Patents Assigned to JSR Corporation
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Publication number: 20200319171Abstract: The present invention relates to composite particles, coated particles, a method of producing composite particles, a ligand-containing solid phase carrier, and a method of detecting or separating a target substance in a sample. The above described composite particles each contains an organic polymer and inorganic nanoparticles, wherein the content of the inorganic nanoparticles in the composite particles is more than 80% by mass, and wherein the composite particles have a volume average particle size of from 10 to 1,000 nm.Type: ApplicationFiled: May 23, 2017Publication date: October 8, 2020Applicants: JSR Micro N.V.C., JSR Corporation, JSR Life Sciences Corporation, JSR Micro, Inc., JSR Micro N.V.Inventors: Takeaki MASUDA, Shunsuke Onogi
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Publication number: 20200247982Abstract: The present invention has as its object the provision of a polymer composition from which a rubber elastic body having high strength is obtained and in which excellent processability is achieved, and a tire having excellent strength.Type: ApplicationFiled: April 10, 2020Publication date: August 6, 2020Applicant: JSR CorporationInventors: Takuya SANO, Takato FUKUMOTO, Takumi ADACHI, Naoya HONDA, Kunpei KOBAYSHI, Jiro UEDA
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Publication number: 20200172682Abstract: The present invention has as its object the provision of a production process of a rubber composition containing a modified conjugated diene-based polymer, which can provide a rubber composition in which processability is excellent, and a filling agent, when contained, has favorable dispersibility therein. The production process of a rubber composition according to the present invention includes: a first step of kneading a modified conjugated diene-based polymer that is obtained by polymerizing a monomer containing a conjugated diene compound and has at least one nitrogen-containing functional group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group and groups in which these amino groups have been converted into an onium group, and a basic compound having an acid dissociation constant of 8.0 or more; and a second step of kneading the kneaded product obtained in the first step and a cross-linking agent.Type: ApplicationFiled: February 6, 2020Publication date: June 4, 2020Applicant: JSR CorporationInventors: Koichiro TANI, Ryota FUNAKI, Rikimaru KUWABARA, Hiroyuki MORITA, Takaomi MATSUMOTO
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Publication number: 20200086687Abstract: A rubber composition contains: (A) a polymer having a carbon-carbon unsaturated bond and exhibiting a value ? of 0.6 or more as obtained by the following formula (i): ?=(p+(0.5×r))/(p+q+(0.5×r)+s)??(i) wherein p, q, r, and s are the proportions by mole of structural units represented by the following formulae (1), (2), (3), and (4), respectively in the polymer: and (B) modified silica.Type: ApplicationFiled: August 16, 2019Publication date: March 19, 2020Applicant: JSR CorporationInventors: Koichiro TANI, Takuya SANO, Takato FUKUMOTO, Naoki SUGIYAMA, Kunpei KOBAYASHI, Takumi ADACHI, Jiro UEDA, Ryoji TANAKA
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Publication number: 20200087490Abstract: A rubber composition contains (A) a modified conjugated diene-based polymer, (B) modified silica, and (C) a polymer having crystalline character. A crosslinked product is produced through crosslinking of the rubber composition containing the modified conjugated diene-based polymer (A), the modified silica (B), and the polymer having crystalline character (C). The crosslinked product is used for producing a tire including a tread and a sidewall, wherein at least one of the tread and the sidewall is formed of the crosslinked product.Type: ApplicationFiled: August 16, 2019Publication date: March 19, 2020Applicant: JSR CorporationInventors: Koichiro Tani, Naoki Sugiyama, Kunpei Kobayashi, Ryoji Tanaka
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Patent number: 10580592Abstract: Provided is a method for manufacturing an electrode material having a pressing step in which an irregularly shaped aggregate containing at least an active material is statically pressed in the presence of an alkali metal source and a solvent.Type: GrantFiled: September 28, 2016Date of Patent: March 3, 2020Assignee: JSR CorporationInventors: Koji Sumiya, Shigehito Asano, Yasuyuki Koga, Ryo Kimura, Tsutomu Reiba, Terukazu Kokubo, Nobuo Ando
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Publication number: 20200054252Abstract: An enzyme sensor is configured to measure a measurement target substance included in a secretion of a living body. The enzyme sensor includes a layered structure including (a) an absorber layer configured to absorb the secretion, (b) an enzyme layer containing an enzyme, and (c) an electrode part arranged in an order of the (a), the (b), and the (c). The absorber layer includes a polymeric material having a chemically bound crosslinked structure.Type: ApplicationFiled: November 7, 2017Publication date: February 20, 2020Applicant: JSR CorporationInventors: Masayasu FUJIOKA, Akinori ITO, Kenichi HAMADA
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Publication number: 20200024483Abstract: An aqueous dispersion for chemical mechanical polishing includes: (A) silica particles; (B) at least one kind selected from the group consisting of organic acids and salts thereof; and (C) at least one kind selected from the group consisting of amino group-containing silane compounds and condensates thereof, and has a pH of 7 or more and 14 or less.Type: ApplicationFiled: June 14, 2019Publication date: January 23, 2020Applicant: JSR CorporationInventors: Masashi Okamoto, Yuuji Hirai, Eiichirou Kunitani, Kouji Nakanishi
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Publication number: 20200026188Abstract: A radiation-sensitive composition contains: a polymer having a first structural unit that includes an acid-labile group; a first compound that generates a first acid upon an irradiation with a radioactive ray; and a second compound that generates a second acid upon an irradiation with a radioactive ray. The first acid does not substantially dissociate the acid-labile group under a condition of a temperature of 110° C. and a time period of 1 min, and the second acid dissociates the acid-labile group under a condition of a temperature of 110° C. and a time period of 1 min. The radiation-sensitive composition satisfies at least one of requirements (1) and (2): (1) the polymer includes a monovalent iodine atom; and (2) the radiation-sensitive composition further contains a third compound that is other than the first compound or the second compound, and that includes a monovalent iodine atom.Type: ApplicationFiled: September 30, 2019Publication date: January 23, 2020Applicant: JSR CorporationInventor: Ken MARUYAMA
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Publication number: 20190391489Abstract: A method for producing a plated shaped structure, includes applying a photosensitive resin composition on a substrate to form a photosensitive resin coating film. The photosensitive resin composition includes: (A) a resin whose solubility in alkali is capable of being increased by an action of an acid; (B) a photoacid generator; and (C) a compound which is capable of being decomposed by an action of an acid to form a primary or secondary amine. The photosensitive resin coating film is exposed to light. The photosensitive resin coating film is developed after the exposing to light to form a resist pattern. A plating process is performed using the resist pattern as a mask.Type: ApplicationFiled: September 4, 2019Publication date: December 26, 2019Applicant: JSR CorporationInventors: Hirokazu Sakakibara, Hirokazu Itou, Tomoyuki Matsumoto, Kazuto Watanabe
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Publication number: 20190391420Abstract: According to the present invention, a liquid crystal aligning agent is configured to contain a polymer (P) which has at least one partial structure selected from the group consisting of a partial structure represented by formula (1) and a partial structure represented by formula (2). In formula (1) and formula (2), X1 represents a tetravalent organic group that has a cyclobutane ring structure, while having at least one substituent in the ring portion of the cyclobutane ring; X2 represents a divalent organic group of a specific structure which has an aliphatic structure and a divalent nitrogen-containing heterocyclic group; and each of R5 and R6 independently represents a hydrogen atom or a monovalent organic group having 1-6 carbon atoms.Type: ApplicationFiled: February 13, 2018Publication date: December 26, 2019Applicant: JSR CorporationInventors: Takuya MURAKAMI, Nobuo YASUIKE, Ryou SUHARA
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Publication number: 20190367722Abstract: A polymer composition including: a filler (A); a polymer (B) having a repeating unit derived from a conjugated diene compound, having a peak temperature of a tan ? temperature dispersion curve of ?110° C. or more and less than ?30° C., and having a functional group capable of interacting with the filler (A); and a polymer (C) having a repeating unit derived from a conjugated diene compound and a repeating unit derived from an aromatic vinyl compound, having a peak temperature of a tan ? temperature dispersion curve of ?30° C. or more and 10° C. or less, and having a functional group capable of interacting with the filler (A), wherein the polymer (B) and the polymer (C) are incompatible with each other, and a concentration of functional groups per unit mass of the polymer (B) is higher than a concentration of functional groups per unit mass of the polymer (C).Type: ApplicationFiled: May 23, 2019Publication date: December 5, 2019Applicant: JSR CorporationInventors: Junji KAWAI, Hiroyuki MORITA, Yusuke AMANO, Noriko MASHIMO, Takaomi MATSUMOTO
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Patent number: 10473836Abstract: An optical filter including a base member having a layer containing near-infrared absorbing fine particles and a dielectric multilayer film, the optical filter satisfying a requirement that, in a wavelength range of 400 nm to 650 nm, an average of transmittance of any of light incident from a direction perpendicular to the optical filter, light obliquely incident at an angle of 30 degrees, and light obliquely incident at an angle of 60 degrees is 45% or higher and lower than 85%; and a requirement that, in a wavelength range of 800 nm to 1,200 nm, an average of optical density (OD value) of any of light incident from the direction perpendicular to the optical filter, light obliquely incident at an angle of 30 degrees with respect to the perpendicular direction, and light obliquely incident at an angle of 60 degrees with respect to the perpendicular direction is 1.7 or higher.Type: GrantFiled: September 21, 2017Date of Patent: November 12, 2019Assignee: JSR CorporationInventors: Katsuya Nagaya, Toshihiro Otsuki, Takashi Tsubouchi
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Publication number: 20190292409Abstract: Provided is a chemical mechanical polishing composition to be used for forming a circuit board including a resin substrate on which a wiring layer containing copper or a copper alloy is provided, the chemical mechanical polishing composition including: (A) at least one selected from a group consisting of carboxyl group-containing organic acids and salts thereof; (B) a basic compound having a first acid dissociation constant (pKa) of 9 or more; and (C) abrasive grains, wherein the component (A) has a complex stability constant with copper of 5 or less, and wherein the chemical mechanical polishing composition has a pH value of from 1 to 3.Type: ApplicationFiled: March 21, 2019Publication date: September 26, 2019Applicant: JSR CorporationInventors: Eiichirou KUNITANI, Kazuhiro Tanaka, Masahiro Noda, Tatsuya Yamanaka
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Publication number: 20190292408Abstract: Provided is a chemical mechanical polishing composition to be used for forming a circuit board including a resin substrate on which a wiring layer containing copper or a copper alloy is provided, the chemical mechanical polishing composition including: (A) at least one selected from a group consisting of organic acids and salts thereof; (B) a phosphorus-containing compound; and (C) abrasive grains each having an absolute value of a zeta potential in the composition of 5 mV or more, wherein, when a content of the component (A) in the composition is represented by MA mass % and a content of the component (B) therein is represented by MB mass %, a ratio MA/MB of the content of the component (A) to the content of the component (B) ranges from 1 to 10, and wherein the chemical mechanical polishing composition has a pH value of from 1 to 3.Type: ApplicationFiled: March 21, 2019Publication date: September 26, 2019Applicant: JSR CorporationInventors: Eiichirou KUNITANI, Kazuhiro TANAKA, Masahiro NODA, Tatsuya YAMANAKA
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Patent number: 10423083Abstract: A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.Type: GrantFiled: March 6, 2017Date of Patent: September 24, 2019Assignee: JSR CorporationInventors: Kentaro Harada, Goji Wakamatsu
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Publication number: 20190269969Abstract: An exercise assistance device includes a biological information acquisition unit, a storage unit, an exercise menu setting unit, and an exercise menu presentation unit. The biological information acquisition unit acquires, from a biosensor that measures a measurement target substance contained in a secretion from a living body, biological information indicating a result of such measurement by the biosensor. The storage unit stores the biological information. The exercise menu setting unit sets an exercise menu based on the biological information stored in the storage unit. The exercise menu presentation unit presents the exercise menu set by the exercise menu setting unit.Type: ApplicationFiled: October 25, 2017Publication date: September 5, 2019Applicant: JSR CorporationInventors: Masayasu FUJIOKA, Takaaki MIYASAKO, Kenichi HAMADA, Taito HAYASHI
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Publication number: 20190249000Abstract: A resin composition includes a resin A, a resin C, and a solvent. The resin A includes a sulfonic-acid-group-containing structural unit in an amount exceeding 5 mol % with respect to total structural units included in the resin A. The resin A has a content of a fluorine atom of 30 mass % or less with respect to a total mass of the resin A. The resin C includes a fluorine atom in a larger content per unit mass than the content of a fluorine atom per unit mass in the resin A. A content of the resin A in the resin composition is lower than a content of the resin C in the resin composition in terms of mass.Type: ApplicationFiled: April 26, 2019Publication date: August 15, 2019Applicant: JSR CorporationInventors: Tomohiko SAKURAI, Sosuke Osawa, Hiromitsu Nakashima
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Publication number: 20190235386Abstract: A pattern-forming method includes forming a base pattern having recessed portions on a front face side of a substrate directly or via other layer. The recessed portions of the base pattern are filled with a first composition to form a filler layer. Phase separation of the filler layer is allowed to form a plurality of phases of the filler layer. A part of the plurality of phases of the filler layer is removed to form a miniaturized pattern. The forming of the base pattern includes: forming a resist pattern on the front face side of the substrate; forming a layer of a second polymer on lateral faces of the resist pattern; and forming a layer of a third polymer that differs from the second polymer on a surface of the substrate or on a surface of the other layer.Type: ApplicationFiled: April 5, 2019Publication date: August 1, 2019Applicant: JSR CorporationInventors: Hiroyuki Komatsu, Takehiko Naruoka, Masafumi Hori, Hitoshi Osaki, Tomohiro Oda
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Publication number: 20190218378Abstract: Provided is a method that can produce an inexpensive rubber composition capable of providing a rubber elastic body having high strength. A method for producing a rubber composition of the present invention includes steps of: (A) kneading a component containing at least a highly saturated conjugated diene-based polymer and a crosslinking agent component; (B) kneading a component containing at least a conjugated diene-based polymer other than the highly saturated conjugated diene-based polymer; and (C) kneading an intermediate composition (a) obtained in the step (A) and an intermediate composition (b) obtained in the step (B).Type: ApplicationFiled: March 26, 2019Publication date: July 18, 2019Applicant: JSR CorporationInventors: Takumi ADACHI, Takuya SANO, Takato FUKUMOTO, Naoya HONDA, Kunpei KOBAYASHI, Jiro UEDA