Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Publication number: 20240168379
    Abstract: The present invention is a positive resist material containing a compound having two or more urethane groups and having two or more carboxy groups that are each substituted with an acid-labile group and are bonded to the urethane groups via a linking group. This provides: a positive resist material that has higher sensitivity and higher resolution than conventional positive resist materials and smaller edge roughness and CDU, and allows excellent pattern profile after exposure to light; and a patterning process.
    Type: Application
    Filed: October 16, 2023
    Publication date: May 23, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun HATAKEYAMA
  • Publication number: 20240168378
    Abstract: A positive resist material containing a compound having two or more urethane groups and having a carboxy group and a sulfonium salt or iodonium salt of a sulfonic acid, the carboxy group being substituted with an acid-labile group and being bonded to a first urethane group via a first linking group, and the sulfonium salt or iodonium salt being bonded to a second urethane group directly or via a second linking group. This provides: a positive resist material that has higher sensitivity and higher resolution than conventional positive resist materials and smaller edge roughness and CDU, and allows excellent pattern profile after exposure to light; and a patterning process.
    Type: Application
    Filed: October 16, 2023
    Publication date: May 23, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun HATAKEYAMA
  • Publication number: 20240168382
    Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).
    Type: Application
    Filed: September 20, 2023
    Publication date: May 23, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • Publication number: 20240166886
    Abstract: The present invention is an additive for water-based paint, containing a siloxane-branched polyether-modified silicone shown by an average composition formula (1) R1aR2bR3cSiO(4-a-b-c)/2 and having a weight-average molecular weight in a range of 500 to 100,000. In the formula (1), R1 represents an alkyl group, an aryl group, an aralkyl group, or an organic group shown by a general formula (2) —CmH2m—O—(C2H4O)d(C3H6O)eR4. R2 represents a group shown by a general formula (3)—CmH2m—O— (C2H4O)f(C3H6O)g—R5; each R3 represents an organosiloxane shown by the following general formula (4). R4 represents a hydrocarbon group, or an organic group shown by R6—(CO)—. R5 represents a hydrogen atom, a hydrocarbon group, or an organic group shown by R6—(CO)—. R6 represents a hydrocarbon group. The siloxane branched polyether-modified silicone satisfies expressions (I), (II).
    Type: Application
    Filed: August 27, 2020
    Publication date: May 23, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Tomoyuki GOTO
  • Publication number: 20240166888
    Abstract: The present invention is a paint additive containing a siloxane-branched polyether-modified silicone shown by an average composition formula (1) R1aR2bR3cSiO(4-a-b-c)/2 and having a weight-average molecular weight in a range of 500 to 100,000. In the formula (1), R1 represents an alkyl group, an aryl group, an aralkyl group, or an organic group shown by a general formula (2) —CmH2m—O—(C2H4O)d(C3H6O)eR4. R2 represents a group shown by a general formula (3) —CmH2m—O—(C2H4O)f(C3H6O)g—R5; each R3 represents an organosiloxane shown by the following general formula (4). R4 represents a hydrocarbon group, or an organic group shown by R6—(CO)—. R5 represents a hydrogen atom, a hydrocarbon group, or an organic group shown by R6—(CO)—. R6 represents a hydrocarbon group. Thus, the present invention provides a paint additive and a paint composition with small environmental load and imparting excellent antifouling performance.
    Type: Application
    Filed: August 27, 2020
    Publication date: May 23, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Tomoyuki GOTO
  • Patent number: 11990521
    Abstract: A laminate contains a crystal substrate; a middle layer formed on a main surface of the crystal substrate, the middle layer comprising a mixture of an amorphous region in an amorphous phase and a crystal region in a crystal phase having a corundum structure mainly made of a first metal oxide; and a crystal layer formed on the middle layer and having a corundum structure mainly made of a second metal oxide, wherein the crystal region is an epitaxially grown layer from a crystal plane of the crystal substrate.
    Type: Grant
    Filed: March 15, 2023
    Date of Patent: May 21, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hiroshi Hashigami
  • Patent number: 11987682
    Abstract: Provided are a photocatalyst transfer film allowing a uniform and highly transparent photocatalyst layer to be transferred to the surfaces of various transfer base materials; and a production method thereof. The photocatalyst transfer film has, on a biaxially oriented polypropylene film, a photocatalyst layer containing a titanium oxide particle-containing photocatalyst, a silicon compound and a surfactant. The production method of the photocatalyst transfer film includes applying a photocatalyst coating liquid to a biaxially oriented polypropylene film; and performing drying. The photocatalyst coating liquid contains a titanium oxide particle-containing photocatalyst, a silicon compound, a surfactant and an aqueous dispersion medium.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: May 21, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Yuyama, Manabu Furudate, Tomohiro Inoue
  • Patent number: 11988955
    Abstract: The present invention is to provide a pellicle characterized by including a pellicle film and a pellicle frame, in which the pellicle film is stretched on the pellicle frame, and the pellicle film is an annealed pellicle film, and to provide a method for producing a pellicle by stretching a pellicle film on a pellicle frame, including the step of annealing the pellicle film alone before stretching the pellicle film on the pellicle frame, annealing the pellicle after stretching the pellicle film on the pellicle frame, or annealing the pellicle film alone and the pellicle both before and after stretching the pellicle film on the pellicle frame.
    Type: Grant
    Filed: February 6, 2023
    Date of Patent: May 21, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Akinori Nishimura
  • Patent number: 11990603
    Abstract: A negative electrode material containing a negative electrode active material particle which includes a silicon compound particle containing a silicon compound (SiOx: 0.5?x?1.6). The silicon compound particle contains at least one or more of Li2SiO3 and Li4SiO4, and the negative electrode material further contains at least one of a metal compound particle containing a metal compound and an aggregate of the metal compound particle. The negative electrode material is capable of stabilizing a slurry prepared in production of a negative electrode for a secondary battery, and improving initial charge-discharge characteristics and cycle characteristics when it is used as a negative electrode active material for a secondary battery.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: May 21, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takumi Matsuno, Takakazu Hirose, Kohta Takahashi
  • Patent number: 11987688
    Abstract: A photocurable composition including the following components (A) to (D), (A) a monomer having one (meth)acryloyl structure, (B) a crosslinking agent having two or more (meth)acryloyl structures, (C) an inorganic ultraviolet-blocking agent having a 50% volume cumulative particle size of 1 to 50 nm, and (D) a photopolymerization initiator in an amount of 0.05 to 1 part by weight, relative to total 100 parts by weight of components (A) and (B), wherein a part or all of component (A) is a hydrophilic monomer, and a content of the hydrophilic monomer is 70% by weight or more, relative to the total weight of components (A) and (B).
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: May 21, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryosuke Yoshii, Kohei Masuda, Mamoru Hagiwara, Tsuneo Kimura
  • Patent number: 11987723
    Abstract: This surface treatment agent can form a water repellent/oil repellent layer having particularly excellent wear durability, weather resistance, and alkali resistance, and contains a fluorinated coating agent composition containing: (A) one or more selected from hydroxy group- or hydrolyzable group-containing silanes and siloxanes modified with a fluorooxyalkylene group-containing polymer, and partial (hydrolyzed) condensates thereof, and (B) a fluorooxyalkylene group-containing polymer-modified polysilazane formed of silazane units modified with a fluorooxyalkylene group-containing polymer, wherein the number-average molecular weight of fluorooxyalkylene group-containing polymer residues in the component (A) is 1,500-10,000, the number-average molecular weight of fluorooxyalkylene group-containing polymer residues in the silazane units modified with the fluorooxyalkylene group-containing polymer in the component (B) is 500-6,000, and the mixed mass ratio between the component (A) and the component (B) is 10:90
    Type: Grant
    Filed: February 18, 2019
    Date of Patent: May 21, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Lisa Katayama, Yuji Yamane
  • Publication number: 20240161952
    Abstract: A R-T-B sintered magnet comprising a main phase of R2Fe14B and a grain boundary phase exhibits a high Br and elevated-temperature stability. The magnet is composed of 12.5-17.0 atom % of R which is typically Nd and Pr, 4.5-5.5 atom % of B, at least 70 atom % of T which is Fe and Co, 0.1-3.0 atom % of M1 which is typically Al, Cu or Ga, 0.01-0.5 atom % of M2 which is typically Sn, 0.05-1.0 atom % of M3 which is typically Zr, and up to 0.8 atom % of O, and the balance of C, N and incidental impurities. The grain boundary phase contains a R-T-(M1, M2) phase and a R-M2-C phase.
    Type: Application
    Filed: October 26, 2023
    Publication date: May 16, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.,
    Inventors: Akihiro Yoshinari, Hiroki Iida, Koichi Hirota
  • Publication number: 20240156108
    Abstract: Provided herein is a method of applying a simple all-in-mix method that can produce a sponge cake with improved swelling thereby favorable appearance and texture without impairing the original flavor of the sponge cake by baking a cake dough containing a large number of air bubbles with uniform size and a dough composition for sponge cake suitable for the method. The objective can be achieved by a method of producing a sponge cake, comprising foaming a dough composition comprising hydroxypropyl methylcellulose having a viscosity of 30 mPa·s to 800 mPa·s when measured with a viscometer at 20° C. using a 2% by mass aqueous solution, cereal flour comprising light flour, egg, sugar, an expander, edible oil and water by the all-in-mix method to obtain a cake dough, and baking the cake dough to obtain a sponge cake; and the like.
    Type: Application
    Filed: November 13, 2023
    Publication date: May 16, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keiichi KOMATSUKI, Shingo NIINOBE
  • Publication number: 20240160101
    Abstract: A resist composition comprising a sulfonium salt composed of a sulfonate anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having the formula (1) exhibits a high sensitivity and reduced LWR or improved CDU.
    Type: Application
    Filed: September 20, 2023
    Publication date: May 16, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Tatsuya Yamahira, Yuki Suda
  • Publication number: 20240160105
    Abstract: Provided is a photosensitive resin composition comprising: (A) a silicone resin having an epoxy group and/or a phenolic hydroxyl group; (B) a photoacid generator represented by formula (B); and (C) a carboxylic acid quaternary ammonium compound.
    Type: Application
    Filed: January 5, 2022
    Publication date: May 16, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hitoshi Maruyama, Kumiko Hayashi
  • Patent number: 11984481
    Abstract: A mist-CVD apparatus contains a first atomizer for atomizing a first metal oxide precursor and generating a first mist of the first metal oxide precursor; a second atomizer for atomizing a second metal oxide precursor and generating a second mist of the second metal oxide precursor; a carrier-gas supplier for supplying a carrier gas to convey the first and second mists; a film-forming unit for forming a film on a substrate by subjecting the first and second mists to a thermal reaction; and a first conveyance pipe through which the first mist and the carrier gas are conveyed to the film forming chamber, a second conveyance pipe through which the second mist and the carrier gas are conveyed to the film forming chamber.
    Type: Grant
    Filed: March 15, 2023
    Date of Patent: May 14, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hiroshi Hashigami
  • Patent number: 11984522
    Abstract: A backside contact solar cell has, on a first main surface of a crystal silicon substrate, a p-type region having a p-conductive type and an n-type region having an n-conductive type, and a positive electrode formed on the p-type region and a negative electrode formed on the n-type region, wherein the positive electrode includes a laminated conductor of a first electric conductor which is formed on the p-type region and which includes a group III element and a second electric conductor which is laminated on the first electric conductor and which has a lower content ratio of the group III element than the first electric conductor, and the negative electrode includes the second electric conductor formed on the n-type region. In this way, a low-cost backside contact solar cell has a high photoelectric conversion efficiency.
    Type: Grant
    Filed: May 7, 2018
    Date of Patent: May 14, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi Hashigami, Takenori Watabe, Hiroyuki Ohtsuka
  • Patent number: 11984327
    Abstract: The present invention is a method for producing a power module, including processes (1) to (4) in the following order: (1) a disposition process of disposing a thermosetting resin composition that is solid at 25° C. into a container housing an insulator substrate with multiple semiconductor components mounted thereon; (2) a melt process involving disposing the container having the thermosetting resin composition disposed therein into a molding apparatus capable of heating, pressurization, and depressurization, and heating the container to melt the thermosetting resin composition; (3) a pressurization-depressurization process of performing one or more depressurizations and one or more pressurizations inside the molding apparatus; and (4) a cure process of heating the inside of the molding apparatus to cure the thermosetting resin composition. This is to provide a method for producing a power module having few voids at the time of molding and excellent reliability.
    Type: Grant
    Filed: August 12, 2021
    Date of Patent: May 14, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoyuki Kushihara, Kazuaki Sumita, Masahiro Kaneta
  • Publication number: 20240150522
    Abstract: Provided is a water-repellent member in which a silica layer having a specific thickness and mainly composed of silica nanoparticles is provided on the outer surfaces of various substrates, and then a water- and oil-repellent layer having a specific thickness and containing a cured product of a fluorine-containing organosilicon compound as a main component is provided on the outer surface of the silica layer. The water-repellent member is obtained by a method comprising: a step for wet coating a dispersion containing silica nanoparticles and a solvent onto the outer surface of a substrate; a step for drying and removing the solvent from the dispersion; a step for wet coating a solution containing a fluorine-containing organosilicon compound and a solvent onto the outer surface of a silica layer formed by drying and removing the solvent; and a step for drying and removing the solvent from the solution to cure the fluorine-containing organosilicon compound.
    Type: Application
    Filed: January 12, 2024
    Publication date: May 9, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuji YAMANE, Lisa KATAYAMA, Ryusuke SAKOH, Takashi MATSUDA
  • Publication number: 20240150612
    Abstract: Provided is a condensation-reaction-curable silicone coating agent composition which contains, as a main component, a hydrolysable-group-containing organosiloxane mixture and also contains a curing catalyst, in which the hydrolysable-group-containing organosiloxane mixture contains an organotrisiloxane compound having a specified molecular structure in which there is at least one non-substituted, halogen-substituted or alkyl-substituted phenyl group in the molecule thereof and at least four hydrolysable groups are contained at molecule chain both ends thereof and an organodisiloxane compound having a specified structure in which there are at least two non-substituted, halogen-substituted or alkyl-substituted phenyl groups on one silicon atom in the molecule thereof and at least two hydrolysable groups are contained on the other silicon atom in the molecule thereof, and the organotrisiloxane compound and the organodisiloxane compound are contained in the hydrolysable-group-containing organosiloxane mixture at
    Type: Application
    Filed: February 14, 2022
    Publication date: May 9, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hiroyasu HARA