Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which a droplet target irradiated with laser light is turned into plasma and extreme ultraviolet light is generated, a light concentrating mirror arranged in the chamber and concentrating the extreme ultraviolet light, a gas curtain forming device injecting a gas to form a gas curtain intersecting an optical path of the extreme ultraviolet light propagating from the plasma generation region to the light concentrating mirror, an etching gas supply unit supplying an etching gas into the chamber, and a gas exhaust unit exhausting a residual gas in the chamber. Pressure in a second space that is a space on a side toward the light concentrating mirror from the gas curtain is lower than pressure in a first space that is a space on a side toward the plasma generation region from the gas curtain.

Abstract: A line narrowing laser device includes an optical element and a diffractive optical element positioned on an optical path of an optical resonator, a wavelength actuator configured to change an incident angle of light incident on the diffractive optical element by moving the optical element, a wavelength driver configured to drive the wavelength actuator, a processor configured to output a wavelength control signal to the wavelength driver so that a wavelength of pulse laser light output from the optical resonator periodically changes, and a notch filter arranged in a path of the wavelength control signal and configured to operate at a notch frequency different from a drive frequency of the wavelength actuator.

Abstract: A high voltage pulse generation device includes n transformer cores configuring a transformer, n being a natural number of 2 or more, each of the n transformer cores being configured to form a magnetic circuit along a first plane and to have a width in a first direction parallel to the first plane larger than a width in a second direction parallel to the first plane and perpendicular to the first direction; n primary electric circuits of the transformer connected in parallel to each other, each of the n primary electric circuits including at least one primary coil, and m pulse generation units connected in parallel to the at least one primary coil, m being a natural number equal to or more than 2; and a secondary electric circuit of the transformer including a secondary coil and connected to a pair of discharge electrodes.

Abstract: A laser apparatus includes: a laser oscillator including a wavelength adjuster and configured to output pulse laser light having a center wavelength adjusted by the wavelength adjuster; a spectrum monitor configured to generate data on a spectrum of the pulse laser light; and a processor configured to control the wavelength adjuster in such a way that the center wavelength of the pulse laser light changes in accordance with a target wavelength that periodically changes to each of multiple values including first and second wavelengths, calculate a first spectral linewidth from data on spectra of multiple pulses each having the first wavelength as the target wavelength, and calculate a second spectral linewidth from data on spectra of multiple pulses each having the second wavelength as the target wavelength.

Abstract: In a chamber of a gas laser apparatus, a distance from an imaginary axis extending along a predetermined direction to a first end portion between first and second primary electrodes increases from one side toward the other side in the predetermined direction, and a distance from the imaginary axis to a second end portion decreases from the one side toward the other side in the predetermined direction.

Abstract: A gas laser device includes a chamber configured to enclose a laser gas as including a pair of discharge electrodes having a longitudinal direction oriented along a predetermined direction and facing each other with a space therebetween; a plurality of capacitors arranged along the predetermined direction, each of the capacitors having one terminal electrically connected to one of the discharge electrodes and the other terminal electrically connected to the other of the discharge electrodes; and first and second magnetic switches each electrically connected to the one discharge electrode and the one terminal of each of the capacitors and electrically connected to each other in parallel. The second magnetic switch is arranged closer to a center of the one discharge electrode in the predetermined direction than the first magnetic switch, and a Vt product of the first magnetic switch is smaller than a Vt product of the second magnetic switch.

Abstract: A method of baking a chamber of a gas laser apparatus provided with a cooling passage configured to make a cooling medium that cools the chamber flow on an outer side of a wall surface in contact with an internal space of the chamber for generating light in the internal space includes a heating step of heating the internal space via the wall surface by making a heating medium flow through the cooling passage before generating the light in the internal space, and an exhaust step of exhausting a gas in the heated internal space to an external space of the chamber.

Abstract: A chamber for a gas laser device includes a first main electrode and a second main electrode arranged along a predetermined direction as being apart from and facing each other in the internal space, a window arranged at a wall surface of the chamber and transmitting light from the internal space, and a first preionization electrode arranged beside one side of the first main electrode. Here, the first preionization electrode includes a first dielectric pipe, a first preionization inner electrode arranged in the first dielectric pipe and extending along the first dielectric pipe, and a first preionization outer electrode extending along the first dielectric pipe and including a first end portion facing the first dielectric pipe with a first gap with respect to the first dielectric pipe. At least a part of the first gap is larger than 0 mm and equal to or smaller than 0.9 mm.

Abstract: A laser system according to one aspect of the present disclosure includes a wavelength-variable first solid-state laser device configured to output a first pulse laser beam; a wavelength conversion system including a first nonlinear crystal configured to wavelength-convert the first pulse laser beam and a first rotation stage configured to change a first incident angle of the first pulse laser beam on the first nonlinear crystal; an excimer amplifier configured to amplify a pulse laser beam wavelength-converted by the wavelength conversion system; and a control unit configured to receive, from an external device, data of a target center wavelength of an excimer laser beam output from the excimer amplifier, control a wavelength of the first pulse laser beam in accordance with the instructed target center wavelength, and control the first incident angle on the first nonlinear crystal in accordance with an average value of the target center wavelength.

Abstract: A laser device, to be used in a laser processing system for performing laser processing by irradiating a workpiece with laser light in a gas containing oxygen includes a solid-state oscillator including a solid-state laser device configured to output laser light having a pulse width in a range of 100 ps to 1 ns both inclusive and having a center wavelength within an oscillation wavelength range of an ArF excimer laser device and outside absorption lines of oxygen, an ArF excimer amplifier configured to amplify the laser light output from the solid-state oscillator, and a first optical pulse stretcher configured to output laser light that is burst-pulsed by dividing the laser light amplified by the ArF excimer amplifier into a plurality of pulses as the laser light being caused to circulate through a delay optical path thereof.

Abstract: A residual pulse cost calculation method for a component of a light source which outputs a pulse laser beam includes, by a processor, acquiring first data in which the component of the light source and an operation pulse count of the component sequentially stored through an operation of the light source are associated with each other, acquiring second data in which the component and a standard guaranteed pulse count of the component are associated with each other, acquiring third data in which the light source and a pulse unit price of the light source are associated with each other, calculating a residual pulse count of the component from the operation pulse count and the standard guaranteed pulse count, calculating a residual pulse cost of the component from the residual pulse count and the pulse unit price, and outputting the residual pulse cost.

Abstract: A gas laser device includes a power source, a main capacitor, a solid-state switch, a step-up transformer, a first magnetic pulse compression circuit including a first transfer capacitor and a first magnetic switch, and connected to a secondary side of the step-up transformer, a second magnetic pulse compression circuit including a second transfer capacitor and a second magnetic switch, and connected subsequently to the first magnetic pulse compression circuit, a peaking capacitor connected subsequently to the second magnetic pulse compression circuit, a pair of discharge electrodes, a regenerative transformer transferring charges generated by the discharge electrodes to the main capacitor after main discharge, and a reset circuit resetting the first magnetic switch and the second magnetic switch. Potential of the cathode electrode in a period of 0.5 ?s to 20 ?s both inclusive after the main discharge starts is within a range of ?200 V to 200 V both inclusive.

Abstract: A discharge electrode according to an aspect of the present disclosure is for use in a gas laser apparatus that excites a laser gas containing fluorine by discharge, and includes a cathode electrode that extends in one direction, and an anode electrode that extends in the one direction and that is disposed facing the cathode electrode in a discharge direction orthogonal to the one direction. At least one of the cathode electrode and the anode electrode includes an electrode substrate containing a metal, and a dielectric including a first layer having voids provided on a pair of side faces of the electrode substrate. A porosity of the first layer is in a range of 0.5% to 25%.

Abstract: A training model creating method includes creating a database by breaking a component in a laser device on a Digital Twin constructed by modeling electrical hardware and software of the laser device, and accumulating data in which the broken component and a failure phenomenon output from the Digital Twin are associated with each other; and training a training model using the data in the database as training data for machine learning so that, upon receiving an input of information on a failure phenomenon, the training model outputs information on a malfunction location corresponding to the input.

Abstract: A line narrowing gas laser device includes a line narrowing device, an output coupling mirror, a laser chamber arranged on an optical path of an optical resonator, a first holder which supports the output coupling mirror, a second holder which supports the first holder to be rotatable about a rotation axis of the first holder, and an adjustment device supported by the second holder and being in contact with the first holder to rotate the first holder about the rotation axis. The line narrowing device has a characteristic of changing, into a first direction, beam pointing of laser light output toward the output coupling mirror when temperature inside the line narrowing device rises. The second holder and the adjustment device rotate the first holder in a direction in which a change in the first direction in the beam pointing of the laser light is suppressed by thermal expansion.

Abstract: A target substance replenishment device may include a first container containing a solid target substance, a first path through which the solid target substance supplied from the first container passes, a first supply switching device switching between a first state where supply of the solid target substance from the first container to the first path is suppressed and a second state where the supply of the solid target substance from the first container to the first path is allowed, a first valve connected to the first path, a second path which is connected to the first valve and through which the solid target substance having passed through the first valve passes, a first detector outputting a first detection signal indicating that the second path is clogged with the solid target substance, and a processor controlling the first supply switching device to the first state based on the first detection signal.

Abstract: A laser processing apparatus includes a placement base on which a workpiece is placed, a beam shaping optical system that shapes laser light such that a first laser light irradiated region of a mask blocking part of the laser light has a rectangular shape having short edges and long edges, the beam shaping optical system capable of causing one of a first radiation width of the first irradiated region in the direction parallel to the short edges and a second radiation width of the first irradiated region in the direction parallel to the long edges to be fixed and causing the other to be changed, a projection optical system that projects a pattern on the mask onto the workpiece, and a mover that moves the first irradiated region at least in the direction parallel to the short edges to move a second laser light irradiated region of the workpiece.

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.

Abstract: A laser apparatus includes an oscillator that outputs a laser beam, an amplifier that amplifies the laser beam in a chamber including discharge electrodes, front-side and rear-side optical systems disposed at positions facing each other across the chamber and constituting a ring resonator including a first optical path and a second optical path intersecting between the pair of discharge electrodes, a front-side observation device for observation of the first and second optical paths between the front-side optical system and the chamber, and a rear-side observation device for observation of the first and second optical paths between the rear-side optical system and the chamber. Through the first optical path, the front-side optical system outputs, toward the rear-side optical system, the laser beam from the oscillator. Through the second optical path, the rear-side optical system outputs, toward the front-side optical system, the laser beam through the first optical path.

Abstract: A laser system includes a first semiconductor laser device configured to output first CW laser light, a first semiconductor optical amplification device configured to amplify the first CW laser light and output second CW laser light, an optical parametric amplification device configured to amplify the second CW laser light and output first pulse laser light, and a wavelength conversion device configured to perform wavelength conversion on the first pulse laser light and output second pulse laser light in a deep ultraviolet wavelength region.