Patents Assigned to Hitachi High-Technologies Corporation
  • Publication number: 20220113331
    Abstract: A method of washing an aspiration probe of an in-vitro diagnostic system is disclosed. The aspiration probe comprises an outer surface and an inner surface forming an inner space for receiving a fluid. The method comprises dipping the aspiration probe into a first wash fluid so that the outer surface is immersed at least in part into the first wash fluid, aspirating an amount of the first wash fluid into the inner space of the aspiration probe, propagating an ultrasonic vibration to the outer surface of the aspiration probe via the first wash fluid, and rinsing the outer surface and the inner surface of the aspiration probe with a second wash fluid. Further, an in-vitro diagnostic method and an in-vitro diagnostic system are disclosed.
    Type: Application
    Filed: October 22, 2021
    Publication date: April 14, 2022
    Applicants: Roche Diagnostics Operations, Inc., Hitachi High-Technologies Corporation
    Inventors: Kouhei Nonaka, Takamichi Mori, Yoichi Aruga, Yosuke Horie, Andrew McCaughey, Alexander Seiler
  • Patent number: 11282184
    Abstract: A state of a sample surface is accurately determined without lowering analysis efficiency. There is provided an apparatus for determining a state of a sample to be analyzed contained in a container, in which the apparatus acquires an image of the sample, analyzes a position and a size of an object to be detected with respect to a detection range set in the image by using the image of the sample, and determines the state of the sample based on a result of the analysis.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: March 22, 2022
    Assignee: HITACHI-HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yasuki Kakishita, Hideharu Hattori, Taku Sakazume, Yoichiro Suzuki
  • Publication number: 20210383524
    Abstract: A pattern inspection system inspects an image of an inspection target pattern of an electronic device using an identifier constituted by machine learning, based on the image of the inspection target pattern of the electronic device and data used to manufacture the inspection target pattern. The system includes a storage unit which stores a plurality of pattern images of the electronic device and pattern data used to manufacture a pattern of the electronic device, and an image selection unit which selects a learning pattern image used in the machine learning from the plurality of pattern images, based on the pattern data and the pattern image stored in the storage unit.
    Type: Application
    Filed: August 24, 2021
    Publication date: December 9, 2021
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shuyang DOU, Shinichi SHINODA, Yasutaka TOYODA, Hiroyuki SHINDO
  • Patent number: 11187712
    Abstract: The present invention makes it possible for an automated analyzer including two or more types of photometers to obtain suitable output of the measurement results of the plurality of photometers and suitable data alarm output even if there is an abnormality, or the like, at the time of measurement. This automated analyzer includes, for example, two types of photometers having different quantitative ranges and an analysis control unit for controlling analysis that includes measurement of a given sample using the two types of photometers. If two types of data alarms corresponding to abnormalities, or the like, during measurement have been added to the two types of measurement results from the two types of photometers, the analysis control unit selects measurement result and data alarm output corresponding to the combination of the two types of data alarms and outputs the same to a user as analysis results.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: November 30, 2021
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuto Kazama, Masahiko Iijima, Chie Yabutani, Kenji Kogure
  • Publication number: 20210287871
    Abstract: To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.
    Type: Application
    Filed: July 14, 2016
    Publication date: September 16, 2021
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kengo ASAI, Hiroyasu SHICHI, Toru IWAYA, Hisayuki TAKASU
  • Patent number: 11107655
    Abstract: In order to optimize defect contrast in a charged particle beam device that inverts charged particles directly above a sample and observes the electrons, this charged particle beam device is provided with a charged particle source, an electron gun control device which applies a first voltage to the charged particle source, a substrate voltage control device which applies a second voltage to a sample, an image forming optical system which includes an imaging lens for imaging charged particles incident from the direction of the sample, a detector which includes a camera for detecting the charged particles, and an image processing device which processes the detected signal, wherein the imaging optical system is configured so as not to image secondary electrons emitted from the sample, but forms an image with mirror electrons bounced back by the electric field formed on the sample by means of the potential difference between the first and the second voltages.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: August 31, 2021
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tomohiko Ogata, Masaki Hasegawa, Katsunori Onuki, Noriyuki Kaneoka, Hisaya Murakoshi
  • Publication number: 20210241998
    Abstract: There is provided a plasma processing apparatus that suppress the contamination of a sample and improves process yield or an inner component of a plasma processing apparatus or a manufacturing method for the inner component. A plasma processing apparatus processes a wafer which is a processing target placed in a processing chamber in an inside of a vacuum chamber using plasma formed from a processing gas supplied to an inside of the processing chamber. A surface of a component that is placed in the inside of the processing chamber and faces the plasma is made of a dielectric material. The dielectric material includes a first material that combines with the supplied processing gas and is volatilized and a second material that combines with the processing gas to produce a non-volatile compound, a volume of the non-volatile compound being increased before the combination.
    Type: Application
    Filed: April 12, 2019
    Publication date: August 5, 2021
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Tomoyuki TAMURA, Kazuyuki IKENAGA
  • Publication number: 20210233740
    Abstract: The present invention provides an electron microscope and an observation method capable of observing secondary electrons in the atmosphere. In detail, a charged particle microscope of the invention includes: a partition wall that separates a non-vacuum space in which a sample is loaded from a vacuum space inside a charged particle optical lens barrel; an upper electrode; a lower electrode on which the sample is loaded; a power supply for applying a voltage to at least one of the upper electrode and the lower electrode; a sample gap adjusting mechanism for adjusting a gap between the sample and the partition wall; and an image forming unit for forming an image of the sample based on the current absorbed by the lower electrode. The secondary electrons are selectively measured by using an amplification effect due to ionization collision between electrons and gas molecules generated when a voltage is applied between the upper electrode and the lower electrode.
    Type: Application
    Filed: April 22, 2016
    Publication date: July 29, 2021
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Minami SHOUJI, Natsuki TSUNO, Yuusuke OOMINAMI
  • Patent number: 11016023
    Abstract: In an is-TPG method in which lasers having two different wavelengths are used to generate a wavelength-variable far-infrared light, a far-infrared light (TPG light) having an unstable output at a broad wavelength is also slightly generated at the same time with only one laser light. The generated is-TPG and the TPG light are converted, after passing through a specimen, to near-infrared light inside a nonlinear optical crystal for detection and are observed by a detector. The signal light output of the is-TPG light becomes unstable due to the TPG light. According to the present invention, the TPG light is removed by means of a slit and the like (filter) immediately before the specimen and is not introduced into the nonlinear optical crystal for detection. At this time, by using a change in the emission direction when the frequency of the is TPG light is changed, the filter is moved in accordance with the frequency so that only the is-TPG light passes therethrough (see FIG. 1C).
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: May 25, 2021
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mizuki Mohara, Kei Shimura, Kenji Aiko
  • Publication number: 20210151336
    Abstract: Provided is a technique capable of implementing efficient transport and processing related to multi-step processing in the case of a link-type vacuum processing apparatus with related to an operating method of a vacuum processing apparatus. The operating method of the vacuum processing apparatus according to the embodiment, in order to minimize time required for all processing of a plurality of wafers in a multi-step processing, includes a first step (steps 601 to 607) of selecting one first processing unit and one second processing unit from a plurality of processing units for each wafer and determining a transport schedule including a transport path using the selected processing units. In the first step, for at least one wafer, a transport schedule including a transport path is configured using the selected first processing unit by excluding at least one first processing unit from the plurality of first processing units.
    Type: Application
    Filed: February 7, 2019
    Publication date: May 20, 2021
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Yoshikazu SAIGOU, Yoshiro SUEMITSU, Hiroyuki ISHIKAWA
  • Patent number: 11009519
    Abstract: This automated analyzer comprises: a sample disk for mounting sample containers accommodating samples; a sample disk control unit for controlling the rotation of the sample disk; a sample dispensing probe for sucking the sample out of a sample container that has arrived at a prescribed suction position as a result of the rotation of the sample disk; a photometer for carrying out automatic biochemical analysis; a blood coagulation time detection unit for carrying out blood coagulation time analysis; a light-blocking cover that covers the photometer and blood coagulation time detection unit; and a sample information output unit for outputting sample information.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: May 18, 2021
    Assignee: Hitachi High-Technologies Corporation
    Inventor: Koji Tokiwa
  • Patent number: 10823695
    Abstract: There is provided an electrolyte measuring device that can decrease a liquid amount used for measurement, in which stable sealing can be provided in connecting passages of ion selective electrodes to each other with no gap, while maintaining high measurement accuracy of an existing ion selective electrode, and a residing sample liquid can be greatly decreased. In a flow-type ion selective electrode, a sealing member is used, which can be brought into intimate contact with a passage connecting unit to near a passage hole. A gap regulating member is provided to keep a gap between the electrodes constant and to prevent the sealing member from being excessively pressed. An electrode case has a structure suitable for the sealing member for allowing the alignment and holding of the sealing member.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: November 3, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Kishioka, Yu Ishige, Tetsuyoshi Ono
  • Publication number: 20200340957
    Abstract: An analysis device of the present invention is provided with a sample introduction unit that introduces a sample into a mass spectroscope; a sample condensation unit that treats the sample introduced into the device; a detection unit that analyzes the sample treated by a treatment unit; and a control unit that controls the sample introduction unit, the sample condensation unit, and the detection unit. The sample introduction unit includes a sample introduction valve, and the sample condensation unit includes an elution valve and a cleaning valve, and the cleaning valve is disposed between the sample introduction valve and the elution valve.
    Type: Application
    Filed: March 7, 2016
    Publication date: October 29, 2020
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Makoto NOGAMI, Shinya ITO
  • Publication number: 20200303159
    Abstract: To acquire a correction image by performing a sub-pixel shift process for shifting an image using a pixel interpolation filter by a pixel shift amount between pixels and a frequency correction process for correcting a frequency characteristic of the image after shifted.
    Type: Application
    Filed: March 5, 2020
    Publication date: September 24, 2020
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Koichi HAMADA, Kei SAKAI, Satoru YAMAGUCHI
  • Patent number: 10784074
    Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: September 22, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takeshi Sunaoshi, Yoshihisa Orai, Haruhiko Hatano, Takashi Mizuo
  • Publication number: 20200292308
    Abstract: The purpose of the present invention is to provide a pattern measurement device that is capable of highly accurately measuring a groove bottom, hole bottom, or the like, regardless of the accuracy of the formation of a deep groove or deep hole. To that end, the present invention proposes a pattern measurement device provided with a computation device for measuring the dimensions of a pattern formed on a sample on the basis of a signal obtained by a charged particle beam device, wherein the computation device determines the deviation between a first part of the pattern and a second part of the pattern at a different height than the first part and pattern dimension values on the basis of a detection signal obtained on the basis of the scanning of the sample by a charged particle beam and corrects the pattern dimension values using the deviation determined from the detection signal and relationship information indicating the relationship between the pattern dimensions and the deviation.
    Type: Application
    Filed: April 13, 2016
    Publication date: September 17, 2020
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Hiroya OHTA, Kenji TANIMOTO, Tomohiro TAMORI, Takuma YAMAMOTO
  • Patent number: 10770260
    Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: September 8, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuko Otani, Yohei Minekawa, Takashi Nobuhara, Nobuhiko Kanzaki, Takehiro Hirai, Miyuki Fukuda, Yuya Isomae, Kaori Yaeshima, Yuji Takagi
  • Publication number: 20200256804
    Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.
    Type: Application
    Filed: February 16, 2018
    Publication date: August 13, 2020
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshifumi HONDA, Shunichi MATSUMOTO, Masami MAKUUCHI, Yuta URANO, Keiko OKA
  • Publication number: 20200242752
    Abstract: A state of a sample surface is accurately determined without lowering analysis efficiency. There is provided an apparatus for determining a state of a sample to be analyzed contained in a container, in which the apparatus acquires an image of the sample, analyzes a position and a size of an object to be detected with respect to a detection range set in the image by using the image of the sample, and determines the state of the sample based on a result of the analysis.
    Type: Application
    Filed: May 31, 2018
    Publication date: July 30, 2020
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yasuki KAKISHITA, Hideharu HATTORI, Taku SAKAZUME, Yoichiro SUZUKI
  • Patent number: 10727024
    Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculate
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: July 28, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kotoko Urano, Zhaohui Cheng, Takeyoshi Ohashi, Hideyuki Kazumi