Patents Assigned to Mapper Lithography IP B.V.
  • Patent number: 10297420
    Abstract: A charged particle lithography system for exposing a wafer according to pattern data. The system comprises an electron optical column for generating a plurality of electron beamlets for exposing the wafer, the electron optical column including a beamlet blanker array for switching the beamlets on or off, a data path for transmitting beamlet control data for control of the switching of the beamlets, and a wafer positioning system for moving the wafer under the electron optical column in a scan direction. The wafer positioning system is provided with synchronization signals from the data path to align the wafer with the electron beams from the electron-optical column. The data path further comprises one or more processing units for generating the beamlet control data and one or more transmission channels for transmitting the beamlet control data to the beamlet blanker array.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: May 21, 2019
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Teunis Van De Peut, Marco Jan-Jaco Wieland
  • Patent number: 10144134
    Abstract: The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: December 4, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Joep Gerard Vijverberg, Laurens Vincent Plandsoen, Bas van Gelder, Guido de Boer, Michel Pieter Dansberg
  • Patent number: 10133186
    Abstract: An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: November 20, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Bart Schipper
  • Patent number: 10110343
    Abstract: The present invention relates to a method and encoding device for encoding a sequence of m-bit pattern words and outputting as a bit-stream a frame comprising corresponding n-bit symbols as well as a predetermined comma symbol, wherein m<n, wherein occurrences of false commas in the output bitstream are avoided. The output bitstream may further be optimized based on CID count and DC balance.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 23, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Marco Jan-Jaco Wieland
  • Patent number: 10096450
    Abstract: A method for initializing a first operation in a first module at a first start time value in a first time base, the method comprising generating a clock signal, generating a second time base in the first module based on the clock signal, determining a second sync value in the second time base, determining a first sync value in the first time base corresponding to a second sync value in the second time base, determining a start trigger value in the second time base based on the first sync value and the start time value in the first time base, and initializing the first operation in the first module based on the start trigger value and a current value of the second time base in the first module.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: October 9, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Herre Tjerk Steenstra
  • Patent number: 10087019
    Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: October 2, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Michel Pieter Dansberg, Sjoerd Hesdahl, Jan Pieter Roelof Jongeneel
  • Patent number: 10078274
    Abstract: The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: September 18, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Hendrik Jan De Jong, Marco Jan-Jaco Wieland
  • Patent number: 10079206
    Abstract: Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: September 18, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper, Marco Jan-Jaco Wieland
  • Patent number: 10054863
    Abstract: The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined waveleng
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: August 21, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido De Boer, Niels Vergeer
  • Patent number: 10048599
    Abstract: The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: August 14, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Jerry Johannes Martinus Peijster
  • Patent number: 10037864
    Abstract: The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: July 31, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Alexander Hendrik Vincent Van Veen, Willem Henk Urbanus
  • Publication number: 20180182514
    Abstract: Feedthrough device (50; 150), for forming a hermetic seal around signal conductors in a signal conductor group (60; 160) with a group width. The device comprises a slotted member (52; 152) and a base (62; 162). The base defines a through hole (65) that extends entirely through the base along a feedthrough direction (X), and is adapted to accommodate the slotted member. The slotted member defines first and second surfaces (53, 54; 153, 154) on opposite sides associated with the feedthrough direction, and a side surface (55, 56; 155, 156) facing transverse to the feedthrough direction. The slotted member comprises a slot (58; 158), which extends along the feedthrough direction through the slotted member, and opens into the first and second surfaces and into a longitudinal opening (59; 159) along the side surface. The slot extends transversely into the slotted member up to a slot depth at least equal to the signal conductor group width.
    Type: Application
    Filed: December 7, 2017
    Publication date: June 28, 2018
    Applicant: Mapper Lithography IP B.V.
    Inventor: Johannes Petrus Sprengers
  • Publication number: 20180182594
    Abstract: Fiber feedthrough device (50), for forming a hermetic seal around optical fibers in a flat fiber group (60) with a group width. The device comprises a slotted member and a base (62). The base defines a hole (65) that extends entirely through the base along a feedthrough direction (X), and is adapted to accommodate the slotted member. The slotted member (52) defines first and second surfaces (53) on opposite sides associated with the feedthrough direction, and a side surface (55, 56) facing transverse to the feedthrough direction. The slotted member comprises a slot (58), which extends along the feedthrough direction through the slotted member, and opens into the first and second surfaces and into a longitudinal opening (59) along the side surface. The slot extends transversely into the slotted member up to a slot depth at least equal to the fiber group width.
    Type: Application
    Filed: December 27, 2016
    Publication date: June 28, 2018
    Applicant: Mapper Lithography IP B.V.
    Inventors: Johannes Petrus Sprengers, Christiaan Otten
  • Patent number: 10008362
    Abstract: Fiber feedthrough device (50), for forming a hermetic seal around optical fibers in a flat fiber group (60) with a group width. The device comprises a slotted member and a base (62). The base defines a hole (65) that extends entirely through the base along a feedthrough direction (X), and is adapted to accommodate the slotted member. The slotted member (52) defines first and second surfaces (53) on opposite sides associated with the feedthrough direction, and a side surface (55, 56) facing transverse to the feedthrough direction. The slotted member comprises a slot (58), which extends along the feedthrough direction through the slotted member, and opens into the first and second surfaces and into a longitudinal opening (59) along the side surface. The slot extends transversely into the slotted member up to a slot depth at least equal to the fiber group width.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: June 26, 2018
    Assignee: Mapper Lithography IP B.V.
    Inventors: Johannes Petrus Sprengers, Christiaan Otten
  • Patent number: 9981293
    Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged par
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: May 29, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard
  • Patent number: 9978562
    Abstract: A method for exposing a wafer according to pattern data using a charged particle lithography machine generating a plurality of charged particle beamlets for exposing the wafer. The method comprises providing the pattern data in a vector format, rendering the vector pattern data to generate multi-level pattern data, dithering the multi-level pattern data to generate two-level pattern data, supplying the two-level pattern data to the charged particle lithography machine, and switching on and off the beamlets generated by the charged particle lithography machine on the basis of the two-level pattern data, wherein the pattern data is adjusted on the basis of corrective data.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: May 22, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Teunis Van De Peut, Marco Jan-Jaco Wieland
  • Patent number: 9941093
    Abstract: The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: April 10, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Johan Joost Koning, David Johannes van den Bergen
  • Patent number: 9939728
    Abstract: A target processing machine (100), such as a lithography or inspection machine, comprising a rigid base plate (150), a projection column (101) for projecting one or more optical or particle beams on to a target (130), a support frame (102) supporting the projection column, the support frame being supported by and fixed to the base plate, a stage comprising a movable part (128) for carrying the target and a fixed part (132, 133) being supported by and fixed to the base plate, a beam sensor (160) for detecting one or more of the beams projected by the column, the beam sensor at least in part being supported by and fixed to the base plate, and a vacuum chamber (110) enclosing the support frame and the column, for maintaining a vacuum environment in the interior space of the chamber, the vacuum chamber formed with the base plate forming part thereof, and supporting a plurality of wall panels (171, 172) including a plurality of side wall panels (171) supported by and fixed thereto.
    Type: Grant
    Filed: September 12, 2012
    Date of Patent: April 10, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Jerry Johannes Martinus Peijster
  • Patent number: 9934943
    Abstract: A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: April 3, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Vincent Sylvester Kuiper, Erwin Slot
  • Patent number: RE47287
    Abstract: Charged particle beamlet lithography system for transferring a pattern to a surface of a target comprising a sensor for determining one or more characteristics of one or more charged particle beamlets. The sensor comprises a converter element for receiving charged particles and generating photons in response. The converter element comprises a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets. Each cell comprises a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface. The converter element surface is covered with a coating layer substantially permeable for said charged particles and substantially impermeable for ambient light.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: March 12, 2019
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Rabah Hanfoug