Abstract: Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of between 400 nm to between 4400 nm and 18000 nm, and another source of wavelengths to provide between 400 nm and as high as at least 50000 nm; a stage for supporting a sample and a detector of electromagnetic radiation, wherein the source provides a beam of electromagnetic radiation which interacts with a sample and enters a detector system optionally incorporating a wavelength modifier, where the detector system can be functionally incorporated with combinations of gratings and/or combination dichroic beam splitter-prisms, which can be optimized as regards wavelength dispersion characteristics to direct wavelengths in various ranges to various detectors that are well suited to detect them.
Type:
Grant
Filed:
March 5, 2021
Date of Patent:
June 13, 2023
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Stefan Schoeche, Martin M. Liphardt, Ping He, Jeremy A Van Derslice, Craig M. Herzinger, Jeffrey S. Hale, Brian D. Guenther, Duane E. Meyer, John A Woollam, James D. Welch
Abstract: Ellipsometer, polarimeter, reflectometer and spectrophotometer systems including one or more wavelength modifiers which convert wavelengths provided by a source of electromagnetic radiation to different wavelengths for use in investigating a sample, and/or which a detector thereof can detect.
Type:
Application
Filed:
September 16, 2021
Publication date:
August 4, 2022
Applicant:
J.A. WOOLLAM CO., INC.
Inventors:
Ping He, Martin M. Liphardt, Jeremy A. Van Derslice, Craig M. Herzinger, Jeffrey S. Hale, Brian D. Guenther, Duane E. Meyer, Stefan Schoeche, James D. Welch
Abstract: A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of an intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample, and after having source beam wavelength content determined using a digital light processor, and/or being directed by a digital light processor elements toward elements in the detector, allows sample parameters to be characterized.
Type:
Grant
Filed:
April 6, 2020
Date of Patent:
July 19, 2022
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Griffin A. P. Hovorka, Jeremy A. Van Derslice, Martin M. Liphardt
Abstract: A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with reduced effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.
Type:
Grant
Filed:
May 1, 2020
Date of Patent:
April 27, 2021
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Martin M. Liphardt, Jeffrey S. Hale, Ping He, Galen L. Pfeiffer, Craig M. Herzinger
Abstract: Materials comprising metamaterials exhibiting form-induced birefringence and anisotropic optical properties are provided. The disclosed articles comprise structures with critical dimensions which are on the order of or smaller than the wavelength for the gigahertz and terahertz spectral range. Methods of preparing same using stereolithography are disclosed. In a further aspect, the disclosed methods pertain to spectroscopic ellipsometry methods comprising a biaxial (orthorhombic) layer homogenization approach is to analyze the terahertz ellipsometric data obtained at three different sample azimuth orientations. The disclosed articles and methods demonstrate provide an avenue to fabricate metamaterials for the terahertz spectral range and allows tailoring of the polarizability and anisotropy of the host material. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
Type:
Grant
Filed:
July 17, 2018
Date of Patent:
February 9, 2021
Assignees:
HARRIS CORPORATION GCS, UNIVERSITY OF NORTH CAROLINA CHARLOTTE, J.A. WOOLLAM CO. INC.
Inventors:
Tino Hofmann, Daniel Fullager, Stefan Schoeche, Craig M. Herzinger, Susanne Madeline Lee, Erin Kathleen Sharma
Abstract: An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.
Type:
Grant
Filed:
September 6, 2016
Date of Patent:
December 8, 2020
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Martin M. Lihardt, Ping He, Galen L. Pfeiffer
Abstract: A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of the intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample allows sample parameters to be characterized without any moving optics.
Type:
Grant
Filed:
October 12, 2018
Date of Patent:
April 28, 2020
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Griffin A. P. Hovorka, Jeremy A. Van Derslice
Abstract: Reflectometer, Spectrophotometer, Ellipsometer and Polarimeter Systems that utilize 1) electromagnetic radiation energy absorbing or reflecting material of spatially distributed different optical densities and 2) wavelength dependent electromagnetic radiation energy aperturing, or both, placed near the entry to said multi-element detector, to improve detector capability to monitor intensity vs. wavelength spectra entered thereinto and provide more uniform detector output, while preferably maintaining beam information content.
Abstract: A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of the intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample allows sample parameters to be characterized without any moving optics.
Type:
Application
Filed:
October 12, 2018
Publication date:
April 16, 2020
Applicant:
J. A. WOOLLAM CO., INC.
Inventors:
Griffin A. P. Hovorka, Jeremy A. Van Derslice
Abstract: A retarder that comprises at least two plates, each of which comprise two surfaces that are parallel to, or substantially parallel to one another, said plates being tipped with respect to one another so that the surfaces of one thereof are not parallel to the surfaces of the other, each said plate further comprising a biased fast axis that is neither parallel to, or perpendicular to surfaces of said plates.
Abstract: Methodology of characterizing surface properties and determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths, using an easy to practice technique.
Abstract: A sample positioning system having two rotation elements with offset therebetween, to the second of which rotation elements is affixed a sample supporting stage. The rotation axes of the two rotation element are parallel, or substantially so. The sample positioning system finds application in the mapping of samples by Metrology systems such as Reflectometer, Spectrophotometer and Ellipsometer systems.
Type:
Grant
Filed:
May 23, 2019
Date of Patent:
October 15, 2019
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Griffin A. P. Hovorka, Martin M. Liphardt, Galen L Pfeiffer
Abstract: Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of about 400-about 2500 nm, a stage for supporting a sample and a detector of electromagnetic radiation, wherein the supercontinuum source provides a coherent beam of electromagnetic radiation which interacts with a sample, and the detector system comprises functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics, directs wavelengths in various ranges to various detectors that are well suited to detect them.
Type:
Grant
Filed:
September 12, 2018
Date of Patent:
September 24, 2019
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Jeremy A. Van Derslice, Martin M. Liphardt
Abstract: In ellipsometer and polarimeter systems, reflective optics including both convex and a concave mirrors that have beam reflecting surfaces, as well as aperture control of beam size to optimize operation with respect to aberration and diffraction effects while achieve the focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved, and further including detectors of electromagnetic radiation that enable optimization of the operation thereof for application over various specific wavelength ranges, involving functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics.
Type:
Grant
Filed:
July 3, 2018
Date of Patent:
July 2, 2019
Assignee:
J.A. WOOLLAM CO., INC.
Inventors:
Martin M. Liphardt, Jeffrey S. Hale, Ping He, Galen L. Pfeiffer, Duane E. Meyer
Abstract: Methodology of characterizing surface properties and determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths, using an easy to practice technique.
Abstract: A combination of a focusing element, and a filtering element which naturally adjusts the cross-sectional area of a beam of electromagnetic radiation passed through the focusing element as a function of wavelength over a specified range of wavelengths, wherein the filtering element is not uniform, but rather varies as a selection from the group consisting of: optical density and/or thickness is greatest near the center thereof; and optical density and/or thickness is smallest near the center thereof; and can demonstrate neutral density characteristics outside the specified range of wavelengths. The combination of a focusing element, and a filtering element can optionally be present in an ellipsometer or polarimeter system.
Abstract: Methodology of characterizing pore size distribution in a porous thin film having a surface, or in a surface region of a porous semi-infinite bulk substrate having a surface, involving applying a mathematical model of a sample based on effective medium approaches, such as the Bruggeman effective medium approach.
Type:
Grant
Filed:
April 20, 2018
Date of Patent:
January 8, 2019
Assignee:
J.A. Woollam Co., Inc.
Inventors:
Stefan Schoeche, Jeremy A. Van Derslice, Jeffrey S. Hale, Craig M. Herzinger
Abstract: Optical Hall Effect (OHE) method for evaluating such as free charge carrier effective mass, concentration, mobility and free charge carrier type in a sample utilizing a permanent magnet at room temperature.
Type:
Grant
Filed:
October 13, 2017
Date of Patent:
September 11, 2018
Assignees:
BOARD OF REGENTS FOR THE UNIVERSITY OF NEBRASKA, J.A. WOOLLAM CO., INC.
Inventors:
Tino Hofmann, Mathias M. Schubert, Stefan Schoeche, Philipp Kuehne, Craig M. Herzinger, John A. Woollam, Gregory K. Pribil, Thomas E. Tiwald, Sean R. Knight
Abstract: A system for providing variable wavelength intensity attenuation to said focused beams by application of an aperture-like element that comprises at least two regions of “filter” material, or comprises different materials graded into one another, which different materials that have different responses to different wavelengths, wherein said system is applied to reduce differences in wavelength intensity levels when applied in collimated portions of a beam as a Spectral Angle Adjustor (SAA) or to preserve information in a beam while changing said beam effective diameter as a Spectral Aperture Stop (SAS); or to affect a Spectral Field Stop (SFS) that controls source image size when applied at a convergent/divergent beam focal point as a Spectrally Varying Aperture, (SVA) the end result depending on where in a beam it is applied.