Abstract: A resist underlayer film that exhibits removability and preferably solubility only in wet etching reagent solutions, while exhibiting good resistance to resist developers that are resist solvents or aqueous alkali solutions. The composition for forming a resist underlayer film includes a dicyanostyryl group-bearing polymer (P) or dicyanostyryl group-bearing compound (C) and includes solvent, and does not contain a protonic acid curing catalyst and does not contain an alkylated aminoplast crosslinking agent derived from melamine, urea, benzoguanamine, or glycoluril.

Abstract: A gel dosimeter for radiation dosimetry includes a radically polymerizable monomer, a gelator, glucose, and glucose oxidase. Although a conventional polymer gel dosimeter contains a deoxygenating agent such as tetrakis(hydroxymethyl)phosphonium chloride, such a deoxygenating agent fails to exhibit sufficient effects. Thus, a more effective deoxygenation treatment technique has been required for a gel dosimeter.

Abstract: A separation device for separating a solid separation target contained in a suspension obtained by suspension culture of adherent cells by using a fine scaffold material, and a separation method. The separation device has a separation chamber having a first chamber and a second chamber, and the first chamber and the second chamber are divided by a mesh structure for separation. The mesh structure for separation has mesh-holes with a predetermined size to suppress passage of the separation target, and a mesh structure for separation is configured in the separation chamber such that the liquid in the aforementioned suspension has a vertically upward directional component in the advancing direction of the liquid when the liquid passes through the mesh-holes.

Abstract: A method for cleaning a semiconductor substrate includes peeling and dissolving an adhesive layer formed on a semiconductor substrate using a peeling and dissolving composition, in which the peeling and dissolving composition contains: a component [I]: a quaternary ammonium salt; a component [II]: an amide-based solvent; and a component [III]: a solvent represented by the following Formula (L): L1-L3-L2??(L) where L1 and L2 each independently represents an alkyl group having 2 to 5 carbon atoms, and L3 represents O or S.

Abstract: A dispersion of exfoliated particles which includes at least one nitrogen-containing basic compound (A) which is a tertiary amine or a quaternary ammonium hydroxide having at least one alkyl group having 3 or 4 carbon atoms, and in which exfoliated particles (C) produced by interlayer-exfoliating a proton-type layered polysilicate compound (B) are dispersed in an aqueous solution (D) having 10 vol % to 90 vol % of an alcohol having 1 to 3 carbon atoms; and a film-forming composition, a porous body-forming composition, an LB film, a coating film, a free-standing membrane, a proton conductor, an electrolyte membrane for fuel cells, and a porous body each containing exfoliated particles.

Abstract: A protective film-forming composition including good mask (protection) function against a wet etching liquid and a high dry etching rate during processing of semiconductor substrates, including good coverage even in stepped substrates, and from which flat films can be formed due to a small difference in film thickness after embedding; a protective film produced using said composition; a substrate with a resist pattern; and a method for manufacturing a semiconductor device. A protective film-forming composition which protects against a semiconductor wet etching liquid, wherein a reaction product (P) of a diepoxy compound (B) and an bifunctional proton-generating compound (C) contains a structure represented by formula (1) (in formula (1), Ar represents a C6-40 aryl group, n represents an integer of 2-10, —Y— represents —OCO—, —O— or —S—, and * represents the bonding site with the reaction product (P) molecule terminal). The protective film-forming composition further includes an organic solvent (S).

Abstract: A borehole cement slurry additive that is capable of suppressing the generation of free water from cement slurries in any environment, whether cold regions, mild regions, or hot regions; and a method for storing the same. The borehole cement slurry additive contains: an aqueous dispersion of silica having an average particle size of 3-200 nm as determined via dynamic light scattering; and a compound having an alcoholic hydroxyl group as a dispersion stabilizer, the compound being included in an amount of 1-30 mol per 1,000 g dispersion medium in the aqueous silica dispersion.

Abstract: A liquid crystal light control element that controls a light absorption state by voltage application, the liquid crystal light control element including: a liquid crystal layer containing a liquid crystal composition between a pair of substrates each having an electrode; and a liquid crystal alignment film that is provided on at least one of the substrates and aligns a liquid crystal vertically, wherein the liquid crystal composition contains a liquid crystal and a dichroic dye, the liquid crystal alignment film is obtained from a liquid crystal aligning agent containing a polyimide precursor in which a diamine having a specific side chain is used as a part of the raw material or a polyimide obtained by imidizing the polyimide precursor, and the proportion of the diamine used is 50 to 100 mol % based on the entire diamine component.

Abstract: A method produces a semiconductor device, the method having a step of transferring an underlayer by employing a resist underlayer film-forming composition containing a hydrolysis condensate prepared through hydrolysis and condensation of a hydrolyzable silane in a non-alcoholic solvent in the presence of a strong acid, followed by a step (G) of removing the patterned resist film, the patterned resist underlayer film, and/or particles with a sulfuric acid-hydrogen peroxide mixture (SPM) prepared by mixing of aqueous hydrogen peroxide with sulfuric acid and/or an ammonia-hydrogen peroxide mixture (SC1) prepared by mixing of aqueous hydrogen peroxide with aqueous ammonia, wherein: the hydrolyzable silane contains a hydrolyzable silane of the following Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) (wherein R1 is an organic group having a primary amino group, a secondary amino group, or a tertiary amino group and is bonded to a silicon atom via an Si—C bond).

Abstract: The present invention provides a lithium ion secondary battery which is provided with: a nonaqueous electrolyte solution; and a positive electrode and a negative electrode, each of which is capable of absorbing and desorbing lithium. This lithium ion secondary battery is configured such that the nonaqueous electrolyte solution contains (A) an electrolyte, (B) a nonaqueous organic solvent and (C) a compound that is obtained by substituting at least one hydrogen atom, which is bonded to a carbon atom in an aromatic ring of a compound that has at least one aromatic ring and no amino group, by a group that is represented by formula (1); and this lithium ion secondary battery is charged at a voltage within the range of 4.35-5 V for use.

Abstract: An insulating composition containing silica particles, a resin, and a curing agent, wherein: when an aqueous solution of the silica particles having an SiO2 concentration of 3.8% by mass is heated at 121° C. for 20 hours, the amount of Na ions eluted from the silica particles is 40 ppm/SiO2 or less, especially, wherein the amount of Na ions eluted from the silica particles after the heating may be 5-38 ppm/SiO2, and, the silica particles may contain a polyvalent metal oxide so the ratio by mole of a polyvalent metal M to Si is 0.001-0.02; the mass ratio of Na2O/SiO2 in the silica particles may be 700-1,300 ppm; and the silica particles may have, on the surfaces thereof, a layer having a thickness of 0.1-1.5 nm and an Na2O/SiO2 mass ratio of 10-400 ppm, and may have an average particle diameter of 5-40 nm.

Abstract: A saccharification reaction mixture can saccharify at least one of cellulose and hemicellulose and contains at least one of cellulose and hemicellulose, a saccharification enzyme, silica or a silica-containing substance, and at least one compound (A) selected from the group consisting of a polyhydric alcohol compound represented by the following formula (1) or a derivative thereof and an acetylene glycol represented by formula (2) or an alkylene oxide adduct thereof.

Abstract: A radiation dosimetry gel, usable in a polymer gel dosimeter having an improved sensitivity and high safety, includes a gelator, and a compound of the following Formula (1): wherein R1 is a hydrogen atom or a methyl group, m and n are each an integer of 2 to 4, k is 0 or 1, and a plurality of R1s and ms are each the same as or different from one another. Also provided for is a radiation dosimeter including the radiation dosimetry gel as a material for radiation dosimetry.

Abstract: A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses said composition for forming a resist underlayer film. A resist underlayer film-forming composition includes a solvent and a polymer having a unit structure represented by formula (I): (in formula (I), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, a methyl group, or an ethyl group, Q1 represents a divalent organic group, R1 represents a tetravalent organic group including a C6-40 aromatic ring structure, and L1 and L2 each independently represent a hydrogen atom or a C1-10 alkyl group optionally substituted with a hydroxy group and optionally interrupted by an oxygen atom).

Abstract: [Task] There is provided a practical method for producing a lipidic peptide compound, the method enabling to mass-produce the lipidic peptide compound inexpensively with no need of complicated operations. [Solution] There is provided a method to mix a non-polar solvent solution of an ester compound represented by formula (1) with a non-polar organic solvent containing an ?-amino acid compound and a base represented by formula (2) so as to produce a lipidic peptide compound or a pharmacologically acceptable salt thereof represented by formula (3).

Abstract: A resist underlayer film-forming composition that exhibits a high etching resistance, a favorable dry etching rate ratio and optical constant, and can form a film exhibiting a good coatability even to a so-called uneven substrate, providing a small difference in film thickness after embedding, and having planarity and a superior hardness; a resist underlayer film formed from the resist underlayer film-forming composition; and a method of producing a semiconductor device.

Abstract: An object of the present invention is to provide a novel method for forming a carbonaceous structure comprising minute carbon bodies such as CNTs. A method for forming a carbonaceous structure on the surface of a substrate, comprising a step of forming a layered structure by at least partially filling a gap between a porous membrane which can hold a dispersion medium and a substrate with a minute-carbon-body dispersion liquid comprising the minute carbon bodies and the dispersion medium, and a step of removing the dispersion medium by at least partially taking the dispersion medium out of the layered structure through the porous membrane and/or the substrate.

Abstract: The invention provides a method for producing a polymer used as a base film for cell culture which comprises (i) preparing a mixture containing (a) a monomer of formula (I): wherein Ua1 and Ua2 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, Ra1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and Ra2 represents a linear or branched alkylene group having 1 to 5 carbon atoms, (b) a radical polymerization initiator, and (c) an organic solvent, and (ii) preparing a polymer by raising a temperature of the mixture under stirring to polymerize the monomer. The invention also provides methods of producing a base film for cell culture and a cell culture container.

Abstract: A condensed heterocyclic compound has a sepiapterin reductase inhibitory action and is particularly useful for treatment of a pain. The condensed heterocyclic compound represented by Formula (I) below (R1 represents a hydrocarbon group or the like; R2 and R3 represent a hydrogen atom or the like; R4, X, and Y represent defined substituents), a tautomer or a pharmaceutically acceptable salt of the compound, or a solvate of any of these.

Abstract: A chemical fluid for underground injection includes an inorganic substance, an antioxidant (e.g. ascorbic acid, gluconic acid, or a salt thereof, or ?-acetyl-?-butyrolactone, or bisulfite, or disulfite), and water. The inorganic substance may be a colloidal particle or a powder. The inorganic substance may be present in the chemical fluid in amounts of 0.001% by mass to 50% by mass based on the total mass of the chemical fluid for underground injection. The antioxidant may be present in the chemical fluid at a ratio of 0.0001 to 2 of the mass of the antioxidant to the mass of the inorganic substance. A surface of the inorganic substance may be coated with a silane compound. The chemical fluid may further include an anionic surfactant, a cationic surfactant, an amphoteric surfactant, a nonionic surfactant, or a mixture thereof.