Abstract: Briefly, in accordance with one or more embodiments, a beam scanner may comprise a nanophotonics chip to provide a scanned output beam. The nanophotonics chip comprises a substrate, a grating in-coupler formed in the substrate to couple a beam from a light source into the substrate, a modulator to modulate the beam, and a photonic crystal (PC) superprism to provide a scanned output beam that is scanned in response to the modulated beam.

Abstract: A bifocal head-up display system includes a projector, at least one projection surface in an intermediate image plane, and relay optics to direct a display image to a reflector in a vehicle operator's field of view. The display image includes two image portions focused at different distances from the vehicle operator. A first image portion focused at a first distance may include information related to vehicle operation, and a second image portion focused at a second distance may include to information related to extra-vehicular objects.

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract: A scanning projector includes a mirror that scans in two dimensions, at least one of which is sinusoidal. A digital phase lock loop locks to the sinusoidal movement of the mirror. A free-running pixel clock is provided. An interpolation component interpolates pixel intensity data from adjacent pixels based on the position of the mirror when a pixel clock arrives.

Abstract: A beam combiner has a first coating on a first side capable of imparting a first polarization rotation, and a second coating on a second side capable of imparting a second polarization rotation. A first beam impinging on the first side passes through the first and second coatings as a first beam component. Second and third beams impinging on the second side partially reflect off the second coating as a second beam component, and partially transmit through the second coating to reflect off the first coating and exit through the second coating as a third beam component. The first, second and third beam components are disposed at selected positions and have respective selected polarizations as a combined beam spot. The positions and polarization of the beams components result in a projected image having increased allowable brightness and/or having reduced speckle.

Abstract: The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.

Abstract: The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.

Abstract: An assembly for a charged particle detection device of high detection efficiency is described. The assembly comprising a metal grid for applying attractive potential to lure charged particles; a scintillator disc to absorb the energy from impinging charged particle and reemit the energy in form of light or photons; a light guide to transmit light or photons; and a photomultiplier tube (PMT) cohere with the end of light guide to receive light or photons from light guide and convert it into current signal. A light guide with a bullet-head-shaped front portion ensures total reflection of light propagating within the light guide. A frustum-cone-shaped scintillator disc releases the light that originally trapped in the scintillator disc due to the shape of scintillator.

Abstract: A plurality of points with identical geometric feature is compared with their SEM characteristic features to inspect defect in a localized image. Original design information is included in the geometric feature such that absolute compare can be performed in this inspection method. Further, this method can also be applied to the localized image with or without repeated or redundant pattern.

Abstract: A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.

Abstract: A projection apparatus includes at least one laser diode and a laser diode junction temperature estimator to estimate the junction temperature of the at least one laser diode. Laser diode current drive values are modified in response to the estimated laser junction temperature. The modification of laser diode current drive values may occur as frequently as once per pixel.

Abstract: The monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. The present invention also provides two ways to build a monochromator into a SEM, in which one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

Abstract: In imaging system (100), a spatial light modulator (101) is configured to produce images (102) by scanning a plurality light beams (104,105,106). A first optical element (107) is configured to cause the plurality of light beams to converge along an optical path (114) defined between the first optical element and the spatial light modulator. A second optical element (115) is disposed between the spatial light modulator and an output of the imaging system. The first optical element and the spatial light modulator are arranged such that an image plane (117) is created between the spatial light modulator and the second optical element. The second optical element is configured to collect the diverging light (118) from the image plane and collimate it. The second optical element then delivers the collimated light to a pupil (120) on the other side of the second optical element relative to the spatial light modulator.

Abstract: A substrate guided relay includes multiple output couplers and multiple light valves positioned between the substrate and the output couplers. The number of light valves may be equal to the number of output couplers, or may be more or less than the number of output couplers. The light valves may be enabled sequentially, or may be enabled based on the position of a user's eye. The light valves may include liquid crystal material.

Abstract: In imaging system (100), a spatial light modulator (101) is configured to produce images (102) by scanning a plurality light beams (104,105,106). A first optical element (107) is configured to cause the plurality of light beams to converge along an optical path (114) defined between the first optical element and the spatial light modulator. A second optical element (115) is disposed between the spatial light modulator and a waveguide (1401). The first optical element and the spatial light modulator are arranged such that an image plane (117) is created between the spatial light modulator and the second optical element. The second optical element is configured to collect the diverging light (118) from the image plane and collimate it. The second optical element then delivers the collimated light to a pupil (120) at an input of the waveguide.

Abstract: Briefly, in accordance with one or more embodiments, a scanned beam display, comprises a light source to generate a beam to be scanned and a scanning platform to scan the beam into an exit cone. The scanning platform receives the beam at a selected feed angle, and the scanning platform has a surface structure to redirect the exit cone at an exit angle that is less than the feed angle.

Abstract: A projection apparatus includes a shutter mechanism to prevent light from reaching an image plane during calibration of light sources. The shutter mechanism may include liquid crystal material that exhibits an effective index of refraction that varies with applied voltage. During calibration, a light beam is shuttered, light sources are driven by calibration data, and optical power is measured.

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract: A scanning projector includes a MEMS device with a scanning mirror that sweeps a beam in two dimensions. Actuating circuits receive scan angle information and provide signal stimulus to the MEMS device to control the amount of mirror deflection on two axes. The period of movement on one or both axes may be modified to effect changes in line density in a resultant display.

Abstract: A laser-based imaging system (200) is configured to reduce perceived speckle in images (201). The imaging system (200) includes one or more laser sources (207), a light modulator (204) configured to produce the images (201) with light (205) from the laser sources (207), and one or more active polarization switches (206) disposed in an optical path of the imaging system (200). The active polarization switch (206) is configured to alternate a polarization orientation of the light in synchrony with an image refresh cycle of the system. The active polarization switch can be clocked in accordance with a clocking angle to optimize speckle reduction. Additionally, one or more light preconditioners (991,992) may be used to help optimize speckle reduction.