Abstract: A lithography system is provided with: a measurement device measuring position information of marks on a substrate held in a first stage; and an exposure apparatus on a second stage, the substrate for which the position information measurement for the marks has been completed, performs alignment measurement to measure position information for part of marks selected from among the marks on the substrate, and performs exposure. The measurement device measures position information of marks on the substrate to obtain higher-degree components of correction amounts of an arrangement of divided areas, and the exposure apparatus measures position information of a small number of marks on the substrate to obtain lower-degree components of the correction amounts of the arrangement of the divided areas and exposes the plurality of divided areas while controlling the position of the substrate by using the obtained lower-degree components and the higher-degree components obtained by the measurement device.

Abstract: An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Abstract: A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system that detects a mark on the substrate; and a controller which detects the marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.

Abstract: A variable magnification optical system comprises, in order from an object side, a negative first lens group, a positive second lens group, a negative third lens group and a positive fourth lens group. Upon varying a magnification, a distance between the first lens group and the second lens group, a distance between the second lens group and the third lens group, and a distance between the third lens group and the fourth lens group are varied. The first lens group consists of, in order from the object side, a negative lens and a positive lens. The second lens group consists of, in order from the object side, a positive 2a lens group, a positive 2b lens group, and a negative 2c lens group. A downsized system having high optical performance is provided.

Abstract: To reduce the feel of incongruity in a model, provided is a detection device comprising: a texture detector that detects texture information of a target object from a first position; a position detector that detects depth information to each point in the target object from a second position different from the first position; a region detector that detects a data deficient region in which the depth information has been acquired but the texture information has not been acquired, on the basis of a detection result of the texture detector and a detection result of the position detector; and an adder that adds specific texture information to the data deficient region.

Abstract: A spatial light modulation unit is used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction. The spatial light modulation unit includes: a spatial light modulator having a plurality of elements; a controller that controls the plurality of elements in accordance with the exposure pattern; and a SLM substrate on which the spatial light modulator and the controller are provided. The controller is arranged side by side in the scan direction with respect to the spatial light modulator.

Abstract: A processor identifies a first position of a vortex vein from a first fundus image, identifies a second position of the vortex vein from a second fundus image, and generates data of a screen to display the first position and the second position.

Abstract: A processing system includes: a processing apparatus configured to perform an additive processing on a plurality of objects; and a control apparatus configured to control the processing apparatus, the control apparatus generates, based on a result of a first measurement operation for measuring a shape of a first object of the plurality of objects, first processing control information for controlling the processing apparatus to perform the additive processing on the first object, the processing apparatus performs, based on the first processing control information, the additive processing on the first object and the additive processing on a second object of the plurality of objects that is different from the first object.

Abstract: An exposure apparatus includes a substrate holder configured to hold a substrate and move, a module including a spatial light modulator having light modulation elements that are two-dimensionally arranged, an illumination unit irradiating the spatial light modulator with illumination lights, and a projection unit guiding the illumination light from the light modulation elements to respective light irradiation areas that are two-dimensionally arranged on the substrate in first and second directions, and a control unit configured to drive the substrate holder in a scanning direction, wherein the light modulation elements are two-dimensionally arranged to be inclined at a predetermined angle ? (0°<?<90°) with respect to the scanning direction and a non-scanning direction orthogonal to the scanning direction, and when a predetermined region of the substrate is exposed, the control unit scans the substrate holder at such a speed that spot positions are arranged in a staggered arrangement.

Abstract: A visual field testing method is a visual field testing method of testing a visual field range divided into at least a first partial area and a second partial area, the method including: a step of measuring sensitivities of a plural first test points that are included in the first partial area: and a step of performing a process of estimating sensitivities of a plural second test points that are included in the first partial area and are test points other than the first test points, by using the sensitivities of the plural first test points.

Abstract: A zoom optical system (ZL) comprises, in order from an object, a first lens group (G1) having a positive refractive power, a second lens group (G2) having a negative refractive power, a third lens group (G3) having a positive refractive power, a fourth lens group (G4) having a positive refractive power and a succeeding lens group (GR). In the zoom optical system, upon zooming, distances between adjacent lens groups change, and the succeeding lens group (GR) includes a plurality of focusing lens groups that have positive refractive powers and move upon focusing.

Abstract: An optical glass comprising: by cation %, more than 0% and up to 40% of a content rate of La3+; 15% to 65% of a content rate of Ti4+; and more than 0% and up to 20% of a content rate of Zr4+; wherein a refractive index (nd) with respect to a d-line is from 2.00 to 2.35.

Abstract: An exposure apparatus includes a spatial light modulator, a calculation unit configured to calculate positions of first connection portions of a first semiconductor chip provided on a substrate and positions of second connection portions of a second semiconductor chip provided on the substrate, based on a first position measurement result, a second position measurement result, and design information of the first connection portions and the second connection portions, the first position measurement result being a measurement result of positions of measurement points on the first semiconductor chip, the second position measurement result being a measurement result of positions of measurement points on the second semiconductor chip, and an exposure processing unit configured to control the spatial light modulator based on a calculation result by the calculation unit so as to expose wiring patterns connecting the first connection portions and the second connection portions.

Abstract: A compound represented by Formula (1). [In the formula, X represents a halogen atom or an alkoxy group, R1 represents any one group selected from an alkyl group having 1 to 5 carbon atoms, a group represented by Formula (R2-1), and a group represented by Formula (R2-2), R2 represents a group represented by Formula (R2-1) or (R2-2), n0 represents an integer of 0 or greater, n1 represents an integer of 0 to 5, and n2 represents a natural number of 1 to 5.

Abstract: A first image is projective transformed into a reference image by using a projective transformation matrix on each pixel of the first image. A projective transformation matrix for transforming a tilted image n into a central image G0 is computed based on positions of combinations of twelve corresponding points indicated in a combination of the central image G0 with the tilted image n. The computed projective transformation matrix is then employed to perform a projective transformation of the tilted image n. A projective-transformed tilted image n1 is created thereby.

Abstract: A device includes an image processing unit configured to calculate color information of at least one cell in a captured image and a determination unit configured to determine a cultured state of the cell on the basis of the color information calculated by the image processing unit.

Abstract: A zoom optical system includes a positive first lens group, a negative second lens group disposed on an image side of the first lens group, a positive third lens group disposed on an image side of the second lens group, a negative fourth lens group disposed on an image side of the third lens group, and a final lens group disposed on an image side of the fourth lens group and closest to an image. During zooming, distances between lens groups change, and the first lens group moves along an optical axis. A negative focusing lens group is provided, and the final lens group is disposed on an image side of the focusing lens group. A negative vibration proof group of the second lens group may include, in order from an object, a negative lens, an air gap and a cemented lens of a negative lens and a positive lens. The final lens group may have negative refractive power.

Abstract: An image processing device includes: a processor; and a memory encoded with instructions executed by the processor, including: imaging pluripotent stem cells with time in a culture process and acquiring a plurality of images, extracting a colony region of the cells from the image, extracting a high luminance region on the basis of a group of pixels with larger luminance values than a standard value from among pixels constituting the image, extracting an extraction target region with relatively high contrast in the colony region on the basis of the colony and high luminance regions, and outputting the extraction target region as an extraction result, wherein as a relationship among the colony, high luminance, and extraction target regions, the colony region is formed, the high luminance region is then formed therein, and the extraction target region is then formed in the high luminance region in the culture process of the cells.

Abstract: Provided are ITO particles having a non-rectangular parallelepiped shape and an aligned crystal orientation inside particles.

Abstract: A plurality of pixels PX include effective pixels and optical black pixels. Signal lines VL are provided corresponding to each column of the pixels PX and supplied with output signals of the pixels PX of the corresponding column. Clip transistors CL are provided corresponding to the respective signal lines VL and limit a potential of the corresponding vertical signal lines VL based on a gate potential. At least in a predetermined operating mode, a potential Vclip_dark is supplied to a gate of one of the clip transistors CL corresponding to at least one pixel column formed of the optical black pixels when reading a noise level from the pixels PX corresponding to the clip transistors CL and when reading a data level from the pixels PX corresponding to the clip transistors CL.