Abstract: The invention provides a single-stranded oligonucleotide represented by the formula (I), wherein X and Y hybridize by a first nucleotide sequence portion and a second nucleotide sequence portion. X is composed of 7 to 100 nucleotides, contains at least one modified-nucleotide, and has a first nucleotide sequence capable of hybridizing with a second oligonucleotide. Y is composed of 4 to 100 nucleotides, enables hybridization with the above-mentioned first oligonucleotide, and has a second nucleotide sequence containing at least one ribonucleotide. At least one of the nucleotide sequences X, Xz and Y has an antisense sequence capable of hybridizing with a target RNA. At least one of L, Lx and Ly is a linking group that contains a non-nucleotide structure.

Abstract: An adhesive composition for use in debonding with light irradiation, which composition can achieve debonding through irradiation with light, characterized in that the adhesive composition contains an adhesive component (S) and a light-absorbing organic compound (X); and the light-absorbing organic compound (X) contains, in the molecule thereof, one or more aromatic rings, one or more rings each containing a heteroatom forming the ring, and one or more groups selected from among a carbonyl group and a thiocarbonyl group.

Abstract: An inorganic oxide particles which have a minute particle diameter at which no interference fringes occur in a coating film and high transparency can be secured even when applied to a high refractive index substrate, and in which excitation by ultraviolet radiation is almost completely suppressed, a coating composition containing such particles, and an optical member having a cured film formed from the coating composition. Inorganic oxide particles obtained by bonding an organosilicon compound having a nitrogen-containing heterocyclic group to the surface of modified metal oxide colloid particles (C) having an average particle diameter of 2 to 100 nm, which include metal oxide colloid particles (A) having an average primary particle diameter of 2 to 60 nm as nuclei and with the nuclei surface coated with a coating composed of inorganic oxide colloid particles (B) having an average primary particle diameter of 1 to 4 nm.

Abstract: A resist underlayer film-forming composition capable of reducing occurrence of defects caused by microparticles or the like that may be generated during formation of a coating film. A silicon-containing resist underlayer film-forming composition including: [A]a polysiloxane; [B] a glycol compound having a normal boiling point of 230.0° C. or higher and being of the following Formula (1): (wherein R1 and R2 are each independently a hydrogen atom, a C1-4 alkyl group, or a C3-4 acyl group; and n is an integer of 3 or more); and [C] a solvent (except for a compound corresponding to the compound [B]).

Abstract: A method for producing a lipid peptide compound represented by formula (3) or a pharmaceutically usable salt thereof, the method comprising: a reaction step of reacting an ester compound of the following Formula (1) with an ?-amino acid compound of the following Formula (2) and a base in a solvent containing a non-polar organic solvent; an extraction step of adding an organic acid to a solution containing a salt of a lipidic peptide prepared through the reaction step and being of the following Formula (3) to thereby neutralize the solution, adding water and an alcohol to the neutralized solution, and subjecting the resultant mixture to phase separation, thereby removing the non-polar organic solvent; and a separation step of removing the lipidic peptide compound of Formula (3) from the solution prepared through the extraction step to the outside of the system.

Abstract: Provided is a method capable of easily producing a layered silicate in a short time. The problem may be solved by a method of producing a layered silicate, including the following steps (a) and (b): (a) providing a cage silicate that contains an anion component represented by formula (1) below and a cation component represented by formula (2) below with a ratio of the mole number of water to the mole number of the anion component in terms of SiO2, (H2O/SiO2), of 0.7 to 30; (in formula (2), R represents an alkyl group having 2 to 9 carbon atoms) and (b) treating the cage silicate obtained in step (a) in an autoclave.

Abstract: An object is to provide a cage silicate that can be industrially safely and simply produced by using an alkali silicate solution that does not generate alcohol as a Si raw material and using non-toxic quaternary ammonium, and a method for producing the same. The problem is solved by the following cage silicate: A cage silicate consisting of anion component 1 represented by following formula (1), anion component 2 which is a mineral acid ion, cation component 1 represented by following formula (2), and cation component 2 which is an alkali ion, in which, to the mole number in terms of SiO2, a ratio of the mole number of water, (H2O/SiO2), is 0.7 to 30, a ratio of the mole number of alkali ions, (alkali ions/SiO2), is 1.0×10?7 to 1.0×10?2, and a ratio of the mole number of the mineral acid ions, (mineral acid ions/SiO2), is 1.0×10?7 to 1.0×10?3. In formula (2), R represents an alkyl group having 2 to 20 carbon atoms.

Abstract: A method for producing a silica sol containing a small amount of metal impurities and in which colloidal silica having an elongated particle shape dispersed in a solvent, includes: preparing a raw material liquid by adding a compound as an anion source selected from inorganic acids, organic acids, and their ammonium salts, and ammonia to a colloidal aqueous solution of activated silica having an SiO2 concentration of 1 to 6% by mass and a pH of 2 to 5 so that the mass ratio of the compound to SiO2 is 3.0 to 7.0%; and heating the raw material liquid at 80 to 200° C. for 0.5 to 20 hours. The elongated colloidal silica particles exhibit a DL/DB ratio of 2.5 or more. DL is an average particle diameter as measured by the dynamic light scattering method. DB is a primary particle diameter as measured by the nitrogen gas adsorption method.

Abstract: The present invention provides a polarization-independent terahertz wave control element, and provides a method for manufacturing a polarization-independent terahertz wave control element.

Abstract: A polishing composition used in wafer polishing process for eliminating protrusion around laser mark, thereby achieving a flat polished surface, as well as a wafer polishing method using the polishing composition. A post-polishing composition for elimination of a laser mark remaining after polishing of silicon wafer with a primary polishing composition containing silica particles, water, and a basic compound, the post-polishing composition including silica particles, water, a tetraalkylammonium ion, and a water-soluble polymer, wherein the mass ratio of the tetraalkylammonium ion to SiO2 of the silica particles is 0.200 to 1.000:1; the mass ratio of SiO2 dissolved in the polishing composition to SiO2 of the silica particles is 0.100 to 1.500:1; and the mass ratio of the water-soluble polymer to SiO2 of the silica particles is 0.005 to 0.05:1. The silica particles have an average primary particle diameter of 1 nm to 100 nm.

Abstract: An acetal-protected polysiloxane composition, used as a photosensitive composition and a coating composition for forming a flat film on a substrate to be processed for performing pattern reversal. A coating composition or photosensitive composition including: a polysiloxane obtained from a hydrolysis-condensation product of a hydrolyzable silane having 2 to 4 hydrolyzable groups in a molecule by protecting the condensation product's silanol groups with acetal groups, wherein in the hydrolysis-condensation product, an organic group bonded to silicon atoms through Si—C bonds exists in molar ratio of 0?(organic group)/(Si)?0.29 on average.

Abstract: A polishing composition eliminating protrusions around a laser mark in wafer polishing processes, the manufacturing method therefor and a polishing method using the composition. The polishing composition including silica particles and water, wherein: the composition includes a tetraalkylammonium ion such that the mass ratio of the ion to SiO2 of the silica particles is 0.400 to 1.500:1, and the mass ratio of SiO2 dissolved in the polishing composition to SiO2 is 0.100 to 1.500:1; the tetraalkylammonium ion is derived from a compound selected from the group made of an alkali silicate, a hydroxide, a carbonate, a sulfate, and a halide while the ion is contained in the polishing composition in 0.2% by mass to 8.0% by mass; and the dissolved SiO2 is derived from a tetraalkylammonium silicate, a potassium silicate, a sodium silicate, or a mixture of any of these.

Abstract: A gel dosimeter for radiation dosimetry includes a radically polymerizable monomer, a gelator, glucose, and glucose oxidase. Although a conventional polymer gel dosimeter contains a deoxygenating agent such as tetrakis(hydroxymethyl)phosphonium chloride, such a deoxygenating agent fails to exhibit sufficient effects. Thus, a more effective deoxygenation treatment technique has been required for a gel dosimeter.

Abstract: The present invention provides a composition containing an electron-donating polymer (D) and an electron-withdrawing polymer (A), wherein the electron-donating polymer (D) has a constitutional unit represented by the following formula (1a), Y1a in the following formula (1a) is a divalent group represented by the following formula (3a), and the electron-withdrawing polymer (A) has a constitutional unit represented by the following formula (4a): wherein the symbols in the formulas are as described in the DESCRIPTION.

Abstract: A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate, the composition containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains an alkylene glycol dialkyl ether and a lactam compound represented by formula (1). (in formula (1), R101 represents a C1 to C6 alkyl group, and R102 represents a C1 to C6 alkylene group.

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent. In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

Abstract: A resist underlayer film-forming composition: in which self-curing is performed at a low temperature without an acid catalyst or a crosslinking agent, the amount of a sublimate can be reduced, and a high-hardness film having high bending resistance; suitable as a crosslinking agent; exhibits higher flattening and heat resistance when used as a crosslinking agent; has embedding properties equivalent to conventional products; and has an optical constant or etching resistance freely changeable according to monomer selection. The composition contains a solvent and a polymer (X) containing a repeating structural unit which is obtained by alternately bonding, via a linking group —O—, an aromatic compound A having an ROCH2— group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) to an aromatic compound B having at most 120 carbon atoms and different from A, and in which one to six B's are bonded to one A.

Abstract: There is provided a laminate including: a support substrate; a semiconductor substrate having a bump on a side of the support substrate; an inorganic material layer interposed between the support substrate and the semiconductor substrate and in contact with the semiconductor substrate; and an adhesive layer interposed between the support substrate and the inorganic material layer and in contact with the support substrate and the inorganic material layer, in which the laminate is used for an application in which the support substrate and the semiconductor substrate are separated from each other after processing of the semiconductor substrate in the laminate, and an adhesive force between the inorganic material layer and the adhesive layer when the support substrate and the semiconductor substrate are separated from each other is smaller than an adhesive force between the inorganic material layer and the semiconductor substrate.

Abstract: A composition forms a resist underlayer film that enables formation of a desired resist pattern; and a method produces a resist pattern and a method produces a semiconductor device, which each use the resist underlayer film-forming composition. This resist underlayer film-forming composition contains a reaction product obtained from: a compound (A) that is dissolved in a solvent and that is represented by formula (1) (in formula (1), A represents an organic group including an aliphatic ring, an aromatic ring, or a heterocyclic ring); a compound (B) having two functional groups that are reactive with respect to an epoxy group; and a compound (C) having one functional group that is reactive with respect to an epoxy group.

Abstract: The invention provides a method for producing a polymer used as a base film for cell culture which comprises (i) preparing a mixture containing (a) a monomer of formula (I): wherein Ua1 and Ua2 each independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, Ra1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and Ra2 represents a linear or branched alkylene group having 1 to 5 carbon atoms, (b) a radical polymerization initiator, and (c) an organic solvent, and (ii) preparing a polymer by raising a temperature of the mixture under stirring to polymerize the monomer. The invention also provides methods of producing a base film for cell culture and a cell culture container.