Abstract: A method of manufacturing a semiconductor device includes forming an oxide film on a substrate by performing a cycle a predetermined number of times. The cycle includes supplying a precursor gas to the substrate; and supplying an ozone gas to the substrate. In the act of supplying the precursor gas, the precursor gas is supplied to the substrate in a state where a catalytic gas is not supplied to the substrate, and in the act of supplying the ozone gas, the ozone gas is supplied to the substrate in a state where an amine-based catalytic gas is supplied to the substrate.

Abstract: A compressed air stream is cooled in an exchanger to form a compressed cooled air stream. The stream is then cryogenically compressed in a first compressor to form a first pressurized gas stream. The first pressurized gas stream is further cooled in the exchanger, cryogenically compressed in a second compressor, and then it is cooled and partially liquefied. The cooled and partially liquefied product is then fed to a system of distillation columns. A liquid product is removed from the system of distillation columns. This product is then pressurized, vaporized and warmed in the exchanger to yield pressurized gaseous product.

Abstract: A catalytic water gas shift process at temperatures above about 450° C. up to about 900° C. or so wherein the catalyst includes rhenium deposited on a support, preferably without a precious metal, wherein the support is prepared from a high surface area material, such as a mixed metal oxide, particularly a mixture of zirconia and ceria, to which may be added one or more of a high surface area transitional alumina, an alkali or alkaline earth metal dopant and/or an additional dopant selected from Ga, Nd, Pr, W, Ge, Fe, oxides thereof and mixtures thereof.

Abstract: During a heating phase, injection of a jet of fuel and oxidant (fuel annularly enshrouding oxidant or oxidant annularly enshrouding fuel) from a fuel-oxidant nozzle is combusted in a combustion space. During a transition from the heating phase to a distributed combustion phase, an amount of a secondary portion of either the fuel or oxidant is injected as a jet into the combustion space while the primary portion of that same reactant from the fuel-oxidant nozzle is decreased. At some point during the transition phase, a jet of actuating fluid is injected at an angle towards the jet of reactants from the fuel-oxidant nozzle and/or towards the jet of the secondary portion of reactant. The jet of primary portions of reactants and/or secondary portion of reactant is caused to be bent/deviated towards the other of the two jets. The staging of the secondary portion of reactant is increased until a desired degrees of staging and commencement of a distributed combustion phase are achieved.

Abstract: A cleaning method includes: providing a process container in which a process of forming a film on a substrate is performed; and removing a deposit including the film adhered to the process container by supplying a cleaning gas into the process container after performing the process. The act of removing the deposit includes generating a mixture gas of a fluorine-containing gas and a nitrosyl fluoride gas as the cleaning gas by mixture and reaction of the fluorine-containing gas and a nitrogen monoxide gas in a mixture part and supplying the mixture gas from the mixture part into the process container after removing exothermic energy generated by the reaction.

Abstract: A cylinder valve comprising a body including a mounting end for attachment in the opening of a pressurized fluid cylinder, a internal withdrawing circuit comprising a first end located at the mounting end and a second end located at an outlet port located in the body, the withdrawing circuit comprising, an isolation valve and a regulating device for regulating selectively the flowrate and/or the pressure of the fluid flowing in the withdrawing circuit, the isolation valve and the regulating device being controlled by manual actuating organ(s) located on the body, the actuating organ(s) controlling the regulating device being mobile relative to the body between a first position setting a flow rate or a regulated pressure to defined minimum value and at least a second position setting a flow rate or a regulated pressure to a defined maximum value.

Abstract: The invention relates to a flowmeter for two-phase gas/liquid cryogenic fluids, comprising: a liquid/gas phase separator, preferably consisting of a tank, into the top part of which the cryogenic liquid is admitted; a liquid flow-rate sensor, located in a liquid duct in fluid communication with the bottom part of the tank, the tank being placed in a high position in space relative to the liquid flow-rate sensor; a gas duct, in fluid communication with the top part of the tank equipped with the gas valve; and a device for measuring the level of liquid in the tank, preferably comprising two level sensors: a lower level sensor and an upper level sensor.

Abstract: Method of deposition on a substrate of a dielectric film by introducing into a reaction chamber a vapor of a precursor selected from the group consisting of Zr(MeCp)(NMe2)3, Zr(EtCp)(NMe2)3, ZrCp(NMe2)3, Zr(MeCp)(NEtMe)3, Zr(EtCp)(NEtMe)3, ZrCp(NEtMe)3, Zr(MeCp)(NEt2)3, Zr(EtCp)(NEt2)3, ZrCp(NEt2)3, Zr(iPr2Cp)(NMe2)3, Zr(tBu2Cp)(NMe2)3, Hf(MeCp)(NMe2)3, Hf(EtCp)(NMe2)3, HfCp(NMe2)3, Hf(MeCp)(NEtMe)3, Hf(EtCp)(NEtMe)3, HfCp(NEtMe)3, Hf(MeCp)(NEt2)3, Hf(EtCp)(NEt2)3, HfCp(NEt2)3, Hf(iPr2Cp)(NMe2)3, Hf(tBu2Cp)(NMe2)3, and mixtures thereof; and depositing the dielectric film on the substrate.

Abstract: The invention relates to a security device forming a pressurized gas release valve, said device including a body that defines a gas flow channel extending between a first upstream end, to be placed in contact with a source of pressurized gas, and a second downstream end, to be placed in contact with the outer atmosphere, the device including a stopper that is located on the channel so as to prevent the flow of the gas between the upstream end and the downstream end in a normal situation, the stopper being fusible and/or frangible so as to release the gas passage in the event of a dangerous situation when a pressure and/or a temperature exceeds a predetermined threshold. Said device is characterized in that said device includes a tank of an unstable, exothermically decomposable gas that is placed in communication with the pressurized gas released during the melting/breaking of the stopper.

Abstract: The invention relates to an antimicrobially effective composition which comprises a) 0.001 to 1% by weight of bispyridiniumalkane, b) humectant and c) water. The composition has an osmolality of from 230 to 350 mOsmol/kg and is free from surfactant. It is used as wound and mucosa antiseptic.

Abstract: There is provided a method of manufacturing a semiconductor device, including: forming a film containing a specific element, nitrogen, and carbon on a substrate, by alternately performing the following steps a specific number of times: a step of supplying a source gas containing the specific element and a halogen element, to the substrate; and a step of supplying a reactive gas composed of three elements of carbon, nitrogen, and hydrogen and having more number of a carbon atom than the number of a nitrogen atom in a composition formula thereof, to the substrate.

Abstract: When a dry cleaning process is performed in a processing chamber by adding nitrogen monoxide (NO) gas to a cleaning gas, the handling is facilitated, and cleaning performance is improved. A substrate processing apparatus includes a processing vessel configured to process a substrate, a first cleaning gas supply system configured to pre-mix a gas containing fluorine atoms with the NO gas and supply the pre-mixed gas into the processing vessel, and a second cleaning gas supply system installed apart from the first cleaning gas supply system and configured to supply the fluorine-containing gas into the processing vessel.

Abstract: A container has: a) a collapsible receptacle, the wall of which is designed flexibly such that the internal volume of the receptacle is adapted to the volume of a liquid contained therein, and which has an outlet with an outlet valve; and b) in the receptacle a disinfectant composition in the form of a solution with a content of aliphatic alcohol of at most 20% by weight. It is possible that the disinfectant composition is not contaminated with spores or other germs also after the container has been opened, even upon repeated discharge from the container.

Abstract: Methods and compositions for depositing a tellurium-containing film on a substrate are disclosed. A reactor and at least one substrate disposed in the reactor are provided. A tellurium-containing precursor is provided and introduced into the reactor, which is maintained at a temperature ranging from approximately 20° C. to approximately 100° C. Tellurium is deposited on to the substrate through a deposition process to form a thin film on the substrate.

Abstract: A filler-withdrawal coupling for a pressurized gas receptacle comprising a body defining an internal filler circuit between an upstream end designed to be connected to a packaging connector and a downstream end designed to be connected to a receptacle, the coupling comprising an isolation valve that can move relative to a seat between an upstream position for closing the circuit and a downstream position for opening the circuit, said isolation valve being moved to its upstream position by a return member, the coupling also comprising a dust-prevention valve placed upstream of the isolation valve, said dust-prevention valve being able to move relative to the body between an upstream position for closing the upstream end of the circuit and a downstream position for opening the circuit upstream end, said dust-prevention valve being moved to its upstream position by a return member.

Abstract: An integrated apparatus for separating a mixture of carbon dioxide and at least one other gas and for separating air by air distillation is provided. The apparatus includes a CO2 separation unit configured to separate the mixture, an air separation unit configured to separate air by cryogenic distillation, a water cooling tower that operates by direct contact, a line for sending water to the top of the tower, a line for sending at least one portion of the nitrogen-enriched gas stream to a lower level of the tower, a cooled water line for withdrawing cooled water from the tower and means for cooling the air upstream of the air separation unit, the cooled water line being connected to means for cooling the air upstream of the air separation unit and to the inlet and/or to the outlet of the unit for separating the gaseous mixture.

Abstract: The invention relates to a cryogenic distillation apparatus for a gas mixture, including a purification apparatus for purifying a gas mixture in a system with a plurality of adsorbant bottles, a column system, a capacity, means for feeding a cryogenic liquid to the capacity, means for feeding a vaporized liquid from the capacity to a column of the system, a vaporizer in the capacity for vaporizing the contained liquid; means for feeding a calorigenic gas to the vaporizer, and means for drawing a liquid from the capacity.

Abstract: A method for repairing a plate heat exchanger of the type comprising a plurality of plates which, together with side bars arranged on the plates, define fluid flow paths is presented.

Abstract: A storage enclosure and an apparatus and method for producing carbon monoxide and/or hydrogen by means of cryogenic separation, including one such enclosure is provided.

Abstract: An air distillation unit comprises an air distillation column (10) suitable for producing a nominal flow of gaseous nitrogen, the top of said column being connected to a liquid nitrogen source (8), and operates by carrying out the following steps: a flow of compressed, cooled and purified air is sent to an exchanger (11) and then to the column, a flow of gaseous nitrogen is withdrawn from the column, the level of liquid at the bottom of the column is controlled; and injection liquid (20), sent from the source to the column, is no longer sent if the required production reduces to at most the nominal production. Application to the separation of air by cryogenic distillation.