Abstract: The present disclosure describes methods and systems for processing semiconductor wafers. A method for processing a wafer includes measuring one or more wafer characteristics of the wafer using a plurality of detectors. The wafer includes a device region and a perimeter region. The method also includes determining a wafer modification profile of the wafer based on the measured one or more wafer characteristics. The method further includes modifying a ring-shaped portion of the wafer within the perimeter region using the wafer modification profile. The modified ring-shaped portion has a penetration depth that is less than a thickness of the wafer. The method further includes performing a wafer thinning process on the wafer.

Abstract: A memory device can include channel structures in a first region. The memory device can also include a plurality of word line cavity structures in a second region abutting the first region. The plurality of word line cavity structures can extend along a first direction. Each of the word line cavity structures can include a first contact structure in a first side of the word line cavity structure along a second direction perpendicular to the first direction. Each of the word line cavity structures can also include a second contact structure in a second side of the word line cavity structure along the second direction. The second side can be opposite to the first side. Each of the word line cavity structures can further include a slit structure. The first contact structure and the second contact structure can be separated with the slit structure along the second direction.

Abstract: A memory device includes a first substrate, a first memory array, a second substrate, and at least one first vertical transistor. The first memory array is disposed on the first substrate. The first memory array includes at least one first word line structure. The first memory array is disposed between the first substrate and the second substrate in a vertical direction. The first vertical transistor is electrically connected with the first word line structure. At least a part of the at least one first vertical transistor is disposed in the second substrate.

Abstract: In a method for fabricating a semiconductor device, an initial stack of sacrificial word line layers and insulating layers is formed over a substrate of the semiconductor device. The sacrificial word line layers and the insulating layers are disposed over the substrate alternately. A first staircase is formed in a first staircase region of a connection region of the initial stack. A second staircase is formed in a second staircase region of the connection region of the initial stack. The connection region of the initial stack includes a separation region between the first and second staircases, and the connection region is positioned between array regions of the initial stack at opposing sides of the initial stack.

Abstract: The present disclosure provide latch performance detecting method and a device. The method includes: extracting circuit structure information of a latch, having a transmission gate and a latch unit, an output terminal of the transmission gate is coupled to the input terminal of the latch unit, and the input terminal is coupled to the output terminal of the drive unit corresponding to the latch; the resistance value of the equivalent resistor of the latch is determined based on the circuit structure information, The first terminal of the equivalent resistor is the output terminal of the driving unit, and the second terminal is the input terminal of the latching unit; based on the resistance value of the equivalent resistor, the latching performance is determined. The embodiments of the present disclosure can accurately detect whether the latch is in a metastable state, which helps to improve the performance of the circuit.

Abstract: This application provides a method for manufacturing a memory and a memory thereof. The manufacturing method includes: providing a substrate, where the substrate includes a plurality of spaced active area and each of the plurality of spaced active area includes a first contact region and a second contact region; forming a plurality of spaced bit lines on the substrate, where each of the plurality of spaced bit lines is connected to at least one first contact region; forming a first isolation layer on each of the plurality of spaced bit lines, a first trench extending in a first direction between two adjacent first isolation layers of the plurality of spaced bit lines; etching a bottom along the first trench to form a second trench; and forming a plurality of conducting wires and a plurality of second isolation layers in the second trench.

Abstract: A semiconductor structure and the fabrication method thereof are provided. The semiconductor structure includes: a substrate including a first doped region and a second doped region; a first selection transistor and a second selection transistor located in the substrate; a conductive layer located between the first doped region and the second doped region; a resistive dielectric layer located on sidewalls of the conductive layer, where the conductive layer, the first doped region, and a portion of the resistive dielectric layer facing the first doped region constitute a first variable resistor, and the conductive layer, the second doped region, and a portion of the resistive dielectric layer facing the second doped region constitute a second variable resistor; and an isolation dielectric layer located between the conductive layer and the substrate. The semiconductor structure improves the storage density of resistive random access memory (RRAM).

Abstract: The invention provides a sense amplifier circuit, a method for operating same, and a fabrication method for same. The sense amplifier circuit includes: an amplifier electrically connected to a memory cell of a semiconductor memory; and a pre-amplifier located between the amplifier and the memory cell, where the pre-amplifier is configured to pre-amplify an electrical signal transmitted from the memory cell to the amplifier. In this way, the pre-amplifier is provided between the amplifier and the memory cell, such that the electrical signal stored in the semiconductor memory can be output after two stages of amplification by the pre-amplifier and the amplifier, thereby avoiding the problem that the electrical signal output from the memory cell cannot be accurately received and output in a case of a small sense margin of a signal of the sense amplifier.

Abstract: The vertical MOSFET device includes: an active region including a first source/drain layer, a channel layer and a second source/drain layer vertically stacked on a substrate in sequence, wherein an outer periphery of the channel layer is recessed with respect to outer peripheries of the first source/drain layer and the second source/drain layer; a spacing layer including an upper spacing layer and a lower spacing layer, wherein the upper spacing layer and the lower spacing layer are both in contact with a side surface of the channel layer and are not in communication with each other; and a gate stack formed at least on a lateral outer periphery of the channel layer and embedded in a groove space between the upper spacing layer and the lower spacing layer.

Abstract: The present disclosure discloses an assembly for carrying a chip, and a device and a method for testing a chip. The assembly for carrying a chip is configured to fasten chips of different sizes, and includes a rotatable vertical rod, a cross beam, a first sidewall, and a second sidewall. The rotatable vertical rod is provided with a gear that surrounds the rotatable vertical rod with gear teeth. The cross beam is internally provided with a first through hole and a first chute. A top of the first sidewall is connected to a first connecting rod located in the first chute. A top of the second sidewall is connected to a second connecting rod located in the first chute. A side surface of the first connecting rod is provided with a plurality of first tooth grooves arranged linearly.

Abstract: In a method for fabricating a semiconductor device, an initial stack is formed. The initial stack is formed of sacrificial layers and insulating layers that are alternatingly disposed over a substrate, and includes a first connection region, a first array region, and a second connection region that are disposed sequentially. A first initial staircase is formed in the first connection region and formed in a first group of sacrificial layers and insulating layers. A first top select gate staircase is formed in the second connection region, and formed in a second group of sacrificial layers and insulating layers. An etching process is subsequently performed in the first connection region to shift the first initial staircase toward the substrate along a vertical direction perpendicular to the substrate so as to form a first bottom select gate staircase.

Abstract: The present application provides a sense amplifier, a memory, and a control method. The sense amplifier includes: an amplification module, configured to: amplify a voltage difference between a bit line and a reference bit line; and a controlled power supply module, connected to the amplification module, and configured to: determine a drive parameter according to a first rated pull rate range and a second rated pull rate range, and supply power to the amplification module according to the drive parameter, to control the amplification module to pull a voltage of the bit line or a voltage of the reference bit line to a first preset value at a first rated pull rate at the amplification stage and pull the voltage of the reference bit line or the voltage of the bit line to a second preset value at a second rated pull rate at the amplification stage.

Abstract: The present invention provides a power control circuit and control method. The power control circuit includes: a control module configured to control, according to an activation command, a memory bank of a plurality of memory banks to perform an operation; a power management module configured to wake up a local power supply for the memory bank according to a clock enable signal; and a power control module communicatively coupled with the power management module and configured to: send the clock enable signal to the power management module of the memory bank corresponding to the activation command in a power-saving mode; and send the clock enable signal to power management modules of the plurality of memory banks in a non-power-saving mode, where the power-saving mode indicates that a system clock is in a low-frequency state.

Abstract: A chip and a chip test system are provided by the present invention. The chip includes a decoding module and a test mode control module, and decodes an input signal to determine whether the input signal is a pre-activation signal or not. If the input signal is decoded into a pre-activation signal, then the chip will respond to a subsequent test signal; otherwise, the chip will not respond to any subsequent test signal. According to the present invention, by configuring a pre-activation signal, the number of chips to be simultaneously connected to and individually tested by the test equipment can be increased, without the need to occupy more input/output (I/O) interfaces.

Abstract: In a method for erasing a memory device including memory cells, a first erase operation is performed on a selected memory cell of the memory cells based on a first erase voltage. A first verifying operation is performed on the selected memory cell based on a first erase verify voltage. A second verifying operation is subsequently performed on the selected memory cell based on a second verify voltage after the selected memory cell passes the first verifying operation. Further, a second erase operation is performed on the selected memory cell based on a second erase voltage after the selected memory cell fails the second verifying operation.

Abstract: A data read/write method and device, as well as a dynamic random-access memory (DRAM) having the same are disclosed. The method may include: entering a page read/write mode configured by a reserved bit in a mode register of the DRAM; receiving a page read/write command including a page read/write enable command configured by a reserved bit in a read/write command of the DRAM; and performing a page read/write operation according to the page read/write command. This method may allow a greater amount of data to be handled by each read/write command, thereby reducing the number of required read/write commands. As a result, a higher read/write rate and lower power consumption can be achieved.

Abstract: The present disclosure provides a method for forming a three-dimensional memory device. The method includes disposing an alternating dielectric stack on a substrate in a first direction perpendicular to the substrate; and forming a staircase structure and a dividing wall in the alternating dielectric stack. The staircase structure and the dividing wall extend in a second direction parallel to the substrate, and the dividing wall is adjacent to the staircase structure. The method also includes forming, sequentially on the staircase structure, a first barrier layer and a second barrier layer different from the first barrier layer. The method further includes forming a gate line slit (GLS) opening in the dividing wall. The GLS opening penetrates through the alternating dielectric stack in the first direction and is distant from the second barrier layer in a third direction that is parallel to the substrate and is perpendicular to the second direction.

Abstract: A three-dimensional (3D) memory device includes a memory string, a coarse top select gate (TSG) line configured to couple a coarse threshold voltage (Vth_coarse) for programming the memory string, a word line configured to program the memory string, a buffer TSG line configured to couple a buffer threshold voltage (Vth_buffer) for programming the memory string, a fine TSG line configured to couple a fine threshold voltage (Vth_fine) for programming the memory string, and a coarse TSG cut disposed between the memory string and a second memory string adjacent the memory string. The 3D memory device can intrinsically increase the coarse threshold voltage (Vth_coarse), decrease leakage current, dynamically adjust and fine tune a threshold voltage (Vth) of the memory string, and increase TSG reliability.

Abstract: Aspects of the disclosure provide a method for fabricating a semiconductor device having an first stack of alternating insulating layers and sacrificial word line layers arranged over a substrate, the first stack including a core region and a staircase region. The method can include forming a first dielectric trench in the core region of the first stack, forming a second dielectric trench that is adjacent to and connected with the first dielectric trench in the staircase region of the first stack, and forming dummy channel structures extending through the first stack where the dummy channel structures are spaced apart from the second dielectric trench.

Abstract: Three-dimensional (3D) NAND memory devices and methods are provided. In one aspect, a fabrication method includes providing a substrate, forming memory cells over the substrate, depositing a first dielectric layer to cover the memory cells, forming at least one contact pad over the substrate, depositing a second dielectric layer over the at least one contact pad, forming first connecting pads over the second dielectric layer, bonding the first connecting pads with second connecting pads of a peripheral structure, and exposing the at least one contact pad from a back side of the substrate.