Abstract: A laser processing method is a laser processing method for forming plural recesses by radiating pulse laser light to plural processing receiving regions separate from each other on a surface of a workpiece, the method including a first process of radiating the pulse laser light to a different one of the processing receiving regions on a pulse basis, and a second process of radiating the pulse laser light to a different one of the processing receiving regions on a pulse basis in such a way that the different processing receiving region overlaps with a part of a radiation receiving region irradiated with the pulse laser light in the first process.

Abstract: A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance, a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe, and a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank.

Abstract: A laser processing system includes a laser apparatus that outputs a deep ultraviolet laser beam in response to a light emission trigger signal, an optical isolator including a polarizer, a deep ultraviolet light transmitting element, and a piezoelectric element connected to the deep ultraviolet light transmitting element, and a processor that supplies, to the piezoelectric element, a drive signal having a voltage changeable with a natural frequency of the deep ultraviolet light transmitting element, and transmits the light emission trigger signal to the laser apparatus using the natural frequency or a frequency obtained by dividing the natural frequency as a repetition frequency so that the deep ultraviolet light transmitting element functions as a ¼ wave plate by stress birefringence due to force from the piezoelectric element, and processing is performed by irradiating a workpiece with the laser beam from the optical isolator.

Abstract: An extreme ultraviolet light generation apparatus includes a chamber, a target supply unit supplying a droplet of a target substance toward a plasma generation region, a light concentrating mirror concentrating extreme ultraviolet light, a debris shield provided with a first opening through which the extreme ultraviolet light passes from the plasma generation region toward the light concentrating mirror and a second opening, a gas supply port supplying a gas to an internal space of the chamber, and an exhaust port exhausting a gas in a space surrounded by the debris shield. At least a part of the second opening is provided at a position symmetrical to at least a part of the first opening with reference to a plane including a trajectory of the laser light and a trajectory of the droplet. The gas at the internal space flows into the space through the first opening and the second opening.

Abstract: A chamber device includes an inner housing including a passage port through which light generated by excitation of laser gas at an internal space thereof passes, an outer housing surrounding at least a part of the inner housing from a lateral side of a travel direction of the light, and a partition wall arranged between the inner housing and the outer housing and fixed to the inner housing and the outer housing.

Abstract: A laser device includes a pair of electrodes configured to cause discharge to occur, and an optical pulse stretcher configured to extend a pulse width of pulse laser light generated by the discharge having occurred between the electrodes. Here, the optical pulse stretcher includes a beam splitter arranged such that an optical surface thereof on which the pulse laser light is incident is inclined with respect to an optical path axis of the pulse laser light, and configured to separate the pulse laser light incident on the optical surface into reflection laser light and transmission laser light; a plurality of mirrors configured to guide the reflection laser light to the beam splitter; and a slide mechanism configured to move the beam splitter in a direction perpendicular to a direction of the discharge and parallel to the optical surface.

Abstract: A gas laser device includes an optical plate in an accommodating portion, a monitor module including a light entrance region and slidable on the optical plate, a positioning member on the optical plate for positioning the monitor module at a predetermined position on the optical plate, and a guide extending parallel to an optical axis of light traveling to the entrance region and guiding the monitor module toward the positioning member in the parallel direction. The monitor module includes a through-hole penetrating therethrough in the parallel direction and provided at a position deviating from the entrance region, slides on the optical plate to a predetermined region perpendicularly to the optical axis, then slides along the guide in the parallel direction toward the positioning member spaced apart from the predetermined region in the parallel direction, and is fixed in an internal space of the accommodating portion with a fixing member.

Abstract: A performance recovery method for an EUV light generation system includes performing a first evaluation step of evaluating performance of EUV light while generating the EUV light at a certain repetition frequency during a first period; performing, when an evaluation result of the first evaluation step is not within a normal range, an adjustment step of adjusting the performance and then the first evaluation step as a check step; performing, when an evaluation result of the check step is within the normal range, a second evaluation step of evaluating performance of the EUV light while generating the EUV light at the repetition frequency during a second period longer than the first period; and terminating processing when the evaluation result of the check step is not within the normal range. An index related to an irradiation position of pulse laser light is evaluated in the first and second evaluation steps.

Abstract: A line narrowing laser device includes a laser resonator including an output coupling mirror and a line narrowing module that includes a prism and a grating that has a reflection surface having a concave shape; a laser chamber including a pair of discharge electrodes, and arranged on an optical path of the laser resonator; a power source configured to apply, to the discharge electrodes, a high voltage pulse whose repetition frequency is variable; a wavefront adjuster including the output coupling mirror; a spectrum detector configured to measure a spectral line width of pulse laser light output from the output coupling mirror; and a processor configured to control the wavefront adjuster based on the measured spectral line width.

Abstract: An EUV light generation apparatus according to an aspect of the present disclosure includes a chamber, a target supply device configured to supply a target into the chamber, a target imaging device configured to create a first target image by imaging a region including the target and a second target image by imaging the region at a timing at which a position of the target in the second target image does not overlap with a position thereof in the first target image, and a processor configured to create a background image using at least the second target image, creating a background corrected image by correcting the first target image, and detecting a position of the target based on the background corrected image.

Abstract: A laser processing method according to one aspect of the present disclosure includes depositing a product generated from a first glass substrate at a processing position of a second glass substrate by irradiating the first glass substrate with a first ultraviolet pulse laser beam under a first irradiation condition, and forming a hole by irradiating the processing position where the product is deposited with a second ultraviolet pulse laser beam under a second irradiation condition different from the first irradiation condition.

Abstract: A profile display device includes an interface configured to receive a beam profile of laser light, a processor configured to generate a shifted outline by shifting a position of an outline of the beam profile in accordance with deviation of a light intensity distribution in the beam profile, and a display configured to display the beam profile and the shifted outline.

Abstract: A laser processing apparatus includes a placement base on which a workpiece is placed, a beam shaping optical system configured to shape laser light in such a way that a laser light irradiated region of a mask configured to block part of the laser light has a rectangular shape having short edges and long edges, a second radiation width of the irradiated region in the direction parallel to the long edges being changeable independently of a first radiation width of the irradiated region in the direction parallel to the short edges, and the irradiated region being movable in the direction parallel to the long edges, a projection optical system configured to project a pattern of the mask on the workpiece placed on the placement base, and a mover configured to be capable of moving the irradiated region in the direction parallel to the short edges.

Abstract: A laser device includes a first actuator configured to adjust an oscillation wavelength of pulse laser light; a second actuator configured to adjust a spectral line width of the pulse laser light; and a processor configured to determine a target spectral line width by reading data specifying a number of irradiation pulses of the pulse laser light with which one location of an irradiation receiving object is irradiated and a difference between a shortest wavelength and a longest wavelength, control the second actuator based on the target spectral line width, and control the first actuator so that the oscillation wavelength periodically changes every number of the irradiation pulses between the shortest wavelength and the longest wavelength.

Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.

Abstract: A laser device includes a laser chamber configured to accommodate laser gas including fluorine, a pair of discharge electrodes arranged inside the laser chamber, a gas supply port arranged in the laser chamber, and an XeF2 crystal to be vaporized as being arranged in an XeF2 vaporization space communicating with the gas supply port.

Abstract: An electric component box includes a first box into which a wiring from the extreme ultraviolet light generation chamber device is introduced and capable of being fixed to a placement surface; a second box into which a wiring from the first box is introduced and capable of being switched, by being raised and lowered, between a fixed state and a movable state; and a connection device providing connection as allowing the second box to be rotatable with respect to the first box, from a facing state in which a predetermined side wall of the first box and a predetermined side wall of the second box face each other, in a direction in which the predetermined side wall of the first box and the predetermined side wall of the second box move away from each other, and to be capable of being raised and lowered with respect to the first box.

Abstract: A gas laser apparatus includes an enclosure, a window holder, a window, and a sealing member. The window holder further having an extending surface located on the side toward which reflected light travels, the reflected light being reflected off the window, the extending surface being continuous with the end surface and extending in a direction away from the window, the extending surface irradiated with the reflected light. A line is obtained by symmetrically folding back the optical axis of the reflected light at the position, on the extending surface, that is irradiated with the reflected light with respect to a reference line passing through the irradiated position and perpendicular to the extending surface. The line 602 extends across a normal to the window in the direction from the extending surface toward the window from the side facing the outer circumference of the window toward the center axis of the window.

Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.

Abstract: An extreme ultraviolet light generation apparatus includes a chamber, a target supply unit configured to supply a target into the chamber, a prepulse laser configured to generate a diffusion target having a Gaussian distribution shape convex toward a travel direction of prepulse laser light by irradiating the target with the prepulse laser light, and a main pulse laser configured to generate extreme ultraviolet light by irradiating the diffusion target with main pulse laser light having an intensity distribution of a Gaussian distribution shape.