Abstract: A process for producing a diolefin polymer or copolymer, comprising the steps of polymerizing 55-100 wt % of a conjugated diolefin with 0-45 wt % of an aromatic vinyl compound as monomers in a hydrocarbon as a solvent, by using initiators: a reaction product [a1] between at least one secondary amine compound (A) and an organic lithium compound and/or a lithium amide compound [a2] of the at least one secondary amine compound (A) as well as a reaction product [b1] between at least one alcohol (B) and an organic lithium compound and/or a lithium alkoxide compound of the at least one alcohol (B). A rubber composition containing not less than 30 wt % of such a diolefin polymer or copolymer with respect to an entire rubber component is also disclosed. This rubber composition exhibits excellent abrasion resistance, high tensile strength, steering stability and low rolling resistance, and is suitable for tires, particularly, as treads of low fuel consumption tires.

Abstract: A reflection preventing film for forming a resist pattern and a process for forming the resist pattern using the film. The film comprises a copolymer was copolymerized of monomers which comprise at least one unsaturated carboxylic acid monomer, at least one epoxy group-containing unsaturated monomer, and at least one cinnamoylphenyl group-containing unsaturated monomer. The reflection preventing film exhibits a high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, is free from occurrence of intermixing, possesses excellent heat resistance, exhibits a superb dry etching performance and storage stability, and produces resist patterns with excellent resolution and precision. The resist pattern forming process comprises forming the reflection preventing film on a substrate, forming a resist coating film on said reflection preventing film, irradiating the resist film with a radiation, and developing the resist coating film.

Abstract: An optical film with a pattern formed by applying a photosensitive composition to the surface of a transparent film and by irradiating the photosensitive composition. The transparent film is made of a thermoplastic resin having a retardation of 30 nm or less, a deflection temperature under load of 100.degree. C. or higher, a transmittance in the visible light region of 85% or higher, and a refractive index of 1.45-1.59. The optical film has optical characteristics as excellent as glass. It has superior heat resistance, more flexible, more easily processed, and lighter in weight than glass bases.

Abstract: A liquid crystal display panel comprising structural elements such as transparent conductive films, polarizers, optical retardation films, color filters, light guide plates, light diffusing films, and converging films is disclosed. At least one of the structural elements comprises a layer made from a specific polymer having a saturated water absorption of 0.1-1% by weight at 23.degree. C. and obtained by the ring-opening polymerization of a specific norbornene derivative with a polar group in the norbornene structure. The liquid crystal display panel is light and convenient to use, excellent in the distinctness of image and productivity, and exhibits no deterioration in image quality during the use in severe, high temperature and high humidity conditions for a long period of time.

Abstract: A thermoplastic elastomer composition which comprises (I) 99 to 1% by weight of a hydrogenated diene copolymer having a number average molecular weight of 50000 to 700,000 in which 80% or more of the double bonds of the conjugated diene portion of the conjugated diene polymer have been saturated, (II) 1 to 99% by weight of an ionomer resin having an .alpha.-olefin unit having 2 to 8 carbon atoms and an .alpha.,.beta.-unsaturated carboxylic acid unit, at least part of the carboxyl group of said unsaturated carboxylic acid unit having been neutralized with a metal ion, and (III) 0 to 70% by weight of a polyolefin resin, provided that (I)+(II)+(III)=100% by weight. Said composition is excellent in moldability and gives a molded article excellent in transparency, flexibility, mechanical strength, heat resistance and impact resilience.

Abstract: A thermoplastic elastomer composition comprising (A) 50-98% by weight of a thermoplastic polyester elastomer, (B) 50-2% by weight of a rubber and (C) a polyorganosiloxane in a proportion of 0.01-10 parts by weight per 100 parts of the total of the components (A) and (B). The above thermoplastic elastomer composition enables one to improve the flexibility and compression set of the thermoplastic polyester elastomer excellent mechanical properties, heat resistance and oil resistance without impairing the abrasion resistance of the thermoplastic polyester elastomer.

Abstract: A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.

Abstract: A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

Abstract: A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent.

Abstract: A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of:95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 2,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I'): ##STR1## wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I') with at least one aldehyde] and5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): ##STR2## wherein n is 0, 1, 2 or 3, with at least one aldehyde].

Abstract: A method for domain-dividing a liquid crystal alignment film, which comprises (1) applying a radiation-sensitive resin composition onto a liquid crystal alignment film aligned in one direction and formed on a substrate, (2) exposing the radiation-sensitive resin composition through a predetermined pattern, (3) carrying out a development with an aqueous solution containing 0.01 to 1.5% by weight of an alkaline compound to partially protect the liquid crystal alignment film, (4) aligning an exposed portion of the liquid crystal alignment film in another direction and (5) removing the radiation-sensitive resin composition; and a liquid crystal device having a liquid crystal display device with the domain-divided liquid crystal alignment film.

Abstract: A water-based maskant composition and a chemical milling method using the maskant composition. Said water-based maskant composition comprises 100 parts by weight (as solids) of a latex constituent consisting of (a) 5-60 parts by weight (as solids) of a copolymer latex obtained by emulsion-polymerization of a monomer mixture consisting of 30-70% by weight of an aliphatic conjugated diene compound, 20-70% by weight of an aromatic vinyl compound, 0-10% by weight of an ethylenically unsaturated carboxylic acid and 0-50% by weight of a vinyl compound copolymerizable therewith and (b) 95-40 parts by weight (as solids) of a natural rubber latex; 10-500 parts by weight of a filler; and 0.1-10 parts by weight of a thickener, wherein the vicosity at 25.degree. C. is 500-5,000 cps as measured by BH type rotor at 20 rpm at a solids concentration of 50% by weight, the pH is 7-9 and the tensile strength and elongation of a film obtained from the composition are 50-150 kgf/cm.sup.

Abstract: A polyorganosiloxane-type thermoplastic resin having excellent slidability, abrasion resistance, weatherability, impact strength, fatigue resistance and chemical resistance is disclosed. The thermoplastic resin comprises a graft copolymer (IV) obtained by graft-polymerizing at least one vinyl monomer (v) onto a modified polyorganosiloxane obtained by polymerizing 80 to 99.8% by weight of an organosiloxane (I) having the structural unit described thereinabove, 0.1 to 10% by weight of at least one graft crosslinking agent (II) containing an alkoxysilyl group, selected from the group consisting of a vinyl-type graft crosslinking agent, a mercapto-type graft crosslinking agent, an acryloyl-type crosslinking agent and a vinylphenyl-type crosslinking agent, and 0.1 to 10% by weight of a compound (III) having two alkoxysilyl groups, provided that (I)+(II)+(III)=100% by weight.

Abstract: A two-stage process for producing a copolymer, comprising emulsion polymerizing (a) a 2-80% by weight of a conjugated diene compound, (b) 0.1-10% by weight of an ethylenically unsaturated carboxylic acid, and (c) 10-97.9% by weight of an ethylenically unsaturated compound other than the components (a) and (b) in the presence of (d) and .alpha.-methylstyrene dimer, wherein in the first stage, 10-50% by weight of the total amount of the components (a), (b) and (c) are added and polymerized at 70.degree.-80.degree. C. for 2-6 hours after the addition of the monomer, and after said first stage, 50-90% by weight of the total amount of the components (a), (b) and (c) are continuously fed and polymerized in a second stage.

Abstract: A thermoplastic resin composition comprising: (I) a rubber-modified thermoplastic resin, and (II) a transparent thermoplastic resin, a thermoplastic elastomer or combination thereof, provided that said resin (I) is excluded from component (II), wherein the rubber-modified thermoplastic resin (I) is a resin prepared by polymerizing (B) 30-100% by weight of at least one member selected from the group consisting of an aromatic alkenyl compound monomer and an alkyl (meth)acrylate monomer and (C) 70-0% by weight of at least one other monomeric compound copolymerizable therewith, in the presence of 5-45% by weight of (A) a hydrogenated diene copolymer of component (I) obtained by hydrogenating a diene copolymer comprising a random copolymer of 50% by weight or more of at least one conjugated diene and 50% by weight or less of an alkenyl aromatic compound until at least 70% by weight of the olefinic unsaturation of the diene copolymer is hydrogenated.

Abstract: A radiation sensitive resin composition for microlens comprising (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, (c) a compound having at least 2 epoxy groups in the molecule, (d) a melamine and (e) a trihalomethyltriazine or an onium salt, which composition exhibits high sensitivity, high resolution and high yield of residual film thickness in the formation of a lens pattern and is small in dependency on heating conditions in the preparation of a microlens.

Abstract: A rubber composition satisfying wear resistance and fracture properties as well as wet skid resistance, ice skid resistance and dry gripping property is provided by including at least 30% by weight of a rubber ingredient which consists of 100 parts by weight of a particular branched styrene-butadiene copolymer (A) and 15-100 parts by weight of a particular low molecular weight butadiene polymer (B) and has a Mooney viscosity of 30-100.

Abstract: An i-ray sensitive positive resist composition: which (A) comprises an alkali-soluble novolak resin obtained by subjecting (a) a phenolic mixture of B to 95 mol % of 2,3-xylenol with 95 to 5 mol % of a phenol selected from mono-, di- and tri-methyl phenols other than 2,3-xylenol or (b) a phenolic mixture of 5 to 50 mol % of 8,4-xylenol with 95 to 50 mol % of a phenol selected from mono-, di- and tri-methyl phenols other than 3,4-xylenol to polycondensation together with an aldehyde, and a 1,2-quinonediazide compound, and (B) which has sensitivity to i-ray. There is also provided a method of forming a pattern, which comprises: (1) applying the i-ray sensitive positive resist composition to a wafer to form a photosensitive layer, (2) irradiating the photosensitive layer with i-ray through a predetermined pattern, and (3) developing the pattern with a developer.

Abstract: A reflection preventing film comprising a copolymer, its salt or both of them, the copolymer having at least one recurring unit selected from the group consisting of recurring units represented by formulas (1) and (2) and at least one recurring unit represented by formula (3): ##STR1## wherein R.sup.1 -R.sup.4 which may be the same as or different from one another, represent hydrogen atoms or organic groups and X represents a carboxyl group or a sulfo group, ##STR2## wherein R.sup.5 represents a hydrogen atom or an organic group, A represents a fluoroalkyl group and Y represents an alkylene group or a fluoroalkylene group. The reflection preventing film is formed on a resist film before irradiation in the formation of a resist pattern, thereby preventing the radiation reflected on the substrate from re-reflecting at the upper interface of the resist film to provide a resist pattern excellent in resolution, developability and pattern form.

Abstract: A thermoplastic resin composition comprising (a) 50-99% by weight of a polyarylenesulfide resin and (b) 50-1% by weight of a norbornene-type resin as essential components is disclosed. This resin composition possesses excellent stiffness properties and high heat resistance, and exhibits only small anisotropic properties and superior moldability during the molding operation, and is useful for molding various electronic parts, household electric or electronic parts and articles. Those having a Vicut softening point of 200.degree. C. or higher are especially useful for sealing electronic parts or photo-semiconductors.