Patents Assigned to Particle Measuring Systems, Inc.
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Patent number: 8174697Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: GrantFiled: September 26, 2011Date of Patent: May 8, 2012Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Jon Sandberg, Karen R. Sandberg, legal representative, Dwight A. Sehler
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Patent number: 8154724Abstract: The present invention provides methods and systems for particle detection and analysis using two-dimensional optical imaging to access enhanced detection sensitivity and expanded sensing functionality relative to conventional point and array detection-based optical particle counters. Methods and systems of the present invention provide a two-dimensional optical imaging-based particle sensing platform wherein system components and specifications are selected to generate reproducible and readily identifiable signals, including particle detection signatures, from optical scattering or emission from particles provided to the system. Systems and methods of the present invention are capable of accurately and sensitively detecting, identifying, and characterizing (e.g., determining the size of) particles in liquid phase or gas phase samples.Type: GrantFiled: December 2, 2008Date of Patent: April 10, 2012Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Dwight A. Sehler, Michael Williamson, David Rice, Jon Sandberg, Karen R. Sandberg, legal representative
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Publication number: 20120012757Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: ApplicationFiled: September 26, 2011Publication date: January 19, 2012Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: John MITCHELL, Jon SANDBERG, Karen R. Sandberg, Dwight A. Sehler
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Patent number: 8027035Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: GrantFiled: March 8, 2011Date of Patent: September 27, 2011Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Jon Sandberg, Karen R. Sandberg, Legal Representative, Dwight A. Sehler
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Patent number: 7985949Abstract: Methods and systems are provided for detecting analytes in a gas phase sample. An ion mobility spectrometer is provided for detecting analytes having an excess amount of dopant in its separation region. In an embodiment, the dopant is added directly to the separation region, such as with a drift gas or by diffusion, thereby providing excess dopant that dominates subsequent cluster formation and maintenance. Excess dopant in the separation region minimizes or reduces interfering signals associated with unwanted substances, such as water vapor, that are introduced to the IMS. In an aspect, the invention provides IMS systems and methods having increased sensitivity and reliability for analyte detection.Type: GrantFiled: July 30, 2008Date of Patent: July 26, 2011Assignee: Particle Measuring Systems, Inc.Inventor: Dan Rodier
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Patent number: 7973929Abstract: Described herein is a portable, low power consuming optical particle counter calibration verification system and reliable and sensitive methods for verifying the calibration status of a gas or liquid particle counter. The calibration verification systems described herein are useful for quickly determining the calibration status of an optical particle counter at its point of use, as well as for allowing the end user to determine if an optical particle counter is in need of a recalibration before the recommended calibration schedule suggests.Type: GrantFiled: November 14, 2008Date of Patent: July 5, 2011Assignee: Particle Measuring Systems, Inc.Inventor: Thomas Bates
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Publication number: 20110155927Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: ApplicationFiled: March 8, 2011Publication date: June 30, 2011Applicant: Particle Measuring Systems, Inc.Inventors: John MITCHELL, Jon Sandberg, Dwight A. Sehler, Karen R. Sandberg
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Patent number: 7916293Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: GrantFiled: December 2, 2008Date of Patent: March 29, 2011Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Jon Sandberg, Karen R. Sandberg, legal representative, Dwight A. Sehler
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Patent number: 7796255Abstract: The invention relates to particle sensors that are capable of passively cooling high-powered optical sources within the sensor, thereby extending the optical source lifetime without requiring additional power. The sensor detects particles within a sample fluid by optical interaction of the optical source with flowing sample fluid in the sample chamber. Sample fluid that exits the sample chamber is directed into thermal contact with the optical source, thereby cooling the optical source. Sample fluid that has come into thermal contact with the optical source is continuously removed from the sensor to ensure the optical source is adequately cooled. A variety of elements are used to facilitate thermal contact between the optical source and sample fluid including plenums, heat sinks, and airflow cavities. Provided are related methods for cooling a one or more heat-producing device within a particle sensor.Type: GrantFiled: March 21, 2008Date of Patent: September 14, 2010Assignee: Particle Measuring Systems, Inc.Inventor: Rick Miller
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Patent number: 7667839Abstract: A particle sensor for optically detecting an unconstrained particle suspended in a flowing gas includes a sample chamber having a gas inlet and a gas outlet; a gas flow system for flowing said gas from said gas inlet through said sample chamber to said gas outlet, a source of light; an optical system directing said light through said sample chamber, an optical collection system located to collect light scattered by said particles in the gas, and a detection system located to detect the collected light. The total pressure drop through said gas flow system is 3 inches of water or less. The gas flow system includes an axial fan, which may be a high static pressure fan or a counter-rotating fan. In a 1.0 CFM system, the gas inlet nozzle has an area of 25 square millimeters or more.Type: GrantFiled: March 30, 2006Date of Patent: February 23, 2010Assignee: Particle Measuring Systems, Inc.Inventor: Thomas Bates
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Publication number: 20090268202Abstract: A liquid particle counter for optically detecting an unconstrained particle suspended in a flowing liquid includes a sample chamber having a liquid inlet and a liquid outlet; a laser diode module producing a symmetrically collimated laser beam; a beam shaping optical system directing the laser beam at the sample chamber; and an optical detector located to detect light scattered by the particle in the sample chamber, the detector producing an electric signal characteristic of a parameter of the particle. The laser beam has an energy of a watt or more and passed through an aperture in a black glass aperture element in the sample chamber. The black glass aperture element removes diffracted and stray light from the beam without damage to the sample chamber.Type: ApplicationFiled: July 7, 2009Publication date: October 29, 2009Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventor: Gregg A. Wagner
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Patent number: 7576857Abstract: A liquid particle counter for optically detecting an unconstrained particle suspended in a flowing liquid includes a sample chamber having a liquid inlet and a liquid outlet; a laser diode module producing a symmetrically collimated laser beam; a beam shaping optical system directing the laser beam at the sample chamber; and an optical detector located to detect light scattered by the particle in the sample chamber, the detector producing an electric signal characteristic of a parameter of the particle. The laser beam has an energy of a watt or more and passed through an aperture in a black glass aperture element in the sample chamber. The black glass aperture element removes diffracted and stray light from the beam without damage to the sample chamber.Type: GrantFiled: August 20, 2004Date of Patent: August 18, 2009Assignee: Particle Measuring Systems, Inc.Inventor: Gregg A. Wagner
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Publication number: 20090190128Abstract: A particle counter for optically detecting an unconstrained particle of less than one micron in size suspended in a flowing liquid includes a sample chamber having a fluid inlet and a fluid outlet; a laser module producing a laser beam; a beam shaping optical system providing a multiple laser beam pattern in the sample chamber; and a CMOS optical detector located to detect light scattered by the particles in the sample chamber. The particle counter has a particle sensing area within the sample chamber in which the intensity of light is at least 10 Watts/mm2, the sensing area having an area of 0.5 square mm or more. The detector has thirty or more detector array elements. In the preferred embodiment, the laser optical system reflects and refocuses the laser beam to effect multiple passes of the same laser beam through the sensing area.Type: ApplicationFiled: November 24, 2008Publication date: July 30, 2009Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Todd A. CERNI, Dwight A. SEHLER
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Publication number: 20090128810Abstract: Described herein is a portable, low power consuming optical particle counter calibration verification system and reliable and sensitive methods for verifying the calibration status of a gas or liquid particle counter. The calibration verification systems described herein are useful for quickly determining the calibration status of an optical particle counter at its point of use, as well as for allowing the end user to determine if an optical particle counter is in need of a recalibration before the recommended calibration schedule suggests.Type: ApplicationFiled: November 14, 2008Publication date: May 21, 2009Applicant: Particle Measuring Systems, Inc.Inventor: Thomas Bates
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Patent number: 7456960Abstract: A particle counter for optically detecting an unconstrained particle of less than one micron in size suspended in a flowing liquid includes a sample chamber having a fluid inlet and a fluid outlet; a laser module producing a laser beam; a beam shaping optical system providing a multiple laser beam pattern in the sample chamber, and a CMOS optical detector located to detect light scattered by the particles in the sample chamber. The particle counter has a particle sensing area within the sample chamber in which the intensity of light is at least 10 Watts/mm2, the sensing area having an area of 0.5 square mm or more. The detector has thirty or more detector array elements. In the preferred embodiment, the laser optical system reflects and refocuses the laser beam to effect multiple passes of the same laser beam through the sensing area.Type: GrantFiled: November 15, 2005Date of Patent: November 25, 2008Assignee: Particle Measuring Systems, Inc.Inventors: Todd A. Cerni, Dwight A. Sehler
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Publication number: 20070229825Abstract: A particle sensor for optically detecting an unconstrained particle suspended in a flowing gas includes a sample chamber having a gas inlet and a gas outlet; a gas flow system for flowing said gas from said gas inlet through said sample chamber to said gas outlet, a source of light; an optical system directing said light through said sample chamber, an optical collection system located to collect light scattered by said particles in the gas, and a detection system located to detect the collected light. The total pressure drop through said gas flow system is 3 inches of water or less. The gas flow system includes an axial fan, which may be a high static pressure fan or a counter-rotating fan. In a 1.0 CFM system, the gas inlet nozzle has an area of 25 square millimeters or more.Type: ApplicationFiled: March 30, 2006Publication date: October 4, 2007Applicant: Particle Measuring Systems IncInventor: Thomas Bates
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Patent number: 7235214Abstract: A molecular contamination monitoring system includes a piezoelectric measurement sensor exposed to a molecular constituent to be measured; a piezoelectric reference sensor; and a filter for filtering said molecular constituent, the filter located between the reference sensor and the measurement environment. The reference sensor is exposed to the same ambient conditions of temperature, pressure and humidity as the measurement sensor. Alternatively, there may be a plurality of different reference sensors having different filters, or there may be a plurality of different measurement sensors.Type: GrantFiled: April 23, 2003Date of Patent: June 26, 2007Assignee: Particle Measuring Systems, Inc.Inventors: Daniel Rodier, Scott Waisanen, Dale Griffin
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Patent number: 7208123Abstract: A flow-through monitor for detecting molecular contamination (MC) within a fluid flow. The monitor has a diffusion chamber having an inlet port and an outlet port, and a structure for supporting a fluid flow from the inlet port to the outlet port. The structure includes a flow gap causing a diffusion of molecular contaminants into the diffusion chamber, while substantially preventing, for a rate of the fluid flow above a predetermined magnitude, particulate contaminants within the fluid from entering the diffusion chamber. A SAW device detects molecular contamination interior to the diffusion chamber. Fluid input to the flow-through monitor may be diluted by a pure fluid for extended monitor life. A system for aggregate sampling connects an ensemble manifold upstream of the flow-through monitor. A system for triggered sampling connects a sample preconcentrator downstream of the flow-through monitor. A chemically selective membrane may be located between the flow gap and the SAW.Type: GrantFiled: June 24, 2002Date of Patent: April 24, 2007Assignee: Particle Measuring Systems, Inc.Inventors: Brian A. Knollenberg, Daniel Rodier, Scott Waisanen
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Publication number: 20060274309Abstract: A particle counter for optically detecting an unconstrained particle of less than one micron in size suspended in a flowing liquid includes a sample chamber having a fluid inlet and a fluid outlet; a laser module producing a laser beam; a beam shaping optical system providing a multiple laser beam pattern in the sample chamber, and a CMOS optical detector located to detect light scattered by the particles in the sample chamber, the detector producing an electric signal characteristic of a parameter of the particle. The particle counter has a particle sensing area within the sample chamber in which the intensity of light is at least 10 Watts/mm2, the sensing area having an area of 0.5 square mm or more. The detector has thirty or more detector array elements. In the preferred embodiment, the laser optical system reflects and refocuses the laser beam to effect multiple passes of the same laser beam through the sensing area.Type: ApplicationFiled: November 15, 2005Publication date: December 7, 2006Applicant: Particle Measuring Systems IncInventors: Todd Cerni, Dwight Sehler
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Patent number: RE39783Abstract: A sensitive particle distribution probe uses special processing including a modified Twomey/Chahine iterative convergence technique and a specially constructed sample cell to obtain particle size distribution measurements from optically dense slurries, such as the slurries used in the semiconductor industry for chemical mechanical planarization. Spectral transmission data is taken over the spectral range of 0.20-2.5 microns, utilizing specially constructed, chemically resistant sample cells of 50-2000 microns thickness, and miniature, fixed grating, linear detector array spectrometers. At wavelengths greater than one micron, the preferred design utilizes InGaAs linear detector arrays. An ultrasonic disrupter can be employed to breakup harmless soft agglomerates. In addition to direct particle size distribution measurement, the invention described here could be used to detect other fundamental causes of slurry degradation, such as foaming and jelling.Type: GrantFiled: August 12, 2003Date of Patent: August 21, 2007Assignee: Particle Measuring Systems, Inc.Inventors: Todd A. Cerni, Scott Waisanen, Dennis J. Knowlton