Abstract: Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (301), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image (304) which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image (303) which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.

Abstract: A plasma processing method in which a stable process region can be ensured in a wide range, from low microwave power to high microwave power. The plasma processing method includes making production of plasma easy in a region in which production of plasma by continuous discharge is difficult, and plasma-processing an object to be processed, with the generated plasma, wherein the plasma is produced by pulsed discharge in which ON and OFF are repeated, radio-frequency power for producing the pulsed discharge, during an ON period, is a power to facilitate production of plasma by continuous discharge, and a duty ratio of the pulsed discharge is controlled so that an average power of the radio-frequency power per cycle is power in the region in which production of plasma by continuous discharge is difficult.

Abstract: The present invention stores a cooled sample subjected to freezing treatment, or the like, while preventing the formation of condensation and frost-like substances and loads the sample into a sample holder for observation using a charged particle beam device. The present invention is provided with a main body for storing a sample and a lid unit mounted above the main body and is characterized in that the main body is divided into a first space and a second space by a partition member; the first space accommodates a cooling medium for cooling the sample; the second space has, disposed therein, a heating unit for heating the cooling medium accommodated in the first space; and the lid unit has, formed therein, a discharge port for discharging the gas generated by the heating of the cooling medium to the outside.

Abstract: An image diagnosis assisting apparatus according to the present invention executes: processing of inputting an image of a tissue or cell; processing of extracting a feature amount of a tissue or cell from a processing target image; processing of extracting a feature amount of a tissue or cell from an image having a component different from that of the target image; and processing of determining presence or absence of a lesion and lesion probability for each of the target images by using a plurality of the feature amounts.

Abstract: One of the objects of the present invention is to provide a semiconductor measurement apparatus capable of obtaining a measurement result that appropriately reflects the deformation of a pattern even if plural causes for the deformation of the pattern exist together. In order to attain the above object, the semiconductor measurement apparatus is proposed in the following way. The semiconductor measurement apparatus is capable of measuring the dimensions between plural measurement points of different positions of the edge of a reference pattern and plural corresponding points of the circuit pattern of an electronic device, in which the corresponding points correspond to the plural measurement points.

Abstract: Provided is a defect detection device including an illumination unit including a condenser lens and a plurality of light beam synthesis units, and a detection unit detecting scattered light generated on a sample by the illumination unit. The condenser lens condenses a plurality of light beams, emitted onto the sample and having substantially the same wavelength and substantially the same polarization, on the sample. The plurality of light beam synthesis units bring the plurality of light beams close to each other and make the light beams have light paths parallel to the optical axis of the condenser lens.

Abstract: A height detection apparatus is configured to project a pattern on a sample arranged at any of a plurality of reference positions and configured to detect a height of the sample. The apparatus includes: a projection optical system that generates a plurality of spatially separated light beams each having the pattern and projects the generated spatially separated light beams onto the sample; an imaging element that images the pattern reflected from the sample; a detection optical system that guides the pattern reflected from the sample to the imaging element; and at least one optical path length correction member disposed on an optical path different from an optical path having a shortest optical path length among a plurality of optical paths corresponding to the plurality of light beams at a position where the plurality of light beams is spatially separated.

Abstract: By switching between a plurality of image transfer units based on a state of a stage and using the switched image transfer unit, traceability of stage movement and tolerance to communication failure can be improved. A first image transfer protocol is a protocol of which reliability is higher than reliability of a second image transfer protocol, and a switch unit may select a first image transfer unit in a case where it is determined that a state of a stage is a state in which the stage is stopping. A second image transfer unit is a protocol of which a transfer speed is higher than a transfer speed of the first image transfer protocol, and the switch unit may select the second image transfer unit in a case where it is determined that the state of the stage is a state in which the stage is moving.

Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).

Abstract: In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.

Abstract: There is provided a charged particle beam apparatus including: a charged particle source; a condenser lens and an object lens for converging a charged particle beam from the charged particle source and irradiating the converged charged particle beam to a specimen; and plural image shift deflectors for deflecting the charged particle beam. In the charged particle beam apparatus, the deflection of the charged particle beam is controlled using first control parameters that set the optical axis of a charged particle beam to a first optical axis that passes through the center of the object lens and enters a predefined position of the specimen, and second control parameters that transform the first control parameters so that the first control parameters set the optical axis of the charged particle beam to a second optical axis having a predefined incident angle different from the incident angle of the first optical axis.

Abstract: The present invention comprises: hinge members which rotatably link a device body and a door; wires which electrically connect the door side with the device body side; and a moving-side wiring retention member and fixed-side wiring retention member which retain the wires and are attached to the hinge members. The moving-side wiring retention member and the fixed-side wiring retention member are disposed spaced apart in an axial direction of the hinge members. The moving-side wiring retention member and the fixed-side wiring retention member rotate relative to each other on the same axis in accordance with a rotation operation of the door.

Abstract: This sensitivity measuring device is provided with: a stage for placing a sample container; a temperature adjustment device that is provided with an upper heating body and a lower heating body, which are disposed above and below the sample container; and an image pickup device for picking up an image of the sample container, said image pickup device being provided with a lighting apparatus and an image pickup apparatus. Each of the upper heating body and the lower heating body has a structure wherein the temperature of a first region, a peripheral portion, is higher than the temperature of a second region including a center portion.

Abstract: The purpose of the present invention is to provide a charged particle beam device for detecting, with highly precise angular discrimination, charged particles emitted from a specimen. To achieve this purpose, proposed is a charged particle beam device provided with a scanning deflector for scanning on a specimen a charged particle beam emitted from a charged particle source, the charged particle beam device being provided with: a first detector for detecting charged particles obtained by scanning of the charged particle beam on a specimen, and a second detector placed between the first detector and the specimen, and supported so as to be able to move in the charged particle beam light axis direction.

Abstract: An image forming device is provided that is capable of forming a proper integrated signal even when an image or a signal waveform is acquired from a pattern having the possibility of preventing proper matching, such as a repetition pattern, a shrinking pattern, and the like. In particular, the image forming device forms an integrated image by integrating a plurality of image signals and is provided with: a matching processing section that performs a matching process between the plurality of image signals; an image integration section that integrates the plurality of image signals for which positioning has been performed by the matching processing section; and a periodicity determination section that determines a periodicity of a pattern contained in the image signals. The matching processing section varies a size of an image signal area for the matching in accordance with a determination by the periodicity determination section.

Abstract: Provided is a charged particle beam device in which a support body is rigid enough to support a sample chamber while the vibration of the support body is reduced even under the action of a disturbance such as environmental sound, the degree of parallelism of the support body is maintained, and increase in weight of the support body is suppressed. The support body includes: a first member which supports a mounted object, and is supported by a vibration removing mount; second members which have a thickness different from that of the first member and arranged to overlap the first member; fixing members which fix the first member and the second members; and damping members which have rigidity lower than the fixing members and are deformed by a difference in variations between the first member and the second members.

Abstract: The present invention relates to an etching method including a reaction layer forming step of forming a reaction layer by adsorption of a gas on a surface of an etching target material, a desorption step of desorbing the reaction layer after the reaction layer forming step, and a removal step of removing the reaction layer or a deposited film, characterized in that the surface of the etching target material is etched by the reaction layer forming step and the desorption step.

Abstract: According to an embodiment of the present invention, a plasma processing apparatus includes: a processing chamber in which plasma processing is performed to a sample; a radio frequency power source that supplies radio frequency power for generating plasma in the processing chamber; and a data processing apparatus that performs processing to light emission data of the plasma. The data processing apparatus performs the processing to the light emission by using an adaptive double exponential smoothing method for varying a smoothing parameter based on an error between input data and a predicted value of smoothed data. A response coefficient of the smoothing parameter is derived by a probability density function including the error as a parameter.

Abstract: The present invention is to provide an electron microscope capable of being activated to an appropriate temperature by disposing an NEG at an extraction electrode around an electron source. The present invention is an electron microscope provided with an electron gun, in which the electron gun includes an electron source, an extraction electrode, and an accelerating tube, the accelerating tube is connected to the extraction electrode at a connection portion, the extraction electrode includes a first heater and a first NEG, and the first heater and the first NEG are spaced apart in an axial direction of an electron beam emitted from the electron source.