Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. The vessel contains an ionic liquid therein. The fluid is contacted with the ionic liquid for take-up of the fluid by the ionic liquid. There is substantially no chemical change in the ionic liquid and the fluid. The fluid is released from the ionic liquid and dispensed from the vessel.

Abstract: A fluid purifying apparatus that includes a manifold that includes a first branch and a second branch, a first check valve coupled to the first branch of the manifold, and a purifier unit that includes a first end and a second end, wherein the first end is coupled to the second branch of the manifold. Also, a fluid purifying apparatus that includes a vessel that includes a first interior compartment for containing a purifier material and a second interior compartment for containment of a fluid containing impurities, wherein the first interior compartment is separated from the second interior compartment by a fluid permeable support, and a rupturable seal.

Abstract: A system and method for generating, purifying, and using ultra-pure ammonia on-site, such as at a semiconductor manufacturing facility. The system includes an ammonia generation system configured to generate ammonia including carbon dioxide, water, and other impurities. A purification system is provided with the generation system in the manufacturing facility and is linked to the output of the generation system. The purification system processes the effluent from the ammonia generation system to remove substantially all of the carbon dioxide, water, and other impurities to produce an outlet stream of ultra-pure ammonia. The system further includes a point of use system provided at the same manufacturing facility to utilize the outlet stream of ultra-pure ammonia.

Abstract: A system and method for processing a matrix fluid to remove one or more impurities (such as moisture from a process gas). The purifier includes a pre-cooler that receives the matrix fluid and cools the matrix fluid to a second, lower temperature. A container is provided to contain a purifier element made up of a high surface area material. The container includes an inlet for receiving the matrix fluid from the pre-cooler and an outlet for outputting the matrix fluid after it is forced to flow through the purifier element. The purifier includes a cooler in thermal contact with an outer surface of the container to cool the outer surface of the container to a purifying temperature, which is selected to be below the ambient temperature and above a phase change point of the matrix fluid and is typically in the range of about 0 to ?200° C.

Abstract: In one embodiment, a device to resurface a sealing surface of a fluid connector in a fluid delivery component is provided. The device may include a housing adapted to be reversibly coupled to the fluid connector. Included may be an arbor which is at least partially disposed in the housing, and both rotationally and axially movable within the housing. The arbor may have a first end proximal to the sealing surface and a second distal end adapted to receive rotational actuation. A resurfacing head may be positioned at the first end of the arbor, and may have a resurfacing face that includes a circular resurfacing groove adapted to fit a circular ridge on the sealing surface of the connector. Rotational contact between the groove and the ridge may cause the resurfacing of the sealing surface. The housing may keep the resurfacing head and the sealing surface aligned during the resurfacing.

Abstract: A method of coating an interior of a gas storage container, where the method includes supplying a chemical vapor precursor to the storage container, and forming a metal coating on the interior surface of the container, where the coating is formed from the chemical vapor precursor. Also, a gas storage container that includes a gas storage vessel with an interior surface that has a liner formed on the interior surface of the storage vessel. The liner may include tungsten metal with a purity of about 99%, by weight, or more. Additionally, a system for making a metal lined gas storage container that may include a chemical vapor precursor generator, and a precursor injection assembly for transporting the precursor into a gas storage vessel. The system may also include an exhaust outlet for removing gaseous deposition products from the gas storage vessel.

Abstract: A continuous method of producing a process fluid gas from a feed stream that includes the process fluid and impurities. The method includes: (a) providing a first and second vessel, each vessel containing one or more regenerable purifier materials for removing at least one of the impurities from the feed stream; (b) removing at least one of the impurities by passing the feed stream through one or the other of the vessels to provide a purified process fluid gas, with the vessel being maintained at a first temperature during the removal of impurities; and (c) regenerating the purifier materials in the vessels at a second temperature and during the time when it is not purifying the feed stream by flowing a portion of the purified process fluid or the feed stream or a separate source of the process fluid gas therethrough.

Abstract: A process for removing trace amounts of moisture and/or one or more impurities from contaminated hydride, inert and non-reactive gases, thus decreasing the concentration of the impurities to parts-per-billion (ppb) or parts-per-trillion (ppt) levels. The gas purifier materials of this invention include thermally activated aluminas, said aluminas including organic alumina materials, modified organic alumina materials, and modified inorganic aluminas. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 50° C.–1000° C. in an inert or non-inert atmosphere or in a vacuum and maintaining the activated material in the inert or non-inert atmosphere or in a vacuum atmosphere subsequent to said activation but prior to use.

Abstract: A method for controlling the delivery of vapor from a bubbler containing a supply of chemical fluid through which a carrier gas is bubbled and from which bubbler vapors are delivered in a vapor stream entrained with the carrier gas. In general, the method involves equilibrating the pressure within the head space to that of the chemical fluid fill line to maintain a constant fluid level based on pressure and not relying on conventional level sensors and controllers.

Abstract: A pressure vessel assembly, and method of use, for storing a gas at an elevated pressure. The assembly includes a vessel body having a rigid wall with an inner surface defining a storage chamber and with an inlet allowing the gas to enter the storage chamber. The assembly includes a flexible liner positioned within the storage chamber to be in fluid communication with the inlet to receive any fluid entering the vessel body. The liner is formed of an elastic inner layer contacting the gas and a metallic outer surface. The inflated, unrestrained liner volume is generally at least as large as the chamber volume and more typically, slightly larger. Stored gas contacts the inner surface of the liner and expands the liner from a smaller deflated volume until the outer surface of the liner contacts the wall of the pressure vessel.

Abstract: In accordance with the present invention, a method and system is described for controlling the delivery of vapor from a bubbler containing a supply of chemical fluid through which a carrier gas is bubbled and from which bubbler vapors are delivered in a vapor stream entrained with the carrier gas. In general, the present invention involves equilibrating the pressure within the head space to that of the chemical fluid fill line, thus maintaining a constant fluid level based on pressure and not relying on conventional level sensors and controllers.

Abstract: A fluid purifying apparatus that includes a manifold that includes a first branch and a second branch, a first check valve coupled to the first branch of the manifold, and a purifier unit that includes a first end and a second end, wherein the first end is coupled to the second branch of the manifold. Also, a fluid purifying apparatus that includes a vessel that includes a first interior compartment for containing a purifier material and a second interior compartment for containment of a fluid containing impurities, wherein the first interior compartment is separated from the second interior compartment by a fluid permeable support, and a rupturable seal.

Abstract: Trace impurities such as organic compounds and carbon monoxide are reduced to sub-ppb levels in gases such as nitrogen, helium and argon, by gas purifying systems that contain an ultra-low emission (ULE) carbon material. Ultra-low emission (ULE) carbon materials is capable of removing impurities from a gas stream down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide to the purified gas stream. The carbon material is superactivated by heating the carbon to temperatures between 300-800° C. in an ultra-dry, inert gas stream. The ultra-low emission (ULE) carbon material is handled and stored in an environment that minimizes contamination from moisture and other oxygenated species in order to maintain its ppb and sub-ppb impurity removal and low emission properties.

Abstract: Trace impurities such as organic compounds in an inert, non-reactive or reactive liquid such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine are reduced by at least a factor of 5 using liquid purifying systems that contain an ultra-low emission (ULE) carbon. The moisture level of the purified reactive liquid is only slightly higher than that of the contaminated liquid.

Abstract: Gas purifier system containing a preconditioned ultra-low emission (P-ULE) carbon for reducing trace impurities such as organic compounds and carbon monoxide in reactive fluids such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine to sub-ppb levels. P-ULE is capable of removing impurities from a reactive fluid down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide into the purified reactive fluid. The P-ULE carbon is prepared by heating a carbon material to temperatures between about 300° C. to 800° C. in an ultra-dry, inert gas stream, to produce an ultra-low emission (ULE) carbon material, subjecting the ULE carbon to a second activation process under a reactive gas atmosphere to produce a P-ULE carbon and storing the P-ULE carbon in an environment that minimizes contamination of the P-ULE prior to its use in a gas purifier system.

Abstract: A gas purifier system containing an ultra-low emission (ULE) carbon material for reducing trace impurities such as organic compounds and carbon monoxide to sub-ppb levels in gases such as nitrogen, helium and argon. Ultra-low emission (ULE) carbon materials is capable of removing impurities from a gas stream down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide to the purified gas stream. The carbon material is superactivated by heating the carbon to temperatures between 300-800° C. in an ultra-dry, inert gas stream. The ultra-low emission (ULE) carbon material is handled and stored in an environment that minimizes contamination from moisture and other oxygenated species in order to maintain its ppb and sub-ppb impurity removal and low emission properties.

Abstract: Trace impurities such as organic compounds and carbon monoxide in reactive fluids such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine are reduced to sub-ppb levels using gas purifying systems that contain a preconditioned ultra-low emission (P-ULE) carbon. P-ULE is capable of removing impurities from a reactive fluid down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide into the purified reactive fluid. The P-ULE carbon is prepared by heating a carbon material to temperatures from 300° C. to about 800° C. in an ultra-dry, inert gas stream, to produce an ultra-low emission (ULE) carbon material, subjecting the ULE carbon to a second activation process under a reactive gas atmosphere to produce a P-ULE carbon and storing the P-ULE carbon in an environment that minimizes contamination of the P-ULE prior to its use in a gas purifier system.

Abstract: Trace impurities such as organic compounds and carbon monoxide are reduced to sub-ppb levels in gases such as nitrogen, helium and argon, by gas purifying systems that contain an ultra-low emission (ULE) carbon material. Ultra-low emission (ULE) carbon materials is capable of removing impurities from a gas stream down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide to the purified gas stream. The carbon material is superactivated by heating the carbon to temperatures between 300-800° C. in an ultra-dry, inert gas stream. The ultra-low emission (ULE) carbon material is handled and stored in an environment that minimizes contamination from moisture and other oxygenated species in order to maintain its ppb and sub-ppb impurity removal and low emission properties.

Abstract: Trace impurities such as organic compounds and carbon monoxide in reactive fluids such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine are reduced to sub-ppb levels using gas purifying systems that contain a preconditioned ultra-low emission (P-ULE) carbon. P-ULE is capable of removing impurities from a reactive fluid down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide into the purified reactive fluid. The P-ULE carbon is prepared by heating a carbon material to temperatures from 300° C. to about 800° C. in an ultra-dry, inert gas stream, to produce an ultra-low emission (ULE) carbon material, subjecting the ULE carbon to a second activation process under a reactive gas atmosphere to produce a P-ULE carbon and storing the P-ULE carbon in an environment that minimizes contamination of the P-ULE prior to its use in a gas purifier system.

Abstract: Trace impurities such as organic compounds and carbon monoxide in reactive fluids such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine are reduced to sub-ppb levels using gas purifying systems that contain a preconditioned ultra-low emission (P-ULE) carbon. P-ULE is capable of removing impurities from a reactive fluid down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide into the purified reactive fluid. The P-ULE carbon is prepared by heating a carbon material to temperatures from 300° to about 800° C. in an ultra-dry, inert gas stream, to produce an ultra-low emission (ULE) carbon material, subjecting the ULE carbon to a second activation process under a reactive gas atmosphere to produce a P-ULE carbon and storing the P-ULE carbon in an environment that minimizes contamination of the P-ULE prior to its use in a gas purifier system.