Patents Assigned to Memory Corporation
  • Patent number: 10903233
    Abstract: A semiconductor device according to an embodiment includes first conductors, a second conductor, a first semiconductor, a multi-layered body, and a third conductor. The second conductor is provided above the first conductors. The multi-layered body is provided between the first semiconductor and the first conductors, and between the first semiconductor and the second conductor. The third conductor is provided between the multi-layered body and the second conductor. The first semiconductor includes a first portion facing an uppermost first conductor and a second portion facing the second conductor. The first semiconductor is continuous at least from the first portion to the second portion.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: January 26, 2021
    Assignee: Toshiba Memory Corporation
    Inventor: Hiroshi Nakaki
  • Patent number: 10895990
    Abstract: According to one embodiment, a memory system includes a first memory as a nonvolatile memory storing first data, second data as a translation table for accessing the first data, third data, fourth data as a translation table for accessing the third data, and including two memory cell arrays which are accessible in parallel, a second memory in which the second and fourth data is storable, and which stores a management table for managing information about whether the second and fourth data is stored in the second memory, a controller checking whether the second and fourth data is stored in the second memory based on the management table, a third memory storing an order of executing commands to be issued to the first memory, and a scheduler scheduling the order based on a result of the checking, two of a first command for reading the first data, a second command for reading the second data, a third command for reading the third data and a fourth command for reading the fourth data being executed in parallel in t
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: January 19, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Sayano Aga, Toshikatsu Hida, Riki Suzuki
  • Patent number: 10896913
    Abstract: According to an embodiment, a semiconductor memory device includes a semiconductor substrate. The semiconductor substrate includes a first surface. A first semiconductor layer is provided on a first region of the first surface. A first transistor is provided on the first semiconductor layer. A second semiconductor layer is provided on a second region of the first surface. A second transistor is provided on the second semiconductor layer. A stacked body is provided on a third region of the first surface. The stacked body includes a plurality of conductors and a plurality of memory pillars. A first insulator is provided between the first semiconductor layer and the second semiconductor layer.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: January 19, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Takashi Fukushima, Junya Fujita, Toshiharu Nagumo
  • Patent number: 10896732
    Abstract: A semiconductor memory device according to the embodiments includes a first laminated body, a second laminated body, an intermediate insulation layer, and a columnar body. The intermediate insulation layer is positioned between the first laminated body and the second laminated body. A plurality of conductive layers of the second laminated body include a first conductive layer which is positioned closest to the intermediate insulation layer among the plurality of conductive layers of the second laminated body. The first conductive layer has a main body part having a first end surface facing the columnar body, and a protrusion part which protrudes from the main body part to the first laminated body, and has a second end surface facing the columnar body. The first end surface and the second end surface are continuous with each other.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: January 19, 2021
    Assignee: Toshiba Memory Corporation
    Inventor: Mikiko Yagi
  • Patent number: 10896733
    Abstract: A semiconductor memory device comprises: a memory transistor; a first wiring connected to a gate electrode of the memory transistor; and a control device that executes a read operation to read data of the memory transistor and a write operation to write data in the memory transistor. In the read operation or the write operation, the control device: increases a voltage of the first wiring to a first voltage from a first timing to a second timing; and adjusts a length from the first timing to the second timing corresponding to at least one of a voltage of the first wiring, a current of the first wiring, and an amount of charge flowed through the first wiring.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: January 19, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Keita Kimura, Hidehiro Shiga
  • Publication number: 20210011809
    Abstract: Various implementations described herein relate to systems and methods for a Solid State Drive (SSD) to manage data in response to a power loss event, including writing data received from a host to a volatile storage of the SSD, detecting the power loss event before the data is written to a non-volatile storage of the SSD, storing the write commands to a non-volatile storage of the SSD, marking at least one storage location of the SSD associated with the write commands as uncorrectable, for example, after the power is restored.
    Type: Application
    Filed: September 28, 2020
    Publication date: January 14, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Nigel HORSPOOL, Steve WELLS
  • Publication number: 20210010134
    Abstract: According to an embodiment, a semiconductor manufacturing apparatus includes a chamber, a process gas nozzle, an inert gas nozzle and a hydrogen radical nozzle. The chamber houses at least one substrate. The process gas nozzle is to release process gas toward the substrate in the chamber. The inert gas nozzle is to release inert gas toward the substrate in the chamber. The hydrogen radical nozzle is disposed in the chamber and is to generate hydrogen radicals by heating raw material gas including hydrogen and to release the generated hydrogen radicals toward the substrate during the release of the inert gas. A metal wire is in the hydrogen radical nozzle, and the metal wire includes a metal catalyst for exciting the generation of the hydrogen radicals.
    Type: Application
    Filed: September 22, 2020
    Publication date: January 14, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Fumiki Aiso, Kensei Takahashi, Tomohisa Iino
  • Patent number: 10892232
    Abstract: A semiconductor device according to an embodiment includes a semiconductor substrate comprising a first face, and a second face on an opposite side to the first face. A semiconductor element is provided on the first face of the semiconductor substrate. A polycrystalline or non-crystalline first material layer is provided at least on an outer edge of the first face of the semiconductor substrate. A second material layer is provided on the second face of the semiconductor substrate. The second material layer transmits laser light.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: January 12, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Takanobu Ono, Tsutomu Fujita, Ippei Kume, Akira Tomono
  • Patent number: 10892270
    Abstract: According to one embodiment, the array chip includes a three-dimensionally disposed plurality of memory cells and a memory-side interconnection layer connected to the memory cells. The circuit chip includes a substrate, a control circuit provided on the substrate, and a circuit-side interconnection layer provided on the control circuit and connected to the control circuit. The circuit chip is stuck to the array chip with the circuit-side interconnection layer facing to the memory-side interconnection layer. The bonding metal is provided between the memory-side interconnection layer and the circuit-side interconnection layer. The bonding metal is bonded to the memory-side interconnection layer and the circuit-side interconnection layer.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: January 12, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshiaki Fukuzumi, Hideaki Aochi
  • Patent number: 10892300
    Abstract: A storage device according to embodiments includes a first conductive layer; a second conductive layer; a resistance change element provided between the first conductive layer and the second conductive layer; and an intermediate layer provided in any one of a position between the resistance change element and the first conductive layer and a position between the resistance change element and the second conductive layer, the intermediate layer containing at least one element of silicon (Si) and germanium (Ge), tellurium (Te), and aluminum (Al).
    Type: Grant
    Filed: September 13, 2019
    Date of Patent: January 12, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Takanori Usami, Takeshi Ishizaki, Ryohei Kitao, Katsuyoshi Komatsu, Takeshi Iwasaki, Atsuko Sakata
  • Patent number: 10892269
    Abstract: According to one embodiment, the array chip includes a three-dimensionally disposed plurality of memory cells and a memory-side interconnection layer connected to the memory cells. The circuit chip includes a substrate, a control circuit provided on the substrate, and a circuit-side interconnection layer provided on the control circuit and connected to the control circuit. The circuit chip is stuck to the array chip with the circuit-side interconnection layer facing to the memory-side interconnection layer. The bonding metal is provided between the memory-side interconnection layer and the circuit-side interconnection layer. The bonding metal is bonded to the memory-side interconnection layer and the circuit-side interconnection layer.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: January 12, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshiaki Fukuzumi, Hideaki Aochi, Mie Matsuo, Kenichiro Yoshii, Koichiro Shindo, Kazushige Kawasaki, Tomoya Sanuki
  • Patent number: 10891061
    Abstract: According to one embodiment, an electronic device connectable to a host via an interface includes a nonvolatile memory and a controller electrically connected to the nonvolatile memory and capable of processing commands issued by the host in parallel. When the electronic device is connected to the host, the controller determines, when one or more commands to be processed by one or more deadline times, respectively, are issued by the host, scheduling indicative of timings at which the one or more commands are processed, respectively, based on the one or more deadline times. The controller performs processing corresponding to the one or more commands in accordance with the scheduling.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: January 12, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Daisuke Iwai, Kenichiro Yoshii, Tetsuya Sunata
  • Patent number: 10892020
    Abstract: According to one embodiment, a semiconductor memory device includes first and second memory cells; a first word line connected to the first and second memory cells; a first bit line connected to the first memory cell; a second bit line connected to the second memory cell; a first sense amplifier connected to the first bit line; a second sense amplifier connected to the second bit line; a voltage generation circuit; and a first row decoder which supplies a voltage to the first word line.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: January 12, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Takeshi Hioka, Tsukasa Kobayashi, Koji Kato, Yuki Shimizu, Hiroshi Maejima
  • Publication number: 20210005270
    Abstract: A nonvolatile semiconductor memory device according to one embodiment of the present invention includes: a memory cell array and a control circuit. The control circuit executes a first reading operation and a second reading operation. The first reading operation is an operation of reading a threshold voltage set in the selected memory cell by setting a voltage between a control gate electrode and source of the selected memory cell to a first value. The second reading operation is an operation of reading a threshold voltage set in the selected memory cell by setting a voltage between the control gate electrode and source of the selected memory cell to a second value lower than the first value. When executing the second reading operation, the control circuit keeps a voltage of the control gate electrode of the selected memory cell to 0 or a positive value.
    Type: Application
    Filed: September 21, 2020
    Publication date: January 7, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Yasuhiro SHIINO, Eietsu TAKAHASHI, Koki UENO
  • Publication number: 20210005266
    Abstract: According to one embodiment, a first well of the first conductivity type which is formed in a substrate. a second well of a second conductivity type which is formed in the first well. The plurality of memory cells, the plurality of first bit line select transistors, and the plurality of second bit line select transistors are formed in the second well, and the plurality of first bit line select transistors and the plurality of second bit line select transistors are arranged on a side of the sense amplifier with respect to the plurality of memory cells of the plurality of bit lines.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Katsuaki ISOBE, Noboru SHIBATA, Toshiki HISADA
  • Publication number: 20210005463
    Abstract: A manufacturing method of a semiconductor device includes etching a film using etching gas that has a first or second molecule which has a C3F4 group and in which the number of carbon atoms is four or five. Further, the first molecule has an R1 group that bonds to a carbon atom in the C3F4 group through a double bond, and the R1 group contains carbon and also chlorine, bromine, iodine, or oxygen. Further, the second molecule has an R2 group that bonds to a carbon atom in the C3F4 group through a single bond and an R3 group that bonds to the carbon atom in the C3F4 group through a single bond, the R2 group or the R3 group or both containing carbon, and both the R2 group and the R3 group containing hydrogen, fluorine, chlorine, bromine, iodine, or oxygen.
    Type: Application
    Filed: September 16, 2020
    Publication date: January 7, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Mitsunari HORIUCHI, Toshiyuki SASAKI, Tomo HASEGAWA
  • Publication number: 20210005580
    Abstract: According to one embodiment, a memory device includes: a first chip including a first circuit, first and second terminals; a second chip including a second circuit and a third terminal; and an interface chip including first and second voltage generators. The first chip is between the second chip and the interface chip. The first terminal is connected between the first circuit and the first voltage generator. A third end of the second terminal is connected to the third terminal and a fourth end of the second terminal is connected to the second voltage generator. A fifth end of the third terminal is connected to the second circuit and a sixth end of the third terminal is connected to the second voltage generator via the second terminal. The third end overlaps with the sixth end, without overlapping with the fourth end.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Mikihiko ITO, Masaru KOYANAGI, Masafumi NAKATANI, Shinya OKUNO, Shigeki NAGASAKA, Masahiro YOSHIHARA, Akira UMEZAWA, Satoshi TSUKIYAMA, Kazushige KAWASAKI
  • Publication number: 20210005264
    Abstract: According to one embodiment, a memory system includes a nonvolatile semiconductor memory, and a controller. The semiconductor memory includes a memory cell, and a write circuit configured to write data to the memory cell by applying a program voltage to the memory cell and comparing a threshold voltage of the memory cell with a first reference voltage corresponding to the write data. The write circuit is configured to execute a first programming operation to obtain a value of a write parameter by comparing the threshold voltage with a second reference voltage different from the first reference voltage.
    Type: Application
    Filed: September 21, 2020
    Publication date: January 7, 2021
    Applicant: Toshiba Memory Corporation
    Inventors: Suguru NISHIKAWA, Yoshihisa KOJIMA, Riki SUZUKI, Masanobu SHIRAKAWA, Toshikatsu HIDA
  • Patent number: 10886221
    Abstract: A semiconductor device includes a first wiring extending in a first direction and a second wiring extending in a second direction crossing the first direction and having an end that faces the first wiring and is a predetermined distance away from the first wiring. The predetermined distance is approximately equal to a width of the second wiring, and the end of the second wiring is formed into one or more loops.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: January 5, 2021
    Assignee: Toshiba Memory Corporation
    Inventor: Takaco Umezawa
  • Patent number: 10884706
    Abstract: A randomizer includes a first pseudorandom number generator, a second pseudorandom number generator, and a first logic circuit configured to output a pseudorandom sequence by carrying out an operation on a pseudorandom sequence generated by the first pseudorandom number generator and a pseudorandom sequence generated by the second pseudorandom number generator, and a second logic circuit configured to randomize a data string input to the randomizer based on the pseudorandom sequence output by the first logic circuit.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: January 5, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Tsuyoshi Atsumi, Yasuhiko Kurosawa, Yohei Koganei, Yuji Nagai