Abstract: A storage device is disclosed herein. The storage device comprises a non-volatile memory, where the non-volatile memory includes a block of 3N wordlines partitioned into a plurality of sub-blocks. The plurality of sub-blocks include an upper sub-block of a first subset of the block of 3N wordlines, a lower sub-block of a second subset of the block of 3N wordlines, and a middle sub-block of a third subset of the block of 3N wordlines. Further, the storage device comprises control circuitry coupled to the block of 3N wordlines and configured to: perform a program operation in a normal order programming sequence on the upper sub-block; perform a program operation in a reverse order programming sequence on the lower sub-block; and perform a program operation in the reverse order programming sequence on the middle sub-block.

Abstract: Technology is disclosed herein for a memory system that includes control circuits that are configured to connect to a three-dimensional memory structure. The memory structure includes NAND strings arranged in a plurality of rows, a plurality of bit lines connected to the NAND strings and a plurality of word lines, each word line coupled to the plurality of rows of NAND strings. The control circuits are configured to, in a program-verify operation, sense memory cells of a first row of NAND strings coupled to the selected word line for a first sense time and sense memory cells of a second row of NAND strings coupled to the selected word line for a second sense time while applying a program-verify voltage to the selected word line.

Abstract: Technology is disclosed herein for a memory system that includes one or more control circuits configured to connect to a three-dimensional memory structure that includes word lines, with each word line connected to a word line driver at one end. The one or more control circuits are configured to, in a program verify operation, sense memory cells of a first region of a selected word line for a first sense time and sense memory cells of a second region of the selected word line for a second sense time while applying a program-verify voltage to the selected word line. The first region is closer to the word line driver than the second region.

Abstract: A method includes forming a first-tier alternating stack of first insulating layers and first sacrificial material layers, forming a joint dielectric layer over the first-tier alternating stack, such that the joint dielectric layer is thicker than each of the first insulating layers and the first sacrificial material layers, forming a second-tier alternating stack of second insulating layers and second sacrificial material layers over the joint dielectric layer and the first-tier alternating stack, performing a level-shift anisotropic etch process to form a recess trench or via cavities vertically extending through the second-tier alternating stack and down to the joint dielectric layer, and performing an extension etching process to extend the recess trench or the via cavities through at least the joint dielectric level. At least one of etching time or etching power used during the extension etching process is different from that used during the level-shift anisotropic etch process.

Abstract: An alternating stack of first material layers and second material layers is formed over a substrate. A hard mask layer is formed over the alternating stack. Optionally, an additional hard mask layer can be formed over the hard mask layer. A photoresist layer is applied and patterned, and cavities are formed in the hard mask layer by performing a first anisotropic etch process that transfers a pattern of the openings in the photoresist layer through the hard mask layer. Via openings are formed through an upper portion of the alternating stack by performing a second anisotropic etch process. A cladding liner can be optionally formed on sidewalls of the cavities in the hard mask layer. The via openings can be vertically extend through all layers within the alternating stack by performing a third anisotropic etch process.

Abstract: An apparatus includes a control circuit that is configured to connect to an array of non-volatile memory cells. The control circuit includes a first plurality of data latches configured to connect to non-volatile memory cells of a first plane and a second plurality of data latches configured to connect to non-volatile memory cells of a second plane. The control circuit also includes a shared data transfer data latch configured for transfer of data with the first plurality of data latches and the second plurality of data latches.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, memory opening fill structures vertically extending through the alternating stack in a memory array region, and an electrically conductive spacer extending vertically and electrically connecting a first drain-select-level electrically conductive layer to a second drain-select-level electrically conductive layer.

Abstract: To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.

Abstract: A semiconductor structure includes semiconductor devices located on a top surface of a substrate semiconductor layer, lower-level metal interconnect structures embedded in lower-level dielectric material layers, source-level material layers, an alternating stack of insulating layers and electrically conductive layers overlying the source-level material layer, memory stack structures, a vertically alternating sequence of insulating plates and dielectric material plates laterally surrounded by the alternating stack, an isolation trench fill structure interposed between the alternating stack and the vertically alternating sequence and including a trench fill material portion and a capping dielectric structure overlying the trench fill material portion, and a first through-memory-level interconnection via structure vertically extending through each plate within the vertically alternating sequence and contacting a top surface of one of the lower-level metal interconnect structures.

Abstract: Technology is disclosed herein for reading programmable resistance memory cells. A first (faster) self-referenced read (SRR) of a group of memory cells is performed and if successful the read is complete. However, if the first SRR fails then a second (slower or nominal) SRR is performed. The bit error rate (BER) of the second SRR may be significantly lower than the BER of the first SRR. However, the BER of the first SRR may be low enough such that most of the time the first SRR is successful. Therefore, most of the time the read is completed with just the first SRR, thereby providing for an SRR having on average is faster than if just the second SRR had been used. Moreover, the effective BER of the SRR is extremely low due to the low BER of the second SRR.

Abstract: A method for multi-state programming of a non-volatile memory structure, comprising: (1) initiating a programming operation with respect to multiple program states, (2) applying, to all selected word lines of the memory structure, a programming voltage bias (VPGM) level pre-determined to be suitable for programming a highest program state of the multiple program states, wherein the programming voltage bias level is applied according to a given program pulse width, and (3) with respect to each program state other than the highest program state of the multiple program states, applying a zero-volt bitline voltage bias (VBL) to one or more bitlines that are associated with one or more memory elements to be programmed to the program state, wherein the zero-volt bitline voltage bias is applied according to a respective program sub-pulse width that is less than the given program pulse width.

Abstract: A memory apparatus and method of operation are provided. The apparatus includes memory cells each connected to one of a plurality of word lines and disposed in memory holes. The memory cells are configured to retain a threshold voltage corresponding to one of a plurality of data states. A control means is coupled to the plurality of word lines and the memory holes and is configured to identify at least one grouping of the memory cells to be programmed with a multi-pass programming operation. The control means is also configured to program the at least one grouping of the memory cells using the multi-pass programming operation. The control means is additionally configured to program the memory cells other than the at least one grouping of the memory cells in a full sequence programming operation.

Abstract: A bonded assembly includes a memory die that is bonded to a logic die. The memory die includes a three-dimensional memory array located on a memory-side substrate, memory-side dielectric material layers located on the three-dimensional memory array and embedding memory-side metal interconnect structures and memory-side bonding pads, a backside peripheral circuit located on a backside surface of the memory-side substrate, and backside dielectric material layers located on a backside of the memory-side substrate and embedding backside metal interconnect structures. The logic die includes a logic-side peripheral circuit located on a logic-side substrate, and logic-side dielectric material layers located between the logic-side substrate and the memory die and embedding logic-side metal interconnect structures and logic-side bonding pads that are bonded to a respective one of the memory-side bonding pads.

Abstract: A memory device includes a cross-point array of magnetoresistive memory cells. Each magnetoresistive memory cell includes a vertical stack of a selector-containing pillar structure and a magnetic tunnel junction pillar structure. The lateral spacing between neighboring pairs of magnetoresistive memory cells may be smaller along a first horizontal direction than along a second horizontal direction, and a dielectric spacer or a tapered etch process may be used to provide a pattern of an etch mask for patterning first electrically conductive lines underneath the magnetoresistive memory cells. Alternatively, a resist layer may be employed to pattern first electrically conductive lines underneath the cross-point array. Alternatively, a protective dielectric liner may be provided to protect selector-containing pillar structures during formation of the magnetic tunnel junction pillar structures.

Abstract: A memory device includes a cross-point array of magnetoresistive memory cells. Each magnetoresistive memory cell includes a vertical stack of a selector-containing pillar structure and a magnetic tunnel junction pillar structure. The lateral spacing between neighboring pairs of magnetoresistive memory cells may be smaller along a first horizontal direction than along a second horizontal direction, and a dielectric spacer or a tapered etch process may be used to provide a pattern of an etch mask for patterning first electrically conductive lines underneath the magnetoresistive memory cells. Alternatively, a resist layer may be employed to pattern first electrically conductive lines underneath the cross-point array. Alternatively, a protective dielectric liner may be provided to protect selector-containing pillar structures during formation of the magnetic tunnel junction pillar structures.

Abstract: An alternating stack of insulating layers and spacer material layers is formed over a substrate. A plurality of arrays of memory opening fill structures is formed through the alternating stack. A plurality of dielectric plates is formed, which laterally surrounds a respective array of memory opening fill structures. Self-aligned drain-select-level isolation structures are formed between a respective neighboring pair of arrays of memory opening fill structures through gaps between neighboring pairs of the dielectric plates into a subset of layers within the alternating stack. Drain side select gate electrodes are provided from a divided subset of the spacer material layers.

Abstract: A non-volatile storage apparatus includes non-volatile memory cells, word lines connected to the non-volatile memory cells, and a control circuit connected to the word lines and the memory cells. The word lines include data word lines and dummy word lines. Memory cells connected to data word lines are configured to store host data. Memory cells connected to dummy word lines do not store host data. The control circuit is configured to erase, program and read the memory cells. Errors from threshold voltage up-shifting in the memory cells connected to dummy word lines is prevented by adjusting the voltage applied to dummy word lines.

Abstract: An apparatus is provided that includes a block of memory cells, and a control circuit coupled to the block of memory cells. The control circuit is configured to perform an erase operation on the block of memory cells by determining a count of a number of times that the block of memory cells previously has been programmed and erased, determining an erase voltage based on the count, and applying an erase pulse having the erase voltage to the block of memory cells.

Abstract: A ferroelectric transistor includes a semiconductor channel comprising a semiconductor material, a strained and/or defect containing ferroelectric gate dielectric layer located on a surface of the semiconductor channel, a source region located on a first end portion of the semiconductor channel, and a drain region located on a second end portion of the semiconductor channel.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, and memory opening fill structures vertically extending through the alternating stack. An insulating liner overlies stepped surfaces of the alternating stack in a staircase region. A plurality of discrete dielectric plates can be formed over the insulating liner. In one embodiment, the plurality of discrete dielectric plates can function as etch stop structures for formation of contact via structures that contact underlying portions of the electrically conductive layers. In another embodiment, the plurality of discrete dielectric plates may be replaced with a metallic material that forms extensions of the electrically conductive layers, and can be employed as etch stop structures during formation of contact via structures.