Patents Assigned to Mapper Lithography IP B.V.
  • Publication number: 20110254565
    Abstract: A capacitive sensing system comprising two or more capacitive sensors, one or more AC power sources for energizing the capacitive sensors, and a signal processing circuit for processing signals from the sensors. The sensors are arranged in pairs, wherein the one or more AC power sources are arranged to energize a first sensor of a pair of the sensors with an alternating current or voltage 180 degrees out of phase to a current or voltage for a second sensor of the pair of sensors, and wherein a pair of the sensors provides a measuring unit for a single measured distance value, the signal processing circuit receiving an output signal from each sensor of the pair and generating a measured value related to the average distance between the sensors of the pair and the target.
    Type: Application
    Filed: December 23, 2010
    Publication date: October 20, 2011
    Applicant: Mapper Lithography IP B.V.
    Inventors: Guido De Boer, Johnny Johannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer, Stijn Willem Herman Karel Steenbrink
  • Publication number: 20110216299
    Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.
    Type: Application
    Filed: March 31, 2011
    Publication date: September 8, 2011
    Applicant: Mapper Lithography IP B.V.
    Inventors: Stijn Willem STEENBRINK, Johan Joost Koning, Peter Veltman
  • Publication number: 20110193573
    Abstract: An integrated sensor system for a lithography machine, the system comprising a projection lens system (132) for focusing one or more exposure beams onto a target, a moveable table (134) for carrying the target (9), a capacitive sensing system (300) for making a measurement related to a distance between a final focusing element of the projection lens system (104) and a surface of the target (9), and a control unit (400) for controlling movement of the moveable table (134) to adjust a position of the target (9) based at least in part on a signal from the capacitive sensing system. The capacitive sensing system (300) comprises a plurality of capacitive sensors (30), each comprising a thin film structure. The capacitive sensors and the final focusing element (104) of the projection lens system are mounted directly to a common base (112), and the sensors are located in close proximity to an edge of the final focusing element of the projection lens system.
    Type: Application
    Filed: December 23, 2010
    Publication date: August 11, 2011
    Applicant: Mapper Lithography IP B.V.
    Inventors: Guido DE BOER, Johnny Joannes Jacobus VAN BAAR, Kaustubh Prabodh PADHYE, Robert MOSSEL, Niels VERGEER, Stijn Willem Herman Karel STEENBRINK
  • Publication number: 20110193574
    Abstract: A capacitive sensing system, comprising a sensor having thin film structure, the thin film structure comprising a sensor having a first insulating layer and a first conductive film comprising a sensing electrode formed on a first surface of the first insulating layer and a second conductive film comprising a back guard electrode. The back guard electrode is formed in a single plane and comprises a peripheral portion in the same plane, and is disposed on a second surface of the first insulating layer and a first surface of a second insulating layer or protective layer. The peripheral portion of the back guard electrode extends beyond the sensing electrode to form a side guard electrode which substantially or completely surrounds the sensing electrode.
    Type: Application
    Filed: December 23, 2010
    Publication date: August 11, 2011
    Applicant: Mapper Lithography IP B.V.
    Inventors: Guido DE BOER, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer, Stijn Willem Herman Karel Steenbrink
  • Patent number: 7988136
    Abstract: The disclosure relates to a transfer stage for moving an object in a vacuum chamber in at least a plane of movement, including at least a first and a second rod each having a first and a second end, the first and second rod being connected one to the other with their first ends by a first hinge, the second end of the first rod being provided with a first hinged support and the second end of the second rod being provided with a second hinged support, the first and second hinged supports being roller supports and the first hinge being provided with a short stroke stage for the object. Particularly when using this transfer stage in lithography systems fast and reliable movements are possible.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: August 2, 2011
    Assignee: Mapper Lithography IP B.V.
    Inventor: Ian Saunders
  • Publication number: 20110079730
    Abstract: A charged particle multi-beamlet system for exposing a target (11) using a plurality of beamlets. The system comprises a charged particle source (1) for generating a charged particle beam (20), a beamlet aperture array (4D) for defining groups of beamlets (23) from the generated beam, a beamlet blanker array (6) comprising an array of blankers for controllably blanking the beamlets (23), a beam stop array (8) for blanking beamlets (23) deflected by the blankers, the beam stop array (8) comprising an array of apertures, each beam stop aperture corresponding to one or more of the blankers, and an array of projection lens systems (10) for projecting beamlets on to the surface of the target. The system images the source (1) onto a plane at the beam stop array (8), at the effective lens plane of the projection lens systems (10), or between the beam stop array (8) and the effective lens plane of the projection lens systems (10), and the system images the beamlet aperture array (4D) onto the target (11).
    Type: Application
    Filed: May 22, 2009
    Publication date: April 7, 2011
    Applicant: Mapper Lithography IP B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • Publication number: 20110073782
    Abstract: The invention relates to a method of exposing a target by means of a plurality of beamlets. First, a plurality of beamlets is provided. The beamlets are arranged in an array. Furthermore, a target to be exposed is provided. Subsequently, relative movement in a first direction between the plurality of beamlets and the target is created. Finally, the plurality of beamlets is moved in a second direction, such that each beamlet exposes a plurality of scan lines on the target. The relative movement in the first direction and the movement of the plurality of beamlets in the second direction are such that the distance between adjacent scan lines exposed by the plurality of beamlets is smaller than a projection pitch Pproj,X in the first direction between beamlets of the plurality of beamlets in the array.
    Type: Application
    Filed: December 6, 2010
    Publication date: March 31, 2011
    Applicant: Mapper Lithography IP B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • Patent number: 7868307
    Abstract: A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of n×m beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.
    Type: Grant
    Filed: October 24, 2008
    Date of Patent: January 11, 2011
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 7868300
    Abstract: Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.
    Type: Grant
    Filed: September 14, 2006
    Date of Patent: January 11, 2011
    Assignee: Mapper Lithography IP B.V.
    Inventors: Pieter Kruit, Erwin Slot, Tijs Frans Teepen, Marco Jan Jaco Wieland, Stijn Willem Karel Herman Steenbrink
  • Patent number: 7842936
    Abstract: The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: November 30, 2010
    Assignee: Mapper Lithography IP B.V.
    Inventors: Pieter Kruit, Remco Jager, Stijn Willem Karel Herman Steenbrink, Marco Jan-Jaco Wieland
  • Publication number: 20100276606
    Abstract: A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 4, 2010
    Applicant: Mapper Lithography IP B.V.
    Inventors: Norman Hendrikus Rudolf BAARS, Gerardus Fernandus Ten Berge, Stijn Willem Herman Karel Steenbrink
  • Patent number: 7709815
    Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.
    Type: Grant
    Filed: September 15, 2006
    Date of Patent: May 4, 2010
    Assignee: Mapper Lithography IP B.V.
    Inventors: Remco Jager, Aukje Arianne Annette Kastelijn, Guido de Boer, Marco Jan Jaco Wieland, Stijn Willem Karel Herman Steenbrink
  • Patent number: 7710009
    Abstract: A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: May 4, 2010
    Assignee: Mapper Lithography IP B.V.
    Inventors: Stijn Willem Herman Karel Steenbrink, Pieter Kruit
  • Patent number: 7612866
    Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: November 3, 2009
    Assignee: Mapper Lithography IP B.V.
    Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van't Spijker, Remco Jager, Pieter Kruit
  • Patent number: 7569833
    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: August 4, 2009
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 7453075
    Abstract: A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of n×m beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.
    Type: Grant
    Filed: April 29, 2005
    Date of Patent: November 18, 2008
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 7391037
    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: June 24, 2008
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 7365338
    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: April 29, 2008
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 7348567
    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: March 25, 2008
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 7215070
    Abstract: A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
    Type: Grant
    Filed: February 13, 2004
    Date of Patent: May 8, 2007
    Assignee: Mapper Lithography IP B.V.
    Inventors: Stijn Willem Herman Karel Steenbrink, Pieter Kruit