Abstract: A culture method (a preservation method) of somatic stem cells does not use a chemical such as DMSO that affects a differentiation function of somatic stem cells. A material for an undifferentiated state-maintaining culture for a somatic stem cell, having a naturally occurring polysaccharide; a culture liquid in which the material for the undifferentiated state-maintaining culture is dispersed; a somatic stem cell-containing culture liquid in which the somatic stem cell is suspended in the culture liquid; and a culture method for mesenchymal stem cells in which a naturally occurring polysaccharide is used.

Abstract: A polymerizable composition that is suitable to produce a molded product that can suppress cracking and dimensional change caused by a high-temperature heat history with a high refractive index of a cured product maintained. A polymerizable composition including (a) 100 parts by mass of the specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of the specific fluorene compound, a cured product obtained by the polymerizable composition and a material for a high-refractive index resin lens including the polymerizable composition.

Abstract: A curable composition for coating comprising: (a) a fluorine-containing highly branched polymer obtained by polymerization of a monomer A having two or more radical polymerizable double bonds in a molecule of the monomer A and a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in a molecule of the monomer B, in the presence of a polymerization initiator C at an amount of 5% by mole to 200% by mole per the number of moles of the monomer A, (b) at least one surface modifier selected from the group consisting of a perfluoropolyether compound and a silicone compound, (c) an active energy ray-curable polyfunctional monomer, and (d) a polymerization initiator that generates radicals by irradiation with an active energy ray; a cured film obtained from the composition; and a hard coating film obtained by use of the composition.

Abstract: Provided is a varnish for the formation of a charge-transporting thin film, said varnish including an organic solvent, a charge-transporting substance, and a 2,2,6,6-tetraalkylpiperidine-N-oxyl derivative represented by formula (T1) (in the formula, each RA independently represents a C1-20 alkyl group, and RB represents a hydrogen atom, a hydroxy group, an amino group, a carboxyl group, a cyano group, an oxo group, an isocyanato group, a C1-20 alkoxy group, a C2-20 alkylcarbonyloxy group, a C7-20 arylcarbonyloxy group, a C2-20 alkylcarbonylamino group or a C7-20 arylcarbonylamino group).

Abstract: A coating-forming composition for an electrical steel sheet that maintains excellent insulating properties, corrosion resistance, adhesion, and the like required in a coating for an electrical steel sheet, and exhibits excellent viscosity stability, with an increase in viscosity over time being kept gradual. A coating-forming composition for an electrical steel sheet comprises colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.

Abstract: A resist underlayer film-forming composition for lithography capable of being dry-etched during pattern transfer from the upper layer or during substrate processing and capable of being removed with an alkaline aqueous solution after the substrate processing. A resist underlayer film-forming composition for lithography includes a polymer (A) including a unit structure of Formula (1) and a unit structure of Formula (2); a crosslinkable compound (B) having at least two groups selected from blocked isocyanate groups, methylol group, or C1-5 alkoxy methyl groups; and a solvent (C), characterized in that the polymer (A) is a polymer in which the unit structure of Formula (1) and the unit structure of Formula (2) are copolymerized in a mol % ratio of the unit structure of Formula (1):the unit structure of Formula (2)=25 to 60:75 to 40.

Abstract: A coating film-forming composition includes a hydrolysis-condensation product of a hydrolyzable silane and fine inorganic particles subjected to a special dispersion treatment, that can be formed into a highly heat-resistant, highly transparent coating film capable of exhibiting a high refractive index and having a large thickness and excellent storage stability as a coating composition; and a process for producing the coating film-forming composition.

Abstract: An electron beam resist underlayer film-forming composition includes a polymer containing a unit structure having a lactone ring and a unit structure having a hydroxy group. The polymer may be a polymer obtained by copolymerizing a monomer mixture containing a lactone (meth)acrylate, a hydroxyalkyl (meth)acrylate, and phenyl (meth)acrylate or benzyl (meth)acrylate. A method for producing a semiconductor device including: applying the electron beam resist underlayer film-forming composition onto a substrate and heating the applied composition to form an electron beam resist underlayer film; coating the electron beam resist underlayer film with an electron beam resist; irradiating the substrate coated with the electron beam resist underlayer film and the electron beam resist with an electron beam; developing the substrate; and transferring an image onto the substrate by dry etching to form an integrated circuit element.

Abstract: There is provided a composition for forming an underlayer film used for an underlayer of a self-organizing film. An underlayer film-forming composition of a self-organizing film, the underlayer film-forming composition including a polymer made of a unit structure derived from an optionally substituted styrene and a unit structure derived from a crosslink forming group-containing compound, the polymer containing 60 mol % to 95 mol % of the unit structure derived from the styrene and 5 mol % to 40 mol % of the unit structure derived from the crosslink forming group-containing compound relative to the whole unit structures of the polymer. The crosslink forming group is a hydroxy group, an epoxy group, a protected hydroxy group, or a protected carboxy group. The crosslink forming group-containing compound is hydroxyethyl methacrylate, hydroxyethyl acrylate, hydroxypropyl methacrylate, hydroxypropyl acrylate, hydroxystyrene, acrylic acid, methacrylic acid, glycidyl methacrylate, or glycidyl acrylate.

Abstract: Provided is a composition for forming a protective film for a transparent conductive film, said composition comprising a triazine ring-containing hyperbranched polymer comprising a repeating unit structure represented by formula (1) and a crosslinking agent having a molecular weight of 1,000 or greater. In formula (1): R and R? independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group; and Ar represents a definite aromatic ring-containing group.

Abstract: A method for producing an optical waveguide composing an optical path conversion component having an extremely low signal loss, allowing a high surface packaging density and high speed operation, and allowing high productivity. A method for producing an optical waveguide that propagates light from a surface of a support to an oblique direction not vertical to the surface, the method for producing an optical waveguide comprising the steps of: (1) providing an anti-reflective coating on the support; (2) placing a photosensitive resin composition on the anti-reflective coating, and exposing the photosensitive resin composition to a light ray entering from a direction non-vertical to the surface of the support through a photomask for curing the composition; and (3) removing the unexposed photosensitive resin composition by development; and an optical waveguide obtained by the method.

Abstract: An optical waveguide-forming composition: 100 parts by mass of a reactive silicone compound (a) composed of a polycondensate of a diarylsilicic acid compound A of Formula [1] Ar1 and Ar2 are a phenyl, naphthyl or a biphenyl group optionally substituted, and an alkoxy silicon compound B of Formula [2] Ar3—Si(OR1)aR23-a??[2]. Ar3 is a phenyl, naphthyl or biphenyl group having at least one group having a polymerizable double bond, R1 is methyl or ethyl group, R2 is methyl, ethyl, or vinylphenyl group, and a is 2 or 3, and 1 part by mass to 200 parts by mass of a di(meth)acrylate compound (b) of Formula [3]. R3 and R4 are a hydrogen atom or methyl group, R5 is a hydrogen atom, methyl group, or ethyl group, L1 and L2 are an alkylene group, and m and n are 0 or a positive integer, wherein m+n is 0 to 20.

Abstract: There is provided a film-forming composition for forming a film that covers a substrate and exhibits good electrical insulation properties, heat resistance, and solvent resistance after heating at a low temperature. A film-forming composition including a polymer (A) containing a unit structure of Formula (1): (wherein T1 is an arylene group or a combination of an arylene group with T0, T0 is an alkylene group, a fluorinated alkylene group, a carbonyl group, a sulfonyl group, or a combination thereof, R1 is a carboxyl group, an amino group, or an imino group, and n1 is an integer of 1 to 6), and a compound (B) having at least two isocyanate groups or blocked isocyanate groups.

Abstract: A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin. The method is applied to a light extraction layer of an LED or a low-reflective glass of a solar cell.

Abstract: A composition for producing a fiber, containing (A) a polymer compound containing a unit structure represented by the formula (1) and a unit structure represented by the formula (2), (B) a crosslinking agent, (C) an acid compound, and (D) a solvent wherein each symbol in the formulas (1) and (2) is as described in the DESCRIPTION.

Abstract: A liquid crystal display device, whereby transparency when no voltage is applied and scattering properties when a voltage is applied, are good, adhesion between a liquid crystal layer and a vertical liquid crystal alignment film is high, and its lifespan is long even in a severe environment. The liquid crystal display device has a liquid crystal layer formed by disposing a liquid crystal composition containing a liquid crystal and a polymerizable compound between a pair of substrates provided with electrodes, and irradiating and curing the composition with ultraviolet rays by an ultraviolet irradiation apparatus, and at least one substrate is provided with a liquid crystal alignment film to vertically align a liquid crystal, wherein the ultraviolet irradiation apparatus is an ultraviolet irradiation apparatus capable of controlling the irradiation light intensity and wavelength of the ultraviolet rays to be irradiated and the surface temperature of the pair of the substrates.

Abstract: A silica sol which has excellent moisture absorption resistance and stability as well as high purity and which does not cause coloring of a solvent or a resin to which the silica sol has been applied. The silica sol contains high-purity silica particles, water and/or a liquid organic medium serving as a dispersion medium, and an organic base compound, the silica particles being dispersed in the dispersion medium, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m2/g; (b) the silica particles have a moisture absorption amount per specific surface area thereof of 0.5 mg/m2 or less; and (c) the organic base compound is not substantially contained in the inside thereof.

Abstract: There is provided a composition that a resist pattern having a reduced LWR representing variations in line width of the resist pattern, compared to conventional resist patterns, can be formed. A resist underlayer film-forming composition for lithography comprising a polymer, 0.1 to 30 parts by mass of a compound having an amino group protected with a tert-butoxycarbonyl group and an unprotected carboxyl group, or a hydrate of the compound, relative to 100 parts by mass of the polymer, and a solvent.

Abstract: A nonlinear optically active copolymer having satisfactory orientation characteristics and able to allow for reduction in heat-induced orientation relaxation of a nonlinear optical material, and a nonlinear optical material obtained using the copolymer. The copolymer including at least a repeating unit A having adamantyl group and a repeating unit B having a nonlinear optically active moiety in one molecule, and an organic nonlinear optical material including the copolymer as a component.

Abstract: To provide a novel pesticidal composition, particularly a composition for a fungicide. A fungicidal or bactericidal composition comprising one or more compounds selected from oxime-substituted amide compounds represented by the formula (I), or their N-oxides or salts, and one or more compounds selected from known fungicidal or bactericidal compounds: wherein G1 represents a structure of G1-1, G1-27, etc., G2 represents a structure of G2-2, etc., W represents an oxygen atom, etc., X1 represents difluoromethyl, trifluoromethyl, etc., X2, X3, X4 and X5 each independently represents a hydrogen atom, etc., Y1 represents a halogen atom, etc., Y2 represents a hydrogen atom, a halogen atom, etc., Y3 represents a halogen atom, trifluoromethyl, C2-C6 alkynyl, etc., Y4 represents a hydrogen atom, etc., R1 represents C1-C6 alkyl, C1-C4 haloalkyl, etc., R2 and R3 each independently represents a hydrogen atom, methyl, etc., R4 represents a hydrogen atom, etc., and R5 represents methyl, etc.