Abstract: The present invention provides a method of sample preparation and analysis and a sample holder that may be used in said method.

Abstract: A method of Particle-Induced X-Ray Emission (PIXE) analysis comprises: (a) delivering a first ion beam from a first ion source and comprising ions having a first composition onto an area of a sample, wherein the kinetic energy of the ions is not greater than 50 kilo-electron-Volts (keV); (b) simultaneously with the delivering of the first ion beam onto the sample area, delivering a second ion beam from a second ion source onto the sample area, the second ion beam comprising ions having a second composition, wherein the kinetic energy of the ions of the second ion beam is not greater than 50 keV; and (c) detecting X-rays that are emitted from the sample area in response to the simultaneous delivery of the first and second ion beams thereto.

Abstract: The present invention describes a blotting material comprising a profiled region that has a portion configured to protrude at least partially into a space created within a boundary formed by the rim of a holder for a sample grid. Also described are methods for making such profiles and components used to make said profiles. There are also provided methods for removing excess liquid from a sample grid by bringing the profiled blotting material into association with the sample grid past the sample grid holder. Systems comprises means to hold a sample grid holder, means to hold the blotting paper, and means to bring the two together are also described.

Abstract: Electrostatic mirror chromatic aberration (Cc) correctors, according to the present disclosure, comprise an electrostatic electron mirror that itself comprises a multipole. The electrostatic electron mirror is positioned within the corrector such that, when the corrector is in use, an electron beam passing through the corrector is not incident on the electrostatic electron mirror along the optical axis of the mirror. The mirror object distance of the electrostatic mirror is equal to the mirror image distance of the electrostatic mirror, and the electrostatic mirror is configured such that the electrostatic mirror applies no dispersion or coma aberration to the electron beam. The multipole is positioned in the mirror plane of the electrostatic electron mirror, and in some embodiments the multipole is a quadrupole.

Abstract: The present invention relates to a method and a system for compensating interference in a charged particle beam microscopy system. A step of capturing data obtained from irradiation of a sample for a sampling duration can be implemented. In the system a respective data storage is provided for capturing and/or storing this data. Further steps of dividing at least representative parts of the sampling duration into time-windows and constructing, for each of the time-windows, an intermediate image, can be implemented. Detecting shift between the intermediate images and determining a compensation function for the shift between the intermediate images is realized as well. In a system the latter steps are automated by a respective processing component. The shift between intermediate images can be a two-dimensional shift and the compensation function represents a shift of the intermediate images in the two dimensions over time.

Abstract: Methods include arranging a substrate in a vacuum chamber of a charged particle beam microscope, wherein the substrate is held at a cryogenic temperature, and depositing on the substrate at the cryogenic temperature a condensate precursor that is stored in a crucible, wherein the deposited condensate precursor forms a deposition layer on the substrate. An apparatus include a vacuum chamber configured to support a substrate, a condensate precursor system coupled to the vacuum chamber, wherein a vacuum pump is configured to draw a vacuum on a storage reservoir to reduce a vapor pressure build-up of a one or more volatile contaminants in the storage reservoir and thereby reduce a deposition of the one or more contaminants on the substrate during the condensing of the condensate precursor on the substrate. A condensate precursor can comprise a transition metal center comprising hafnium or osmium. Related deposition and cap layers are disclosed.

Abstract: The invention relates to a system for sensor protection in electron imaging applications comprising a beam control device configured to provide a beam signal based on an incoming beam signal, wherein the beam signal comprises an altered beam intensity, wherein the beam control device is further configured to receive a control signal and to activate based on the control signal. The system further comprises a sensor configured to capture the beam signal and to provide a capture signal based on the beam signal, and a control module configured to provide the control signal to the beam control device, to generate an exposure value based on the capture signal and to modify the control signal based on the exposure value.

Abstract: Dual beam charged particle microscopy systems, sensors, and techniques are disclosed. A charged particle microscope system can include a vacuum chamber, a sample stage disposed in the vacuum chamber, a first beam source operable to direct a first particle beam into the vacuum chamber, a second beam source operable to direct a second particle beam into the vacuum chamber, a first charged particle sensor, and a second charged particle sensor. The first charged particle sensor can include a detector cell having a semiconductor layer characterized by a bandgap equal to or greater than about 2.0 eV, oriented to detect secondary electrons generated based on an interaction between the first particle beam or the second particle beam and the sample. The second charged particle sensor can include a scintillator detector configured to be saturated from electrons generated based on an interaction between the second particle beam and the sample.

Abstract: The present invention relates to a method for acquiring tomographic images of a sample in a microscopy system, wherein the sample comprises a defined region, and wherein the method comprises determining a location in three-dimensional space of the defined region, wherein the method further comprises capturing an image of at least a part of the sample, and wherein the determination of the location in three-dimensional space of the defined region is based, at least in part, on the image of the part of the sample. The present invention also relates to a corresponding microscopy system and a computer program product to perform the method according to the present invention.

Abstract: Phase contrast images in a charged-particle beam system are obtained by directing a CPB as modulated by a sample to a phase plate to have a diffraction plane that is displaced from the phase plate. Based on interference fringes in the images, a transverse displacement of the CPB with respect to the phase plate can be estimated and adjusted.

Abstract: Methods include acquiring a series of images or spectra of a volume of a model sample, reconstructing a 3D image of the volume of the model sample using the series of images, constructing a 3D model of the volume of the model sample by forming a segmentation of the reconstructed 3D image and fitting one or more primitive geometrical shapes to the segmentation, acquiring test sample images or spectra, and measuring test sample critical dimensions using the constructed 3D model to guide analysis of test spectra or images. Additional methods and related systems are disclosed, optical critical dimension (OCD) methods and systems.

Abstract: Sample shuttles are operable to electrically contact and secure samples during and after ion beam milling. During sample processing with an ion beam incident to a first sample surface along a first direction, sample electrical characteristics such as voltage or impedance are measured. Based on the measurements, sample electrical characteristics are adjusted by applying a voltage or a current, the sample shuttle is rotated to permit sample milling from a second direction. A non-conductive mask can be situated to reduce redeposition of material from shuttle surfaces on samples.

Abstract: The invention relates to a sample holder tip for use in a charged particle microscope, such as a transmission electron microscope; a sample holder comprising said sample holder tip and methods of using said sample holder tip and sample holder.

Abstract: CPB images are acquired with pulsed exposures of fields of view (FOVs) defined in a region of interest of a sample. Multiple exposures are configured with a time interval greater than a phonon lifetime to reduce sample damage induced by the CPB exposure. FOVs can defined to be spaced apart to control effective irradiation dose based on a combination of direct exposure and evanescent exposure.

Abstract: In some embodiments, a scientific instrument includes an electron-beam column configured to scan an electron beam across a sample. The electron-beam column includes a beam blanker configured to gate the electron beam in response to a drive signal. The scientific instrument also includes an electron detector configured to measure a flux of transmitted or scattered electrons having interacted with the sample and an electronic controller configured to acquire an image of the sample using values of the flux measured with the electron detector for a plurality of electron-beam scan locations. The electronic controller is further configured to cause the drive signal to have a gating frequency at which the image has a moiré pattern therein.

Abstract: In an example, a method includes recording a plurality of data frames by performing test location measurements at a plurality of sample test locations and recording response signals. Each test location measurement is characterized by a phase delay. For at least one sample test location, the test location measurement is performed with a repeated phase delay in non-consecutive measurements. In another example, the test location measurement is performed at each sample test location such that different respective phase delays are used at each of two or more different sample test locations. In another example, a CPM system is configured to direct an illumination pulse of a charged particle beam to a sample test location, to apply an excitation stimulus to the sample test location, and to receive one or more response signals. The CPM system includes a controller programmed to execute one or more methods disclosed herein.

Abstract: Embodiments herein relate to a process for electron holography image aberration reduction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a propagating component that reduces hologram aberration of an electron hologram (EH) image by modifying of a pair of sequenced parameters of an array upon which the EH image is constructed, resulting in a modified array, and a generating component that generates a propagated EH image using a propagator comprising the modified array.

Abstract: Systems, components, and methods for detecting characteristic signals are described. A detector includes a detector cell. The detector cell can be configured to generate an electrical signal in response to a particle incident on an active layer of the detector cell, The active layer can define an absorption surface. The detector can include a filter. The filter can include a membrane of carbon material. The filter can be disposed relative to the detector cell to shield the absorption surface from a subset of the incident particles. The subset of the incident particles can include electrons, ions, and photons. The photons can have an energy less than about 40 eV.

Abstract: Magnetic lenses, charged particle microscope systems including the same, and associated methods. In an example, a magnetic lens is configured to direct a charged particle beam to a sample location and comprises a plurality of pole pieces and at least two independent coils. The magnetic lens operates as an objective lens with variable main objective plane without immersing a sample in a magnetic field. The variable main objective plane permits selective adjustment of a magnification of the charged particle beam at the focal plane without immersing the sample location in the magnetic fields produced by coils of the magnetic lens. In an example, a charged particle microscope system comprises a charged particle source, a sample holder, and a magnetic objective lens. In an example, a method comprises positioning a sample relative to a magnetic lens and operating the magnetic lens to focus a charged particle beam to a focus location.

Abstract: Trenches produced in ion beam or laser beam milling of lamella for electron microscopy can be filled by milling trench sidewalls to taper so as to be wider at a top, typically at a workpiece surface, than at a bottom. Taper angles of between 40 and 80 degrees are preferred as measured from a workpiece surface to a trench sidewall. With such tapers, after lamella removal, trenches can be at least 90% filled using ion beam or laser beam assisted deposition.