Abstract: An adhesive composition, including: a reaction product (A) among a bifunctional epoxy resin represented by the formula (2), a tri- or more functional epoxy resin represented by the formula (3), and a saturated acid anhydride represented by the following general formula (4); a UV-sensitive reaction initiator (B); and a dilution solvent (C), wherein the component (A) is a compound represented by the formula (1), a ratio of a total mole of epoxy groups in the multi-functional epoxy resin to a mole of the saturated acid anhydride is 1.30 to 3.00, and a mole of the bifunctional epoxy resin relative to a total mole of the multi-functional epoxy resin is 0.001 to 0.15. This provides a highly reliable epoxy-resin-based adhesive composition and film-shaped sealing material having a low viscosity, curability at low temperature, and high adhesiveness, and retaining power generation performance of a perovskite solar cell before and after sealing.

Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a substituted or unsubstituted salicylic acid exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

Abstract: Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.

Abstract: A molecular resist composition is provided comprising (A) a betaine type onium compound having a sulfonium cation moiety and a sulfonate anion moiety in a common molecule, the sulfonium cation moiety having a phenyl group substituted with an optionally heteroatom-containing monovalent hydrocarbon group, the phenyl group being attached to the sulfur atom, and (B) an organic solvent, the resist composition being free of a base resin. When processed by lithography using KrF, ArF excimer laser, EB or EUV, the resist composition is improved in dissolution contrast, EL, MEF, and LWR.

Abstract: A negative electrode active material for a non-aqueous electrolyte secondary battery which contains a negative electrode active material particle. The negative electrode active material particle contains a silicon compound particle containing Li2SiO3. When measuring the negative electrode active material particle by X-ray diffraction, a half-value width of a peak derived from the Li2SiO3 (020) plane is in a range from 1.1° to 1.5° inclusive, and formulae (1) to (3) are all satisfied, 1.1?Ib/Ia?1.5??(1) I(24.8°)/Ia?0.5??(2) I(28.4°)/Ia?1.0??(3) where Ia denotes intensity of a peak derived from the Li2SiO3 (020) plane, Ib denotes intensity of a peak derived from the Li2SiO3 (111) plane, I(24.8°) denotes intensity at 2?=24.8°, and I(28.4°) denotes intensity at 2?=28.4°.

Abstract: A resist composition comprising a polymer is provided, the polymer comprising photo-decomposable repeat units derived from a sulfonium salt having a polymerizable unsaturated bond, a sulfonium cation site, and a link therebetween, the link having a urethane bond, thiourethane bond or urea bond. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A water repellent composition containing a component that is a condensation reaction product between: an organopolysiloxane shown by the following general formula (1) and having a hydroxyl group or an alkoxy group at both terminals of a molecular chain of the organopolysiloxane, (R2O)R12SiO—(R12SiO)m—SiR12(OR2) (1); and a trialkylsiloxysilicate containing R13SiO1/2 an unit, an SiO2 unit, and a siloxane unit having a hydroxyl group bonded to a silicon atom, where a molar ratio of the R13SiO1/2 unit/the SiO2 unit is 0.6 to 1.3, and a content of the hydroxyl group is 0.1 or more and less than 2.0 mass %. A water repellent composition which is used as a water repellent in water repellency, particularly suitably applied as an agent for paintwork and a glass surface of an automobile, so as to impart initial water repellency and long-lasting water repellency.

Abstract: An oil-bleeding silicone rubber composition which comprises 100 parts by mass of (A) an organopolysiloxane containing an alkenyl group, 0.2-20 parts by mass of (B) an organohydrogenpolysiloxane containing a hydrogen atom bonded to a silicon atom, (C) a catalyst based on a platinum-group metal, the amount of which is 0.5-500 ppm in terms of platinum-group metal amount (in mass) with respect to the total mass of the components (A) and (B), 1-10 parts by mass of (D) a specific phenyl-group-containing organopolysiloxane, 1-25 parts by mass of (E) a specific nonfunctional dimethylpolysiloxane, and (F) a specific benzotriazole derivative, the amount of which is 2-100 mol per mol of the platinum atoms contained in the component (C). The oil-bleeding silicone rubber composition gives cured objects having improved heat resistance, without containing any of conventional additives for improving heat resistance.

Abstract: According to the present invention, a coating composition which contains (A) a hydrolyzable silyl group-containing acrylic resin, (B) an organopolysiloxane that is represented by average unit formula (I), and (C) a curing catalyst is able to be produced by a simple process; and this coating composition forms a cured coating film that has excellent cracking resistance. coating film hardness, chemical resistance, alkali resistance, heat resistance and weather resistance. (SiO4/2)a(R1SiO3/2)b(R12SiO2/2)c(R13SiO1/2)d(R2O1/2)e??(I) (In the formula, each R1 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, and at least one of the R1 moieties represents a substituted or unsubstituted aryl group having 6 to 12 carbon atoms; R2 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; a, b, c and d represent numbers that satisfy, 0?a<1, 0<b<1, 0<c?0.

Abstract: A spray coating containing a rare earth fluoride and/or a rare earth acid fluoride contains carbon at 0.01-2% by mass or titanium or molybdenum at 1-1000 ppm. When an acid fluoride is not contained, the spray coating is gray to black in which, in terms of the L*a*b* chromaticity, L* is 25-64, a* is ?3.0 to +5.0, and b* is ?4.0 to +8.0. When an acid fluoride is contained, the spray coating is white or gray to black in which, in terms of the L*a*b* chromaticity, L* is equal to or greater than 25 and less than 91, a* is ?3.0 to +5.0, and b* is ?6.0 to +8.0. By forming this coating on a plasma resistant member, a partial color change is reduced, thus, a member that is capable of reliably realizing the original longevity is obtained.

Abstract: A method for producing a gallium precursor, including, a step of preparing a solvent comprising an aqueous solution containing an acid and/or an alkali, a step of immersing gallium in the solvent, a step of making the gallium immersed in the solvent fine, and a step of dissolving the fined gallium. This provides a method for producing a gallium precursor with high quality and highly productive.

Abstract: Provided is a novel device or a novel implantation device. The implantation device is one of the following: (1) an implantation device comprising a material (A) having a density of 12 mg/cm3 or more and a dissolution rate of 80% or less as determined after immersion of the material (A) in physiological saline at 37° C. for 24 hours; and (2) an implantation device comprising a material (A) having a dissolution rate of 80% or less as determined after immersion of the material (A) in physiological saline at 37° C. for 24 hours and a ratio of X/Y of 0.24 or more wherein X is a density (mg/cm3) of the material (A) and Y is a degree of swelling of the material (A) expressed in terms of fold increase as determined after immersion of the material (A) in physiological saline at 37° C. for 60 minutes.

Abstract: The present invention is an onium salt represented by the following general formula (1), wherein RALU represents any one of a tertiary ether, tertiary carbonate or acetal formed together with the adjacent oxygen atom; I represents an iodine atom; Ra represents a hydrocarbyl group having 1 to 20 carbon atoms and optionally having a heteroatom; and Z+ represents an onium cation. This can provide an onium salt used for a resist composition that has high sensitivity, excellent resolution, improved LWR (roughness) and CDU (critical dimension uniformity), and that can inhibit collapse of a resist pattern in lithography.

Abstract: A negative electrode including: a negative electrode current collector with a roughened surface; and a negative electrode active material layer provided on the negative electrode current collector. The negative electrode active material layer includes: negative electrode active material particles containing a compound of lithium, silicon, and oxygen; and a composite compound filled in interparticle gaps and a surface layer of the negative electrode active material particles, the composite compound at least containing chemically bonded carbon and oxygen atoms, the composite compound not being alloyed with the negative electrode active material particles. A ratio O/Si of the oxygen to the silicon constituting the negative electrode active material particles is in the range of 0.8 or more and 1.2 or less.

Abstract: The present invention provides a composition for forming an adhesive film that provides an adhesive film that yields good pattern profiles and has high adhesion to a resist upper layer film to prevent collapse of fine patterns in a fine patterning process during semiconductor apparatus manufacturing processes, as well as a patterning process using the composition and a method for forming an adhesive film using the composition. As such, provided is a composition for forming an adhesive film directly under a resist upper layer film. The composition includes: (A) a polymer containing a repeating unit shown by the following general formula (1) and a repeating unit shown by the following general formula (2); and (B) an organic solvent.

Abstract: This two-component type room temperature fast-curing organopolysiloxane composition: includes a first agent containing, at a specific ratio, (A) a specific structure organopolysiloxane having a silanol group or a hydrolyzable silyl group at molecular chain ends thereof, (B) a hydrolyzable organosilane compound and/or a partially hydrolyzed condensate thereof that releases a cyclic ketone compound as a leaving group (leaving substance) by hydrolysis, and (C) a curing catalyst; and a second agent containing, in a specific amount, (A?) a specific structure organopolysiloxane having a silanol group at molecular chain ends thereof; and has more excellent hardenability than one-component type room temperature-curing organopolysiloxane compositions. This composition leaves or releases a cyclic ketone compound such as cyclobutanone or cyclopentanone as a leaving group (leaving compound) at the time of curing, and thus solves hazard or safety problems with respect to human bodies or environments.

Abstract: The present invention provides a pattern forming method using an adhesion film forming composition comprising (A) a polymer compound, (B) a thermal acid generator, and (C) an organic solvent includes steps of: (I-1) applying the adhesion film forming composition onto a substrate to be processed and thereafter performing thermal treatment to form an adhesion film; (I-2) forming a resist upper layer film on the adhesion film using a resist upper layer film forming composition; (I-3) performing pattern exposure on the resist upper layer film and thereafter developing the resist upper layer film with a developer to form a circuit pattern on the resist upper layer film; and (I-4) transferring a pattern to the adhesion film and the substrate to be processed by dry etching with the resist upper layer film on which the circuit pattern is formed as a mask.

Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has advantages including solvent solubility and improved lithography properties such as high sensitivity, high contrast, EL, and LWR when processed by photolithography using high-energy radiation.

Abstract: A molecular resist composition and a pattern forming process. A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography. The molecular resist composition does not contain a base polymer. The molecular resist composition comprising a sulfonium salt having a cation of specific partial structure has a high sensitivity and forms a resist film with improved resolution and LWR, so that the resist composition is quite useful for precise micropatterning.

Abstract: A defect inspection apparatus has a defect detection unit 152 that acquires first defect information on a defect of a photomask blank MB as a substrate; and a comparative information acquisition unit 150 that acquires a result of comparison between predetermined defect information stored in a storage unit 155 and the first defect information.