Abstract: Dual beam charged particle microscopy systems, sensors, and techniques are disclosed. A charged particle microscope system can include a vacuum chamber, a sample stage disposed in the vacuum chamber, a first beam source operable to direct a first particle beam into the vacuum chamber, a second beam source operable to direct a second particle beam into the vacuum chamber, a first charged particle sensor, and a second charged particle sensor. The first charged particle sensor can include a detector cell having a semiconductor layer characterized by a bandgap equal to or greater than about 2.0 eV, oriented to detect secondary electrons generated based on an interaction between the first particle beam or the second particle beam and the sample. The second charged particle sensor can include a scintillator detector configured to be saturated from electrons generated based on an interaction between the second particle beam and the sample.

Abstract: The present invention relates to a method for acquiring tomographic images of a sample in a microscopy system, wherein the sample comprises a defined region, and wherein the method comprises determining a location in three-dimensional space of the defined region, wherein the method further comprises capturing an image of at least a part of the sample, and wherein the determination of the location in three-dimensional space of the defined region is based, at least in part, on the image of the part of the sample. The present invention also relates to a corresponding microscopy system and a computer program product to perform the method according to the present invention.

Abstract: Phase contrast images in a charged-particle beam system are obtained by directing a CPB as modulated by a sample to a phase plate to have a diffraction plane that is displaced from the phase plate. Based on interference fringes in the images, a transverse displacement of the CPB with respect to the phase plate can be estimated and adjusted.

Abstract: Methods include acquiring a series of images or spectra of a volume of a model sample, reconstructing a 3D image of the volume of the model sample using the series of images, constructing a 3D model of the volume of the model sample by forming a segmentation of the reconstructed 3D image and fitting one or more primitive geometrical shapes to the segmentation, acquiring test sample images or spectra, and measuring test sample critical dimensions using the constructed 3D model to guide analysis of test spectra or images. Additional methods and related systems are disclosed, optical critical dimension (OCD) methods and systems.

Abstract: Sample shuttles are operable to electrically contact and secure samples during and after ion beam milling. During sample processing with an ion beam incident to a first sample surface along a first direction, sample electrical characteristics such as voltage or impedance are measured. Based on the measurements, sample electrical characteristics are adjusted by applying a voltage or a current, the sample shuttle is rotated to permit sample milling from a second direction. A non-conductive mask can be situated to reduce redeposition of material from shuttle surfaces on samples.

Abstract: The invention relates to a sample holder tip for use in a charged particle microscope, such as a transmission electron microscope; a sample holder comprising said sample holder tip and methods of using said sample holder tip and sample holder.

Abstract: CPB images are acquired with pulsed exposures of fields of view (FOVs) defined in a region of interest of a sample. Multiple exposures are configured with a time interval greater than a phonon lifetime to reduce sample damage induced by the CPB exposure. FOVs can defined to be spaced apart to control effective irradiation dose based on a combination of direct exposure and evanescent exposure.

Abstract: In some embodiments, a scientific instrument includes an electron-beam column configured to scan an electron beam across a sample. The electron-beam column includes a beam blanker configured to gate the electron beam in response to a drive signal. The scientific instrument also includes an electron detector configured to measure a flux of transmitted or scattered electrons having interacted with the sample and an electronic controller configured to acquire an image of the sample using values of the flux measured with the electron detector for a plurality of electron-beam scan locations. The electronic controller is further configured to cause the drive signal to have a gating frequency at which the image has a moiré pattern therein.

Abstract: In an example, a method includes recording a plurality of data frames by performing test location measurements at a plurality of sample test locations and recording response signals. Each test location measurement is characterized by a phase delay. For at least one sample test location, the test location measurement is performed with a repeated phase delay in non-consecutive measurements. In another example, the test location measurement is performed at each sample test location such that different respective phase delays are used at each of two or more different sample test locations. In another example, a CPM system is configured to direct an illumination pulse of a charged particle beam to a sample test location, to apply an excitation stimulus to the sample test location, and to receive one or more response signals. The CPM system includes a controller programmed to execute one or more methods disclosed herein.

Abstract: Embodiments herein relate to a process for electron holography image aberration reduction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a propagating component that reduces hologram aberration of an electron hologram (EH) image by modifying of a pair of sequenced parameters of an array upon which the EH image is constructed, resulting in a modified array, and a generating component that generates a propagated EH image using a propagator comprising the modified array.

Abstract: Systems, components, and methods for detecting characteristic signals are described. A detector includes a detector cell. The detector cell can be configured to generate an electrical signal in response to a particle incident on an active layer of the detector cell, The active layer can define an absorption surface. The detector can include a filter. The filter can include a membrane of carbon material. The filter can be disposed relative to the detector cell to shield the absorption surface from a subset of the incident particles. The subset of the incident particles can include electrons, ions, and photons. The photons can have an energy less than about 40 eV.

Abstract: Magnetic lenses, charged particle microscope systems including the same, and associated methods. In an example, a magnetic lens is configured to direct a charged particle beam to a sample location and comprises a plurality of pole pieces and at least two independent coils. The magnetic lens operates as an objective lens with variable main objective plane without immersing a sample in a magnetic field. The variable main objective plane permits selective adjustment of a magnification of the charged particle beam at the focal plane without immersing the sample location in the magnetic fields produced by coils of the magnetic lens. In an example, a charged particle microscope system comprises a charged particle source, a sample holder, and a magnetic objective lens. In an example, a method comprises positioning a sample relative to a magnetic lens and operating the magnetic lens to focus a charged particle beam to a focus location.

Abstract: Trenches produced in ion beam or laser beam milling of lamella for electron microscopy can be filled by milling trench sidewalls to taper so as to be wider at a top, typically at a workpiece surface, than at a bottom. Taper angles of between 40 and 80 degrees are preferred as measured from a workpiece surface to a trench sidewall. With such tapers, after lamella removal, trenches can be at least 90% filled using ion beam or laser beam assisted deposition.

Abstract: The disclosure relates to a method of preparing a sample in a charged particle microscope. The method comprises the steps of providing a sample carrier having a mechanical support contour and a grid member connected thereto. The method comprises the step of connecting said sample carrier to a mechanical stage device of the charged particle microscope. Additionally, the method comprises the step of providing a sample, for example a chunk-shaped or lamella-shaped sample and connecting said sample to the grid member of the sample carrier. The method allows, in an embodiment, easy and reliable transfer of a sample between a bulk sample and a sample carrier.

Abstract: A sample manipulation system for a sample to be used in a charged particle beam process. The sample manipulation system includes a carrier defining a passageway, a wire slidably supported and at least partially housed by the carrier, and a feed mechanism. The wire is configured to slide through the passageway. The wire includes a supported portion and a protruding portion. The supported portion is disposed in the passageway and the protruding portion extends from the carrier for engaging the sample. The feed mechanism is configured to drive the wire through the passageway to control a length of the protruding portion.

Abstract: A computer-implemented method of processing image data according to the present disclosure comprises: receiving the image data, wherein the image data is scanning transmission charged-particle microscope (STCPM) image data representing a STCPM scan obtained at a first focus depth; and processing a system of equations expressing the image data as a sum of contributions from a plurality of slices of the sample at a plurality of focus depths, wherein each equation of the system of equations relates at least a portion of the image data to: at least one of a plurality of contrast transfer functions of the STCPM, each contrast transfer function of the STCPM being determined at a different respective focus depth; and at least one set of unknown objects of the STCPM, each unknown object in a set being at a different respective focus depth. The step of processing comprises solving the system of equations to obtain at least one of the plurality of unknown objects of the STCPM.

Abstract: Methods for preparing a sample for analysis by a charged particle microscope (for example by providing a lamella) include removing material from a surface of a sample to provide a newly exposed surface and determining a region of interest (ROI) on the newly exposed surface. A plurality of lines is formed on the newly exposed surface and material from a working surface of the sample, different from the newly exposed surface, is removed a plurality of times. The working surface is imaged a plurality of times to at least capture the plurality of lines and an endpoint is determined based on a relative spatial characteristic between two or more lines of the plurality of lines.

Abstract: In an example, a method includes determining a characteristic displacement gradient (DG) tensor that characterizes a deformation characteristic. The method includes, in an iterative routine, calculating an objective function value associated with a trial DG tensor based, at least in part, on pixel values within a zone of consideration (ZOC) that is determined automatically based at least in part on the trial DG tensor. In another example, a method includes determining one or more rotational transformation components corresponding to a test image and determining a characteristic DG tensor based at least in part on the rotational transformation component(s). In another example, a system includes an electron optics assembly, a detector assembly, and a controller programmed to determine a characteristic DG tensor. In another example, a non-transitory computer readable medium stores instructions which, when executed by a computer, cause the computer to perform a method of determining a deformation characteristic.

Abstract: An apparatus for plasma control is disclosed. The apparatus comprises: a plasma generator comprising two electrodes, an anode and a cathode, configured to produce a plasma between the two electrodes; a solenoid coil disposed to surround the plasma and configured to produce a magnetic field parallel to a longitudinal axis between the two electrodes; and circuitry configured for allowing independent timing of the magnetic field with respect to the production of the plasma. A method for plasma control in a spectroscopy system and an optical emission spectrometer using said method are also disclosed.

Abstract: The disclosure relates to a method for micromachining a biological sample for creating a lamella for analysis in a Cryo-Charged Particle Microscope (Cryo-CPM). The method comprising the steps of providing a biological sample on a sample carrier; Locating a sample area on the sample carrier, said sample area comprising a region of interest having biological material from which a lamella can be created; and Micromachining at least part of the biological sample so as to remove material in a part of the sample area surrounding the region of interest, in order to increase a visual contrast between the biological material in the region of interest and its surroundings. With the increased visual contrast a location for a potential lamella can be identified.