Patents Assigned to Entegris, Inc.
  • Wafer contact surface protrusion profile with improved particle performance
    Patent number: 10770330
    Abstract: An electrostatic chuck with a generally non-arcuate top surface shaped protrusions that has edge surfaces similar to a portion of a ellipse. The structure of the protrusions leads to the reduction of particulate material generated by interaction between the supported substrate and chuck. Reduced levels of scratching, abrasion, wear and particulate generation are achieved by improved smoothing and flattening of the protrusion surface.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: September 8, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John Michael Glasko, I-Kuan Lin, Carlo Waldfried
  • Post chemical mechanical polishing formulations and method of use
    Patent number: 10731109
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material. In addition, the cleaning compositions are compatible with ruthenium-containing materials.
    Type: Grant
    Filed: April 11, 2018
    Date of Patent: August 4, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Donald Frye, Jun Liu, Daniela White, Michael White
  • Vacuum chuck with polymeric embossments
    Patent number: 10734270
    Abstract: A vacuum chuck with polymeric embossments is disclosed. The polymeric embossments are formed on the surface of a base substrate and are lapped to a flatness such that a wafer substrate clamped by the vacuum chuck has a peak to valley flatness that is less than a peak to valley flatness across the base substrate. Lapping of the polymeric embossments accommodates for variations in the flatness of the base substrate so long as the embossments are tall enough to stand over the peak to valley height variations in the base substrate.
    Type: Grant
    Filed: February 11, 2014
    Date of Patent: August 4, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John Glasko, Richard A. Cooke, I-Kuan Lin
  • Wafer container with external passive getter module
    Patent number: 10734264
    Abstract: A semiconductor wafer container assembly includes a container defining an exterior and defining an interior having a wafer storage area adapted to support one or more semiconductor wafers. The container also defines an opening in the container between the exterior and the interior. The container has a door and a latching mechanism to sealingly secure the door closed, and the door is openable for access to the wafer storage area. A passive getter module is removably secured with respect to the exterior of the container by substantially rigid connection structure that is a part of or extends from substantially rigid getter module housing. Getter material is disposed within the housing to decrease concentration of contaminants within the wafer storage area of the container via the access opening and the opening in the container.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: August 4, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Jeffrey J. King, Matthew A. Fuller, John Burns, Martin Forbes
  • Wafer container with latching mechanism for large diameter wafers
    Patent number: 10723525
    Abstract: A wafer container with a latch mechanism that provides sealing for large wafer containers, such as for 450 mm wafers, accomplishes secure door closing and latching with reduced torque requirements for rotating the central rotatable cam plate. In various embodiments, a camming slot formed in the rotatable cammed plate is arcuate and defined by opposing cam surfaces which are selectively engaged by a cam follower, such as a roller, attached to a proximal end of a latch arm. The roller can include unitary axle portions that snap into the proximal end of the latch arm and is supported at both axial ends of the roller. The proximal end of the latch arm can include parallel extensions separated by a gap, and have guide in surfaces to deflect the extensions as the axle portions of the roller are forced into position thereby seating the roller at both axial ends.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: July 28, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Barry Gregerson, Matthew A. Fuller
  • Carbon electrode and lithium ion hybrid capacitor comprising same
    Patent number: 10707488
    Abstract: A carbon material is described, having utility for fabricating an electrode of an electrochemical energy device, wherein the carbon material includes a particulate carbon having a particle size d50 in a range of from 1 to 15 ?m, a bulk density in a range of from 0.3 g/cc to 1.2 g/cc, a surface area as measured by nitrogen BET surface area determination at 25° C. that does not exceed 10 m2/g, and an impurity content of less than 3000 ppm by weight, based on weight of the carbon material. Such carbon material may be utilized in amorphous or graphitic form in an electrode of an electrochemical energy device, such as a negative electrode of a lithium-ion battery or a lithium-ion hybrid capacitor.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: July 7, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Troy Scoggins, Mackenzie King, Rex Gerald Sheppard
  • Liquid dispensing systems with gas removal and sensing capabilities
    Patent number: 10676341
    Abstract: A dispensing assembly for a pressure dispense package includes a connector having separate and distinct liquid and extraction conduits, and having a pressurization gas conduit. A liner fitment adapter may include a longitudinal bore to receive a probe portion of a connector defining a liquid extraction conduit, and may include a lateral bore to enable removal of gas. Insertion of a connector into a dispensing assembly simultaneously makes fluidic connections between (a) a gas extraction conduit and a dispensing volume; (b) a liquid extraction conduit and the dispensing volume, and (c) a pressurization gas conduit and a space to be pressurized within a pressure dispense vessel.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: June 9, 2020
    Assignee: Entegris, Inc.
    Inventors: Glenn M. Tom, Joseph Patrick Menning, Matthew Kusz, Amy Koland, Donald D. Ware, Richard D. Chism
  • Internal purge diffuser with offset manifold
    Patent number: 10672637
    Abstract: A purge tower assembly for a substrate container. The assembly may include a purge interface body, including a base portion and a top portion, for mounting to a bottom plate of a substrate container. The base portion may include a substantially tubular base sidewall and the top portion may have a top sidewall positioned on the top edge of the base portion. The top portion may include an inlet nozzle for mounting through a rearward inlet in the bottom plate. The inlet nozzle may have a substantially tubular sidewall extending upwardly from the top sidewall and defining an interior of the inlet nozzle. The base portion and the top sidewall may define an offset conduit portion disposed connected to the base portion and the inlet nozzle, the base portion and the inlet nozzle in fluid communication via the offset conduit portion.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: June 2, 2020
    Assignee: Entegris, Inc.
    Inventors: Kyle Glavan, Jeffery J. King, Matthew Fuller
  • Depth filtration media with multiple organic and/or inorganic materials
    Patent number: 10668411
    Abstract: A method of making depth filtration media, such as for use in a depth filter, are described. The resulting depth filtration media includes a core tube having two or more different layers. The layers can be fibers, such as polymeric or inorganic fibers, wrapped layers of a filter material, or pleated and folded layers of a filter material.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: June 2, 2020
    Assignee: Entegris, Inc.
    Inventors: Henry Wang, Dean Tsou, Yi Wei Lu, Bob Shie
  • Diaphragm valve with total valve cavity evacuation
    Patent number: 10648587
    Abstract: A fluid valve incorporates a plunger with a fluid channel. The plunger is connected to a boss coupled to a diaphragm, this boss also includes a fluid channel and the plunger and boss fluid channels are in fluid communication. The boss fluid channel opens to the backside of the diaphragm in the valve cavity and permits substantially complete pressurization or evacuation of the volume behind the diaphragm in the valve. The substantially complete pressurization of the volume behind the diaphragm enables full closure of the diaphragm and improves contact of the diaphragm with the valve seat thereby improving performance of the valve.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: May 12, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Iraj Gashgaee, George Gonnella, Bruce Garber
  • Compositions and methods for etching silicon nitride-containing substrates
    Patent number: 10651045
    Abstract: Described are compositions and methods useful for wet-etching a microelectronic device substrate that includes silicon nitride; the compositions including phosphoric acid, hexafluorosilicic acid, and an amino alkoxy silane, and optionally one or more additional optional ingredients; a wet etching method of a substrate that includes silicon nitride and silicon oxide, that uses a composition as described, can achieve useful or improved silicon nitride etch rate, useful or improved silicon nitride selectivity, a combination of these, and optionally a reduction in particles present at a substrate surface after etching.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: May 12, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Emanuel Cooper, Steven Bilodeau, Wen-Haw Dai, Min-Chieh Yang, Sheng-Hung Tu, Hsing-Chen Wu, Sean Kim, SeongJin Hong
  • Aminoiodosilanes and methods of synthesizing these aminoiodosilanes
    Patent number: 10640523
    Abstract: Methods of synthesizing aminoiodosilanes are disclosed. The reaction to produce the disclosed aminoiodosilanes is represented by the formula: SiI4+z(NH2R1)=SiIy(NHR1)z, wherein R1 is selected from a C1-C10 alkyl or cycloalkyl, aryl, or a hetero group; y=1 to 3; and z=4?y.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: May 5, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Thomas H. Baum, Manish Khandelwal, David Kuiper
  • Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation
    Patent number: 10622192
    Abstract: A gas supply assembly is described for delivery of gas to a plasma flood gun which includes an inert gas and a fluorine-containing gas, wherein the assembly is configured to deliver a volume of the fluorine-containing gas to the flood gun that is not greater than 10% of a total volume of the fluorine-containing and inert gasses. The fluorine-containing gas can generate volatile reaction product gases from material deposits in the plasma flood gun, and to effect re-metallization of a plasma generation filament in the plasma flood gun. In combination with the gas amounts, the assembly and methods can use gas flow rates to optimize the cleaning effect and reduce filament material loss from the plasma flood gun during use.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: April 14, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Sharad N. Yedave, Ying Tang, Joseph R. Despres, Joseph D. Sweeney
  • Substrate container with window retention spring
    Patent number: 10593577
    Abstract: A reticle container for containing a reticle including a base plate having one or more windows. Each of the windows can include mounting recess having a recess sidewall including an undercut defined therein. A transparent substrate can be disposed in the mounting recess and is retained therein by a retention member having an arcuate portion extending between a first end portion and a second end portion. At least the first end portion of the retention member can be positioned in the undercut defined in the recess sidewall such that the arcuate portion of the retention member contacts the transparent substrate to retain the transparent substrate in the mounting recess.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: March 17, 2020
    Assignee: Entegris, Inc.
    Inventors: Russ V. Raschke, Jason T. Steffens
  • Anti-rotation device for hydraulic connectors
    Patent number: 10584813
    Abstract: An anti-rotation device for preventing a hydraulic connector assembly from leaking. Various embodiments of the anti-rotation device provide a mechanism whereby threadably engaged connectors, such as compression fittings, are permitted to rotate only a fraction of a turn after loosening. For many applications, the limited degree of loosening is sufficient to prevent the onset of leaking. Structurally, the anti-rotation device can include a band that is secured to a female nut of a hydraulic connector. Protrusions extend laterally from the band and engage with a stop tab on the male body of the hydraulic connector assembly, thereby limiting rotation of the female nut that would otherwise cause leaks. Locking provided by zip tie structures proximate the free ends of the anti-rotation device.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: March 10, 2020
    Assignee: Entegris, Inc.
    Inventors: John A. Leys, Michael Schleicher, Jeffrey J. McKenzie
  • Cleaning compositions for removing post etch residue
    Patent number: 10577567
    Abstract: The disclosure relates to a cleaning composition that aids in the removal of post-etch residues in the production of semiconductors. There is provided a stock composition comprising: a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base; a corrosion inhibitor; and a combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous.
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: March 3, 2020
    Assignee: Entegris, Inc.
    Inventors: Makonnen Payne, Emanuel I. Cooper, WonLae Kim, Eric Hong, Sean Kim
  • Etching solution for copper or copper alloy
    Patent number: 10570522
    Abstract: A solution for selectively etching copper or a copper alloy from a microelectronic device, wherein the device simultaneously includes copper or a copper alloy and nickel-containing material, the solution being an etching solution for copper or a copper alloy comprising a chelating agent having an acid group in a molecule, hydrogen peroxide, and a surfactant having an oxyethylene chain in a molecule.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: February 25, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Yutaka Yoshida, Yukichi Koji
  • High torque polymer fittings
    Patent number: 10569390
    Abstract: A high torque polymer fittings useful in fluid handling systems. The fittings are especially useful for fluid handling fittings having diameters of one inch or greater. Various embodiments of the fittings disclosed accommodate specialized wrenches for securing the fittings, the wrenches being used to tighten the fittings to a desired torque.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: February 25, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John A. Leys, Michael Schleicher, Jeffrey J. McKenzie, Steven P. Kolbow
  • Substrate container with enhanced containment
    Patent number: 10566225
    Abstract: Substrate containers and/or portions thereof for use in the semiconductor manufacturing industry can be formed by injection molding metal slurries. More particularly, such substrate containers and/or portions thereof can be formed by injection molding metal slurries containing magnesium or magnesium alloys. Substrate containers, wherein at least a portion of the substrate container is injection molded from a metal slurry containing magnesium or magnesium alloy can exhibit improved permeation control of moisture and oxygen over, and as compared to, comparable substrate carriers formed of polymer based materials. Exemplary substrate containers can include wafer containers, reticle pods, disk shippers and/or work-in-process boxes.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: February 18, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Gary Gallagher, Stephen Sumner
  • Post chemical mechanical polishing formulations and method of use
    Patent number: 10557107
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: February 11, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: Laisheng Sun, Peng Zhang, Jun Liu, Steven Medd, Jeffrey A. Barnes, Shrane Ning Jenq