Abstract: This invention relates to a filament for electron emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source. Embodiments of the present invention discloses method with which a Re (Rhenium) is used as heat source such that vibration issue of prior tungsten filament can be depressed.

Abstract: System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

Abstract: The radiance of a laser is a function of drive current. The radiance is also a function of other factors, such as age and temperature. A laser projection device adjusts laser drive parameters using a gradient descent operation. The device parameters may be adjusted iteratively and periodically. The period may be shorter or longer than a scan line in a video image.

Abstract: A scanning beam projection system includes a two-mirror scanning system. One mirror scans in one direction, and a second mirror scans in a second direction. A fast scan mirror receives a modulated light beam from a fold mirror and directs the modulated light beam to a slow can mirror. The fold mirror may be formed on an output optic or may be formed on a common substrate with the slow scan mirror.

Abstract: Briefly, in accordance with one or more embodiments, a scanning platform to scan a beam as a projected image comprises a frame and a scanning mirror supported by a flexure coupled to the frame of the scanning platform. The flexure has an asymmetric structure comprising a longer flexure arm and a shorter flexure arm to locate the scanning mirror at a position offset from a center of the frame. The resonant frequency of oscillation of the scanning mirror may be maintained or otherwise determined by selecting an appropriate cross-sectional area of the longer flexure arm or the shorter flexure arm, or combinations thereof.

Abstract: In one tiling system described below, a first portable projection device (101) projects a first image (103) on a projection surface (105). A periphery delimiting light source projects a peripheral image demarcation (107), which can be non-visible light, about the first image (103). A second portable projection device (102) projects a second image (104) on the projection surface (105) with a second peripheral image demarcation (106). The first peripheral image demarcation (107) and the second peripheral image demarcation (106) can be uniquely encoded. A control circuit (229) that is operable with the one or more light sources and a light modulator is configured to tile images by altering its image as a function of the peripheral image demarcations.

Abstract: A optical apparatus (201) for use in an laser imaging system (200) is provided. The optical apparatus (201) includes one or more optical elements (215) that are configured to create an intermediate image plane (217) in the laser imaging system (200). A diffractive optical element (216) is then disposed at the intermediate image plane (217) to reduce speckle. The diffractive optical element (216) includes a periodically repeating phase mask (218) that can be configured in accordance with steps, vortex functions, Hermite-Gaussian functions, and so forth. Smooth grey-level phase transitional surface (337) can be placed between elements (333,334) to improve brightness and image quality. The periodically repeating phase mask (218) makes manufacture simple by reducing alignment sensitivity, and can be used to make applicable safety standards easier to meet as well.

Abstract: The present invention discloses a structure and method for determining a defect in integrated circuit manufacturing process, wherein the structure comprises a plurality of normal active areas formed in a plurality of first arrays and a plurality of defective active areas formed in a plurality of second arrays. The first arrays and second arrays are interlaced, and the defect is determined by monitoring a voltage contrast from a charged particle microscope image of the active areas.

Abstract: The present invention discloses a structure and a method for determining a defect in integrated circuit manufacturing process. Test keys are designed for the structure to be the interlaced arrays of grounded and floating conductive cylinders, and the microscopic image can be predicted to be an interlaced pattern of bright voltage contrast (BVC) and dark voltage contrast (DVC) signals for a charged particle beam imaging system. The system can detect the defects by comparing patterns of the detected VC signals and the predicted VC signals.

Abstract: Briefly, in accordance with one or more embodiments, a display projector may comprise a light source to generate a beam to be scanned, a scanning platform to scan the beam in a selected pattern to project an image on a projection surface, and a collection lens and microlens array to shape the beam to a desired beam profile without significantly increasing spot size of the beam with increasing distance from the projection surface.

Abstract: A scanning projector includes a MEMS device with a scanning mirror that sweeps a beam in two dimensions. Actuating circuits receive scan angle information and provide signal stimulus to the MEMS device to control the amount of mirror deflection on two axes. The period of movement on one or both axes may be modified to effect changes in line density in a resultant display.

Abstract: A method for inspecting overlay shift defect during semiconductor manufacturing is disclosed herein and includes a step for providing a charged particle microscopic image of a sample, a step for identifying an inspection pattern measure in the charged particle microscopic image, a step for averaging the charged particle microscopic image by using the inspection pattern measure to form an averaged inspection pattern measure, a step for estimating an average width from the averaged inspection pattern measure, and a step for comparing the average width with a predefined threshold value to determine the presence of the overlay shift defect.

Abstract: A phase for an analog-to-digital converter sampling clock is determined. The analog-to-digital converter samples a video signal to generate pixel values. Differences of successive pixel values are compared to a threshold. The number of times the threshold is exceeded is counted for multiple phase values to create a phase profile. The threshold may be dynamic.

Abstract: Briefly, in accordance with one or more embodiments, an electric comb drive scanner comprises a scanning body comprising a mirror supported by one or more flexures along a first axis and one or more support structures coupled to the one or more flexures. One or more drive combs are disposed on the one or more support structures, wherein the drive combs cause the mirror to rotate about the first axis in response to a drive signal applied to the drive combs. The one or more support structures are tuned to reduce non-uniformity of warping of the support structures to reduce variation in disengagement of the drive combs along a length of the drive combs.

Abstract: An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic immersion lens and an electrostatic immersion lens. The magnetic immersion lens orients its gap between an inner pole piece and an outer pole piece to specimen's surface, and uses a magnetic specimen stage. The electrostatic immersion lens comprises three or four electrodes which apply suitable retarding field to a primary beam of the charged particle device for reducing its landing energy on specimen surface and further eliminating imaging aberrations.

Abstract: A method, apparatus and computer readable medium for charged particle beam inspection of a sample comprising at least one sampling region and at least one skip region is disclosed. The method, apparatus and computer readable medium comprise receiving an imaging recipe which at least comprises information of the area of the sampling and skip regions; calculating a default stage speed according to the imaging recipe; calculating an alternative stage speed at least according to the default stage speed, the sampling region area information, and the skip region area information; calculating at least one imaging scan compensation offset at least according to the alternative stage speed; and inspecting the sample at the alternative stage speed while adjusting the motion of the charged particle beam according to the imaging scan compensation offsets, such that the charged particle beam tightly follows the motion of the stage and images only the sampling regions on the sample.

Abstract: A method of inspecting an EUV reticle is proposed, which uses an electron beam (EB) with low density and high energy to scan the surface of an EUV reticle for inspecting the EUV reticle. A step of conditioning surface charge is followed by a step of inspecting surface of the EUV reticle. The step of conditioning surface can neutralize the surface charge and the step of inspecting can obtain an image of the EUV reticle. The present invention uses a scanning electron microscope (SEM) to provide a primary electron beam for conditioning the surface charge and a focused primary electron beam for scanning the surface.

Abstract: An imaging system (100) includes one or more light sources (101,102,103) configured to produce one or more light beams (104,105,106). An additional light source (111) produces an additional light beam (112), which may be a non-visible light beam like an infrared beam. A spatial light modulator (107) is configured to produce images (109) on a projection surface (110) by scanning the light beams and the additional light beam within an image cone (118) oriented in a first direction (119). A partial reflector (117) is disposed within the image cone (118) and is configured to pass at least a portion of the light beams and reflect at least a portion of the additional light beam within a second cone (120) oriented in a second direction (121).

Abstract: Briefly, in accordance with one or more embodiments, scanned beam projector may comprise a light source, a scan drive and a scanning platform to project an image onto a projection surface. The scan drive circuit is capable of at least partially correcting distortion in the projected image by varying an amplitude of the scan drive signal to at least partially compensate for the distortion in the projected image.

Abstract: A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.