Patents Assigned to FEI Company
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Patent number: 11773905Abstract: An axial alignment assembly (100) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.Type: GrantFiled: May 20, 2021Date of Patent: October 3, 2023Assignee: FEI CompanyInventors: Pleun Dona, Casper Maria Smit
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Publication number: 20230307209Abstract: Methods and apparatus are disclosed for determining a distance from a cut face of an active sample to a target plane, using data acquired from a reference sample. The active and reference samples have congruent structure, allowing reference data to be used as an index. An SEM image of the cut face is compared with the reference data to determine position within the active sample, and thereby the remaining distance to the target plane. The technique can be applied repeatedly between phases of ion beam milling until an endpoint at the target plane is reached. Consistent, accurate endpointing is achieved. The technique is suitable for preparing 5-100 nm thick lamella for TEM analysis of electronic circuits and can be used in a wide range of applications. Variations are disclosed.Type: ApplicationFiled: December 19, 2022Publication date: September 28, 2023Applicant: FEI CompanyInventors: Zoltán Orému{hacek over (s)}, Luká{hacek over (s)} Hübner, Jaroslav Stárek, Tomá{hacek over (s)} Onderlicka
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Publication number: 20230298853Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.Type: ApplicationFiled: May 22, 2023Publication date: September 21, 2023Applicant: FEI CompanyInventors: Bart BUIJSSE, Bart Jozef JANSSEN
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Publication number: 20230296639Abstract: The invention relates to a sample handling and storage system. The system is used for storing and handling samples, which may be cryogenic samples, that are arranged for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a sample from said plurality of samples when connected to said storage apparatus, and arranged for transferring said sample from said transfer device to said CPA when connected to said CPA.Type: ApplicationFiled: March 21, 2022Publication date: September 21, 2023Applicant: FEI CompanyInventors: Vojtech DOLEZAL, Jiri BENDA, Vaclav KUCERA, Martin DVORAK
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Patent number: 11756762Abstract: A sample holder retains a sample and can continuously rotate the sample in a single direction while the sample is exposed to a charged particle beam (CPB) or other radiation source. Typically, the CPB is strobed to produce a series of CPB images at random or arbitrary angles of rotation. The sample holder can rotate more than one complete revolution of the sample. The CPB images are used in tomographic reconstruction, and in some cases, relative rotation angles are used in the reconstruction, without input of an absolute rotation angle.Type: GrantFiled: February 3, 2022Date of Patent: September 12, 2023Assignee: FEI CompanyInventors: Bart Jozef Janssen, Edwin Verschueren, Erik Franken
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Patent number: 11753254Abstract: The invention relates to a transport apparatus for transferring a sample between two devices. The transport apparatus comprises a transport tube provided with a carrier for holding a sample. The carrier is movable within said transport tube along a length thereof. The transport apparatus further comprises an actuator tube extending substantially next to said transport tube and which is provided with an actuator element that is movable within said actuator tube. Said actuator element comprises a first magnet part, and said sample carrier is provided with a second magnet part, wherein said first magnet part and said second magnet part are configured such that movement of the sample carrier through said transport tube is linked to movement of the magnetic actuator element through the actuator tube. In this way, movement of the magnetic actuator causes movement of the sample carrier, allowing safe, reliable and protected transport of the sample.Type: GrantFiled: January 23, 2020Date of Patent: September 12, 2023Assignee: FEI CompanyInventor: Tomas Kratochvíl
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Patent number: 11749492Abstract: An electron source has an insulating base, a pair of conductive terminals, an insulating support member, a drift isolation member, an emitter-cathode, and one or more heating elements. The conductive terminals are exposed from a first surface of the insulating base. The insulating support member extends from the first surface of the insulating base. The drift isolation member is disposed at an end of the insulating support member remote from the insulating base. The emitter-cathode is coupled to the drift isolation member. The one or more heating elements are coupled to the conductive terminals and the drift isolation member. The combination of the drift isolation member with the insulating support member can prevent stress-induced drift from impacting position of the emitter-cathode, thereby improving the mechanical stability of the electron source.Type: GrantFiled: March 14, 2022Date of Patent: September 5, 2023Assignee: FEI CompanyInventors: Kun Liu, Gregory A. Schwind, Alan S. Bahm
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Patent number: 11749496Abstract: Disclosed herein are techniques directed toward a protective shutter for a charged particle microscope. An example apparatus at least includes a charged particle column and a focused ion beam (FIB) column, a gas injection nozzle coupled to a translation device, the translation device configured to insert the gas injection nozzle in close proximity to a stage, and a shutter coupled to the gas injection nozzle and arranged to be disposed between the sample and the SEM column when the gas injection nozzle is inserted in close proximity to the stage.Type: GrantFiled: June 21, 2021Date of Patent: September 5, 2023Assignee: FEI CompanyInventor: Philip Brundage
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Patent number: 11749498Abstract: Systems and method for the preparation and delivery of biological samples for charged particle analysis are disclosed herein. An example system at least includes an ion filter coupled to select a sample ion from an ionized sample supply, the ion filter including a quadrupole filter to select the sample ion from the sample supply, an energy reduction cell coupled to receive the selected sample ion and reduce a kinetic energy of the sample ion, a validation unit coupled to receive the sample ion and determine whether the sample ion is a target sample ion, a substrate coupled to receive the sample, wherein the substrate is electron transparent, an ion transport module coupled to receive the sample ion from the ion filter and transport the sample ion to the substrate, and an imaging system arranged to image, with a low energy charged particle beam, the sample located on the substrate, wherein the substrate is arranged in an analysis location.Type: GrantFiled: December 22, 2021Date of Patent: September 5, 2023Assignee: FEI CompanyInventors: Marcus Straw, Alexander Makarov, Josh Gilbert, Aaron Torok, Joseph Christian, Alan Bahm, Kun Liu, Tom Nichols, Jeff Kosmoski, Dmitry Grinfeld
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Publication number: 20230274908Abstract: A charged particle beam microscope system is operated in a transmission imaging mode. During the operation, the charged particle beam microsystem directs a charged particle beam to the sample to produce images. A time series of beam tilts is applied in a pattern to the charged particle beam directed to the sample to produce a sequence of images. At least some of the images in the sequence of images are captured while the charged particle beam is transitioning between one beam tilt in the time series of beam tilts and a sequentially adjacent beam tilt in the time series of beam tilts. The pattern is configured to induce image changes between the images in the sequence of images that are indicative of optical aberrations in the charged particle beam microscope system.Type: ApplicationFiled: February 28, 2022Publication date: August 31, 2023Applicant: FEI CompanyInventors: Erik Franken, Bart Jozef Janssen
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Patent number: 11742175Abstract: Disclosed herein are methods, apparatuses, systems, and computer-readable media related to defective pixel management in charged particle microscopy. For example, in some embodiments, a charged particle microscope support apparatus may include: first logic to identify a defective pixel region of a charged particle camera, wherein the charged particle camera cannot detect charged particle events in the defective pixel region; second logic to generate a first charged particle event indicator that identifies a first time and a first location of a first charged particle event outside the defective pixel region, wherein the first charged particle event is detected by the charged particle camera; third logic to generate a second charged particle event indicator that identifies a second time and a second location in the defective pixel region; and fourth logic to output data representative of the charged particle event indicators.Type: GrantFiled: June 30, 2021Date of Patent: August 29, 2023Assignee: FEI CompanyInventors: Erik Michiel Franken, Bart Jozef Janssen
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Patent number: 11741730Abstract: Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.Type: GrantFiled: June 24, 2021Date of Patent: August 29, 2023Assignee: FEI CompanyInventors: Pavel Potocek, Maurice Peemen, Bert Henning Freitag
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Patent number: 11735404Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: GrantFiled: September 10, 2020Date of Patent: August 22, 2023Assignee: FEI CompanyInventors: Alex De Marco, Sergey Gorelick, Chad Rue, Joseph Christian, Kenny Mani, Steven Randolph, Matthias Langhorst
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Publication number: 20230260085Abstract: Methods and systems for performing a hybrid machine learning method for enhancing scanning electron microscopy (SEM) images are disclosed herein. Methods include the steps of acquiring a plurality of images of a region of a sample that were each generated by irradiating the sample with a pulsed charged particle beam, upscaling each of the individual images to generate a plurality of upscaled images of the region of the sample, and combining the plurality of upscaled images to form a noise reduced image of the region of the sample.Type: ApplicationFiled: February 17, 2022Publication date: August 17, 2023Applicant: FEI CompanyInventor: Umesh ADIGA
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Publication number: 20230253176Abstract: Various approaches are provided for contamination-free vacuum transfer of samples. As one example, an apparatus includes a compartment configured to store multiple samples held by a cartridge removably coupled to the compartment, a sample port for transferring the cartridge between a charged particle system and a position within the compartment, and a valve configured to seal the compartment at vacuum pressure during transport of the multiple samples between charged particle systems. In this way, samples such as lamellae may be transferred between charged particle systems while maintaining the samples at vacuum pressure, thereby reducing the possibility of sample contamination during sample transfer.Type: ApplicationFiled: February 7, 2022Publication date: August 10, 2023Applicant: FEI CompanyInventors: Jakub Kuba, John M. Mitchels, Jakub Drahotský, Michal Valík
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Publication number: 20230243767Abstract: Methods and systems for spectroscopic analysis of focused ion beam induced optical emission include accessing a spectrum acquired from a sample responsive to irradiating the sample with an ion beam and identifying the spectral peaks of the spectrum. The emission type of the spectral peak is determined based on a spectral resolution of a light collection system for collecting the spectrum. The emission types include elemental emission, molecular emission, and bandgap emission.Type: ApplicationFiled: February 1, 2022Publication date: August 3, 2023Applicant: FEI CompanyInventor: Garrett Budnik
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Publication number: 20230245850Abstract: Various approaches are provided for transferring samples within an inert gas environment to and from a beam system. In one example, a sample transfer capsule includes a container configured to store a sample during transport, wherein the container is adjustable between a closed configuration and an open configuration, an inert gas storage chamber coupled to the container and configured to store an inert gas, and a valve coupled to the inert gas storage chamber and the container and configured to selectively allow the inert gas to flow from the inert gas storage chamber to the container when the container is in the closed configuration. In this way, samples may be maintained in an inert gas environment during transport and while beam system vacuum chambers are vented, thereby reducing exposure of the samples and subsequently reducing the rate of a chemical reaction, such as oxidation or nitridation, of the samples.Type: ApplicationFiled: January 31, 2022Publication date: August 3, 2023Applicant: FEI CompanyInventors: Libor Novák, Petr Glajc, Marek Uncovský
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Publication number: 20230245291Abstract: Various approaches are provided for automatically focusing particle beams for SPA. In one example, a method includes determining a focus adjustment for a region of a sample to achieve a targeted defocus based on at least one defocus measurement from at least one neighboring region of the sample, and causing an acquisition of an image of the sample at the region with the focus adjustment. In this way, a targeted defocus may be achieved across regions of a sample with reduced auxiliary imaging, thereby providing increased and uniform image quality while reducing the time and thus increasing the throughput of processing.Type: ApplicationFiled: January 28, 2022Publication date: August 3, 2023Applicant: FEI CompanyInventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
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Publication number: 20230245334Abstract: Methods include acquiring a series of images or spectra of a volume of a model sample, reconstructing a 3D image of the volume of the model sample using the series of images, constructing a 3D model of the volume of the model sample by forming a segmentation of the reconstructed 3D image and fitting one or more primitive geometrical shapes to the segmentation, acquiring test sample images or spectra, and measuring test sample critical dimensions using the constructed 3D model to guide analysis of test spectra or images. Additional methods and related systems are disclosed, optical critical dimension (OCD) methods and systems.Type: ApplicationFiled: February 2, 2022Publication date: August 3, 2023Applicant: FEI CompanyInventors: John Flanagan, Mary Wu, Erik Franken, Daniel Lichau
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Publication number: 20230238207Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.Type: ApplicationFiled: January 24, 2022Publication date: July 27, 2023Applicant: FEI CompanyInventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr