Abstract: A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R1, R2, R5, and R6 are an alkyl group , R3 and R7 are a hydroxyl group or —OR4 (wherein R4 is an organic group), A1− and A2− indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.

Abstract: A curable resin composition comprising (A) a hydrolyzate or a partial condensate of an organosilane compound, or both; (B) at least one compound selected from the group consisting of polyamic acids having a hydrolyzable silyl group or carboxylic acid anhydride group, or both, and polyimides having a hydrolyzable silyl group or carboxylic acid anhydride group, or both; and (C) a chelate compound or an alkoxide compound with a metal selected from the group consisting of zirconium, titanium, and aluminum, or both the chelate compound and the alkoxide compound. The resin composition can be cured and fabricated without producing no cracks into a cured product such as a semiconductor device having a low dielectric constant, high heat resistance and moisture resistance, superior adhesion to various substrate materials, superb electrical insulation properties, and low moisture absorption.

Abstract: A liquid curable resin composition for optical fibers comprising a polymer (a) having a number average molecular weight of 5,000 or more and containing at least two types of recurring ethylenic units, of which one type has a substituent group containing an ethylenically unsaturated group and the second type is substituted by a group —COOR3 (wherein R3 is a hydrogen atom or a hydrocarbon group having 1-30 carbon atoms), an aryl group, a cyano group, an alkyl group having 1-10 carbon atoms or by one or more halogen atoms.

Abstract: A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): 1

Abstract: A process and an apparatus for molding, in which a molten thermoplastic resin is firmly fitted onto a molding surface of a mold under a pressure lower than or equal to 100 kg/cm.sup.2 and is cured to obtain a molded product. The molding apparatus has a mold main body, and a mold body on which the molding surface is defined. The mold body is supported relative to the mold main body with maintaining a space on the back side of the molding surface in a heat insulative manner by a supporting member which includes at least a heat insulative supporting member having a thermal conductivity of 0.001 to 1 Kcal/mh .degree.C. and a longitudinal elastic modulus of 0.01 to 10 kg/cm.sup.2. In the space, a heating fluid for heating the molding surface from the bask side to a temperature higher than or equal to Vicat softening temperate (T) .degree.C.

Abstract: A process and an apparatus for molding, in which a molten thermoplastic resin is firmly fitted onto a molding surface of a mold under a pressure lower than or equal to 100 kg/cm.sup.2 and is cured to obtain a molded product. The molding apparatus has a mold main body, and a mold body on which the molding surface is defined. The mold body is supported relative to the mold main body with maintaining a space on the back side of the molding surface in a heat insulative manner by a supporting member which includes at least a heat insulative supporting member having a thermal conductivity of 0.001 to 1 Kcal/mh .degree.C. and a longitudinal elastic modulus of 0.01 to 10 kg/cm.sup.2. In the space, a heating fluid for heating the molding surface from the bask side to a temperature higher than or equal to Vicat softening temperate (T) .degree.C.

Abstract: A water-treating agent comprising a ternary copolymer of conjugated dienesulfonic acid/(meth)acrylic acid/2-hydroxyethyl (meth)acrylate, or a ternary copolymer of conjugated dienesulfonic acid/(meth)acrylic acid/(meth)acrylamido-2-methylalkanesulfonic acid ternary copolymer, is effective against scaling and fouling in water systems and a method for treating water with the water-treating agent. When combined with a corrosion inhibitor, the water-treating agent exhibits an excellent anti corrosion effect.

Abstract: A radiation-sensitive resin composition comprising:(i) an alkali-soluble resin;(ii) a phenol compound represented by the following formula (1): ##STR1## wherein R.sub.1 to R.sub.4 each represent halogen, alkyl, alkoxyl, aryl, nitro, cyano, hydroxyalkyl, hydroxyalkoxyl or hydroxyl; a, b, c and d each represent an integer of 0 to 4 and satisfying 0.ltoreq.a+b.ltoreq.4 and 0.ltoreq.c+d.ltoreq.4, provided that when a+b is 1 and c+d is 1 at least one of R.sub.1 (or R.sub.2) and R.sub.3 (or R.sub.4) is alkyl, hydroxyalkyl or hydroxyalkoxyl; R.sub.5 to R.sub.10 each represent hydrogen, alkyl or aryl; and X.sub.1 and X.sub.2 each represent oxygen or sulfur atom; and(iii) a 1,2-quinonediazide compound. This composition has good resolution, sensitivity and developability, as well as has as a positive resist good focal latitude and heat resistance. The patterns formed have good shapes, and the composition may cause no fine particles during storage.

Abstract: A radiation sensitive composition for color filters comprising (A) a colorant, (B) a binder polymer, (C) a poly-functional monomer, (D) a photopolymerization initiator containing at least one biimidazole compound typified by 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-biimid azole and 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and (E) a solvent. The composition can be used for the manufacture of color filters exhibiting excellent photographic sensitivity and superior contrast, while effectively controlling production of residual insoluble material during development process.

Abstract: The present invention provides a photosensitive resin composition which is superior in water-developing properties, resilience, strength of resin plate after exposure, elongation at break, and transparency of resin plate. The composition comprises:(1) a particulate copolymer obtained by polymerizing a monomer mixture comprising:(a) an aliphatic conjugated diene monomer,(b) a monomer represented by the following general formula (I): ##STR1## and (c) a monomer having at least two groups capable of addition-polymerizing;(2) a photopolymerizable unsaturated monomer;(3) an amino group-containing compound; and(4) a photopolymerization initiator.

Abstract: A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises:(1) a granular copolymer produced by polymerizing a monomer mixture comprising:(i) an aliphatic conjugated diene monomer;(ii) a monomer expressed by the general formula (I): ##STR1## (in which R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20);(iii) a monomer having at least two addition-polymerizable groups, and(iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable;(2) a photo-polymerizable unsaturated monomer;(3) an amino group-containing compound, and(4) a photo-polymerization initiator.

Abstract: A novel optical molding process for forming a three-dimensional article from a photosensitive resin which is liquid at normal temperatures which involves forming a plurality of laminated cured resin layers by a repetition of the step of forming a cured resin layer by selectively irradiating the surface of a photosensitive resin, wherein the photosensitive resin has been coagulated by cooling and the coagulated resin is irradiated to cure it. The process can produce a three-dimensional article having an overhanging part without producing warping in the finished product and without requiring a support for the overhanging part while this part is being optically molded.

Abstract: A radiation sensitive resin composition containing an alkali soluble resin and a 1,2-quinonediazide compound of a polyphenol or a radiation sensitive resin composition containing an alkali soluble resin and a 1,2-quinonediazide compound and a polyphenol compound.

Abstract: A radiation sensitive composition containing a fluorescent substance dispersed therein, comprising (A) the fluorescent substance, (B) an organic polymer binder, (C) at least one optically crosslinkable compound selected from optically crosslinkable monomers and oligomers, and (D) an optically radical-generating agent which comprises (a) a 2,4,5-triaryl imidazole dimer, (b) an amino group-containing benzophenone photosensitizer, and (c) a thiol compound represented by the following formula (1): ##STR1## wherein Z is --O--, --S--, --NH-- or --CONH--. This radiation sensitive composition can provide a fluorescent screen having a larger film thickness and a higher display brightness and hence, will greatly contribute to increases in the size and precision of a fluorescent display device such as a plasma display panel.

Abstract: A coated paper prepared by coating an original paper with a paper-coating composition is provided containing a pigment and a copolymer latex having a gel content of 10% by weight or more obtained by polymerizing,(a) 20-65% by weight of a conjugated diene compound,(b) 0.1 to 10% by weight of an ethylenically unsaturated carboxylic acid, and(c) 33-79.5% by weight of at least one ethylenically unsaturated compound other than said components (a) and (b),(d) in the presence of 0.1 to 10 parts by weight of .alpha.-methylstyrene dimer, per 100 parts by weight of a total of components (a), (b) and (c).

Abstract: There are provided a polyamic acid obtainable by reacting a diamine compound of the formula (1) ##STR1## wherein R.sup.1 is an alkyl group having 1 to 12 carbon atoms, a haloalkyl group having 1 to 12 carbon atoms or a halogen atom, each of X and Y is independently a divalent linking group,with a tetracarboxylic acid dianhydride; a polyimide obtainable by dehydrating and ring-closing the above polyamic acid; and a liquid crystal aligning agent containing the above polyamic acid and/or the above polyimide.

Abstract: A process for producing a polyorganosiloxane-based thermoplastic resin which comprises graft polymerizing (3) at least one vinyl monomer using (4) an initiator which is an organic peroxide which, upon decomposition, produces an organic radical represented by the structural formula: ##STR1## wherein R.sup.2, R.sup.3 and R.sup.4 represent independently hydrogen atoms or alkyl groups having 1 to 10 carbon atoms, in the presence of (2) a polyorganosiloxane.

Abstract: The present invention relates to a process of producing a polyimide-type copolymer, to a thin layer forming agent, to a liquid crystal alignment layer and to processes of producing thin layer formation agents and liquid crystal alignment layers. More specifically, this invention relates to a polyamic acid block copolymer, a polyimide block copolymer, a polyimide-polyamic acid block copolymer, a thin layer forming agent comprised of a polyimide-type block copolymer, and a liquid crystal alignment layer comprised of a polyimide-type block copolymer and processes of their production.

Abstract: A process for producing modified cross-linked polymer particles which comprises polymerizing 0.01 to 900 parts by weight of (B) a monomer component containing 50% by weight or more of at least one member selected from the group consisting of aromatic monoalkenyl compounds, acrylic acid esters, methacrylic acid esters, fluoroalkyl acrylates, fluoroalkyl methacrylates, unsaturated carboxylic acids, conjugated diene compounds, vinyl esters and organosilane compounds in the presence of 100 parts by weight of (A) cross-linked polymer particles obtained by polymerizing a monomer mixture comprising 50% by weight or more of at least one cross-linking monomer selected from the group consisting of divinylbenzene, ethylene glycol dimethacrylate and trimethylolpropane trimethacrylate.

Abstract: A process for producing a patterned anisotropic polymeric film using an ac field and photopolymerizable liquid crystalline monomers.