Abstract: The objective of the present invention is to provide a DNA aptamer that can specifically binding to a molecular targeted medicine, a composition comprising the DNA aptamer, and a method for detecting a molecular targeted medicine using the DNA aptamer. A DNA aptamer comprising specifically binding to a molecular targeted medicine, a composition for detecting a molecular targeted medicine comprising the DNA aptamer, a kid for detecting a molecular targeted medicine, and a method for detecting a molecular targeted medicine comprising using the DNA aptamer.

Abstract: There are provided a hydrogel having a highly strengthened self-supporting property, which can be prepared by simply mixing at room temperature, and a method for producing the hydrogel. A hydrogel-formable composition capable of forming a hydrogel having a self-supporting property characterized by comprising: a water-soluble organic polymer having an organic acid structure, an organic acid salt structure, or an organic acid anion structure; a silicate; a compound having a diphosphonic acid structure of Formula (I): wherein R1 and R2 each are independently specific substituents, X1 and X2 each are independently a single bond or a linking group, and n is an integer of 1 to 5; or a salt thereof; and a compound having or generating a positive charge of divalent or more, a hydrogel which is formed from the composition, and a method for producing the hydrogel.

Abstract: Described herein are non-aqueous ink compositions containing a sulfonated conjugated polymer, a polymeric acid, an optional matrix compound, and an amine compound. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.

Abstract: A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 ?m is 50% or more.

Abstract: A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent, wherein each of R1 to R4 is independently hydrogen atom or methyl group, and X1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X1 in Formula (1) is organic group of Formula (2), wherein A1 is phenylene group or naphthylene group, A2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and wherein each of A3 and A4 is independently phenylene group or naphthylene group, and dotted line is bond.

Abstract: Described herein are non-aqueous ink compositions containing a polythiophene having a repeating unit complying with formula (I) described herein, one or more metallic nanoparticles, and a liquid carrier having one or more organic solvents. The present disclosure also concerns the uses of such non-aqueous ink compositions, for example, in organic electronic devices.

Abstract: A liquid crystal display device, containing: a pair of substrates provided with an electrode and a liquid crystal layer formed by disposing a liquid crystal composition between the pair of substrates and by irradiating and curing the liquid crystal composition with ultraviolet rays using an ultraviolet irradiation apparatus, wherein at least one of the substrates is further provided with a liquid crystal alignment film to vertically align a liquid crystal, the liquid crystal composition contains a liquid crystal, a curable resin, a bifunctional monomer and a monomer having at least one polar group of a hydroxy group, a carboxy group or a phosphoric acid group, and the liquid crystal alignment film is a liquid crystal alignment film obtained from a liquid crystal aligning agent containing a polymer having a specific side chain structure.

Abstract: A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

Abstract: A resist underlayer film forming composition for lithography for a resist underlayer film usable as a hardmask. A resist underlayer film forming composition for lithography, including: as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1) or a hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2), and a content of the hydrolyzable silane of Formula (1) or the hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2) in all silanes is less than 50% by mole, R1aR2bSi(R3)4?(a+b)??Formula (1) R4a1R5b1Si(R6)4?(a1+b1)??Formula (2).

Abstract: The present invention provides a method of isolating cells or tissues from a culture preparation of the cells or tissues in a medium composition which enables culture of the cells or tissues in suspension, which comprises at least one step selected from the group consisting of the following (A), (B) and (C): (A) passing the culture preparation through a filter having fine pores having a pore diameter of 5-500 ?m, (B) adding a chelator to the culture preparation, and (C) diluting the culture preparation with a physiological aqueous solution.

Abstract: Provided is an agent for dispersing an electrically conductive carbon material, in which the agent consists of a polymer which has an oxazoline group in a side chain and which is obtained by using an oxazoline group-containing monomer such as that represented by formula (1) for example, and in which the agent exhibits excellent dispersion of an electrically conductive carbon material and produces a thin film that exhibits excellent adhesion to a current collection substrate when formed into a thin film together with the electrically conductive carbon material. (In the formula, X denotes a polymerizable carbon-carbon double bond-containing group, and R1-R4 each independently denote a hydrogen atom, a halogen atom, an alkyl group optionally having a branched structure having 1-5 carbon atoms, an aryl group having 6-20 carbon atoms, or an aralkyl group having 7-20 carbon atoms.

Abstract: A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent wherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.

Abstract: To provide a liquid crystal aligning agent to obtain a liquid crystal alignment film which has favorable seal adhesion and a favorable residual image property, and which is excellent in removability of a decomposed product formed after irradiation with ultraviolet rays. A liquid crystal aligning agent containing at least one polymer selected from the group consisting of a polyimide precursor having structural units represented by the formula (1) and structural units represented by the formula (2) and an imidized polymer of the polyimide precursor: wherein X1 and X2 are a tetravalent organic group, Y1 and Y2 are a bivalent organic group, and R1 and R2 are a hydrogen atom or a C1-5 alkyl group.

Abstract: Provided is a fluorine atom-containing compound represented by formula (1) below (In the formula, Z represents a predetermined divalent group, each Ar independently represents a predetermined aromatic ring-containing group, and each ArF independently represents a predetermined fluorine atom-containing aryl group).

Abstract: A photosensor element that is capable of achieving a good balance between high photoelectric conversion efficiency and low dark current is able to be obtained by using a composition for forming a hole collecting layer of a photosensor element, which contains an organic solvent and a charge-transporting material that is composed, for example, of an aniline derivative or thiophene derivative represented by one of formulae (AA)-(DD) and having a molecular weight of 200-2,000.

Abstract: A novel imprint material and film produced from the material, on which a pattern is transferred. An imprint material having: a component (A); a component (B); a component (C); and a component (D), wherein, (A): a compound of Formula (1), Formula (2), or Formula (3): wherein, X is C1-5 linear alkylene, R1 is H or CH3; each of R2, R3, and R4 is independently H, CH3, or C2H5; and the sum of the number of carbon atoms on R2, R3, and R4 is 0 to 2; (B): a silsesquioxane compound having a repeating unit of Formula (4), and having two or more polymerizable groups of Y; (C): a silicone compound having a repeating unit of Formula (5), and having two polymerizable groups on its ends: wherein, each of R6 and R7 is independently C1-3 alkyl; R5 is C1-3 alkylene; and k is 0 to 3; and (D): photopolymerization initiator.

Abstract: A dispersion that inorganic oxide microparticles may be dispersed at a high concentration in a solvent, a composition for film formation having high transparency, high refractive index and adhesion to a base layer. Inorganic oxide microparticles wherein an amphiphilic organosilicon compound having one or more selected from a polyoxyethylene group, a polyoxypropylene group, or a polyoxybutylene group as a hydrophilic group, and one or more selected from a C1-18 alkylene group or a vinylene group as a hydrophobic group bonded to a surface of modified metal oxide colloidal particles (C) having a primary particle diameter of 2 to 100 nm, the modified metal oxide colloidal particles wherein a surface of metal oxide colloidal particles (A) having a primary particle diameter of 2 to 60 nm as a nucleus is coated with a coating material (B) including metal oxide colloidal particles having a primary particle diameter of 1 to 4 nm.

Abstract: Materials having charge-storing properties and made variously of dipyridine-fused benzoquinones of formula (1) below or derivatives thereof, dipyridine-fused benzoquinones of formula (4) below or derivatives thereof, or dipyridine-fused benzoquinone skeleton-containing polymers are provided. In the formulas, Ar1 and Ar2 are each independently a pyridine ring that forms together with two carbon atoms on a benzoquinone skeleton, or a derivative thereof. When used as electrode active materials, these charge storage materials are capable of providing high-performance batteries possessing a high capacity, high rate characteristics and high cycle characteristics.

Abstract: The present invention provides a novel insecticidal, miticidal, nematicidal, microbicidal, or bactericidal composition and a novel pest control method. An insecticide, miticide, nematicide, molluscicide, disinfectant, or bactericide composition containing one or two substances selected from 4-[5-(3,5-dichlorophenyl)-4,5-dihydro-5-(trifluoromethyl)isoxazole-3-yl]-2-methyl-N-[2-oxo-2-[(2,2,2-trifluoroethyl)amino]ethyl]benzamide or (Z)-4-[5-(3,5-dichlorophenyl)-5-trifluoromethyl-4,5-dihydroisoxazole-3-yl]-N-(methoxyiminomethyl)-2-methylbenzamide, and one or more substances selected from known insecticide, miticide, nematicide, molluscicide, disinfectant, or bactericide compounds.

Abstract: There is provided a composition for forming a novel resist underlayer film that has a high dry etching rate, functions as an anti-reflective coating during exposure, and fills a recess having a narrow space and a high aspect ratio. A composition for forming a resist underlayer film comprising a copolymer having a structural unit of the following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent. (wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group.