Patents Assigned to JEOL Ltd.
  • Patent number: 9396906
    Abstract: A transmission electron microscope (100) includes an electron beam source (2), an illumination lens system (4), an objective lens (8), a projector lens (12), an imager (14) for capturing the TEM image projected by the projector lens (12), a display controller (22) for causing the TEM image captured by the imager (14) to be displayed at a given size reduction percentage on a display device (20), and a control unit (24) for controlling the objective lens (8). The control unit (24) controls the amount of underfocus of the objective lens (8) on the basis of the size reduction percentage to display an edge enhanced image.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: July 19, 2016
    Assignee: JEOL Ltd.
    Inventor: Takaki Ishikawa
  • Patent number: 9396904
    Abstract: There is disclosed a method of fabricating a smaller-sized multipole lens having polar elements that can be formed with high accuracy. The method starts with forming a first member (10) having a first yoke (14) formed integrally with first polar elements (12). A second member (20) having a second yoke (24) formed integrally with second polar elements (22) is formed. The first yoke (14) is made to overlap with the second yoke (24). The first member (10) and the second member (20) are held.
    Type: Grant
    Filed: February 11, 2015
    Date of Patent: July 19, 2016
    Assignee: JEOL Ltd.
    Inventors: Yuji Kohno, Norikazu Arima
  • Patent number: 9389287
    Abstract: In a nuclear magnetic resonance (NMR) spectrometer, a sample spins about an axis tilted at a magic angle, a corrective magnetic field generating portion produces a corrective magnetic field, and a control portion controls the operation of the corrective magnetic field generating portion. An arithmetic unit included in the control portion uses at least one of BZ(1), B1(1)e, and B1(1)o or the linear sum of at least two of them as the first-order magnetic field component of the corrective magnetic field, uses at least one of B2(2)e, B2(2)o, B2(1)e, and B2(1)o or the linear sum of at least two of them as the second-order magnetic field component of the corrective magnetic field, and uses at least one of BZ(3), B3(1)e, B3(1)o, B3(2)e, B3(2)o, B3(3)e, and B3(3)o or the linear sum of at least two of them as the third-order magnetic field component of the corrective magnetic field.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: July 12, 2016
    Assignee: JEOL Ltd.
    Inventor: Yusuke Nishiyama
  • Patent number: 9373493
    Abstract: A mass spectrometer and method capable of optimizing the opening time of a collision cell includes: an ion source (10) for ionizing a sample; a first mass analyzer (30) for selecting first desired ions from the ions generated in the ion source (10); a collision cell (40) for fragmenting some or all of the first desired ions into product ions; a second mass analyzer (50) for selecting second desired ions from the first desired ions and the product ions; a detector (60) for detecting the second desired ions; and a control section (200) for controlling the collision cell (40) in such a way that the cell performs a storing operation for storing the first desired ions and the product ions for a given storage time and then performs an opening operation for ejecting the stored ions for a given opening time based on information about settings in an adjustment mode.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: June 21, 2016
    Assignee: JEOL Ltd.
    Inventor: Junkei Kou
  • Patent number: 9362082
    Abstract: An electron microscope is offered which can facilitate adjusting a monochromator. The electron microscope (100) includes the monochromator (20) having an energy filter (22) for dispersing the beam (EB) according to energy and a slit plate (24) disposed on an energy dispersive plane. The slit plate (24) is provided with plural energy-selecting slits (25) which are different in width taken in a direction where the beam (EB) is dispersed.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: June 7, 2016
    Assignee: JEOL Ltd.
    Inventor: Masaki Mukai
  • Patent number: 9362085
    Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: June 7, 2016
    Assignee: JEOL Ltd.
    Inventors: Noriyuki Kobayashi, Yoshiaki Takizawa
  • Publication number: 20160154017
    Abstract: [PROBLEMS] It is an object to provide a gripping mechanism that enables inhibition of possible static electricity and contamination in a gripping object such as a reaction container, while enabling the orientation of the gripping object to be stabilized. [MEANS TO SOLVE PROBLEMS] The gripping mechanism is a gripping mechanism for gripping a cuvette T, the gripping mechanism comprising: a sandwiching section 50 for holding the cuvette T in a laterally sandwiching manner; a pressing section 60 for pressing downward an upper end surface of the cuvette T held in a sandwiching manner by the sandwiching section 50, wherein the pressing section 60 is arranged such that, with the cuvette T being held in a sandwiching manner by the sandwiching section 50, a central axis of the cuvette T along a vertical direction coincides mutually with a central axis of the pressing section 60 in the vertical direction.
    Type: Application
    Filed: November 25, 2015
    Publication date: June 2, 2016
    Applicants: FUJIREBIO INC., JEOL LTD.
    Inventors: Kazuyuki OGURI, Tomohiro ENDO, Toshiaki OHTAKE, Hidenobu KAWADA, Takahiro MATSUMOTO
  • Patent number: 9349568
    Abstract: A sample introduction device (100) is adapted to introduce a sample (S) into the sample chamber (1) of a charged particle beam instrument. The device includes: a pre-evacuation chamber (2) for performing a pre-evacuation; a sample holder (10) having a sample holding portion (12) capable of holding the sample (S); a support portion (20) for supporting the sample holder (10); mechanical drives (30); and goniometer (50) for moving and rotating the support portion (20) such that the sample holding portion (12) moves from inside the pre-evacuation chamber (2) into the sample chamber (1). Partition valve (70) can be activated by the action of the goniometer.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: May 24, 2016
    Assignee: JEOL Ltd.
    Inventor: Shuichi Yuasa
  • Patent number: 9349569
    Abstract: A charged particle beam system capable of suppressing drift of a functional component used in association with a sample is offered. The charged particle beam system (1000) images the sample (S) by irradiating the sample with a charged particle beam (EB). The system includes the functional component (such as a sample holder (20)), drive portions (40, 50) for moving the sample holder (20), and a controller (60) for controlling the drive portions (40, 50). The controller (60) controls the drive portions (40, 50) to vibrate the sample holder (20) such that its amplitude is driven to decrease with time.
    Type: Grant
    Filed: February 11, 2015
    Date of Patent: May 24, 2016
    Assignee: JEOL Ltd.
    Inventors: Takaki Ishikawa, Kazunori Somehara
  • Patent number: 9349565
    Abstract: A multipole lens (100) which can produce static magnetic fields showing different strengths in the direction of travel of an electron beam has lens subasssemblies (10a, 10b, 10c) stacked on top of each other. The lens subassemblies (10a, 10b, 10c) have yokes (14a, 14b, 14c), respectively, and polar elements (12a, 12b, 12c), respectively. The polar elements (12a, 12b, 12c) have base portions (13a, 13b, 13c), respectively, magnetically coupled to the yokes (14a, 14b, 14c), respectively, and front end portions (11a, 11b, 11c), respectively, magnetically coupled to the base portions (13a, 13b, 13c), respectively. Magnetic field separators (20, 22) made of a nonmagnetic material are mounted between the front end portions (11a, 11b, 11c) which are successively adjacent to each other in the direction of stacking of the lens subassemblies (10a, 10b, 10c).
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: May 24, 2016
    Assignee: JEOL Ltd.
    Inventor: Hidetaka Sawada
  • Patent number: 9318301
    Abstract: A sample introduction device (100) has a pre-evacuation chamber (2), a sample holder (10), a mechanical drive arrangement (30) for moving the sample holder (10), and a controller (90). The controller (90) performs a first operation for controlling the mechanical drive arrangement (30) to move a support member (20) such that this support member (20) supports the sample holder (10) when its sample holding portion (12) is in the pre-evacuation chamber (2) and to bring the support member (20) to a halt, a second operation for making a decision as to whether the sample holding portion (12) can be moved into the sample chamber (1), based on the position at which the support member (20) is halted, and a third operation for moving the support member (20) supporting the sample holder (10) such that the sample holding portion (12) moves from the pre-evacuation chamber (2) into the sample chamber (1) if the decision is affirmative to indicate that the sample holding portion (12) can be moved into the sample chamber (1).
    Type: Grant
    Filed: November 26, 2014
    Date of Patent: April 19, 2016
    Assignee: JEOL Ltd.
    Inventor: Masaaki Kobayashi
  • Patent number: 9318300
    Abstract: A charged particle beam instrument is offered which can easily perform an in situ observation in a gaseous atmosphere. The charged particle beam instrument (100) is used to perform an observation of a specimen (S) placed in a gaseous atmosphere and has a specimen chamber (2), a gas supply portion (6) for supplying a gas into the specimen chamber (2), a venting portion (7) for venting the specimen chamber (2), a gaseous environment adjuster (4), and a gas controller (812) for controlling the gaseous environment adjuster (4). This adjuster (4) has a gas inflow rate adjusting valve (40) for adjusting the flow rate of the gas supplied into the specimen chamber (2) and a first vacuum gauge (CG1) for measuring the pressure of the gas supplied into the specimen chamber (2).
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: April 19, 2016
    Assignee: JEOL Ltd.
    Inventors: Yasushi Hiroki, Mitsuaki Ohsaki
  • Patent number: 9310596
    Abstract: A compound microscope device allows simultaneous observation of one specimen by a transmission electron microscope and an optical microscope. The compound microscope device 1 of the present invention has a transmission electron microscope 2 and an optical microscope 4. A specimen 10 and a reflection mirror 41 are disposed on an electron optical axis C of an electron ray. The reflection mirror 41 is inclined from the electron optical axis C toward the optical object lens 43 and the specimen 10. Light from the specimen 10 (fluorescent light, reflection light, and the like) is reflected by the reflection mirror 41 and enters into the optical object lens 43. The electron ray from the electron microscope 2 passes through a mounting center hole 42 of the reflection mirror 41. This makes it possible to observe one specimen simultaneously by the electron microscope 2 and the optical microscope 4.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: April 12, 2016
    Assignees: INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION NATIONAL INSTITUTE OF NATURAL SCIENCES, JEOL LTD.
    Inventors: Kuniaki Nagayama, Yoshihiro Arai, Hirofumi Iijima, Susumu Terakawa
  • Patent number: 9292742
    Abstract: An image generating apparatus capable of facilitating analysis of a substance having a repeating structure has: an ion intensity data acquisition portion for acquiring ion intensity data arising from the substance, the data including information about a relative intensity of each ion against mass-to-charge ratio; a mass information acquisition portion for acquiring mass information about the repeating unit of the substance; a data alignment portion for aligning the ion intensity data within each given range of mass-to-charge ratios based on the mass information about the repeating unit of the substance; and an image generation portion for generating an image based on the aligned ion intensity data.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: March 22, 2016
    Assignees: The University of Electro-Communications, JEOL Ltd.
    Inventors: Shinichi Mukousaka, Kanae Teramoto, Hideki Koike
  • Patent number: 9275830
    Abstract: A scanning charged particle microscope is offered which can selectively detect and image electrons. The scanning charged particle microscope (100) has: a source (1) of a charged particle beam (E1); an objective lens (6) for bringing the charged particle beam (E1) emitted from the source (1) into focus at a sample (S); a scanning deflector (4) for scanning the focused charged particle beam (E1) over the sample (S); a sorting portion (10) for sorting out electrons emitted at given emission angles from electrons released from the sample (S) in response to irradiation of the sample (S) by the charged particle beam (E1); an electron deflector (20) for producing a deflecting field to deflect the electrons (E2) sorted out according to their energy; a detection portion (30) for detecting the electrons (E2) deflected by the electron deflector (20); and an image creating portion (44) for creating an image, based on the results of the detection performed by the detection portion (30).
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: March 1, 2016
    Assignee: JEOL Ltd.
    Inventor: Takeshi Otsuka
  • Patent number: 9268036
    Abstract: A radiation detector is offered which can suppress generation of sum peaks.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: February 23, 2016
    Assignee: JEOL Ltd.
    Inventor: Genki Kinugasa
  • Patent number: 9269520
    Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8).
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: February 23, 2016
    Assignee: JEOL Ltd.
    Inventor: Takashi Satoh
  • Patent number: 9256068
    Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.
    Type: Grant
    Filed: July 23, 2014
    Date of Patent: February 9, 2016
    Assignee: JEOL Ltd.
    Inventors: Hidetaka Sawada, Yu Jimbo
  • Patent number: 9234831
    Abstract: A particle analysis instrument is offered which can make a measurement in a shorter time than heretofore. The particle analysis instrument (100) is used to analyze a sample (S) containing plural particles by measuring the sample over plural fields of view. The instrument (100) includes a measuring section (10) for scanning primary rays (EB) over the sample (S) and detecting a signal emanating from the sample (S), a particle area totalizing portion (222) for finding the area of particles for each field of view from the results of the measurement made by the measuring section (10) and summing up such areas of particles for all of the fields of view to find a total area of particles, and a decision portion (226) for making a decision as to whether the measurement process should be ended, based on the ratio of the total area of particles to an area of the sample (S) measured to obtain the total area of particles.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: January 12, 2016
    Assignee: JEOL Ltd.
    Inventor: Masaru Takakura
  • Patent number: 9196456
    Abstract: An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: November 24, 2015
    Assignee: JEOL Ltd.
    Inventor: Hirofumi Iijima