Patents Assigned to Mapper Lithography IP B.V.
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Publication number: 20120292491Abstract: The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.Type: ApplicationFiled: November 14, 2011Publication date: November 22, 2012Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink, Teunis Van De Peut, Henk Derks
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Patent number: 8294117Abstract: The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet center line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet center line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.Type: GrantFiled: September 17, 2010Date of Patent: October 23, 2012Assignee: Mapper Lithography IP B.V.Inventors: Pieter Kruit, Aernout Christiaan Zonnevylle
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Patent number: 8263942Abstract: A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.Type: GrantFiled: April 7, 2011Date of Patent: September 11, 2012Assignee: Mapper Lithography IP B.V.Inventors: Stijn Willem Herman Karel Steenbrink, Pieter Kruit
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Patent number: 8258484Abstract: The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet projector. The beam generator is configured to generate a plurality of charged particle beamlets. The beamlet blanker is configured to pattern the beamlets. The beamlet projector is configured to project the patterned beamlets onto the target surface. The system further has a deflection device. The deflection device has a plurality of memory cells. Each memory cell is provided with a storage element and is connected to a switching electrode of a deflector.Type: GrantFiled: October 15, 2010Date of Patent: September 4, 2012Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco Wieland, Alexander Hendrik Vincent Van Veen
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Patent number: 8247958Abstract: A dispenser cathode which is comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, and emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.Type: GrantFiled: March 30, 2010Date of Patent: August 21, 2012Assignee: Mapper Lithography IP B.V.Inventors: Stijn Willem Herman Karel Steenbrink, Pieter Kruit
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Patent number: 8242467Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.Type: GrantFiled: March 22, 2010Date of Patent: August 14, 2012Assignee: Mapper Lithography IP B.V.Inventors: Remco Jager, Aukje Arianne Annette Kastelijn, Guido de Boer, Marco Jan Jaco Wieland, Stijn Willem Karel Herman Steenbrink
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Patent number: 8242470Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: January 11, 2007Date of Patent: August 14, 2012Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Patent number: 8198602Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.Type: GrantFiled: March 31, 2011Date of Patent: June 12, 2012Assignee: Mapper Lithography IP B.V.Inventors: Stijn Willem Herman Karel Steenbrink, Johan Joost Koning, Peter Veltman
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Patent number: 8188450Abstract: The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.Type: GrantFiled: March 17, 2011Date of Patent: May 29, 2012Assignee: Mapper Lithography IP B.V.Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20120091318Abstract: The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet projector. The beam generator is configured to generate a plurality of charged particle beamlets. The beamlet blanker is configured to pattern the beamlets. The beamlet projector is configured to project the patterned beamlets onto the target surface. The system further has a deflection device. The deflection device has a plurality of memory cells. Each memory cell is provided with a storage element and is connected to a switching electrode of a deflector.Type: ApplicationFiled: October 15, 2010Publication date: April 19, 2012Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco WIELAND, Alexander Hendrik Vincent VAN VEEN
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Publication number: 20120091358Abstract: The invention relates to a charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system has a charged particle source, an aperture array, a beamlet manipulator, a beamlet blanker, and an array of projection lens systems. The charged particle source is configured to generate a charged particle beam. The aperture array is configured to define separate beamlets from the generated beam. The beamlet manipulator is configured to converge groups of the beamlets towards a common point of convergence for each group. The beamlet blanker is configured to controllably blank beamlets in the groups of beamlets. Finally, the array of projection lens systems is configured to project unblanked beamlets of the groups of beamlets on to the surface of the target. The beamlet manipulator is further adapted to converge each of the groups of beamlets towards a point corresponding to one of the projection lens systems.Type: ApplicationFiled: October 15, 2010Publication date: April 19, 2012Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco WIELAND, Alexander Hendrik Vincent VAN VEEN
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Patent number: 8153991Abstract: A direct write lithography system. The system includes a converter having an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each filed emitter having an activation area. A plurality of individually controllable light sources, each light source arranged for activating one field emitter. A controller controls each light source individually. Each electron beam is focused from the field emitters with a diameter smaller than the diameter of a light source on an object plane.Type: GrantFiled: June 10, 2005Date of Patent: April 10, 2012Assignee: Mapper Lithography IP B.V.Inventor: Pieter Kruit
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Publication number: 20120061583Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.Type: ApplicationFiled: November 25, 2011Publication date: March 15, 2012Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco WIELAND, Bert Jan KAMPHERBEEK, Alexander Hendrik VAN VEEN, Pieter KRUIT, Stijn Willem Herman Karel STEENBRINK
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Patent number: 8134135Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.Type: GrantFiled: July 23, 2007Date of Patent: March 13, 2012Assignee: Mapper Lithography IP B.V.Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20120043438Abstract: A substrate support structure for clamping a substrate on a surface by means of a capillary layer of a liquid. The surface has an outer edge and includes one or more substrate supporting elements for receiving the substrate to be clamped, wherein the one or more substrate supporting elements are arranged to provide support for the substrate at a plurality of support locations. The substrate support structure further includes a sealing structure circumscribing the surface and having a top surface or edge forming a sealing rim. A distance between the outer edge of the surface and an outermost of the support locations is greater than a distance between the outer edge and the sealing rim.Type: ApplicationFiled: February 18, 2011Publication date: February 23, 2012Applicant: Mapper Lithography IP B.V.Inventor: Hendrik Jan DE JONG, JR.
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Patent number: 8110813Abstract: A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction.Type: GrantFiled: April 29, 2010Date of Patent: February 7, 2012Assignee: Mapper Lithography IP B.V.Inventors: Norman Hendrikus Rudolf Baars, Gerardus Fernandus Ten Berge, Stijn Willem Herman Karel Steenbrink
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Patent number: 8089056Abstract: A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.Type: GrantFiled: February 26, 2009Date of Patent: January 3, 2012Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink
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Publication number: 20110266418Abstract: The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.Type: ApplicationFiled: October 26, 2010Publication date: November 3, 2011Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Ferry Michael Postma
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Publication number: 20110261340Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the plurality of beamlets in accordance with a pattern. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data.Type: ApplicationFiled: October 26, 2010Publication date: October 27, 2011Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20110261344Abstract: A method for exposing a surface of a target in a system comprising a set of sensors (30) for measuring distance to the target. The method comprises clamping the target to a moveable table (134), moving the target to a plurality of positions in which one or more of the sensors are positioned above the target, receiving signals from one or more of the sensors positioned above the target, calculating one or more tilt correction values (Rx, Ry) based on the signals received from the sensors, adjusting the tilt of the table based on the one or more tilt correction values, and exposing the target.Type: ApplicationFiled: December 23, 2010Publication date: October 27, 2011Applicant: Mapper Lithography IP B.V.Inventors: Guido DE BOER, Johnny Joannes Jacobus Van Baar, Kaustubh Prabodh Padhye, Robert Mossel, Niels Vergeer, Stijn Willem Herman Karel Steenbrink, Johan Joost Koning