Abstract: A wiring pattern manufacturing method includes: applying a liquid body including a first formation material on a substrate to form a base film; applying a liquid body including a second formation material on at least part of a surface of the base film to form a protection layer of the base film; forming a resist layer on a surface of the protection layer to expose the resist layer with desired patterning light; causing the exposed resist layer to come into contact with a developer to remove the resist layer and the protection layer until the base film is uncovered corresponding to the patterning light; and after depositing a catalyst on a surface of the uncovered base film, causing an electroless plating solution to come into contact with the surface of the base film to perform electroless plating.
Abstract: A microparticle detection system includes a stage unit including a mounting surface on which a fluid device having a flow path through which a sample containing microparticles is movable is capable of being mounted, an emission unit configured to emit illumination light to the flow path, an imaging unit configured to image scattered light generated from microparticles in the sample when illumination light is emitted, an identification unit configured to identify the microparticles included in the image for each of the microparticles on the basis of the image captured by the imaging unit, a particle size determination unit configured to determine a particle size of the microparticle for each of the microparticles identified by the identification unit, a zeta potential determination unit configured to determine a zeta potential of the microparticle for each of the microparticles identified by the identification unit, and a correlation unit configured to associate the particle size for each of the microparticles
October 17, 2017
Date of Patent:
May 21, 2019
THE UNIVERSITY OF TOKYO NIKON CORPORATION
Abstract: An image sensor includes: a first light-receiving unit that: receives a modulated optical signal having being reflected on an image-capturing target and including a modulated component with an intensity modulated at a predetermined modulation frequency; and outputs a first electrical signal; a second light-receiving unit that: receives a reference optical signal with an intensity modulated in synchronization with the modulated optical signal; and outputs a second electrical signal; and a detecting unit that: is provided to a substrate stacked on a substrate including the first light-receiving unit; refers to the second electrical signal; and detects, from the first electrical signal, a third electrical signal corresponding to the modulated component.
Abstract: The present invention relates to a nucleic acid linker for producing a complex of mRNA, and a protein or a peptide which is encoded by the mRNA, the linker comprising: a spacer portion at the 5?-terminal; a polynucleotide portion hybridizable with at least a part of a sequence of the mRNA; and an arm portion which has a connection portion for the protein or the peptide at the 3?-terminal, in which the spacer portion, the polynucleotide portion, and the arm portion form a single strand, and in which the polynucleotide portion contains a photoreactive base derivative.
September 10, 2015
Date of Patent:
May 21, 2019
THE UNIVERSITY OF TOKYO, NIKON CORPORATION
Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.
June 21, 2017
Date of Patent:
May 21, 2019
Michael B. Binnard, Daniel Gene Smith, David M. Williamson
Abstract: An image sensor includes a first photoelectric conversion unit that converts light incident through a first opening to an electric charge, a second photoelectric conversion unit that converts light incident through a second opening which is smaller than the first opening to an electric charge, and a signal output wiring that outputs a first signal generated by the electric charge converted by the first photoelectric conversion unit and a second signal generated by the electric charge converted by the second photoelectric conversion unit. The second photoelectric conversion unit is disposed between the second opening and the signal output wiring.
Abstract: A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.
Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.
Abstract: A method of manufacturing a stacked substrate by bonding a first substrate and a second substrate, including a step of determining, based on information about curving of each of the first substrate and the second substrate, whether or not the first substrate and the second substrate satisfy a predetermined condition, and, a step of bonding the first substrate and the second substrate if the predetermined condition is satisfied. The stacked substrate manufacturing method described above includes a step of estimating, based on the information, an amount of misalignment which occurs after the first substrate is bonded to the second substrate and the predetermined condition may include that the amount of misalignment is equal to or less than a threshold.
Abstract: A structured illuminating apparatus includes a branching unit branching an exit light flux from a light source into at least two branched light fluxes, an illuminating optical system making the two branched light fluxes to be respectively collected at mutually different positions on a pupil plane of an objective lens and making the two branched light fluxes to be interfered with each other to illuminate a specimen with an interference fringe of the two branched light fluxes, and an adjusting unit adjusting a height from an optical axis of the illuminating optical system to two collecting points formed on the pupil plane of the objective lens by the two branched light fluxes.
Abstract: In an exposure operation of a substrate, a controller controls first and second drive systems based on correction information for compensating for a measurement error of an encoder system and measurement information of first and second measurement devices, so that scanning exposure is performed and a measurement error is compensated for. In the scanning exposure, a mask and the substrate are each moved relative to illumination light with a first direction serving as a scanning direction, the measurement error occurring due to a difference between a position of a reference plane and a position of a grating surface of a grating section in a third direction orthogonal to a predetermined plane that includes the first direction, and the reference plane being a reference plane for position control or positioning of a second stage or a reference plane with which the substrate coincides in the exposure operation.
Abstract: A focus detection device includes: a sensor outputting a pair of focus detection signal sequences, each of which being made of a plurality of focus detection signals; a difference calculation unit obtaining a plurality of differences by sequentially calculating differences between focus detection signals corresponding to each other in the pair of focus detection signal sequences; a division unit dividing the pair of focus detection signal sequences into at least two pairs of partial signal sequences based on the plurality of differences; a focus detection parameter calculation unit calculating a first focus detection parameter according to a phase difference amount of a first pair of partial signal sequences and a second focus detection parameter in accordance with a phase difference amount of a second pair of partial signal sequences; and a focus adjustment parameter determination unit determining either the first or second focus detection parameters, as a focus adjustment parameter.
Abstract: There is provided a wavefront measuring method for obtaining wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.
Abstract: A method for deblurring a blurry image (400) includes the steps of: performing a first phase of deconvolution (202) with a first phase regularization spatial mask (300) to reconstruct the main edges and generate a first phase latent sharp image (404) having reconstructed main edges; and performing a second phase of deconvolution (204) with a second phase regularization spatial mask (304) to reconstruct the texture and generate a second phase latent sharp image (406). The second phase regularization spatial mask (304) can be different from the first phase regularization spatial mask (300).
Abstract: A purpose is to provide a resin encoder scale a cost of which can be reduced by making processing easy by producing the encoder scale as a resin molded piece including a scale pattern. A resin encoder scale is used in a reflection-type optical encoder and a scale pattern for position measurement is provided thereto. In the scale pattern, a low reflection part a surface of which is molded as a rough surface during resin molding and which has low reflectivity of light and a high reflection part a surface of which is molded as a mirror surface during the resin molding and which has higher reflectivity of light than the low reflection part are arranged alternately.
Abstract: Reception of the invisible light wavelength band in an incident luminous flux has not been considered. In view of this, an image sensor is provided, the image sensor including: a visible parallax pixel that is associated with a visible range light-receiving photoelectric conversion pixel having any of a plurality of types of aperture mask each including an aperture that is positioned to allow passage, to a photoelectric converting element, of a mutually different partial luminous flux of an incident luminous flux in a visible light wavelength band; and an invisible parallax pixel that is associated with an invisible range light-receiving photoelectric conversion pixel having any of a plurality of types of aperture mask each including an aperture positioned to allow passage, to the photoelectric converting element, of a mutually different partial luminous flux in an incident luminous flux in an invisible light wavelength band.
Abstract: Provided is a zoom lens (ZL) which includes, in order from an object, a first lens group (G1) having negative refractive power, and a second lens group (G2) having positive refractive power, and which satisfies the following conditional expression (1): 1.90<ft/Gf2<3.50??(1), where ft denotes a focal length of the zoom lens (ZL) in the telephoto end state, and Gf2 denotes a focal length of the second lens group (G2).
Abstract: A first stage system having a first stage and a first drive system that moves the first stage is configured to hold a mask illuminated with illumination light. A second stage system having a second stage and a second drive system that moves the second stage is configured to hold a substrate. A measurement system having a first encoder system and a second encoder system measures positional information of the first and second stages, respectively. The second encoder system measures the positional information of the second stage with a plurality of heads that face a grating section. The first and second drive systems are controlled while compensating for a measurement error that occurs due to at least one of a gradient and a telecentricity of the head, based on correction information.
Abstract: A scanning lithography tool that includes a reticle stage for clamping and imparting a bending moment onto a reticle by applying a force along a plane surface of the reticle to bend the reticle in a deterministic manner.
Abstract: Provided is an image processing apparatus including as image acquiring section that acquires a plurality of images obtained by imaging, at different times, a subject irradiated with lights intensity-modulated with a plurality of modulation frequencies or modulation frequency bands; and a demodulating section that demodulates pixel values of the plurality of images with a plurality of demodulation frequencies or demodulation frequency bands based on the plurality of modulation frequencies or modulation frequency bands, for each pixel, thereby generating a plurality of pieces of pixel information indicating subject light amounts from the subject caused by each of the lights intensity-modulated with the plurality of modulation frequencies or modulation frequency bands, for each pixel.