Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. The vessel contains an ionic liquid therein. The fluid is contacted with the ionic liquid for take-up of the fluid by the ionic liquid. There is substantially no chemical change in the ionic liquid and the fluid. The fluid is released from the ionic liquid and dispensed from the vessel.

Abstract: A gas cylinder transport cap is described. The cap has a bottom opening adapted for reversible attachment to a gas cylinder, where the attached cap surrounds a cylinder valve coupled to the gas cylinder. The cap also has a side surface which at least in part defines the perimeter of the bottom opening, where the side surface include a plurality of side openings; and a top surface formed on an opposite side of the cap from the bottom surface, where the top surface includes a top opening. The side openings and top opening improve transmissions of radio-frequency signals from a RFID device positioned inside the cylinder cap when the cap is attached to the gas cylinder. A method of tracking a gas cylinder transported between a first and second location is also described.

Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. A polymerized polymeric material is provided within the vessel. The fluid is contacted with the polymerized polymeric material for take-up of the fluid by the polymerized polymeric material. The fluid is released from the polymerized polymeric material and dispensed from the vessel.

Abstract: Methods of cleaning a process chamber used to fabricate electronics components are described. The methods may include the step of providing a cleaning gas mixture to the process chamber, where the cleaning gas mixture may include a fluorine-containing precursor, and where the cleaning gas mixture removes contaminants from interior surfaces of the processing chamber that are exposed to the cleaning gas mixture. The methods may also include the steps of removing the reaction products of the cleaning gas mixture from the process chamber, and providing a substrate to the process chamber following the evacuation of the reaction products from the process chamber. The cleaning gas mixture may include one or more hydrofluoronated ethers, and the contaminants may include one or more tin-containing contaminants.

Abstract: Methods of removing gallium and gallium-containing materials from surfaces within a substrate processing chamber using a cleaning mixture are described. The cleaning mixture contains an iodine-containing compound and is introduced into the processing chamber. Iodine reacts with gallium resident within the chamber to produce thermally volatile Gal3. The Gal3 is removed using the exhaust system of the chamber by raising the temperature of the desorbing surface. Other volatile gallium-containing by-products may also be formed and removed from the exhaust system.

Abstract: Methods of forming a conductive fluorine-doped metal oxide layer on a substrate by chemical vapor deposition are described. The methods may include heating the substrate in a processing chamber, and introducing a metal-containing precursor and a fluorine-containing precursor to the processing chamber. The methods may also include adding an oxygen-containing precursor to the processing chamber. The precursors are reacted to deposit the fluorine-doped metal oxide layer on the substrate. Methods may also include forming the conductive fluorine-doped metal oxide layer by plasma-assisted chemical vapor deposition. These methods may include providing the substrate in a processing chamber, and introducing a metal-containing precursor, and a fluorine-containing precursor to the processing chamber. A plasma may be formed that includes species from the metal-containing precursor and the fluorine-containing precursor. The species may react to deposit the fluorine-doped metal oxide layer on the substrate.

Abstract: Methods of cleaning a processing chamber with nitrogen trifluoride (NF3) are described. The methods involve a concurrent introduction of nitrogen trifluoride and a reactive diluent into the chamber. The NF3 may be excited in a plasma inside the chamber or in a remote plasma region upstream from the chamber. The reactive diluent may be introduced upstream or downstream of the remote plasma such that both NF3 and the reactive diluent (and any plasma-generated effluents) are present in the chamber during cleaning. The presence of the reactive diluent enhances the chamber-cleaning effectiveness of the NF3.

Abstract: Methods of etching high-aspect-ratio features in dielectric materials such as silicon oxide are described. The methods may include a concurrent introduction of a fluorocarbon precursor and an iodo-fluorocarbon precursor into a substrate processing system housing a substrate. The fluorocarbon precursor may have a F:C atomic ratio of about 2:1 or less, and the iodo-fluorocarbon may have a F:C ratio of about 1.75:1 to about 1.5:1. Exemplary precursors may include C4F6, C5F8 and C2F3I, among others. The substrate processing system may be configured to allow creation of a plasma useful for accelerating ions created in the plasma toward the substrate. The substrate may have regions of exposed silicon oxide and an overlying patterned photoresist layer which exposes narrow regions of silicon oxide. The etch process may remove the silicon oxide to a significant depth while maintaining a relatively constant width down the trench.

Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. A solvent mixture comprising an ionic liquid and a cosolvent is provided within the vessel. The fluid is contacted with the solvent mixture for take-up of the fluid by the solvent mixture. The fluid is released from the ionic liquid and dispensed from the vessel.

Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. The vessel contains an ionic liquid therein. The fluid is contacted with the ionic liquid for take-up of the fluid by the ionic liquid. There is substantially no chemical change in the ionic liquid and the fluid. The fluid is released from the ionic liquid and dispensed from the vessel.

Abstract: Methods and systems of purifying an acetylene process gas are described. The methods may include the steps of providing an acetylene vessel containing source acetylene mixed with a solvent impurity, and flowing the source acetylene through a purification container that holds a cooled purifying medium, where at least a portion of the solvent impurity in the source acetylene separates as a liquid impurity on the purifying medium. The method may also include removing the liquid from the purification container and flowing a purified acetylene gas from the purification container. The purified acetylene gas has a concentration of the solvent impurity of about 5 vol. % or less, and the separated liquid impurity is removed without interrupting the flow of the acetylene while the purified acetylene gas flows from the purification container to keep the concentration of the solvent impurity substantially constant in the purified acetylene gas.

Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. The vessel contains an ionic liquid therein. The fluid is contacted with the ionic liquid for take-up of the fluid by the ionic liquid. There is substantially no chemical change in the ionic liquid and the fluid. The fluid is released from the ionic liquid and dispensed from the vessel.

Abstract: In one embodiment, a device to resurface a sealing surface of a fluid connector in a fluid delivery component is provided. The device may include a housing adapted to be reversibly coupled to the fluid connector. Included may be an arbor which is at least partially disposed in the housing, and both rotationally and axially movable within the housing. The arbor may have a first end proximal to the sealing surface and a second distal end adapted to receive rotational actuation. A resurfacing head may be positioned at the first end of the arbor, and may have a resurfacing face that includes a circular resurfacing groove adapted to fit a circular ridge on the sealing surface of the connector. Rotational contact between the groove and the ridge may cause the resurfacing of the sealing surface. The housing may keep the resurfacing head and the sealing surface aligned during the resurfacing.

Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. A solvent mixture comprising an ionic liquid and a cosolvent is provided within the vessel. The fluid is contacted with the solvent mixture for take-up of the fluid by the solvent mixture. The fluid is released from the ionic liquid and dispensed from the vessel.

Abstract: Methods of purifying hydrogen-containing materials are described. The methods may include the steps of providing a purifier material comprising silica. The silica may be heated at temperature of about 100° C. or more in a dry atmosphere to form activated silica. The activated silica may be contacted with a starting hydrogen-containing material, where the activated silica reduces a concentration of one or more impurity from the starting hydrogen-containing material to form the purified hydrogen-containing material, and where the activated silica does not decompose the purified hydrogen-containing material.

Abstract: According to the invention, a system for applying torque to a valve element that stops fluid flow through the valve is disclosed. The system may include an input element, a drive element, and a torque transferring mechanism. The input element may be configured to receive a torque. The drive element may be configured to apply substantially none of the torque, or at least a portion of the torque, to the valve element. The torque transferring mechanism may be configured to receive the torque from the input element, and transfer substantially none of the torque, or at least a portion of the torque, to the drive element based at least in part on a resistance of the valve element to turning.

Abstract: According to the invention, an apparatus to characterize leaks in a fluid storage container is disclosed. The apparatus may include a valve coupler, a gas manifold and a processor. The valve coupler may couple the apparatus with a closed valve on the fluid storage container. The gas manifold may be coupled with the valve coupler and may include a first branch connected with a gas monitoring device. The gas monitoring device may scan for a plurality of gases that may be emitted by the closed valve of the fluid storage container. The processor may be operable to receive gas monitoring device data representing masses for one or more of the plurality of gases detected by the monitor.

Abstract: An apparatus for determining a leak rate of a gas from a closed valve is disclosed. The apparatus may include a vacuum pump, a pressure measuring device, a monitoring device, and a computer. The vacuum pump may be configured to couple downstream of the closed valve and decrease the pressure of the downstream side of the closed valve. The pressure measuring device may be configured to couple with the downstream side and determine the pressure. The monitoring device may be configured to couple with the downstream side and monitor a gas, where the gas may be emitted from the closed valve and be characterized by a mass. The monitoring device may further be configured to determine the mass. The computer may be configured to control the vacuum pump based on the pressure, and determine the leak rate of the gas based at least in part on the mass.

Abstract: A system (10) for leak-testing an article (20) required to be fluid leak-tight in use at a fluid contacting region (38) thereof, to determine fluid leakage through the article to a non-fluid contacting region (40) of the article. The system includes a leak-testing fluid held in confinement by the fluid-contacting region of the article, a vacuum assembly (46, 66) arranged for establishing a vacuum environment at the non-fluid-contacting region of the article, and a leak detector (76) arranged to detect presence or absence of the leak-testing fluid in the vacuum environment, to determine fluid leakage through the article. The system enables leak sensitivity significantly below 1×10?6 standard atmospheric-cc/scc to be achieved, e.g., sensitivity in a range of from 1×10?7 to 1×10?11 standard atmospheric-cc/see, and is useful for quality assurance testing of vessels (118) intended to carry hazardous gases.

Abstract: A method of storing and dispensing a fluid includes providing a vessel configured for selective dispensing of the fluid therefrom. The vessel contains an ionic liquid therein. The fluid is contacted with the ionic liquid for take-up of the fluid by the ionic liquid. There is substantially no chemical change in the ionic liquid and the fluid. The fluid is released from the ionic liquid and dispensed from the vessel.