Patents Assigned to FEI Company
  • Patent number: 12293525
    Abstract: Methods and systems for implementing artificial intelligence enabled metrology are disclosed. An example method includes segmenting a first image of structure into one or more classes to form an at least partially segmented image, associating at least one class of the at least partially segmented image with a second image, and performing metrology on the second image based on the association with at least one class of the at least partially segmented image.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: May 6, 2025
    Assignee: FEI Company
    Inventors: John Flanagan, Brad Larson, Thomas Miller
  • Publication number: 20250138037
    Abstract: An apparatus for moving first and second sample holders between respective first and second starting positions and respective first and second end positions comprises a guide assembly configured to: guide the first sample holder along a first path from the first starting position to the first end position and back along the first path from the first end position to the first starting position; and guide the second sample holder along a second path from the first starting position to the second end position and back along the second path from the second end position to the second starting position. The guide assembly is configured such that the first and second sample holders are spaced apart as they move along at least a portion of the lengths of their respective paths.
    Type: Application
    Filed: September 7, 2022
    Publication date: May 1, 2025
    Applicant: FEI Company
    Inventors: Martin CAFOUREK, Jan PATÁK
  • Patent number: 12288667
    Abstract: A method of imaging a sample includes acquiring one or more first images of a region of the sample at a first imaging condition with a charged particle microscope system. The one or more first images are applied to an input of a trained machine learning model to obtain a predicted image indicating atom structure probability in the region of the sample. An enhanced image indicating atom locations in the region of the sample based on the atom structure probability in the predicted image is caused to be displayed in response to obtaining the predicted image.
    Type: Grant
    Filed: June 2, 2022
    Date of Patent: April 29, 2025
    Assignee: FEI Company
    Inventors: Pavel Potocek, Bert Henning Freitag, Maurice Peemen
  • Publication number: 20250125116
    Abstract: A charged particle beam microscope system directs a charged particle beam to a sample to produce a plurality of images for a plurality of areas of the sample. Respective first sets of one or more aberration predictor values are acquired for each of the plurality of images. During the image acquisition, an aberration measurement and a corresponding second set of aberration predictor values are periodically acquired. An aberration model is obtained using the aberration measurements the corresponding second sets of aberration predictor values, wherein the model takes a set of aberration predictor values as an input and outputs predicted aberration data. The model is applied to the first sets of aberration predictor values to obtain respective aberration data, which is used to reduce or at least partially correct for aberration in the charged particle microscope images. A sample reconstruction is obtained using the acquired charged particle microscope images.
    Type: Application
    Filed: October 10, 2024
    Publication date: April 17, 2025
    Applicant: FEI Company
    Inventors: Erik Franken, Yuchen Deng
  • Patent number: 12278087
    Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.
    Type: Grant
    Filed: March 26, 2024
    Date of Patent: April 15, 2025
    Assignee: FEI Company
    Inventors: Christopher Thompson, Dustin Ellis, Adam Stokes, Ronald Kelley, Cedric Bouchet-Marquis
  • Patent number: 12270602
    Abstract: The invention relates to a method and an apparatus for preparing a cryogenic sample, whereby the sample is subjected to rapid cooling using a cryogen. A pair of conduits for transporting cryogenic fluid are provided, each of which conduits opens out into a mouthpiece, which mouthpieces are arranged to face each other across an intervening gap, wherein in the gap a sample that is provided on a substantially planar sample carrier can be received. Cryogenic fluid can be pumped through the conduits so as to concurrently flush from the mouthpieces and suddenly immerse the sample in cryogenic fluid from two opposite sides. As defined herein, at least one of the mouthpieces comprises at least two nozzle openings for evenly cooling the substantially planar sample carrier during the flushing.
    Type: Grant
    Filed: April 23, 2024
    Date of Patent: April 8, 2025
    Assignee: FEI Company
    Inventors: Maarten Kuijper, Hervé Remigy, Mathijs Petrus Wilhelmus Van Den Boogaard, Adrian Koh, Ivanka Spee, John Hazenberg, Marius Van Der Does
  • Publication number: 20250108317
    Abstract: Cryogenic cleaning devices comprise a body and an attachment element for attaching the body to a vacuum chamber to provide a fluid path between the body and the vacuum chamber. A surface is configured to accumulate gas molecules received into the body via the fluid path by condensing and/or adsorbing the gas molecules on the surface when cooled and a single-stage refrigeration system is configured to cool the surface. A pump is configured to pump out the accumulated gas molecules during baking of and a valve is moveable between a first position in which the fluid path is open to allow the gas molecules to be evacuated from the vacuum chamber into the body, and a second position in which the fluid path is closed to prevent the gas molecules from being received into the body.
    Type: Application
    Filed: October 3, 2023
    Publication date: April 3, 2025
    Applicant: FEI Company
    Inventors: Jan Lásko, Libor Novák, Kamil Bencko
  • Publication number: 20250112024
    Abstract: Milling depth is selected based on sample dimensions to increase the rate at which sample images are acquired. A cutface height and associated focused ion beam dose are selected based on an image of a previously acquired sectional surface. Edges in the image can be identified such as those corresponding to a sample mount or a coating applied to the sample and used to establish a CPB dose. Cutface height can be based on a single or multiple prior sectional surface images.
    Type: Application
    Filed: September 28, 2023
    Publication date: April 3, 2025
    Applicant: FEI Company
    Inventors: Jirí Vítecek, Bronislav Pribyl, Dávid Pacura
  • Publication number: 20250112016
    Abstract: Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a charged particle source and an optical column. The optical column can include a multipole condenser with one or more condenser quadrupole-generating elements and/or a multipole objective with a plurality of objective multipole elements. The plurality of objective multipole elements can include at least three quadrupole-generating elements and at least three octupole-generating elements configured to at least partially correct a spherical aberration of a charged particle beam. The optical column can be configured such that the charged particle beam enters the multipole objective with a non-circular beam profile and/or such that the charged particle beam is characterized by a non-circular beam profile through at least a portion of the multipole objective.
    Type: Application
    Filed: September 29, 2023
    Publication date: April 3, 2025
    Applicant: FEI Company
    Inventors: Alexander Henstra, Galen Gledhill, Ali Gheidari
  • Publication number: 20250112018
    Abstract: Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam. The apparatus additionally includes a deflector assembly with a corrector electrostatic prism. The corrector electrostatic prism can include a first corrector prism electrode and a second corrector prism electrode that define an electrode gap therebetween and a deflector optical axis extends within the electrode gap. The plurality of electrostatic multipole elements can include a first hexapole-generating element, a second hexapole-generating element, a third hexapole-generating element, and/or a fourth hexapole-generating element. In some examples, the second hexapole-generating element is positioned proximate to a midpoint of the deflector optical axis.
    Type: Application
    Filed: September 29, 2023
    Publication date: April 3, 2025
    Applicant: FEI Company
    Inventor: Alexander Henstra
  • Publication number: 20250112022
    Abstract: A method of producing an electron diffraction pattern comprises of directing an electron beam to be incident upon a sample and detecting, by a particle detector with an array of pixels, electrons scattered from the sample. The detecting comprises, for each detected electron at a pixel, measuring an energy value that is proportional to the energy of the detected electron. The measured energy value of each detected electron and an identifier of the pixel that detected the electron are sent to a processing device. An energy-weighted contribution value from each measured energy value is calculated by the processing device using an energy-dependent function. The energy-dependent function produces energy-weighted contribution values that vary with electron energy. An energy-weighted electron diffraction pattern is then generated using pixel positions associated with each pixel identifier, and the energy-weighted contribution values.
    Type: Application
    Filed: September 27, 2024
    Publication date: April 3, 2025
    Applicant: FEI Company
    Inventors: Jakub HOLZER, Chris STEPHENS, Tomáš VYSTAVEL, Branislav STRAKA
  • Publication number: 20250112019
    Abstract: Multipole elements and charged particle microscope systems including the same. In an example, an apparatus can include plurality of electrodes including a first shape subset and a second shape subset. Each electrode of the first shape subset includes an electrode active surface with a shape that is different than that of each electrode of the second shape subset. In another example, an apparatus can include a plurality of electrodes including a first side subset and a second side subset. Each electrode includes an electrode extension extending along a first lateral direction or a second lateral direction. In another example, an apparatus can include an optical column with a plurality of multipole elements that are fully contained within a first angular envelope that subtends a first angle that is at most 50 degrees while the working distance is at most 10 mm.
    Type: Application
    Filed: September 29, 2023
    Publication date: April 3, 2025
    Applicant: FEI Company
    Inventors: Alexander Henstra, Galen Gledhill, Ali Gheidari
  • Patent number: 12260473
    Abstract: Methods and systems for generation and use of an accelerated tomographic reconstruction preconditioner (ATRP) for accelerated iterative tomographic reconstruction are disclosed. An example method for generating an ATRP for accelerated iterative tomographic reconstruction includes accessing data for a tomography investigation of a sample and determining a trajectory of the tomography investigation of a sample. At least one toy model sample depicting a feature characteristic of the sample are accessed and at least one candidate preconditioner is selected. A first performance of each of the at least one candidate preconditioner on the one or more toy samples is determined, where the candidate preconditioners are then updated to create updated candidate preconditioners. A second performance of each of the updated candidate preconditioners on the one or more toy samples is determined determining. An ATRP is then generated based on at least the first performance and the second performance.
    Type: Grant
    Filed: September 30, 2022
    Date of Patent: March 25, 2025
    Assignee: FEI Company
    Inventors: Glenn Myers, Andrew Kingston, Adrian Sheppard, Shane Latham, Trond Varslot
  • Patent number: 12260583
    Abstract: Systems for and methods for generating precise structure reconstruction using slice and view images, are disclosed. An example method comprises, obtaining a slice and view images of a sample that depicts a 3D fiducial and cross-sections of a structure in the sample. The 3D fiducial is configured such that when a layer of material having a uniform thickness is removed from a surface of the sample that includes the 3D fiducial the cross-sectional shape of the 3D fiducial in the new surface is consistent. Relative positions are determined between the 3D fiducial the cross-sections of the structure in individual images. Positional relationships are then determined between the cross-sections of the structure in different images in a common reference frame based on the relative positions.
    Type: Grant
    Filed: February 9, 2021
    Date of Patent: March 25, 2025
    Assignee: FEI Company
    Inventors: Mark Najarian, Victoriea Bird, Peter D. Carleson, Sean Morgan-Jones
  • Publication number: 20250095959
    Abstract: Methods include conditioning at least a portion of a gas delivery system with a carbon-based conditioning agent to provide a carbon-based residual, and etching a substrate with a focused ion beam, in the presence of an ammonia-based delayering agent provided by the gas delivery system and in the presence of the carbon-based residual, wherein the carbon-based residual reduces a topographical variation of a depth of the etching. Apparatus include a focused ion beam system configured to deliver a focused ion beam to a sample, and a pre-conditioned gas delivery system configured to deliver an ammonia-based delayering agent to the sample at least while the focused ion beam is being delivered to the sample, wherein the pre-conditioned gas delivery system includes a carbon-based residual in the gas delivery system, wherein a portion of the carbon-based residual is present at the sample during the etching of the sample with the ammonia-based delayering agent.
    Type: Application
    Filed: September 19, 2023
    Publication date: March 20, 2025
    Applicant: FEI Company
    Inventors: Chad Rue, Lilly Landers, Jason Arjavac, Gavin Mitchson
  • Publication number: 20250095159
    Abstract: Sample regions of interest (ROIs) for use in autofocus procedures are identified based on a gradient image of the sample. ROIs with gradient values greater that a threshold are selected, and eigenvalues of the associated image matrices are determined. ROIs with suitable variation in eigenvalues such as at least two relatively large eigenvalues are associated with high contrast features orientated in multiple directions so that such ROIs are suitable for automatic focus and astigmatism correction. Suitable ROIs can also be identified based on a histogram of gradient orientations.
    Type: Application
    Filed: September 19, 2023
    Publication date: March 20, 2025
    Applicant: FEI Company
    Inventors: Umesh ADIGA, Derek HIGGINS, Mark BIEDRZYCKI, Melanie DOUD
  • Patent number: 12255045
    Abstract: The invention relates to a transmission charged particle microscope comprising a charged particle beam source for emitting a charged particle beam, a sample holder for holding a sample, an illuminator for directing the charged particle beam emitted from the charged particle beam source onto the sample, and a control unit for controlling operations of the transmission charged particle microscope. As defined herein, the transmission charged particle microscope is arranged for operating in at least two modes that substantially yield a first magnification whilst keeping said diffraction pattern substantially in focus. Said at least two modes comprise a first mode having first settings of a final projector lens of a projecting system; and a second mode having second settings of said final projector lens.
    Type: Grant
    Filed: April 8, 2024
    Date of Patent: March 18, 2025
    Assignee: FEI Company
    Inventor: Peter Christiaan Tiemeijer
  • Patent number: 12254645
    Abstract: Fiducial coordinates are obtained by aligning template with region of interest extracted from a workpiece image. Image values in the region of interest are projected along a template axis and the project values evaluated to establish a fiducial location which can be used as a reference location for locating workpiece areas for ion beam milling or other processing.
    Type: Grant
    Filed: December 3, 2021
    Date of Patent: March 18, 2025
    Assignee: FEI Company
    Inventors: Umesh Adiga, Mark Biedrzycki
  • Patent number: 12249482
    Abstract: Methods and apparatus are disclosed for integration of image-based metrology into a milling workflow. A first ion beam milling operation is performed to an edge at a distance from a final target position on a sample. An SEM image of the sample is used to determine a distance between the milled edge and a reference structure on the sample. Based on the determined distance, the ion beam is adjusted to perform a second milling operation to shift the milled edge to the final target position. Extensions to iterative procedures are disclosed. Various geometric configurations and corrections are disclosed. Manufacturing and analytic applications are disclosed in a variety of fields, including read-write head manufacture and TEM sample preparation. Other combinations of imaging and milling tools can be used.
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: March 11, 2025
    Assignee: FEI Company
    Inventors: Thomas Gary Miller, Jason Arjavac, Brian Routh, Jr., Mark Biedrzycki
  • Patent number: 12244115
    Abstract: A laser device for use with a scientific instrument. The laser device includes a laser emitter and a control system. The laser emitter is configured to generate a laser beam for radiating a sample disposed in a vacuum chamber of the scientific instrument. The control system is configured to receive a pressure signal associated with the vacuum chamber from a pressure sensor, and to change a state of the laser beam in response to the pressure reaching a threshold level.
    Type: Grant
    Filed: December 16, 2022
    Date of Patent: March 4, 2025
    Assignee: FEI COMPANY
    Inventors: Francis Deck, Justin Morrow