Patents Assigned to Materious, LLC
  • Publication number: 20110151671
    Abstract: Semiconductor substrates are cleaned and subsequently oxidized. After the semiconductor is oxidized it is textured to reduce incident light reflectance. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 23, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. BARR, Corey O' Connor
  • Publication number: 20110147220
    Abstract: Anti-displacement hard gold compositions are disclosed for inhibiting displacement of metal from substrates which are plated with the hard gold. The anti-displacement hard gold compositions may be used to spot plate substrates with hard gold.
    Type: Application
    Filed: September 22, 2010
    Publication date: June 23, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Wan Zhang-Beglinger, Jonas Guebey, André Egli
  • Publication number: 20110143281
    Abstract: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
    Type: Application
    Filed: August 17, 2010
    Publication date: June 16, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan WANG, Peter Trefonas, III, Michael K. Gallagher
  • Patent number: 7960498
    Abstract: An embodiment of the invention is a water soluble chain-extended polyamine product made by a process comprising reacting a multi-arm polyether amine with a bifunctional crosslinker of the formula: X1—R—X2. Another embodiment is a water soluble chain-extended polyamine product made by a process comprising reacting a multi-arm polyether having at least three arms and three electrophilic endgroups with a primary diamine crosslinker of the formula: NH2—R2—NH2, followed by treating of the chain-extended product so as to convert the remaining electrophilic endgroups to amine endgroups. Crosslinking of the chain-extended polyamine products with an oxidized polysaccharide provides useful tissue adhesives with modified elasticity, that provides greater compliance to underlying tissue, and improved stability in aqueous environments.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: June 14, 2011
    Assignee: Actamax Surgical Materials, LLC
    Inventors: Henry Keith Chenault, Garret D. Figuly
  • Patent number: 7955778
    Abstract: Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
    Type: Grant
    Filed: May 19, 2009
    Date of Patent: June 7, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. Gallagher, Deyan Wang
  • Patent number: 7955978
    Abstract: Silicon containing substrates are coated with nickel. The nickel is coated with a protective layer and the combination is heated to a sufficient temperature to form nickel silicide. The nickel silicide formation may be performed in oxygen containing environments.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: June 7, 2011
    Assignee: Rohm and Hass Electronic Materials LLC
    Inventors: John P. Cahalen, Gary Hamm, George R. Allardyce, David L. Jacques
  • Patent number: 7955531
    Abstract: A light extraction encapsulant sheet having a patterned encapsulant region is disclosed. A method of making that light extraction encapsulant sheet and of affixing that light extraction encapsulant sheet to a luminous stack surface of a multi-layer stack is also disclosed.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: June 7, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Garo Khanarian
  • Patent number: 7955977
    Abstract: Methods of light induced plating of nickel onto semiconductors are disclosed. The methods involve applying light at an initial intensity for a limited amount of time followed by reducing the intensity of the light for the remainder of the plating period to deposit nickel on a semiconductor.
    Type: Grant
    Filed: June 23, 2009
    Date of Patent: June 7, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gary Hamm, David L. Jacques
  • Patent number: 7955989
    Abstract: Semiconductors are textured with aqueous solutions containing non-volatile alkoxylated glycols, their ethers and ether acetate derivatives having molecular weights of 170 or greater and flash points of 75° C. or greater. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: June 7, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Patent number: 7952047
    Abstract: An improved automatic feedback control scheme enhances plasma spraying of powdered material through reduction of process variability and providing better ability to engineer coating structure. The present inventors discovered that controlling centroid position of the spatial distribution along with other output parameters, such as particle temperature, particle velocity, and molten mass flux rate, vastly increases control over the sprayed coating structure, including vertical and horizontal cracks, voids, and porosity. It also allows improved control over graded layers or compositionally varying layers of material, reduces variations, including variation in coating thickness, and allows increasing deposition rate. Various measurement and system control schemes are provided.
    Type: Grant
    Filed: August 8, 2005
    Date of Patent: May 31, 2011
    Assignee: Cyber Materials LLC
    Inventors: Michael Alan Gevelber, Donald Edward Wroblewski
  • Publication number: 20110123937
    Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
    Type: Application
    Filed: August 24, 2010
    Publication date: May 26, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. GALLAGHER, Gerald B. Wayton, Gregory P. Prokopowicz, Stewart A. Robertson
  • Publication number: 20110117490
    Abstract: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
    Type: Application
    Filed: June 28, 2010
    Publication date: May 19, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol BAE, Thomas Cardolaccia, Yi Liu
  • Patent number: 7939438
    Abstract: Methods of inhibiting background plating on semiconductor substrates using oxidizing agents are disclosed.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: May 10, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gary Hamm, David L. Jacques, Carl J. Colangelo
  • Patent number: 7940361
    Abstract: A liquid crystal display device including, a pair of substrates, a gate electrode of a thin film transistor (TFT) formed on one of the substrates, and a wiring layer connected to the gate electrode or an electrode of the thin film transistor, wherein at least a part of the gate electrode or a part the wiring layer is formed by a layer structured by a pure copper layer and a Cu—Mn alloy layer including Mn, wherein a concentration of Mn in the Cu—Mn alloy layer is more than 0.1 and not more than 20 atomic percentage within a solubility limit of Mn in the copper, and wherein a boundary surface between the Cu—Mn alloy layer and said one of the substrate includes an oxide layer having a Mn oxide layer.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: May 10, 2011
    Assignee: Advanced Interconnect Materials, LLC
    Inventor: Junichi Koike
  • Publication number: 20110103022
    Abstract: Indium compositions including hydrogen suppressor compounds and methods of electrochemically depositing indium metal from the compositions onto substrates are disclosed. Articles made with the indium compositions are also disclosed.
    Type: Application
    Filed: December 13, 2007
    Publication date: May 5, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Edit Szocs, Felix J. Schwager, Thomas Gaethke, Nathaniel E. Brese, Michael P. Toben
  • Patent number: 7934444
    Abstract: A portable protection system including a selectively collapsible truss for supporting a protection member. The truss is movable between a collapsed position and an expanded position. The protection member includes at least one layer of ballistic armor material for disrupting a projectile. The truss includes suitable connectors for releasably connecting the protection member to the truss, and also suitable connectors for releasably connecting the truss to an adjoining truss so as to form a protection wall.
    Type: Grant
    Filed: July 21, 2010
    Date of Patent: May 3, 2011
    Assignee: Dynamic Defense Materials, LLC
    Inventors: John Carberry, George Forsythe, Harvey Kliman, Katherine Leighton, John Garnier, Ray Ballario, Wiktor Serafin, Jason Ickes
  • Patent number: 7932016
    Abstract: Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: April 26, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Mark R. Winkle, Jill E. Steeper, Xiang-Qian Liu, Janet Okada-Coakley, Scott A. Ibbitson
  • Patent number: 7931793
    Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: April 26, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Motoya Shimazu, Yasuo Ohta
  • Publication number: 20110086314
    Abstract: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
    Type: Application
    Filed: December 17, 2010
    Publication date: April 14, 2011
    Applicant: Rohm and Haas Electronic Material LLC
    Inventors: Edgardo ANZURES, Robert K. Barr
  • Publication number: 20110081742
    Abstract: Semiconductors are textured with aqueous solutions containing non-volatile alkoxylated glycols, their ethers and ether acetate derivatives having molecular weights of 170 or greater and flash points of 75° C. or greater. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Application
    Filed: September 22, 2010
    Publication date: April 7, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor