Abstract: Discharge electrodes to be used in a gas laser device for exciting a laser gas containing fluorine by discharge include a cathode and an anode. The anode is arranged as facing the cathode and includes an electrode base member including a metal, and a coating layer including an insulating material and coating a part of a side surface, parallel to a longitudinal direction, of the electrode base member. The coating layer includes a first portion coating a first region of the side surface and a second portion coating a second region of the side surface, located farther from the cathode than the first region in a discharge direction perpendicular to the longitudinal direction, and being thicker than the first portion.

Abstract: A target supply system includes a target generation unit configured to generate a liquid target substance by melting a solid target substance at an inside thereof, and output the liquid target substance; an input mechanism configured to introduce the solid target substance to the target generation unit; a heater arranged at the target generation unit; a sensor configured to detect a temperature of the target generation unit; and a processor configured to control an input timing at which the solid target substance is introduced to the target generation unit, perform feedback control on the heater based on a present temperature detected by the sensor, and perform feedforward control on the heater based on the input timing while performing feedback control on the heater.

Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.

Abstract: An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pulse laser light to be radiated to the target, and a processor configured to change a generation frequency of the target generated by the target supply unit to a natural number multiple of an irradiation frequency of the pulse laser light based on a size of the target or related information related to the size of the target.

Abstract: A laser apparatus includes a first wavelength variable semiconductor laser that outputs first continuous-wave laser light; a first amplifier that pulses and amplifies the first laser light and outputs first pulse laser light; a wavelength conversion system that converts a wavelength of the first pulse laser light and outputs second pulse laser light; an excimer amplifier that amplifies the second pulse laser light and outputs third pulse laser light; a monitor module that measures a wavelength of the third pulse laser light; and a processor that periodically changes a target wavelength of the third pulse laser light and controls a current for changing the wavelength of the laser light from the first semiconductor laser such that the wavelength of the third pulse laser light becomes the target wavelength based on a measured value of the wavelength of the third pulse laser light output at the same target wavelength.

Abstract: A laser apparatus includes a first semiconductor laser outputting first continuous-wave laser light; a first amplifier a wavelength conversion system outputting second pulse laser light; an excimer amplifier amplifying the second pulse laser light; a monitor module; and a processor calculating a center wavelength being an average of a measured value of the wavelength of the third pulse laser light output at the first target wavelength and a measured value of the wavelength thereof output at the second target wavelength, calculating a wavelength difference of the measurement values, calculating an average current value of a current flowing through the first semiconductor laser, calculating a current value difference such that a difference between a target wavelength difference and the wavelength difference decreases, and calculating a first current value at the first target wavelength and a second current value at the second target wavelength to control the first semiconductor laser.

Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which a droplet target irradiated with laser light is turned into plasma and extreme ultraviolet light is generated, a light concentrating mirror arranged in the chamber and concentrating the extreme ultraviolet light, a gas curtain forming device injecting a gas to form a gas curtain intersecting an optical path of the extreme ultraviolet light propagating from the plasma generation region to the light concentrating mirror, an etching gas supply unit supplying an etching gas into the chamber, and a gas exhaust unit exhausting a residual gas in the chamber. Pressure in a second space that is a space on a side toward the light concentrating mirror from the gas curtain is lower than pressure in a first space that is a space on a side toward the plasma generation region from the gas curtain.

Abstract: A line narrowing laser device includes an optical element and a diffractive optical element positioned on an optical path of an optical resonator, a wavelength actuator configured to change an incident angle of light incident on the diffractive optical element by moving the optical element, a wavelength driver configured to drive the wavelength actuator, a processor configured to output a wavelength control signal to the wavelength driver so that a wavelength of pulse laser light output from the optical resonator periodically changes, and a notch filter arranged in a path of the wavelength control signal and configured to operate at a notch frequency different from a drive frequency of the wavelength actuator.

Abstract: A high voltage pulse generation device includes n transformer cores configuring a transformer, n being a natural number of 2 or more, each of the n transformer cores being configured to form a magnetic circuit along a first plane and to have a width in a first direction parallel to the first plane larger than a width in a second direction parallel to the first plane and perpendicular to the first direction; n primary electric circuits of the transformer connected in parallel to each other, each of the n primary electric circuits including at least one primary coil, and m pulse generation units connected in parallel to the at least one primary coil, m being a natural number equal to or more than 2; and a secondary electric circuit of the transformer including a secondary coil and connected to a pair of discharge electrodes.

Abstract: A laser apparatus includes: a laser oscillator including a wavelength adjuster and configured to output pulse laser light having a center wavelength adjusted by the wavelength adjuster; a spectrum monitor configured to generate data on a spectrum of the pulse laser light; and a processor configured to control the wavelength adjuster in such a way that the center wavelength of the pulse laser light changes in accordance with a target wavelength that periodically changes to each of multiple values including first and second wavelengths, calculate a first spectral linewidth from data on spectra of multiple pulses each having the first wavelength as the target wavelength, and calculate a second spectral linewidth from data on spectra of multiple pulses each having the second wavelength as the target wavelength.

Abstract: In a chamber of a gas laser apparatus, a distance from an imaginary axis extending along a predetermined direction to a first end portion between first and second primary electrodes increases from one side toward the other side in the predetermined direction, and a distance from the imaginary axis to a second end portion decreases from the one side toward the other side in the predetermined direction.

Abstract: A gas laser device includes a chamber configured to enclose a laser gas as including a pair of discharge electrodes having a longitudinal direction oriented along a predetermined direction and facing each other with a space therebetween; a plurality of capacitors arranged along the predetermined direction, each of the capacitors having one terminal electrically connected to one of the discharge electrodes and the other terminal electrically connected to the other of the discharge electrodes; and first and second magnetic switches each electrically connected to the one discharge electrode and the one terminal of each of the capacitors and electrically connected to each other in parallel. The second magnetic switch is arranged closer to a center of the one discharge electrode in the predetermined direction than the first magnetic switch, and a Vt product of the first magnetic switch is smaller than a Vt product of the second magnetic switch.

Abstract: A chamber for a gas laser device includes a first main electrode and a second main electrode arranged along a predetermined direction as being apart from and facing each other in the internal space, a window arranged at a wall surface of the chamber and transmitting light from the internal space, and a first preionization electrode arranged beside one side of the first main electrode. Here, the first preionization electrode includes a first dielectric pipe, a first preionization inner electrode arranged in the first dielectric pipe and extending along the first dielectric pipe, and a first preionization outer electrode extending along the first dielectric pipe and including a first end portion facing the first dielectric pipe with a first gap with respect to the first dielectric pipe. At least a part of the first gap is larger than 0 mm and equal to or smaller than 0.9 mm.

Abstract: A method of baking a chamber of a gas laser apparatus provided with a cooling passage configured to make a cooling medium that cools the chamber flow on an outer side of a wall surface in contact with an internal space of the chamber for generating light in the internal space includes a heating step of heating the internal space via the wall surface by making a heating medium flow through the cooling passage before generating the light in the internal space, and an exhaust step of exhausting a gas in the heated internal space to an external space of the chamber.

Abstract: A laser system according to one aspect of the present disclosure includes a wavelength-variable first solid-state laser device configured to output a first pulse laser beam; a wavelength conversion system including a first nonlinear crystal configured to wavelength-convert the first pulse laser beam and a first rotation stage configured to change a first incident angle of the first pulse laser beam on the first nonlinear crystal; an excimer amplifier configured to amplify a pulse laser beam wavelength-converted by the wavelength conversion system; and a control unit configured to receive, from an external device, data of a target center wavelength of an excimer laser beam output from the excimer amplifier, control a wavelength of the first pulse laser beam in accordance with the instructed target center wavelength, and control the first incident angle on the first nonlinear crystal in accordance with an average value of the target center wavelength.

Abstract: A training model creating method includes creating a database by breaking a component in a laser device on a Digital Twin constructed by modeling electrical hardware and software of the laser device, and accumulating data in which the broken component and a failure phenomenon output from the Digital Twin are associated with each other; and training a training model using the data in the database as training data for machine learning so that, upon receiving an input of information on a failure phenomenon, the training model outputs information on a malfunction location corresponding to the input.

Abstract: A gas laser device includes a power source, a main capacitor, a solid-state switch, a step-up transformer, a first magnetic pulse compression circuit including a first transfer capacitor and a first magnetic switch, and connected to a secondary side of the step-up transformer, a second magnetic pulse compression circuit including a second transfer capacitor and a second magnetic switch, and connected subsequently to the first magnetic pulse compression circuit, a peaking capacitor connected subsequently to the second magnetic pulse compression circuit, a pair of discharge electrodes, a regenerative transformer transferring charges generated by the discharge electrodes to the main capacitor after main discharge, and a reset circuit resetting the first magnetic switch and the second magnetic switch. Potential of the cathode electrode in a period of 0.5 ?s to 20 ?s both inclusive after the main discharge starts is within a range of ?200 V to 200 V both inclusive.

Abstract: A discharge electrode according to an aspect of the present disclosure is for use in a gas laser apparatus that excites a laser gas containing fluorine by discharge, and includes a cathode electrode that extends in one direction, and an anode electrode that extends in the one direction and that is disposed facing the cathode electrode in a discharge direction orthogonal to the one direction. At least one of the cathode electrode and the anode electrode includes an electrode substrate containing a metal, and a dielectric including a first layer having voids provided on a pair of side faces of the electrode substrate. A porosity of the first layer is in a range of 0.5% to 25%.

Abstract: A laser device, to be used in a laser processing system for performing laser processing by irradiating a workpiece with laser light in a gas containing oxygen includes a solid-state oscillator including a solid-state laser device configured to output laser light having a pulse width in a range of 100 ps to 1 ns both inclusive and having a center wavelength within an oscillation wavelength range of an ArF excimer laser device and outside absorption lines of oxygen, an ArF excimer amplifier configured to amplify the laser light output from the solid-state oscillator, and a first optical pulse stretcher configured to output laser light that is burst-pulsed by dividing the laser light amplified by the ArF excimer amplifier into a plurality of pulses as the laser light being caused to circulate through a delay optical path thereof.

Abstract: A residual pulse cost calculation method for a component of a light source which outputs a pulse laser beam includes, by a processor, acquiring first data in which the component of the light source and an operation pulse count of the component sequentially stored through an operation of the light source are associated with each other, acquiring second data in which the component and a standard guaranteed pulse count of the component are associated with each other, acquiring third data in which the light source and a pulse unit price of the light source are associated with each other, calculating a residual pulse count of the component from the operation pulse count and the standard guaranteed pulse count, calculating a residual pulse cost of the component from the residual pulse count and the pulse unit price, and outputting the residual pulse cost.