Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.

Abstract: A laser device includes a laser chamber configured to accommodate laser gas including fluorine, a pair of discharge electrodes arranged inside the laser chamber, a gas supply port arranged in the laser chamber, and an XeF2 crystal to be vaporized as being arranged in an XeF2 vaporization space communicating with the gas supply port.

Abstract: An electric component box includes a first box into which a wiring from the extreme ultraviolet light generation chamber device is introduced and capable of being fixed to a placement surface; a second box into which a wiring from the first box is introduced and capable of being switched, by being raised and lowered, between a fixed state and a movable state; and a connection device providing connection as allowing the second box to be rotatable with respect to the first box, from a facing state in which a predetermined side wall of the first box and a predetermined side wall of the second box face each other, in a direction in which the predetermined side wall of the first box and the predetermined side wall of the second box move away from each other, and to be capable of being raised and lowered with respect to the first box.

Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.

Abstract: A gas laser apparatus includes an enclosure, a window holder, a window, and a sealing member. The window holder further having an extending surface located on the side toward which reflected light travels, the reflected light being reflected off the window, the extending surface being continuous with the end surface and extending in a direction away from the window, the extending surface irradiated with the reflected light. A line is obtained by symmetrically folding back the optical axis of the reflected light at the position, on the extending surface, that is irradiated with the reflected light with respect to a reference line passing through the irradiated position and perpendicular to the extending surface. The line 602 extends across a normal to the window in the direction from the extending surface toward the window from the side facing the outer circumference of the window toward the center axis of the window.

Abstract: An extreme ultraviolet light generation apparatus includes a chamber, a target supply unit configured to supply a target into the chamber, a prepulse laser configured to generate a diffusion target having a Gaussian distribution shape convex toward a travel direction of prepulse laser light by irradiating the target with the prepulse laser light, and a main pulse laser configured to generate extreme ultraviolet light by irradiating the diffusion target with main pulse laser light having an intensity distribution of a Gaussian distribution shape.

Abstract: A chamber to generate extreme ultraviolet light includes a gas supply port through which gas is supplied into the chamber; a light concentrating mirror concentrating the extreme ultraviolet light; a first exhaust pipe arranged in the chamber, surrounding a plasma generation region, and including a first opening through which the gas supplied into the chamber is sucked and through which the extreme ultraviolet light is radiated toward the light concentrating mirror, and a first exhaust port through which the gas sucked through the first opening is exhausted to an outside of the chamber; and a second exhaust pipe arranged in the chamber, and including a second opening which is located in a periphery of the first opening and through which the gas supplied into the chamber is sucked, and a second exhaust port through which the gas sucked through the second opening is exhausted to the outside of the chamber.

Abstract: A laser apparatus includes a laser chamber connected to a gas circulating system including a merging pipe where exhaust gases exhausted from multiple laser apparatuses merge with each other, and configured to select one of a fresh gas containing xenon and a circulating gas flowing through the merging pipe and supply the multiple laser apparatuses with the selected gas; an exhaust pipe which is connected to and between the laser chamber and the merging pipe, and through which the exhaust gas exhausted from the laser chamber flows toward the merging pipe; a fluorine trap connected to a halfway point of the exhaust pipe and configured to remove fluorine from the exhaust gas; and a xenon adder connected to a halfway point of the exhaust pipe and configured to add an additive gas having a xenon concentration higher than a xenon concentration in the fresh gas to the exhaust gas.

Abstract: A differential evacuation device includes a connection pipe connecting a first chamber which outputs extreme ultraviolet light and a second chamber to which the extreme ultraviolet light is input, a first partition wall including a first opening and a first partition plate being arranged such that the extreme ultraviolet light passes through the first opening, a second partition wall including a second opening and a second partition plate being arranged such that the extreme ultraviolet light passes through the second opening, and a first exhaust port exhausting a gas in a first differential evacuation chamber between the first partition wall and the second partition wall. Here, the first partition wall is arranged such that the second opening is surrounded by a portion outside a first high pressure region where a pressure is highest in pressure distribution at the second partition plate on the first differential evacuation chamber side.

Abstract: An optical pulse stretcher includes a beam splitter separating laser light incident on an optical surface thereof into reflection laser light and transmission laser light, a holder fixing the beam splitter with the optical surface of the beam splitter inclined with respect to an optical path axis of the incident laser light, mirrors guiding the reflection laser light to the beam splitter, and a slide mechanism moving the beam splitter in a direction parallel to the optical surface. The slide mechanism includes a slide plate to which the holder is coupled, and a case which holds the slide plate in a movable manner in a slide direction with respect to a base plate on which the mirrors are arranged. The case includes a threaded hole having an internal thread formed on an inner circumference thereof. The slide plate includes a through hole at a position corresponding to the threaded hole.

Abstract: A chamber for a gas laser device includes first and second main electrodes arranged with a longitudinal direction being along a predetermined direction as being spaced apart from and facing each other in the internal space, a window arranged at a wall surface of the chamber, and a first preionization electrode arranged beside one side of the first main electrode. The first preionization electrode includes a first dielectric pipe extending along the longitudinal direction, a first preionization inner electrode arranged in the first dielectric pipe and extending along the longitudinal direction, and a first preionization outer electrode extending along the longitudinal direction, including a first end portion facing an outer circumference surface of the first dielectric pipe, and extending from the first end portion in a direction away from the first dielectric pipe. In a plane perpendicular to the longitudinal direction, a first corona discharge angle is an acute angle.

Abstract: An EUV light generation system includes a processor controlling an actuator which changes an irradiation position of laser light on a target. The processor executes a first control of acquiring a value of a first index related to output values of EUV energy sensors, acquiring a value of a second index related to a ratio of the output values of the EUV energy sensors, and controlling the actuator based on the value of the first index; and a second control of, during the first control, controlling the actuator to move the irradiation position of the laser light in a direction for causing the value of the second index not to exceed a vibration threshold when the value of the second index has exceeded the vibration threshold which reflects a vibration occurrence irradiation position being the irradiation position at which the EUV energy temporally vibrates due to the buffer gas.

Abstract: A high-voltage pulse generation device configured to apply a pulsed high voltage to the space between a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus includes n transformer cores that form a transformer, where n is a natural number greater than or equal to two, n primary electric circuits of the transformer, the n primary electric circuits each having a first terminal connected to a reference potential and a second terminal connected to a charger, the n primary electric circuits each including one or more primary coils, one or more diodes connected in parallel to the one or more primary coils, and one or more pulse generators connected in parallel to the one or more primary coils, and a secondary electric circuit of the transformer, the secondary electric circuit including a secondary coil and connected to the pair of discharge electrodes.

Abstract: A line narrowing module includes a mirror including a bottom surface and a reflection surface of light; a grating configured to wavelength-disperse the light reflected by the reflection surface; a base plate to which the bottom surface of the mirror is fixed with an adhesive; a rotation stage configured to rotate the base plate, arranged thereon, about a rotation axis perpendicular to a plane in which the light is wavelength-dispersed to rotate the mirror about the rotation axis; and a drive unit configured to rotate the rotation stage about the rotation axis. A centroid of the mirror, a centroid of the adhesive, a centroid of the base plate, and a centroid of the rotation stage are located on the rotation axis.

Abstract: An extreme ultraviolet light generation chamber device includes a chamber in which a target substance irradiated with laser is turned into plasma and extreme ultraviolet light is generated, a tank configured to store the target substance, a nozzle having an internal space which communicates with the tank and the chamber, an exhaust device configured to exhaust the chamber, a supply device configured to supply a purge gas to the chamber, a pressure sensor configured to measure a pressure in the chamber, and a processor. Here, the processor causes, before the target substance is melted, the exhaust device to exhaust a gas from the chamber, and after the gas is exhausted, performs supply operation to cause the supply device to supply the purge gas into the chamber and exhaust operation to cause the exhaust device to exhaust the purge gas from the chamber.

Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; a second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.

Abstract: A photosensitive substrate developing method includes heating a photosensitive substrate exposed by scanning each of a plurality of scan fields included in the photosensitive substrate in a first direction with a pulse laser beam including a plurality of center wavelengths via a photomask so as to have a temperature distribution having a temperature gradient in a second direction intersecting the first direction on a surface of the photosensitive substrate in each of the scan fields, and supplying a developer to the surface of the photosensitive substrate to perform development after heating the photosensitive substrate.

Abstract: A laser system includes a pump laser device outputting pump laser light having a first wavelength, a signal laser device outputting signal laser light having a second wavelength, and an amplification system including optical parametric crystals outputting amplification light. The optical parametric crystals include first and second optical parametric crystals. The amplification system is arranged such that beam waist positions of first amplification light and the pump laser light coincide with each other, and that the first amplification light and the pump laser light are coaxially incident on the second optical parametric crystal; and includes a first beam diameter adjustment optical system in which a ratio of a beam waist diameter of the pump laser light to that of the first amplification light is set larger than a ratio of a beam waist diameter of the pump laser light to that of the signal laser light.

Abstract: A line narrowing module includes an enclosure, a prism which is disposed in an internal space of the enclosure and through which light passes, a mounter which is disposed in the internal space and on which the prism is mounted, a fixing unit which is disposed in the internal space and fixes the prism to the mounter, and a light blocking member. The light blocking member is disposed in the internal space and blocks scattered light in the internal space, the scattered light produced from the light and traveling to the fixing unit.

Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus emitting a pulse laser beam, an illumination optical system guiding the pulse laser beam to a reticle, a reticle stage moving the reticle, and a processor controlling emission of the pulse laser beam and movement of the reticle. The exposure system performs scanning exposure of a semiconductor substrate by irradiating the reticle with the pulse laser beam. The reticle has first and second regions. The processor instructs the laser apparatus about, based on proximity effect characteristics corresponding to the first and second regions, a value of a control parameter of the pulse laser beam corresponding to each region so that the laser apparatus emits the pulse laser beam with which a difference of the proximity effect characteristic of each region from a reference proximity effect characteristic is in an allowable range.