Patents Assigned to Materious, LLC
  • Coating compositions for use with an overcoated photoresist
    Patent number: 7919222
    Abstract: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
    Type: Grant
    Filed: January 26, 2007
    Date of Patent: April 5, 2011
    Assignee: Rohm and Haas Electronics Materials LLC
    Inventors: Vaishali Raghu Vohra, James W. Thackeray, Gerald B. Wayton
  • Method and Composition for Chemical Mechanical Planarization of a Metal-Containing Substrate
    Publication number: 20110070735
    Abstract: A composition and associated method for chemical mechanical planarization of a metal-containing substrate afford low dishing levels in the polished substrate while simultaneously affording high metal removal rates. Suitable metal-containing substrates include tungsten- and copper-containing substrates. Components in the composition include a silatrane compound, an abrasive, and, optionally, a strong oxidizing agent, such as a per-compound.
    Type: Application
    Filed: September 14, 2010
    Publication date: March 24, 2011
    Applicant: DuPont Air Products Nano Materials, LLC
    Inventor: Xiaobo Shi
  • PREPARING SUBSTRATES CONTAINING POLYMERS FOR METALLIZATION
    Publication number: 20110064870
    Abstract: Methods of swelling and topographically altering polymers of substrates using low foaming compositions are disclosed. Solvent swells which are stable, homogeneous and low foaming are applied to substrates containing polymers to swell and soften the polymers followed by applying an oxidizer to topographically alter and desmear the polymers in preparation for metallization of the substrate.
    Type: Application
    Filed: August 18, 2010
    Publication date: March 17, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Crystal P. L. LI, Dennis K. W. YEE, Michael CY TANG
  • ORGANOMETALLIC COMPOUNDS
    Publication number: 20110064879
    Abstract: Methods of vapor depositing metal-containing films using certain organometallic compounds containing a carbonyl-containing ligand are disclosed.
    Type: Application
    Filed: September 14, 2010
    Publication date: March 17, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Qing Min Wang, Deodatta Vinayak Shenai-Khatkhate, Huazhi Ll
  • ENHANCED METHOD OF FORMING NICKEL SILICIDES
    Publication number: 20110065274
    Abstract: Silicon containing substrates are coated with nickel. The nickel is coated with a protective layer and the combination is heated to a sufficient temperature to form nickel silicide. The nickel silicide formation may be performed in oxygen containing environments.
    Type: Application
    Filed: August 25, 2010
    Publication date: March 17, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: John P. CAHALEN, Gary HAMM, George R. ALLARDYCE, David L. JACQUES
  • Contact plug structure, semiconductor device, and method for forming contact plug
    Publication number: 20110057317
    Abstract: A contact plug structure formed on a contact hole of an insulating layer of a semiconductor device includes a metal silicide layer formed on a bottom part of the contact hole of the insulating layer, a manganese oxide layer formed on the metal silicide layer in the contact hole, and a buried copper formed on the manganese oxide layer which substantially fills the contact hole.
    Type: Application
    Filed: September 7, 2010
    Publication date: March 10, 2011
    Applicants: Tohoku University, Advanced Interconnect Materials, LLC
    Inventors: Junichi Koike, Akihiro Shibatomi, Kouji Neishi
  • NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
    Publication number: 20110039206
    Abstract: Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring, aromatic and/or multi-cyclic ester monomers.
    Type: Application
    Filed: May 18, 2010
    Publication date: February 17, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Cong LIU, Cheng-Bai Xu
  • NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
    Publication number: 20110039210
    Abstract: Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.
    Type: Application
    Filed: May 18, 2010
    Publication date: February 17, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Cheng-Bai Xu, Anthony Zampini
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20110033801
    Abstract: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
    Type: Application
    Filed: May 18, 2010
    Publication date: February 10, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20110033800
    Abstract: Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
    Type: Application
    Filed: May 18, 2010
    Publication date: February 10, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony ZAMPINI, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
  • Copper alloy and liquid-crystal display device
    Publication number: 20110032467
    Abstract: A liquid crystal display device including, a pair of substrates, a gate electrode of a thin film transistor (TFT) formed on one of the substrates, and a wiring layer connected to the gate electrode or an electrode of the thin film transistor, wherein at least a part of the gate electrode or a part the wiring layer is formed by a layer structured by a pure copper layer and a Cu—Mn alloy layer including Mn, wherein a concentration of Mn in the Cu—Mn alloy layer is more than 0.1 and not more than 20 atomic percentage within a solubility limit of Mn in the copper, and wherein a boundary surface between the Cu—Mn alloy layer and said one of the substrate includes an oxide layer having a Mn oxide layer.
    Type: Application
    Filed: July 9, 2010
    Publication date: February 10, 2011
    Applicants: Tohoku University, Advanced Interconnect Materials LLC
    Inventor: Junichi Koike
  • PROCESS CONTROL APPLICATION DEVELOPMENT ENVIRONMENT AND FEATURES
    Publication number: 20110022197
    Abstract: A process control application development environment provides an abstraction layer for vendor-independent process control application development. Various features such as validation of high-level representations of process control applications, exception handler agents, structured interactive operation of multiple machines, and multiple device states can be implemented for process control applications.
    Type: Application
    Filed: July 26, 2010
    Publication date: January 27, 2011
    Applicant: REC Advanced Silicon Materials LLC
    Inventor: Urban Robert Kultgen, II
  • Thermally-responsive materials and devices comprising such materials
    Patent number: 7875207
    Abstract: Devices are described that include a component comprised of a material having a structure of R1—C(O)—NX—R2, wherein each of R1 and R2 is independently a saturated alkyl having between 7-22 carbon atoms or an aryl, X is H or C(O)—Y, Y together with R1 forms a ring. The material is characterized by a single, sharp melting point, thus making it suitable for use, for example, in thermomechanical actuating devices or in temperature-indicating devices. Also described are compositions comprising two or more materials each having a structure of Rn1—C(O)—NH—R2 wherein, n is an identifying integer corresponding to a material in the composition; wherein for each material n in the composition, Rn1 and Rn2 are a saturated alkyl having between 7-22 carbon atoms, wherein for each material n Rn1 and Rn2 differ by one carbon atom, and wherein the number of carbon atoms in Rn2 of each material n differs by four or less.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: January 25, 2011
    Assignee: Bay Materials, LLC
    Inventor: Ray F. Stewart
  • COMPOSITIONS AND METHODS FOR FORMING ELECTRONIC DEVICES
    Publication number: 20110008729
    Abstract: Compositions are provided which can be used for treating photoresist patterns in the manufacture of electronic devices. The compositions allow for the formation of fine lithographic patterns and find particular applicability in semiconductor device manufacture.
    Type: Application
    Filed: June 28, 2010
    Publication date: January 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol BAE, Thomas Cardolaccia, Yi Liu
  • Low temperature molding process for making solid biodegradable articles
    Patent number: 7867587
    Abstract: The present invention is directed toward a process for making solid biodegradable articles from wheat gluten. Hydrated wheat gluten is provided in the form of a cohesive, elastic dough. The cohesive, elastic dough comprises at least 8% by weight wheat gluten and wherein the wheat gluten comprises a protein having a primary structure. The cohesive, elastic dough is formed into a shaped article and placed in an environment sufficient to remove excess water from the shaped article without modifying the primary structure of the wheat gluten protein, such that a solid biodegradable article results. The solid biodegradable articles of the present invention comprise at least 8% by weight wheat gluten.
    Type: Grant
    Filed: August 2, 2005
    Date of Patent: January 11, 2011
    Assignee: R&D Green Materials, LLC
    Inventor: Dara L Woerdeman
  • Portable Protection Device
    Publication number: 20110000362
    Abstract: A portable protection system including a selectively collapsible truss for supporting a protection member. The truss is movable between a collapsed position and an expanded position. The protection member includes at least one layer of ballistic armor material for disrupting a projectile. The truss includes suitable connectors for releasably connecting the protection member to the truss, and also suitable connectors for releasably connecting the truss to an adjoining truss so as to form a protection wall.
    Type: Application
    Filed: July 21, 2010
    Publication date: January 6, 2011
    Applicant: Dynamic Defense Materials LLC
    Inventors: John Carberry, George Forsythe, Harvey Kliman, Katherine Leighton, John Garnier, Ray Ballario, Wiktor Serafin, Jason Ickes
  • DOPING METHOD
    Publication number: 20110003463
    Abstract: Methods of doping a III-V compound semiconductor film are disclosed.
    Type: Application
    Filed: June 21, 2010
    Publication date: January 6, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventor: Deodatta Vinayak SHENAI-KHATKHATE
  • COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20110003250
    Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: June 10, 2010
    Publication date: January 6, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: John P. Amara, James F. Cameron, Jin Wuk Sung, Gregory P. Prokopowicz
  • PROCESSES FOR PHOTOLITHOGRAPHY
    Publication number: 20110003257
    Abstract: New lithographic processing methods are provided which are particularly useful in immersion lithography schemes. In one aspect, processes of the invention comprise: applying on a substrate a photoresist composition; exposing the photoresist layer to radiation activating for the photoresist composition; removing a portion but not all of the exposed photoresist layer; and developing the treated photoresist layer to provide a photoresist relief image.
    Type: Application
    Filed: June 8, 2010
    Publication date: January 6, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, George G. Barclay, Thomas A. Estelle, Kenneth J. Spizuoco, Doris Kang
  • METHODS OF FORMING ELECTRONIC DEVICES
    Publication number: 20100330499
    Abstract: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 30, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol BAE, Thomas CARDOLACCIA, Yi LIU