Patents Assigned to Monolithic 3D Inc.
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Publication number: 20170200715Abstract: An Integrated Circuit device, including: first transistors and second transistors, where the first transistors and the second transistors each include a single crystal channel, where at least one of the second transistors overlays at least one of the first transistors with less than 1 micron distance apart, and where at least one of the second transistors is a dopant segregated schottky barrier transistor.Type: ApplicationFiled: March 27, 2017Publication date: July 13, 2017Applicant: Monolithic 3D Inc.Inventors: Deepak Sekar, Zvi Or-Bach, Brian Cronquist
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Publication number: 20170186770Abstract: A semiconductor memory, including: a first memory cell including a first transistor; a second memory cell including a second transistor; and a memory peripherals transistor, the memory peripherals transistor is overlaying the second transistor or is underneath the first transistor, where the second memory cell overlays the first memory cell at a distance of less than 200 nm, and where the memory peripherals transistor is part of a peripherals circuit controlling the memory.Type: ApplicationFiled: March 16, 2017Publication date: June 29, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Brian Cronquist, Deepak C. Sekar, Zeev Wurman, Israel Beinglass
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Patent number: 9691869Abstract: An Integrated Circuit device, including: a first layer including first transistors; and a second layer including second transistors overlaying the first layer, where the first transistors are facing down and the second transistors are facing up, and where the second layer includes a through layer via of less than 300 nm diameter.Type: GrantFiled: October 11, 2015Date of Patent: June 27, 2017Assignee: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Deepak C. Sekar, Brian Cronquist
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Publication number: 20170179155Abstract: A 3D integrated circuit device, including: a first transistor; a second transistor; and a third transistor, where the third transistor is overlaying the second transistor and is controlled by a third control line, where the second transistor is overlaying the first transistor and is controlled by a second control line, where the first transistor is part of a control circuit controlling the second control line and third control line, and where the first transistor, the second transistor and the third transistor are all aligned to each other with less than 100 nm misalignment.Type: ApplicationFiled: March 7, 2017Publication date: June 22, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Deepak C. Sekar, Brian Cronquist
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Publication number: 20170162585Abstract: A 3D semiconductor device including: a first layer including a first monocrystalline layer, the first layer including first logic cells; a second layer including a monocrystalline semiconductor layer, the second layer overlying the first layer, the second layer including second transistors, where the logic cells include a Look-Up-Table logic cell, and where the second transistors are aligned to the first logic cells with less than 200 nm alignment error.Type: ApplicationFiled: July 28, 2016Publication date: June 8, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Zeev Wurman
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Publication number: 20170133395Abstract: A semiconductor device, including: a plurality of non-volatile memory cells including a first memory cell and a second memory cell, where the plurality of non-volatile memory cells includes source diffusion lines and drain diffusion lines, at least one of the source diffusion lines and drain diffusion lines are shared by the first memory cell and the second memory cell, where the first memory cell includes a thin tunneling oxide of less than 1 nm thickness, and where the second memory cell includes a thick tunneling oxide of greater than 2 nm thickness.Type: ApplicationFiled: November 6, 2016Publication date: May 11, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Jin-Woo Han
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Publication number: 20170133432Abstract: A semiconductor memory, including: a first memory cell including a first transistor; a second memory cell including a second transistor; and a memory peripherals transistor overlaying the second transistor or underneath the first transistor, where the second memory cell overlays the first memory cell, and where the first memory cell and the second memory cell have both been processed following a lithography step and accordingly are precisely aligned, and where the memory peripherals transistor is part of a peripherals circuit controlling the memory.Type: ApplicationFiled: January 19, 2017Publication date: May 11, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Deepak C. Sekar, Brian Cronquist, Israel Beinglass, Zeev Wurman
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Publication number: 20170117291Abstract: A multilevel semiconductor device, including: a first level including a first array of first memory cells; a second level including a second array of second memory cells, the first level is overlaid by the second level, where at least one of the first memory cells includes a vertically oriented first transistor, and where at least one of the second memory cells includes a vertically oriented second transistor, and where the first transistor includes a first single crystal channel, and where the second transistor includes a second single crystal channel, and where the first transistor is self-aligned to the second transistor.Type: ApplicationFiled: October 24, 2016Publication date: April 27, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Jin-Woo Han
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Patent number: 9613844Abstract: A 3D semiconductor device, including: a first layer including first transistors; a first interconnection layer interconnecting the first transistors and overlying the first layer; and a second layer including second transistors, where the second layer thickness is less than 2 microns and greater than 5 nm, where the second layer is overlying the first interconnection layer, and where the second layer includes dice lines formed by an etch step.Type: GrantFiled: August 7, 2015Date of Patent: April 4, 2017Assignee: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Brian Cronquist, Deepak C. Sekar, Zeev Wurman, Israel Beinglass
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Patent number: 9613887Abstract: An Integrated Circuit device, including: a base wafer including single crystal, the base wafer including a plurality of first transistors; at least one metal layer providing interconnection between at least a portion of the plurality of first transistors; a second layer of less than 2 micron thickness, the second layer including a plurality of second transistors, the second layer overlying the at least one metal layer; and at least one conductive structure constructed to provide power to a portion of the second transistors, where the provide power is controlled by at least one of the transistors.Type: GrantFiled: March 23, 2016Date of Patent: April 4, 2017Assignee: Monolithic 3D Inc.Inventors: Deepak Sekar, Zvi Or-Bach, Brian Cronquist
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Publication number: 20170092541Abstract: A 3D semiconductor device including: a first structure including first single crystal transistors; a second structure including second single crystal transistors, the second structure overlaying the first single crystal transistors, where at least one of the second single crystal transistors is at least partially self-aligned to at least one of the first single crystal transistors; and at least one thermal conducting path from at least one of the first single crystal transistors and second single crystal transistors to an external surface of the device.Type: ApplicationFiled: July 2, 2016Publication date: March 30, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Deepak C. Sekar, Brian Cronquist
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Publication number: 20170062600Abstract: A 3D IC based system, the system including: a first layer including first memory cells including first transistors, where the first transistors include first transistor channels; a second layer overlying the first layer, the second layer including second memory cells including second transistors, where the second transistors include second transistor channels, where the second layer includes vertically oriented doped regions, where the second layer includes at least one through second layer via having a diameter of less than 400 nm, and where at least one of the first transistor channels and at least one of the second transistor channels are directly coupled to at least one of the vertically oriented doped region.Type: ApplicationFiled: November 14, 2016Publication date: March 2, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Yuniarto Widjaja
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Publication number: 20170053906Abstract: A device, including: a first structure including first memory cells, the first memory cells including first transistors; and a second structure including second memory cells, the second memory cells including second transistors, where the second transistors overlay the first transistors, and a plurality of memory cells control lines, where the first transistors are self-aligned to the second transistors, where a second transistor channel of the second transistors is aligned to a first transistor channel of the first transistors, the aligned is at an atomic level as would have been resulted from an epitaxial growth process.Type: ApplicationFiled: August 22, 2016Publication date: February 23, 2017Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Jin-Woo Han
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Patent number: 9509313Abstract: A semiconductor device comprising first layer comprising multiplicity of first transistors and, second layer comprising multiplicity of second transistors and, at least one function constructed by the first transistors are structure so it could be replaced by a function constructed by the second transistors.Type: GrantFiled: March 6, 2011Date of Patent: November 29, 2016Assignee: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Zeev Wurman
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Publication number: 20160343774Abstract: A semiconductor device, including: a first memory cell including a first transistor; a second memory cell including a second transistor, where the second transistor overlays the first transistor and the second transistor self-aligned to the first transistor; and a plurality of junctionless transistors, where at least one of the junctionless transistors controls access to at least one of the memory cells.Type: ApplicationFiled: August 1, 2016Publication date: November 24, 2016Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Deepak C. Sekar, Brian Cronquist, Israel Beinglass, Zeev Wurman
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Patent number: 9460991Abstract: A 3D semiconductor device, including: a first layer including first transistors; a second layer overlying the first transistors and including second transistors; wherein the second layer includes a through layer via with a diameter of less than 150 nm; and a first circuit including at least one of the first transistors, and the first circuit has a first circuit output connected to at least one of the second transistors, wherein the at least one of the second transistors is connected to a device output that is designed to be connected to external devices, and wherein the at least one of the second transistors is substantially larger than the at least one of the first transistors.Type: GrantFiled: April 17, 2013Date of Patent: October 4, 2016Assignee: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Brian Cronquist, Deepak Sekar
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Patent number: 9460978Abstract: A 3D semiconductor device, including: a first layer including first transistors; a second layer overlying the first transistors and including second transistors; wherein the second layer includes a through layer via with a diameter of less than 150 nm; and a Phase-Lock-Loop (PLL) circuit, where the Phase-Lock-Loop (PLL) circuit is connected to at least one input structure, and where the least one input structure is designed to connect an input to the device from external devices.Type: GrantFiled: April 17, 2013Date of Patent: October 4, 2016Assignee: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Brian Cronquist, Deepak Sekar
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Publication number: 20160218046Abstract: A 3D device, including: a first layer including first transistors, the first transistors interconnected by a first layer of interconnection; a second layer including second transistors, the second transistors overlaying the first layer of interconnection, where the first layer includes a first clock distribution structure, where the second layer includes a second clock distribution structure, where the device includes a Phase Lock Loop (“PLL”) circuit, where the second clock distribution structure is connected to the Phase Lock Loop (“PLL”) circuit, and where the second transistors are aligned to the first transistors with less than 200 nm alignment error.Type: ApplicationFiled: April 1, 2016Publication date: July 28, 2016Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Zeev Wurman
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Publication number: 20160204085Abstract: An Integrated Circuit device, including: a base wafer including single crystal, the base wafer including a plurality of first transistors; at least one metal layer providing interconnection between at least a portion of the plurality of first transistors; a second layer of less than 2 micron thickness, the second layer including a plurality of second transistors, the second layer overlying the at least one metal layer; and at least one conductive structure constructed to provide power to a portion of the second transistors, where the provide power is controlled by at least one of the transistors.Type: ApplicationFiled: March 23, 2016Publication date: July 14, 2016Applicant: Monolithic 3D Inc.Inventors: Deepak Sekar, Zvi Or-Bach, Brian Cronquist
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Publication number: 20160141274Abstract: An Integrated Circuit device, including: a base wafer including single crystal, the base wafer including a plurality of first transistors; at least one metal layer providing interconnection between the plurality of first transistors; a first wire structure constructed to provide power to a portion of the first transistors; a second layer of less than 2 micron thickness, the second layer including a plurality of second single crystal transistors, the second layer overlying the at least one metal layer; and a second wire structure constructed to provide power to a portion of the second transistors, where the second wire structure is isolated from the first wire structure to provide a different power voltage to the portion of the second transistors.Type: ApplicationFiled: January 28, 2016Publication date: May 19, 2016Applicant: Monolithic 3D Inc.Inventors: Zvi Or-Bach, Brian Cronquist