Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Patent number: 11920011
    Abstract: The present invention is a resin substrate including an organic resin and a quartz glass cloth, where the organic resin has a dielectric loss tangent of 0.0002 to 0.0020 measured at 10 GHz and a 40 GHz/10 GHz ratio is 0.4 to 0.9, the quartz glass cloth has a dielectric loss tangent of 0.0001 to 0.0015 measured at 10 GHz and a 40 GHz/10 GHz ratio is 1.2 to 2.0, and the resin substrate has a dielectric loss tangent of 0.0001 to 0.0020 at 10 GHz and a 40 GHz/10 GHz ratio is 0.8 to 1.2. This provides a resin substrate having a low dielectric loss tangent in a high-frequency region and dielectric characteristics with little frequency dependence.
    Type: Grant
    Filed: January 20, 2022
    Date of Patent: March 5, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshio Shiobara, Yusuke Taguchi, Ryunosuke Nomura, Hajime Itokawa
  • Publication number: 20240072203
    Abstract: A method for fabricating light emitting diode (LED) dice includes the steps of: providing a substrate, and forming a plurality of die sized semiconductor structures on the substrate. The method also includes the steps of providing a receiving plate having an elastomeric polymer layer, placing the substrate and the receiving plate in physical contact with an adhesive force applied by the elastomeric polymer layer, and performing a laser lift-off (LLO) process by directing a uniform laser beam through the substrate to the semiconductor layer at an interface with the substrate to lift off the semiconductor structures onto the elastomeric polymer layer. During the laser lift-off (LLO) process the elastomeric polymer layer functions as a shock absorber to reduce momentum transfer, and as an adhesive surface to hold the semiconductor structures in place on the receiving plate.
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Applicants: SemiLEDs Corporation, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Chen-Fu Chu, Shih-Kai Chan, Yi-Feng Shih, David Trung Doan, Trung Tri Doan, Yoshinori Ogawa, Kohei Otake, Kazunori Kondo, Keiji Ohori, Taichi Kitagawa, Nobuaki Matsumoto, Toshiyuki Ozai, Shuhei Ueda
  • Patent number: 11914291
    Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: February 27, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Patent number: 11912828
    Abstract: Described herein is a crosslinked organosilicone resin that has a crosslinked structure formed by reacting a silicone or hydrocarbon having an alkenyl group at both ends thereof with a hydrosilyl group-containing organosilicone resin, is soluble with a liquid oil at room temperature, and forms a film by volatilization of the oil. Also described herein is a method for preparing a crosslinked organosilicone resin and cosmetics containing a crosslinked organosilicone resin.
    Type: Grant
    Filed: July 9, 2019
    Date of Patent: February 27, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takuya Abe, Masayuki Konishi, Chihiro Hayakawa
  • Patent number: 11912583
    Abstract: A slurry of a dispersion medium and rare earth oxide particles. The particles having a volume basis median particle size D50 of up to 50 nm. The rare earth oxide particles having a dispersity index S of up to 1, the dispersity index S being determined according to the formula (1): (D90?D10)/D50??(1) wherein D10, D50 and D90 are cumulative 10%, 50% and 90% diameters in volume basis particle size distribution, respectively.
    Type: Grant
    Filed: November 8, 2021
    Date of Patent: February 27, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazuhiro Wataya
  • Patent number: 11911161
    Abstract: The present invention provides a biological electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer includes a resin layer and particles dispersed in the resin layer, the particles being coated with gold, silver, or platinum, and a thickness of the resin layer is equal to or thinner than an average particle size of the particles. The biological electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, and can be manufactured at low cost.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: February 27, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Motoaki Iwabuchi
  • Patent number: 11914294
    Abstract: A positive resist composition comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by an acid labile group in the form of a tertiary hydrocarbon group containing a nitrogen atom and aromatic group exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: February 27, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 11915845
    Abstract: A rare earth sintered magnet is produced by depositing a coating of rare earth-containing particles on the surface of a rare earth magnet body, and heat treating the magnet body for causing absorption and diffusion of rare earth element in the magnet body. The depositing step utilizes a particle impingement phenomenon.
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: February 27, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Taiga Asai, Akira Fujimoto, Tetsuya Ohashi
  • Patent number: 11912869
    Abstract: A non-curable thermal-conductive silicone composition contains essential components of: (A) an organopolysiloxane having a kinematic viscosity at 25° C. of 1,000,000 mm2/s or more in an amount of 5 to 20 mass % relative to a sum of the component (A) and a component (B); (B) a hydrolysable organopolysiloxane compound shown by the following general formula (1) in an amount of 80 to 95 mass % relative to the sum of the components (A) and (B); and (C) a heat conductive filler in an amount of 10 to 95 mass % relative to a total amount of the composition. A mixture of the components (A) and (B) has a molecular weight distribution Mw/Mn of 10 or more. R1 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms optionally having a substituent. “m” represents an integer of 5 to 100.
    Type: Grant
    Filed: February 4, 2020
    Date of Patent: February 27, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keita Kitazawa, Wataru Toya
  • Patent number: 11914295
    Abstract: The present invention is a thermosetting silicon-containing material containing one or more of a repeating unit shown by the following general formula (Sx-1), a repeating unit shown by the following general formula (Sx-2), and a partial structure shown by the following general formula (Sx-3): where R1 represents an iodine-containing organic group; and R2 and R3 are each independently identical to R1, a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms. This provides: a thermosetting silicon-containing material used for forming a resist underlayer film which is capable of contributing to sensitivity enhancement of an upper layer resist while keeping LWR thereof from degrading; a composition for forming a silicon-containing resist underlayer film, the composition containing the thermosetting silicon-containing material; and a patterning process using the composition.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: February 27, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama, Ryo Mitsui
  • Publication number: 20240063339
    Abstract: A method for fabricating light emitting diode (LED) dice includes the steps of: providing a substrate, and forming a plurality of die sized semiconductor structures on the substrate. The method also includes the steps of providing a receiving plate having an elastomeric polymer layer, placing the substrate and the receiving plate in physical contact with an adhesive force applied by the elastomeric polymer layer, and performing a laser lift-off (LLO) process by directing a uniform laser beam through the substrate to the semiconductor layer at an interface with the substrate to lift off the semiconductor structures onto the elastomeric polymer layer. During the laser lift-off (LLO) process the elastomeric polymer layer functions as a shock absorber to reduce momentum transfer, and as an adhesive surface to hold the semiconductor structures in place on the receiving plate.
    Type: Application
    Filed: October 26, 2023
    Publication date: February 22, 2024
    Applicants: SamiLEDs Corporation, SHIN-ETSU CHEMICAL. CO., LTD.
    Inventors: Chen-Fu Chu, SHIH-KAI CHAN, YI-FENG SHIH, DAVID TRUNG DOAN, TRUNG TRI DOAN, YOSHINORI OGAWA, KOHEI OTAKE, KAZUNORI KONDO, KEIJI OHORI, TAICHI KITAGAWA, NOBUAKI MATSUMOTO, TOSHIYUKI oZAI, SHUHEI UEDA
  • Publication number: 20240059929
    Abstract: An organosilicon compound represented by formula (1). (R1 is an alkyl, alkenyl, aryl, or acyl group, R2 is an alkyl or aryl group, R3 is a hydrogen atom or a methyl group, A1 is a single bond or an alkylene group, A2, A3, and A4 are each a methylene group or an oxygen atom, with the proviso that at least one of the A2, A3, and A4 moieties is an oxygen atom, and n is an integer of 1-3.
    Type: Application
    Filed: December 15, 2021
    Publication date: February 22, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeki YASUDA, Minoru URATA
  • Publication number: 20240059842
    Abstract: Provided are an organic titanium compound and curing catalyst capable of quickly curing a room temperature-curable organopolysiloxane composition when added thereto, and improving an adhesiveness of a cured product of such composition, especially an adhesiveness thereof after being dipped in warm water, while maintaining an unimpaired storage stability. The organic titanium compound is a reaction product of an organooxy group- and chelating ligand-containing organic titanium compound represented by an average composition formula (I) Ti(OR)4-a(X)a wherein R is a substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, X is a chelating ligand, a is a number of 0.1 to 3.5; and a fatty acid ester of a polyhydric alcohol.
    Type: Application
    Filed: January 20, 2022
    Publication date: February 22, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Taiki KATAYAMA, Takafumi SAKAMOTO
  • Patent number: 11909038
    Abstract: A negative electrode active material containing a negative electrode active material particle; the negative electrode active material particle including a silicon compound shown by SiOx (0.5?x?1.6), and having a peak in a range of 539 to 541 eV in a XANES spectrum obtained by XANES measurement of the negative electrode active material particle. This provides a negative electrode active material that is capable of increasing battery capacity and improving cycle performance when it is used as a negative electrode active material for a secondary battery.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: February 20, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takakazu Hirose, Reiko Sakai
  • Patent number: 11905368
    Abstract: Provided is a water-repellent member in which a silica layer having a specific thickness and mainly composed of silica nanoparticles is provided on the outer surfaces of various substrates, and then a water- and oil-repellent layer having a specific thickness and containing a cured product of a fluorine-containing organosilicon compound as a main component is provided on the outer surface of the silica layer. The water-repellent member is obtained by a method comprising: a step for wet coating a dispersion containing silica nanoparticles and a solvent onto the outer surface of a substrate; a step for drying and removing the solvent from the dispersion; a step for wet coating a solution containing a fluorine-containing organosilicon compound and a solvent onto the outer surface of a silica layer formed by drying and removing the solvent; and a step for drying and removing the solvent from the solution to cure the fluorine-containing organosilicon compound.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: February 20, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuji Yamane, Lisa Katayama, Ryusuke Sakoh, Takashi Matsuda
  • Patent number: 11904521
    Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: February 20, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
  • Publication number: 20240052172
    Abstract: A resin-coated metal powder according to the present invention is obtained by covering at least a part of the surface of a metal powder with a hydrolyzable resin that has an average composition of general formula (1) and a number average molecular weight of from 500 to 100,000; and this resin-coated metal powder exhibits sufficient dispersibility in an aqueous solution, while being stable for a relatively long period of time even in the coexistence of water in an aqueous coating material.
    Type: Application
    Filed: October 14, 2020
    Publication date: February 15, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shotaro AOKI, Ayumu KIYOMORI
  • Publication number: 20240053678
    Abstract: A resist composition comprising an acid compound, a photoacid generator of iodonium salt type and/or a photo-decomposable quencher of iodonium salt type, and a base polymer has a high sensitivity, reduced edge roughness or size variation, improved resolution and satisfactory storage stability.
    Type: Application
    Filed: July 26, 2023
    Publication date: February 15, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yutaro Otomo, Tomohiro Kobayashi
  • Publication number: 20240053675
    Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.
    Type: Application
    Filed: October 26, 2023
    Publication date: February 15, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki YARITA, Daijitsu HARADA, Masaki TAKEUCHI
  • Publication number: 20240051839
    Abstract: A sprayed article is disclosed including a substrate and a sprayed coating deposited thereon and containing a rare earth oxyfluoride as main phase. Provided is a slurry for suspension plasma spraying, which is a spray material used for suspension plasma spraying in an atmosphere including an oxygen-containing gas, contains 5-40 mass % of rare earth fluoride particles having a maximum particle diameter (D100) of 12 ?m or less, and contains one or more types of solvent selected from among water and organic solvents. A rare earth acid fluoride-containing sprayed film, in which process shift and particle generation hardly occur, can be stably formed on a base material by carrying out suspension plasma spraying in an atmosphere including an oxygen-containing gas. A spraying member provided with this sprayed film exhibits excellent corrosion resistance to halogen-based gas plasma.
    Type: Application
    Filed: October 26, 2023
    Publication date: February 15, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya