Patents Assigned to JEOL Ltd.
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Patent number: 10048335Abstract: A specially shaped coil assembly for accurate adjustment of the magic angle is provided to permit accurate adjustment of an angle made between the direction of a static magnetic field and the axis of sample spinning without impairing the resolution of NMR signals. The sample is placed within the external static magnetic field B0. The coil assembly is for use in a solid-state NMR apparatus that performs NMR detection while spinning the sample about an axis tilted at the magic angle relative to the external static magnetic field B0. The coil assembly comprises a pair of arcuate conductor lines and a pair of straight conductor lines. Each of the arcuate lines has a diameter of 2a. Each of the straight lines has a length of 2L. The diameter 2a and the length 2L are so selected as to satisfy the relationship: 1.91?2L/2a?2.15.Type: GrantFiled: March 24, 2016Date of Patent: August 14, 2018Assignee: JEOL Ltd.Inventors: Tatsuya Matsunaga, Kiyonori Takegoshi, Takashi Mizuno
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Patent number: 10036797Abstract: A pulse pattern forming a pulse sequence is repeatedly generated according to a repetition frequency Fp, and an original pulse train is generated. A modulation signal which repeats ON and OFF states at a modulation frequency Fm is generated. Fp and Fm are in a relationship Fp=2n×Fm, wherein n is an integer greater than or equal to 1. The original pulse train is modulated according to the modulation frequency Fm, and a pulse train signal is generated. A microwave signal is modulated by the pulse train signal and is supplied to an electron spin resonance chamber. By executing a lock-in demodulation on a detection signal reflecting electron spin resonance using the modulation frequency Fm, an ESR signal is obtained.Type: GrantFiled: October 5, 2015Date of Patent: July 31, 2018Assignee: JEOL Ltd.Inventor: Takayuki Suzuki
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Patent number: 10024874Abstract: A measurement container supply device. A supply section transfers the measurement container to the predetermined supply position includes a holding section (50) that holds the measurement container, and the holding section (50) has a first groove (52) that is formed to have a width that corresponds to the outer diameter of a body of the measurement container, and a second groove (54) that is formed to have a width that corresponds to the outer diameter of a neck of the measurement container. When the holding section (50) holds the measurement container, the first groove (52) comes in contact with the outer circumferential surface of the body, the second groove (54) comes in contact with the outer circumferential surface of the neck, and a step (56) that is formed by the first groove (52) and the second groove (54) comes in contact with a step that is formed by the body and the neck.Type: GrantFiled: June 20, 2014Date of Patent: July 17, 2018Assignee: JEOL Ltd.Inventor: Mizuki Nakamura
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Patent number: 10020162Abstract: There is provided a beam alignment method capable of easily aligning an electron beam with a coma-free axis in an electron microscope. The method starts with tilting the electron beam (EB) in a first direction (+X) relative to a reference axis (A) and obtaining a first TEM (transmission electron microscope) image. Then, the beam is tilted in a second direction (?X) relative to the reference axis, the second direction (?X) being on the opposite side of the reference axis (A) from the first direction (+X), and a second TEM image is obtained. The reference axis is incrementally varied so as to reduce the brightness of the differential image between a power spectrum of the first TEM image and a power spectrum of the second TEM image.Type: GrantFiled: March 7, 2017Date of Patent: July 10, 2018Assignee: JEOL Ltd.Inventors: Yuko Shimizu, Akira Yasuhara, Kazuya Yamazaki, Fumio Hosokawa
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Patent number: 10014152Abstract: There are disclosed an aberration correction method and a charged particle beam system capable of correcting off-axis first order aberrations. The aberration correction method is for use in the charged particle beam system (100) equipped with an aberration corrector (30) which has plural stages of multipole elements (32a, 32b) and a transfer lens system (34) disposed between the multipole elements (32a, 32b). The method includes varying the excitation of the transfer lens system (34) and correcting off-axis first order aberrations.Type: GrantFiled: December 21, 2016Date of Patent: July 3, 2018Assignee: JEOL Ltd.Inventor: Shigeyuki Morishita
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Patent number: 10014153Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).Type: GrantFiled: February 2, 2017Date of Patent: July 3, 2018Assignee: JEOL Ltd.Inventor: Yuji Kohno
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Patent number: 10014156Abstract: There is provided a method capable of calibrating a sample stage easily. This method is for use in a charged particle beam system having the sample stage for moving a sample and an imaging subsystem for capturing a charged particle beam image and obtaining a final image. The method includes the steps of obtaining the final image from the imaging subsystem (step S100), obtaining correlation information that associates a given position in the final image with a position of the sample stage assumed when the final image was taken (step S102), obtaining length information about a length per pixel of the final image at a final magnification (step S106), and finding a correction between coordinates of the final image and coordinates of the sample stage on the basis of the correlation information and of the length information (step S110).Type: GrantFiled: October 21, 2016Date of Patent: July 3, 2018Assignee: JEOL Ltd.Inventor: Naoki Hosogi
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Patent number: 10014159Abstract: There is provided a detector apparatus capable of detecting the position or tilt angle of a sample stage with high resolution and high reliability. The detector apparatus (100) is operative to detect the position or tilt angle of the sample stage (2), and has a potentiometer (10) for detecting the position or tilt angle of the sample stage (2), an encoder (20) for detecting the position or tilt angle of the sample stage (2), and a computing unit (30) for calculating the position or tilt angle of the sample stage (2), based both on an output signal from the potentiometer (10) and on an output signal from the encoder (20).Type: GrantFiled: October 21, 2016Date of Patent: July 3, 2018Assignee: JEOL Ltd.Inventor: Takaki Ishikawa
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Patent number: 9997327Abstract: There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.Type: GrantFiled: December 8, 2016Date of Patent: June 12, 2018Assignee: JEOL Ltd.Inventors: Hidetaka Sawada, Yu Jimbo, Masashi Shimizu
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Patent number: 9952243Abstract: A reagent vessel housing unit 7 is provided with a drive unit 121 for a base member 122. The base member supports a first opening/closing mechanism 135 for a first reagent vessel and a second opening/closing mechanism 136 for a second reagent vessel. The drive unit 121 positions the base member 122 at an initial position, at a position at which the cap of a first reagent vessel and the cap of a second reagent vessel are closed, at a first opening position at which the cap of the first reagent vessel is opened, and at a second opening position at which the cap of the second reagent vessel is opened.Type: GrantFiled: March 13, 2015Date of Patent: April 24, 2018Assignees: JEOL Ltd., Fujirebio Inc.Inventor: Takashi Watanabe
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Patent number: 9945797Abstract: An analysis method includes: acquiring a photoelectron spectrum and an X-ray-excited Auger spectrum, the photoelectron spectrum being obtained by detecting photoelectrons emitted from a specimen by irradiating the specimen with X-rays, and the X-ray-excited Auger spectrum being obtained by detecting Auger electrons emitted from the specimen by irradiating the specimen with X-rays; calculating a quantitative value of each element included in the specimen based on the photoelectron spectrum; and performing a curve fitting process on the X-ray-excited Auger spectrum by using an electron beam-excited Auger electron standard spectrum, and calculating a quantitative value of an analysis target element in each chemical bonding state included in the specimen.Type: GrantFiled: September 7, 2016Date of Patent: April 17, 2018Assignee: JEOL Ltd.Inventor: Masahide Shima
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Patent number: 9916963Abstract: A specimen loading method for loading a specimen that contains water into a specimen chamber of a charged particle beam device, includes: a step (S100) of mounting the specimen on a specimen support; a step (S102) of covering a predetermined area of the specimen with a water retention material; a step (S104) of evacuating the specimen chamber in which the specimen having the predetermined area covered with the water retention material is placed; and a step (S106) of exposing the predetermined area covered with the water retention material.Type: GrantFiled: June 18, 2015Date of Patent: March 13, 2018Assignee: JEOL Ltd.Inventors: Noriyuki Inoue, Yoshiko Takashima
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Patent number: 9892886Abstract: There is provided a charged particle beam system for reducing phase variations in a charged particle beam due to sixth order three-lobe aberration. The charged particle beam system (100) is equipped with an aberration corrector (30) for correcting aberrations in the optical system, and includes: an aberration measuring section (44) for measuring sixth order three-lobe aberration of sixth order geometric aberration, a computing section (46) for computing the magnitude of at least one of fourth order three-lobe aberration of fourth order geometric aberration and three-fold astigmatism of second order geometric aberration for reducing phase variations in the charged particle beam due to the sixth order three-lobe aberration on the basis of the measured sixth order three-lobe aberration, and a controller (48) for controlling the aberration corrector (30) to produce at least one of the fourth order three-lobe aberration and the three-fold astigmatism on the basis of the computed magnitude.Type: GrantFiled: June 8, 2017Date of Patent: February 13, 2018Assignee: JEOL Ltd.Inventor: Shigeyuki Morishita
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Publication number: 20180031499Abstract: In an embodiment of the invention inductive coupling of an idler coil to a parent coil is used to provide a double resonance circuit without the disadvantages of capacitive coupling to the parent coil. In an embodiment of the invention, an inductive coupling coil can be used to achieve a double-tuned circuit. In an embodiment of the invention, a circuit uses inductive coupling to achieve a double resonance circuit for 1H, 19F, and 13C experiments where one of the three nuclei are observed and the other two are decoupled. In an embodiment of the invention a pivot or a shunt can be used to couple and decouple the idler coil and the parent coil.Type: ApplicationFiled: April 8, 2016Publication date: February 1, 2018Applicant: JEOL LTD.Inventor: ALBERT ZENS
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Patent number: 9881768Abstract: A charged particle beam system capable of reducing contamination has a sample chamber (15) in which the sample (S) is irradiated with a charged particle beam and a receptacle chamber (21) which is connected into the sample chamber (15) via an isolation valve (25) and is connected to the ambient via a door (26). A transport mechanism (22) conveys the sample (S) from the ambient via the door (26) into the receptacle chamber (21) and via the isolation valve (25) into the sample chamber (15). A cleaning portion supplies active oxygen into the receptacle chamber which can then be evacuated by a vacuum pump.Type: GrantFiled: August 10, 2016Date of Patent: January 30, 2018Assignee: JEOL Ltd.Inventor: Shuji Kawai
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Patent number: 9874532Abstract: A scatter diagram display device includes a principal component analysis section that performs principal component analysis on intensity or concentration map data that represents each element, a priority level setting section that sets a priority level to each element based on the results of the principal component analysis performed by the principal component analysis section, and a display control section that performs a control process that arranges a plurality of scatter diagrams generated by combining each element based on the priority level that has been set to each element by the priority level setting section, and displays the plurality of scatter diagrams on a display section.Type: GrantFiled: October 19, 2015Date of Patent: January 23, 2018Assignee: JEOL Ltd.Inventors: Norihisa Mori, Masaru Takakura, Shinya Fujita, Shigeru Honda, Naoki Kato, Shuichi Sakamoto
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Patent number: 9859095Abstract: An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).Type: GrantFiled: May 11, 2016Date of Patent: January 2, 2018Assignees: The University of Tokyo, JEOL Ltd.Inventors: Naoya Shibata, Yuji Kohno, Hidetaka Sawada
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Patent number: 9835639Abstract: The gripping mechanism is a gripping mechanism for gripping a cuvette T, the gripping mechanism comprising: a sandwiching section 50 for holding the cuvette T in a laterally sandwiching manner; a pressing section 60 for pressing downward an upper end surface of the cuvette T held in a sandwiching manner by the sandwiching section 50, wherein the pressing section 60 is arranged such that, with the cuvette T being held in a sandwiching manner by the sandwiching section 50, a central axis of the cuvette T along a vertical direction coincides mutually with a central axis of the pressing section 60 in the vertical direction.Type: GrantFiled: November 25, 2015Date of Patent: December 5, 2017Assignees: FUJIREBIO INC., JEOL LTD.Inventors: Kazuyuki Oguri, Tomohiro Endo, Toshiaki Ohtake, Hidenobu Kawada, Takahiro Matsumoto
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Patent number: 9824856Abstract: A deposition method is implemented in a focused ion beam system that supplies a compound gas to a specimen, and applies an ion beam to the specimen to deposit a deposition film, the deposition method including: a first deposition film-depositing step that deposits a first deposition film on the specimen using the ion beam that is defocused with respect to the specimen; and a second deposition film-depositing step that deposits a second deposition film on the first deposition film using the ion beam that is smaller in defocus amount than that used in the first deposition film-depositing step.Type: GrantFiled: December 2, 2015Date of Patent: November 21, 2017Assignee: JEOL Ltd.Inventor: Misumi Kadoi
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Publication number: 20170312756Abstract: An automatic analysis device and method having a BF separation process, wherein the width in a container conveyance direction of a surface facing a reaction container of a magnet for preliminary magnetic collection of a first magnetic generation part (32p) is set to have a length including a region for housing a liquid sample of the reaction container conveyed to a magnetic collection position of the first magnetic generation part. An end in the container conveyance direction of a surface facing the reaction container of a magnet for regular magnetic collection of a second magnetic generation part (32m) is designed to be close to the center of the region for housing the liquid sample of the reaction container conveyed to a magnetic collection position of the second magnetic generation part.Type: ApplicationFiled: September 29, 2015Publication date: November 2, 2017Applicants: JEOL LTD., Fujirebio Inc.Inventors: Nakamura Mizuki, Endo Tomohiro, Oguri Kazuyuki