Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Publication number: 20200249561
    Abstract: During reactive sputtering using a silicon-containing target, an inert gas, and a nitrogen-containing reactive gas, a hysteresis curve is drawn by sweeping the flow rate of the reactive gas, and plotting the sputtering voltage or current during the sweep versus the flow rate of the reactive gas. In the step of sputtering in a region corresponding to a range from more than the lower limit of reactive gas flow rate providing the hysteresis to less than the upper limit, the target power, the inert gas flow rate and/or the reactive gas flow rate is increased or decreased continuously or stepwise. The halftone phase shift film including a layer containing transition metal, silicon and nitrogen is improved in in-plane uniformity of optical properties.
    Type: Application
    Filed: April 21, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takuro KOSAKA, Yukio INAZUKI, Hideo KANEKO
  • Publication number: 20200249571
    Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.
    Type: Application
    Filed: January 15, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Masaki Ohashi, Tomohiro Kobayashi
  • Patent number: 10731007
    Abstract: Provided is an addition-curable silicone rubber composition that contains (A) an alkenyl group-containing organopolysiloxane, (B) an organohydrogenpolysiloxane, (C) a platinum catalyst and (D) a reinforcement filler material surface treated with a benzotriazole derivative represented by formula (I) (in the formula, R1 is a hydrogen atom or a monovalent hydrocarbon group and R2 is a monovalent organic group) and that is capable of lowering the compression set of a cured article and suppressing changes in hardness after heat degradation characteristic testing while suppressing reduced curability. Also provided are a cured article thereof and a manufacturing method for the addition-curable silicone rubber composition.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hidenori Mizushima, Shigeru Ubukata, Shigeki Shudo, Nobu Kato
  • Patent number: 10730273
    Abstract: The present invention is a resin composition including: (A) an epoxy resin; (B) an epoxy compound shown by the following formula (1) and/or formula (2); (C) an epoxy compound shown by the following formula (3); (D) a phenolic curing agent; and (E) a curing accelerator, wherein “A” represents a single bond or a divalent organic group selected from the following formulae. This provides a resin composition with improved strength, reduced warpage, and excellent adhesion, a resin film with improved strength formed from the composition, a semiconductor laminate containing the cured material of the resin film and a method for manufacturing the same, as well as a semiconductor device into which the semiconductor laminate is diced and a method for manufacturing the same.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoichiro Ichioka, Naoyuki Kushihara, Kazunori Kondo, Kazuaki Sumita
  • Patent number: 10734132
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a sodium salt, a potassium salt, or an ammonium salt including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe, Takayuki Fujiwara, Motoaki Iwabuchi, Yasuyoshi Kuroda
  • Patent number: 10730817
    Abstract: The object of the present invention is to provide an industrial and economical process for preparing (E2,Z6)-2,6-nonadienal of the following formula (4): The present invention provides a process for preparing (E2,Z6)-2,6-nonadienal (4), comprising at least steps of: subjecting (Z3,Z6)-3,6-nonadien-1-ol of the following formula (1): to oxidation with a sulfoxide compound of the following formula (2): CH3(R1)S?O??(2) in which R1 represents a monovalent hydrocarbon group having from 1 to 12 carbon atoms, in the presence of a sulfur trioxide complex and an amine compound of the following formula (3): N(R2)(R3)(R4)??(3) in which R2, R3, and R4 each independently represent a monovalent hydrocarbon group having from 1 to 12 carbon atoms, or R3 and R4 may be bonded to each other to form a divalent hydrocarbon group having from 3 to 12 carbon atoms, R3-R4, to form the aforesaid (E2,Z6)-2,6-nonadienal (4).
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: August 4, 2020
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Miyoshi Yamashita, Yuki Miyake, Takeshi Kinsho
  • Publication number: 20200241418
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Application
    Filed: January 28, 2020
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Publication number: 20200239320
    Abstract: A reaction furnace for producing a polycrystalline silicon according to the present invention is designed so as to have an in-furnace reaction space in which a reaction space cross-sectional area ratio (S=[SO?SR]/SR) satisfies 2.5 or more, which is defined by an inner cross-sectional area (So) of a reaction furnace, which is perpendicular to a straight body portion of the reaction furnace, and a total sum (SR) of cross-sectional areas of polycrystalline silicon rods that are grown by precipitation of polycrystalline silicon, in a case where a diameter of the polycrystalline silicon rod is 140 mm or more. Such a reaction furnace has a sufficient in-furnace reaction space even when the diameter of the polycrystalline silicon rod has been expanded, and accordingly an appropriate circulation of a gas in the reaction furnace is kept.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shigeyoshi NETSU, Naruhiro HOSHINO, Tetsuro OKADA, Hiroshi SAITO
  • Publication number: 20200241417
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: December 30, 2019
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Masaki Ohashi
  • Publication number: 20200239641
    Abstract: A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, wherein R1 and R2 each independently represent a substituted or unsubstituted C1-C50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX2, or (NH)(3-r)/2—SiR1R2r (R1 and R2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX2 is denoted by p, p satisfies 0?p/(2n+4)?0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a?1, 0?b<1, and a+b=1.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masato Kawakami, Shotaro Aoki, Ayumu Kiyomori
  • Publication number: 20200241414
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: December 30, 2019
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Masaki Ohashi
  • Publication number: 20200243855
    Abstract: A method for producing a negative electrode active material containing particles of negative electrode active material containing particles of silicon compound. The method includes preparing a container in which silicon has been contained; melting the silicon contained in the container to form a silicon melt; generating a mixed gas in which a silicon gas and a silicon oxide gas are mixed by introducing a raw material which generates a silicon oxide gas into the silicon melt; producing particles of silicon compound containing a silicon compound (SiOx: 0.5x<1.0) by solidifying and depositing the mixed gas on an adsorption plate, and inserting lithium into the particles of silicon compound.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takakazu HIROSE, Hiromichi KAMO, Masahiro FURUYA, Takumi MATSUNO
  • Publication number: 20200239321
    Abstract: A reactor 200 according to the present invention includes a heater storage section serving as a space section capable of accommodating a carbon heater for initial heating of silicon core wires. A carbon heater 13 is loaded in a deposition reaction space 20 in the reactor 200 only when necessary for initial heating of silicon core wires 12. After initial heating of the silicon core wires 12 is finished, the carbon heater 13 is unloaded from the deposition reaction space to the heater storage section 30. As a result, the carbon heater 13 is not unduly damaged in the reactor any longer and its deterioration is reduced. In addition, because of reduction in reaction with hydrogen gas in the reactor, the generation of methane is reduced, and thus carbon contamination of polycrystalline silicon is reduced.
    Type: Application
    Filed: April 15, 2020
    Publication date: July 30, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yasushi Kurosawa, Shigeyoshi Netsu, Naruhiro Hoshino
  • Patent number: 10726967
    Abstract: The present invention provides: a biological electrode composition formable a living body contact layer for a biological electrode which is excellent in conductivity and biocompatibility, as well as light in the weight thereof and producible at a low cost, and in addition, which does not cause a significant decrease in the conductivity thereof regardless of under a water-wet condition and a dry condition; a polymer compound which can be suitably used for the biological electrode composition; a polymerizable monomer suitable as a raw material of the polymer compound; a biological electrode having a living body contact layer formed of the biological electrode composition; and a method for producing the same; and wherein, the polymerizable monomer is represented by the following general formula (1).
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe, Motoaki Iwabuchi, Takayuki Fujiwara
  • Patent number: 10727129
    Abstract: A substrate manufacturing method includes: a first step of disposing a condenser for condensing a laser beam in a non-contact manner on a surface 20r of a magnesium oxide single crystal substrate 20 to be irradiated; and a second step of irradiating a laser beam to a surface of the magnesium oxide single crystal substrate 20 and condensing the laser beam into an inner portion of the single crystal member under designated irradiation conditions using the condenser, and at a same time, two-dimensionally moving the condenser and the magnesium oxide single crystal substrate 20 relatively to each other, and sequentially forming processing marks to sequentially allow planar peeling.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: July 28, 2020
    Assignees: SHIN-ETSU POLYMER CO., LTD., NATIONAL UNIVERSITY CORPORATION SAITAMA UNIVERSITY, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Junichi Ikeno, Yohei Yamada, Hideki Suzuki, Hitoshi Noguchi
  • Patent number: 10725378
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of brominated benzene-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10727410
    Abstract: A surface modifier for a transparent oxide electrode contains a reactive silyl compound represented by General Formula (1): Rf—X-A-SiR13-n(OR2)n??(1) in which, Rf is an aryl group having 10 or fewer carbon atoms that may have an alkyl substituent having 1 to 5 carbon atoms, wherein at least one hydrogen atom is replaced with a fluorine atom, X represents a divalent group selected from —O—, —NH—, —C(?O)O—, —C(?O)NH—, —OC(?O)NH—, —NHC(?O)NH—, or a single bond, A represents a straight chain, branched chain or cyclic aliphatic divalent hydrocarbon group having 1 to 10 carbon atoms, an aromatic divalent hydrocarbon group, or a single bond, a surface-modified transparent oxide electrode formed by coating with the surface modifier. A method for producing a surface-modified transparent oxide electrode is also provided.
    Type: Grant
    Filed: November 19, 2013
    Date of Patent: July 28, 2020
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ayumu Kiyomori, Yusuke Itoh
  • Patent number: 10725377
    Abstract: A negative resist composition comprising a sulfonium compound having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaaki Kotake, Satoshi Watanabe, Keiichi Masunaga, Kenji Yamada, Masaki Ohashi
  • Patent number: 10723808
    Abstract: Provided is a method for producing a cellulose ether including a drying step capable of continuously and stably drying a highly adhesive wet cellulose ether with high thermal efficiency without causing adhesive growth and solidification of the wet cellulose ether in a dryer. More specifically, the method for producing a cellulose ether includes a step of drying a wet cellulose ether having water content of more than 50% by weight in a rotary type through-flow dryer.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Mitsuhiro Yoshida
  • Patent number: 10723807
    Abstract: Provided is a method for producing a hydroxyalkyl alkyl cellulose having high thermal gel strength while suppressing a reduction in thermal gelation temperature. More specifically, provided is a method for producing a hydroxyalkyl alkyl cellulose including steps of: mixing cellulose pulp with a first alkali metal hydroxide solution to obtain alkali cellulose, reacting the alkali cellulose with an alkylating agent and a hydroxyalkylating agent to obtain a first reaction product mixture, adding a second alkali metal hydroxide solution to the first reaction product mixture without further adding any of alkylating and hydroxyalkylating agents to obtain a second reaction product mixture, and subjecting the second reaction product mixture to purification to obtain a hydroxyalkyl alkyl cellulose.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Akira Kitamura, Mitsuo Narita