsou, Yi Wei Lu, Bob Shie
  • Compositions and methods for etching silicon nitride-containing substrates
    Patent number: 10651045
    Abstract: Described are compositions and methods useful for wet-etching a microelectronic device substrate that includes silicon nitride; the compositions including phosphoric acid, hexafluorosilicic acid, and an amino alkoxy silane, and optionally one or more additional optional ingredients; a wet etching method of a substrate that includes silicon nitride and silicon oxide, that uses a composition as described, can achieve useful or improved silicon nitride etch rate, useful or improved silicon nitride selectivity, a combination of these, and optionally a reduction in particles present at a substrate surface after etching.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: May 12, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Emanuel Cooper, Steven Bilodeau, Wen-Haw Dai, Min-Chieh Yang, Sheng-Hung Tu, Hsing-Chen Wu, Sean Kim, SeongJin Hong
  • Diaphragm valve with total valve cavity evacuation
    Patent number: 10648587
    Abstract: A fluid valve incorporates a plunger with a fluid channel. The plunger is connected to a boss coupled to a diaphragm, this boss also includes a fluid channel and the plunger and boss fluid channels are in fluid communication. The boss fluid channel opens to the backside of the diaphragm in the valve cavity and permits substantially complete pressurization or evacuation of the volume behind the diaphragm in the valve. The substantially complete pressurization of the volume behind the diaphragm enables full closure of the diaphragm and improves contact of the diaphragm with the valve seat thereby improving performance of the valve.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: May 12, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Iraj Gashgaee, George Gonnella, Bruce Garber
  • Aminoiodosilanes and methods of synthesizing these aminoiodosilanes
    Patent number: 10640523
    Abstract: Methods of synthesizing aminoiodosilanes are disclosed. The reaction to produce the disclosed aminoiodosilanes is represented by the formula: SiI4+z(NH2R1)=SiIy(NHR1)z, wherein R1 is selected from a C1-C10 alkyl or cycloalkyl, aryl, or a hetero group; y=1 to 3; and z=4?y.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: May 5, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Thomas H. Baum, Manish Khandelwal, David Kuiper
  • Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation
    Patent number: 10622192
    Abstract: A gas supply assembly is described for delivery of gas to a plasma flood gun which includes an inert gas and a fluorine-containing gas, wherein the assembly is configured to deliver a volume of the fluorine-containing gas to the flood gun that is not greater than 10% of a total volume of the fluorine-containing and inert gasses. The fluorine-containing gas can generate volatile reaction product gases from material deposits in the plasma flood gun, and to effect re-metallization of a plasma generation filament in the plasma flood gun. In combination with the gas amounts, the assembly and methods can use gas flow rates to optimize the cleaning effect and reduce filament material loss from the plasma flood gun during use.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: April 14, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Sharad N. Yedave, Ying Tang, Joseph R. Despres, Joseph D. Sweeney
  • Substrate container with window retention spring
    Patent number: 10593577
    Abstract: A reticle container for containing a reticle including a base plate having one or more windows. Each of the windows can include mounting recess having a recess sidewall including an undercut defined therein. A transparent substrate can be disposed in the mounting recess and is retained therein by a retention member having an arcuate portion extending between a first end portion and a second end portion. At least the first end portion of the retention member can be positioned in the undercut defined in the recess sidewall such that the arcuate portion of the retention member contacts the transparent substrate to retain the transparent substrate in the mounting recess.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: March 17, 2020
    Assignee: Entegris, Inc.
    Inventors: Russ V. Raschke, Jason T. Steffens
  • Anti-rotation device for hydraulic connectors
    Patent number: 10584813
    Abstract: An anti-rotation device for preventing a hydraulic connector assembly from leaking. Various embodiments of the anti-rotation device provide a mechanism whereby threadably engaged connectors, such as compression fittings, are permitted to rotate only a fraction of a turn after loosening. For many applications, the limited degree of loosening is sufficient to prevent the onset of leaking. Structurally, the anti-rotation device can include a band that is secured to a female nut of a hydraulic connector. Protrusions extend laterally from the band and engage with a stop tab on the male body of the hydraulic connector assembly, thereby limiting rotation of the female nut that would otherwise cause leaks. Locking provided by zip tie structures proximate the free ends of the anti-rotation device.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: March 10, 2020
    Assignee: Entegris, Inc.
    Inventors: John A. Leys, Michael Schleicher, Jeffrey J. McKenzie