Patents Assigned to Inficon, Inc.
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Publication number: 20070222428Abstract: A high-performance miniature RF sensor that maintains gain, directivity, and isolation in a miniature package. The miniature RF sensor includes stacked current and voltage pickups disposed in a PCB construction, the sensor further including quarter wave transforming filter, triaxial shielding, and skin-effect filtering.Type: ApplicationFiled: March 19, 2007Publication date: September 27, 2007Applicant: Inficon, Inc.Inventors: Craig Garvin, Michael Bonner, Kenneth Rosys
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Patent number: 7257494Abstract: A method of monitoring a microelectronic manufacturing process includes the implementation of a monitoring sensor that is configured to operate in an inter-process mode. During an inter-process mode, a first valve is opened in order to initiate transfer of a processing substrate between at least one processing chamber and a transfer chamber. The monitoring sensor is programmed to monitor the interior of the at least one processing chamber only after the first valve is opened.Type: GrantFiled: May 11, 2005Date of Patent: August 14, 2007Assignee: Inficon, Inc.Inventors: William T. Conner, Craig Garvin, Steven J. Lakeman, Igor Tepermeister, Chenglong Yang
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Patent number: 7041984Abstract: A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permits electrons to be projected into the anode wherein any insulating deposits adhere to the interior of the anode liner, thereby increasing the effective life of the anode without premature replacement or repair.Type: GrantFiled: May 20, 2004Date of Patent: May 9, 2006Assignee: Inficon, Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Patent number: 6991110Abstract: A package for retaining at least one crystal for use with vacuum deposition processing apparatus includes a tray portion having at least one vertically disposed supporting slot sized for retaining a crystal and a cover portion overlaying the tray portion. The cover portion is rotated until a slotted opening of the cover portion is aligned with a vertical supporting slot, permitting removal of the crystal that is supported within the vertical slot only along its peripheral edges.Type: GrantFiled: July 2, 2003Date of Patent: January 31, 2006Assignee: Inficon, Inc.Inventors: Robert F. Flynn, Christopher W. Cipro, Jon Hughes, Paul Harold Lindsay
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Publication number: 20050258374Abstract: A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permits electrons to be projected into the anode wherein any insulating deposits adhere to the interior of the anode liner, thereby increasing the effective life of the anode without premature replacement or repair.Type: ApplicationFiled: May 20, 2004Publication date: November 24, 2005Applicant: Inficon, Inc.Inventors: Robert Ellefson, Louis Frees
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Publication number: 20050256653Abstract: A method of monitoring a microelectronic manufacturing process includes the implementation of a process monitor that is configured to operate in an inter-process mode.Type: ApplicationFiled: May 11, 2005Publication date: November 17, 2005Applicant: Inficon, Inc.Inventors: William Conner, Craig Garvin, Steven Lakeman, Igor Tepermeister, Chenglong Yang
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Patent number: 6906799Abstract: A novel method for analyzing the pulse train resulting from a scanned beam particle monitor is described. The method enhances signal-to-noise ratio and significantly reduces particle false alarm rate. Performed in the time domain, the method filters noise pulses that do not occur at the scanner frequency. The analysis further identifies particle-pulse-envelopes (PPE's) by performing a forward-looking and backward-looking autocorrelation. Gaussian fits are subsequently applied to identified particle-pulse envelopes, to determine particle characteristics, such as size and speed.Type: GrantFiled: September 9, 2002Date of Patent: June 14, 2005Assignee: Inficon, Inc.Inventors: Michel P. Bonin, Aaron Stibbich, Donald J. Holve
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Patent number: 6740195Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.Type: GrantFiled: August 30, 2002Date of Patent: May 25, 2004Assignee: Leybold Inficon, Inc.Inventors: Louis C. Frees, Valentin Rio
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Patent number: 6642641Abstract: An apparatus for determining both total and partial pressures of a gas using one common electron beam includes a partial pressure ionization region and a total pressure ionization region separated by a grid or aperture. A filament produces a plurality of electrons which are focused into an electron beam by a repeller and an aperture or an anode. The interaction between the electron beam and molecules of the gas within the partial pressure and total pressure regions produces first and second ion streams. A focus plate is biased such that the first ion stream is directed to an analyzer which calculates the partial pressure of the gas. An ion collector collects the ions from the second ion stream, where the resulting reference current is used to determine the total pressure of the gas.Type: GrantFiled: April 19, 2001Date of Patent: November 4, 2003Assignee: Inficon, Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Publication number: 20030076494Abstract: A novel method for analyzing the pulse train resulting from a scanned beam particle monitor is described. The method enhances signal-to-noise ratio and significantly reduces particle false alarm rate. Performed in the time domain, the method filters noise pulses that do not occur at the scanner frequency. The analysis further identifies particle-pulse-envelopes (PPE's) by performing a forward-looking and backward-looking autocorrelation. Gaussian fits are subsequently applied to identified particle-pulse envelopes, to determine particle characteristics, such as size and speed.Type: ApplicationFiled: September 9, 2002Publication date: April 24, 2003Applicant: Inficon, Inc.Inventors: Michel P. Bonin, Aaron Stibich, Donald J. Holve
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Publication number: 20030008422Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.Type: ApplicationFiled: August 30, 2002Publication date: January 9, 2003Applicant: Leybold Inficon, Inc.Inventors: Louis C. Frees, Valentin Rio
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Patent number: 6482649Abstract: A method of determining the reaction efficiency of a CVD process reactor by which a reactive gas combination entering the reactor deposits a solid reaction product as a thin film onto a substrate. The composition of the reactive gas combination is measured by an acoustic cell which is disposed downstream from the outlet port of the reactor to determine the reactor's efficiency. Determination of the reactor's efficiency allows the growth rate of the thin film to be determined as well as associated rates of the products which have been exhausted from the reactor.Type: GrantFiled: September 23, 1999Date of Patent: November 19, 2002Assignee: Leybold, Inficon, Inc.Inventors: Carl A. Gogol, Jr., Abdul Wajid, Gary Rubloff
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Patent number: 6476612Abstract: In an ionization gauge, the effect of X-rays emitted when a collimated electron beam strikes grid surfaces in the gauge structure is reduced by a louvered beam stop. The louvered beam stop creates shadow regions having no X-rays, thus minimizing the amount of X-rays striking the collector plate and reducing the X-ray effect portion of the residual current.Type: GrantFiled: April 19, 2001Date of Patent: November 5, 2002Assignee: Inficon Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Publication number: 20020153820Abstract: An apparatus for determining both total and partial pressures of a gas using one common electron beam includes a partial pressure ionization region and a total pressure ionization region separated by a grid or aperture. A filament produces a plurality of electrons which are focused into an electron beam by a repeller and an aperture or an anode. The interaction between the electron beam and molecules of said gas within the partial pressure and total pressure regions produces first and second ion streams. A focus plate is biased such that the first ion stream is directed to an analyzer which calculates the partial pressure of the gas. An ion collector collects the ions from the second ion stream, where the resulting reference current is used to determine the total pressure of the gas.Type: ApplicationFiled: April 19, 2001Publication date: October 24, 2002Applicant: Inficon Inc.Inventors: Robert E. Ellefson, Louis C. Frees
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Patent number: 6468814Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.Type: GrantFiled: July 21, 1999Date of Patent: October 22, 2002Assignee: Leybold Inficon, Inc.Inventors: Louis C. Frees, Valentin Rio
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Patent number: 6091068Abstract: An ion collector includes a Faraday collector having a conductive surface disposed substantially parallel to and spaced from the axis of an entering particle beam containing charged and uncharged particles. A grounded plate disposed in the path of the particle beam allows incoming uncharged particles to impinge thereupon. Preferably, the application of a suitable potential to the conductive plate manipulates incoming charged ions to impinge upon either the electron multiplier or the Faraday collector. The ion collector can further include an electron multiplier used in conjunction with the Faraday collector to allow separate modes of operation. Application of a suitable first potential to the electron multiplier can cause charged particles to be deflected directly to the Faraday collector in one mode, and application of a second potential can cause deflection of charged particles to the electron multiplier, with the effects of the uncharged particles on the output of the detector being minimized.Type: GrantFiled: May 4, 1998Date of Patent: July 18, 2000Assignee: Leybold Inficon, Inc.Inventors: William E. Parfitt, Timothy L. Karandy, Louis C. Frees, Robert E. Ellefson
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Patent number: 5948983Abstract: A wall deposit monitoring system for measuring variation in wall deposit thickness in an etch or deposition chamber having a contained reactive environment includes at least one quartz or other piezoelectric crystal sensor installed through a wall of the chamber using a feed-through member. A cover assembly retains the sensor at a projecting end of the feed-through member in a position in proximity with the interior of a chamber wall. The cover includes an opening providing access to the active portion of the sensor for exposure to the reactive environment. An attached oscillating device causes the active portion of the sensor to resonate. As processing is performed in the chamber, a solid reaction product accumulates on the exposed active portion, damping the vibration of the sensor. A detection device sensing the shift in frequency can then calculate the relative change in thickness for a given material.Type: GrantFiled: July 22, 1998Date of Patent: September 7, 1999Assignee: Leybold Inficon, Inc.Inventors: Carl C. Gogol, Jr., Mark F. Kendrick
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Patent number: 5889281Abstract: A method for linearizing the sensitivity of a quadrupole mass spectrometric system to allow the sensor to more accurately report partial pressures of a gas in high pressure areas in which the reported data is effected by a number of loss mechanisms. According to the invention, correction factors can be applied empirically or software in a quadrupole mass analyzer system can be equipped with correcting software to expand the useful range of the mass spectrometer.Type: GrantFiled: July 11, 1997Date of Patent: March 30, 1999Assignee: Leybold Inficon, Inc.Inventors: David H. Holkeboer, Robert E. Ellefson
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Patent number: 5852270Abstract: A method for manufacturing a miniature quadrupole from a single blank includes fastening four lengthwise insulating strips into parallel slots formed in the blank. A lengthwise axial hole is cut through the blank for the guide wire used in the EDM process. The blank is machined lengthwise into four electrodes using the EDM process so that the electrodes are spaced apart in a widthwise direction and each electrode is connected to an adjacent electrode by one of the insulating strips. During the cutting, the electrodes are held in place by the insulating strips.Type: GrantFiled: June 3, 1997Date of Patent: December 22, 1998Assignee: Leybold Inficon Inc.Inventor: David H. Holkeboer
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Patent number: RE38138Abstract: A method for linearizing the sensitivity of a quadrupole mass spectrometric system to allow the sensor to more accurately report partial pressures of a gas in high pressure areas in which the reported data is effected by a number of loss mechanisms. According to the invention, correction factors can be applied empirically or software in a quadrupole mass analyzer system can be equipped with correcting software to expand the useful range of the mass spectrometer.Type: GrantFiled: October 6, 2000Date of Patent: June 10, 2003Assignee: Leybold Inficon, Inc.Inventors: David H. Holkeboer, Robert E. Ellefson