Patents Assigned to Materious, LLC
  • NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS
    Publication number: 20110269074
    Abstract: New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.
    Type: Application
    Filed: March 31, 2011
    Publication date: November 3, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Cong Liu, Cheng-Bai Xu, Mingqi Li
  • Imaging methods
    Patent number: 8048606
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: November 1, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Metal plating compositions
    Patent number: 8048284
    Abstract: Disclosed are metal plating compositions for plating a metal on a substrate. The metal plating compositions include compounds which influence the leveling and throwing performance of the metal plating compositions. Also disclosed are methods of depositing metals on a substrate.
    Type: Grant
    Filed: April 2, 2008
    Date of Patent: November 1, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Erik Reddington, Gonzalo Urrutia Desmaison, Zukhra I. Niazimbetova, Donald E. Cleary, Mark Lefebvre
  • TIN OR TIN ALLOY ELECTROPLATING SOLUTION
    Publication number: 20110259754
    Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.
    Type: Application
    Filed: April 26, 2011
    Publication date: October 27, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Motoya SHIMAZU, Yasuo Ohta
  • PHOTOSENSITIVE COMPOSITION
    Publication number: 20110262861
    Abstract: Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps.
    Type: Application
    Filed: April 26, 2011
    Publication date: October 27, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Mark R. WINKLE, Jill E. STEEPER, Xiang-Qian LIU, Janet OKADA-COAKLEY, Scott A. IBBITSON
  • Aqueous solution for surface treatment of metal and method for preventing discoloration of metal surface
    Patent number: 8043662
    Abstract: To provide a solder-plating film which has good solder wettability and with which discoloration and twisting of the tin film after heat treatment are prevented. A method and a solution for surface treating a tin film are disclosed. The aqueous solution contains specific compounds and is brought into contact with a tin-plating film before reflow treatment of the tin film.
    Type: Grant
    Filed: August 21, 2006
    Date of Patent: October 25, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Masanori Orihashi
  • Molybdenum metal powder
    Patent number: 8043406
    Abstract: Molybdenum metal powder. Molybdenum metal powder includes molybdenum metal particles having a surface-area-to-mass ratio of between about 1 m2/g and about 4 m2/g, as determined by BET analysis, and a flowability of between about 29 s/50 g and 86 s/50 g as determined by a Hall Flowmeter.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: October 25, 2011
    Assignee: Climax Engineered Materials, LLC
    Inventors: Loyal M. Johnson, Jr., Sunil Chandra Jha, Patrick Ansel Thompson
  • Densified molybdenum metal powder
    Patent number: 8043405
    Abstract: Densified molybdenum metal powder. Densified molybdenum metal powder has substantially generally spherical particles, surface-area-to-mass ratio of no more than about 0.5 m2/g as determined by BET analysis, and a flowability greater than about 32 s/50 g as determined by a Hall Flowmeter.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: October 25, 2011
    Assignee: Climax Engineered Materials, LLC
    Inventors: Loyal M. Johnson, Jr., Sunil Chandra Jha, Patrick Ansel Thompson
  • PHOTORESISTS AND METHODS OF USE THEREOF
    Publication number: 20110256481
    Abstract: New photoresist are provided that comprises a low-Tg component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride and other inorganic surfaces.
    Type: Application
    Filed: December 15, 2010
    Publication date: October 20, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventor: Gerhard POHLERS
  • PHOTORESISTS AND METHODS FOR USE THEREOF
    Publication number: 20110254140
    Abstract: New photoresists are provided that comprise preferably as distinct components: a resin, a photoactive component and a phenolic component Preferred photoresists of the invention are can be useful for ion implant lithography protocols.
    Type: Application
    Filed: December 15, 2010
    Publication date: October 20, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventor: Gerhard POHLERS
  • COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
    Publication number: 20110255069
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Application
    Filed: June 27, 2011
    Publication date: October 20, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventor: Deyan WANG
  • PHOTORESISTS AND METHODS FOR USE THEREOF
    Publication number: 20110254133
    Abstract: New photoresist are provided that comprises an Si-containing component and that are particularly useful for ion implant lithography applications. Photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride and other inorganic surfaces.
    Type: Application
    Filed: December 15, 2010
    Publication date: October 20, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventor: Gerhard POHLERS
  • DELIVERY DEVICE
    Publication number: 20110256313
    Abstract: Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors.
    Type: Application
    Filed: June 28, 2011
    Publication date: October 20, 2011
    Applicant: Rohm and Haas Electric Materials LLC
    Inventor: Deodatta Vinayak SHENAI-KHATKHATE
  • Molybdenum/molybdenum disulfide metal articles and methods for producing same
    Patent number: 8038760
    Abstract: A method for producing a metal article according to one embodiment may involve the steps of: Providing a composite metal powder including a substantially homogeneous dispersion of molybdenum and molybdenum disulfide sub-particles that are fused together to form individual particles of the composite metal powder; and compressing the molybdenum/molybdenum disulfide composite metal powder under sufficient pressure to cause the mixture to behave as a nearly solid mass.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: October 18, 2011
    Assignee: Climax Engineered Materials, LLC
    Inventors: Matthew C. Shaw, Carl V. Cox, Yakov Epshteyn
  • SULFONYL PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20110250542
    Abstract: New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
    Type: Application
    Filed: December 14, 2010
    Publication date: October 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Cong LIU, Cheng-Bai XU
  • METHOD OF CLEANING AND MICRO-ETCHING SEMICONDUCTOR WAFERS
    Publication number: 20110250762
    Abstract: A method of simultaneously cleaning inorganic and organic contaminants from semiconductor wafers and micro-etching the semiconductor wafers. After the semiconductor wafers are cut or sliced from ingots, they are contaminated with cutting fluid as well as metal and metal oxides from the saws used in the cutting process. Aqueous alkaline cleaning and micro-etching solutions containing alkaline compounds and mid-range alkoxylates are used to simultaneously clean and micro-etch the semiconductor wafers.
    Type: Application
    Filed: October 14, 2010
    Publication date: October 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Raymond Chan
  • PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20110250538
    Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
    Type: Application
    Filed: December 10, 2010
    Publication date: October 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Mingqi LI, Emad AQAD, Cong LIU, Joseph MATTIA, Cheng-Bai XU, George G. BARCLAY
  • CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20110250537
    Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
    Type: Application
    Filed: December 10, 2010
    Publication date: October 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Emad AQAD, Mingqi Li, Joseph Mattia, Cheng-Bai Xu
  • Thin film photovoltaic cell
    Publication number: 20110232758
    Abstract: A thin film photovoltaic cell is provided having a substrate; a back contact provided on the substrate; a p-type semiconductor absorber layer provided on the back contact; a n-type semiconductor layer provided on the p-type semiconductor absorber layer; a dielectric organic material layer provided on the n-type semiconductor layer; a transparent conductive film provided on the dielectric organic material layer; and, optionally, an antireflective layer provided on the transparent conductive film. Also provided is a method of manufacturing a thin film photovoltaic cell.
    Type: Application
    Filed: March 25, 2010
    Publication date: September 29, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Garo Khanarian, Nicola Pugliano, Charles R. Szmanda, Jae Hyung Yi
  • NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS
    Publication number: 20110236823
    Abstract: The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
    Type: Application
    Filed: November 22, 2010
    Publication date: September 29, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Roger A. Nassar