Abstract: A subresolution grating composed of approximately circular contacts is fabricated around the border of the primary pattern of a photomask. As a result, resolution at the edges of the photomask pattern is improved when the pattern is printed on a wafer surface. In addition, the reduced leakage enables a more efficient use of the glass plate on which the photomask is fabricated as well as a more efficient use of the wafer surface as a result of being able to place patterns closer together.

Abstract: A sense amplifier is coupled to a memory array comprising a first plurality of cells coupled to a first bit line and a dummy cell coupled to a second bit line. The sense amplifier includes a first source follower comprising a first current sink and a first source follower transistor having a gate coupled to the first bit line and a second source follower comprising a second current sink and a second source follower transistor having a gate coupled to the second bit line. The sense amplifier also includes a first n-channel transistor having a gate coupled to the first bit line and a first p-channel transistor having a gate coupled to the first bit line through the first source follower. The sense amplifier also includes a second n-channel transistor having a gate coupled to the second bit line and a second p-channel transistor having a gate coupled to the second bit line through the second source follower.