Abstract: A projection system (900) includes a scanner (802) and light source (801). The scanner (802) is configured to crate a scan cone (994) for forming images (995). A principal beam (992) defines a traveling direction of the scan cone (994). An optical device (880) having decentered, free-form major faces is disposed at an output of the projection system (900) such that the scan cone (994) passes through the optical device (880). The optical device (880) is configured to redirect the principal beam (992), and accordingly the traveling direction of the scan cone (994), by a predetermined amount and to correct both anamorphic distortion and vertical smile distortion initially present in the image.

Abstract: Regions are defined in projected content to create a virtually segmented display. When reflections are received from objects within a defined region, the reflections are recognized and passed to a user interface circuit. When reflections are received from objects outside a defined region, the reflections are gated and not recognized.

Abstract: A method for forming a memory cell transistor is disclosed which includes providing a substrate, forming a trench structure in the substrate, depositing a conductive substance on the surface of the substrate to form a conductive member inside the trench structure, forming one or more dielectric layers on the surface of the substrate, forming one or more first conductive layers on top of the dielectric layers, and etching the first conductive layers and the dielectric layers to form a hole structure extending through the first conductive and the dielectric layers, reaching to the substrate surface. The formed memory cell transistor thus comprises a hole structure which is formed from the surface of the top first conductive layer, extending downwards through the first conductive layers and the dielectric layers, and reaching the substrate surface. One or more second conductive layers may be formed on top of the first conductive layers, with the second conductive layer material filling the hole structure.

Abstract: A method for examining a sample with a scanning charged particle beam imaging apparatus. First, an image area and a scan area are specified on a surface of the sample. Herein, the image area is entirely overlapped within the scan area. Next, the scan area is scanned by using a charged particle beam along a direction neither parallel nor perpendicular to an orientation of the scan area. It is possible that only a portion of the scan area overlapped with the image area is exposed to the charged particle beam. It also is possible that both the shape and the size of the image area are essentially similar with that of the scan area, such that the size of the area projected by the charged particle beam is almost equal to the size of the image area.

Abstract: A method for inspecting overlay shift defect during semiconductor manufacturing is disclosed herein and includes a step for providing a charged particle microscopic image of a sample, a step for identifying an inspection pattern measure in the charged particle microscopic image, a step for averaging the charged particle microscopic image by using the inspection pattern measure to form an averaged inspection pattern measure, a step for estimating an average width from the averaged inspection pattern measure, and a step for comparing the average width with a predefined threshold value to determine the presence of the overlay shift defect.

Abstract: A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A grounding pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the grounding pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.

Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

Abstract: An assembly for a charged particle detection unit is described. The assembly comprises a scintillator disc, a partially coated light guide a thin metal tube for allowing the primary charged particle beam to pass through and a photomultiplier tube (PMT). The shape of scintillator disc and light guide are redesigned to improved the light signal transmission thereafter enhance the light collection efficiency. A light guide with a conicoidal surface over an embedded scintillator improved the light collection efficiency of 34% over a conventional design.

Abstract: This invention relates to a filament for electron emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source. Embodiments of the present invention discloses method with which a Re (Rhenium) is used as heat source such that vibration issue of prior tungsten filament can be depressed.

Abstract: In imaging system (100), a spatial light modulator (101) is configured to produce images (102) by scanning a plurality light beams (104,105,106). A first optical element (107) is configured to cause the plurality of light beams to converge along an optical path (114) defined between the first optical element and the spatial light modulator. A second optical element (115) is disposed between the spatial light modulator and a waveguide (1401). The first optical element and the spatial light modulator are arranged such that an image plane (117) is created between the spatial light modulator and the second optical element. The second optical element is configured to collect the diverging light (118) from the image plane and collimate it. The second optical element then delivers the collimated light to a pupil (120) at an input of the waveguide.

Abstract: A method for enhancing the quality of a charged particle microscopic image of a sample is disclosed. The image is formed by a charged particle beam imaging system. The method comprising: scanning, using a first scanning beam, a surface of the sample in at least one first scan line; and scanning, using a second scanning beam, the sample surface in at least one second scan line, wherein said second scanning beam is scanned across said sample surface during a time interval between the end of said first scan lines and the beginning of the next said first scan lines. Application of the proposed method as a charged particle beam imaging system is also disclosed.

Abstract: A scanning laser projector drives laser light sources with waveforms for higher efficiency. Optical light power values for pixels are mapped to amplitude/duration pairs. Laser diodes are driven with electrical currents having the amplitude for time period specified by the duration. For increasing optical light power values, amplitude values are increased, and then durations are increased.

Abstract: A scanning projector includes a scanning mirror that sweep a beam in two dimensions. The beam is created by multiple laser light sources, at least two of which create light at substantially the same wavelength. A first of the two light sources is driven up to a transition point past which both of the two light sources are driven (equally or unequally).

Abstract: An imaging system (300) configured to reduce perceived flicker in three-dimensional images is provided. The imaging system (300) can include a plurality of light sources (305,306,307), a light combiner (302), a light modulator (303) and a polarization rotator (301). The light combiner (302) combines light received from each of the light sources into a combined beam (304). A first light portion (313) in the combined beam has a first light portion polarization state that is different from a second light portion polarization state of a second light portion (314). The light modulator (303) produces images by modulating the combined beam (304) along a projection surface (316). The polarization rotator (301) selectively rotates a polarization state of the combined beam (304) in synchrony with an image refresh cycle of the imaging system. A circular polarizer (1004) can be used to transform linear polarization states to circular polarization states.

Abstract: A microelectromechanical systems (MEMS) device includes a scanning platform suspended from a fixed platform by two flexures that form a pivot axis. The two flexures may be symmetric or asymmetric about a centerline of the scanning platform. At least one flexure includes two segments that are not parallel to each other. A second flexure may include two segments with one segment being wider than the other. Flexure design reduces effects of mounting and thermal stresses when the MEMS device is mounted as part of an assembly.

Abstract: A microelectromechanical systems (MEMS) device includes a scanning platform suspended from a fixed platform by two flexures that form a pivot axis. The two flexures may be symmetric or asymmetric about a centerline of the scanning platform. At least one flexure includes two segments that are not parallel to each other. A second flexure may include two segments with one segment being wider than the other. Flexure design reduces effects of mounting and thermal stresses when the MEMS device is mounted as part of an assembly.

Abstract: A scanning beam projection system includes a scanning mirror having a fast-scan axis and a slow-scan axis. Movement on the fast-scan axis is controlled by a fast-scan scanning mirror control system. The control system receives position information describing angular displacement of the mirror. A fast-scan drive signal is generated that causes the scanning mirror to oscillate at a resonant frequency with a varying amplitude.

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

Abstract: A scanning laser projector includes a scanning mirror that moves in a sinusoidal motion on at least one axis. Pixels are displayed by modulating a laser beam that is reflected by the scanning mirror. Pixels are generated using light pulses of different duty cycles based on the position and/or angular velocity of the laser beam.