Patents Assigned to Shin-Etsu Chemical Co., Ltd.
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Publication number: 20240063339Abstract: A method for fabricating light emitting diode (LED) dice includes the steps of: providing a substrate, and forming a plurality of die sized semiconductor structures on the substrate. The method also includes the steps of providing a receiving plate having an elastomeric polymer layer, placing the substrate and the receiving plate in physical contact with an adhesive force applied by the elastomeric polymer layer, and performing a laser lift-off (LLO) process by directing a uniform laser beam through the substrate to the semiconductor layer at an interface with the substrate to lift off the semiconductor structures onto the elastomeric polymer layer. During the laser lift-off (LLO) process the elastomeric polymer layer functions as a shock absorber to reduce momentum transfer, and as an adhesive surface to hold the semiconductor structures in place on the receiving plate.Type: ApplicationFiled: October 26, 2023Publication date: February 22, 2024Applicants: SamiLEDs Corporation, SHIN-ETSU CHEMICAL. CO., LTD.Inventors: Chen-Fu Chu, SHIH-KAI CHAN, YI-FENG SHIH, DAVID TRUNG DOAN, TRUNG TRI DOAN, YOSHINORI OGAWA, KOHEI OTAKE, KAZUNORI KONDO, KEIJI OHORI, TAICHI KITAGAWA, NOBUAKI MATSUMOTO, TOSHIYUKI oZAI, SHUHEI UEDA
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Publication number: 20240059929Abstract: An organosilicon compound represented by formula (1). (R1 is an alkyl, alkenyl, aryl, or acyl group, R2 is an alkyl or aryl group, R3 is a hydrogen atom or a methyl group, A1 is a single bond or an alkylene group, A2, A3, and A4 are each a methylene group or an oxygen atom, with the proviso that at least one of the A2, A3, and A4 moieties is an oxygen atom, and n is an integer of 1-3.Type: ApplicationFiled: December 15, 2021Publication date: February 22, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shigeki YASUDA, Minoru URATA
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Publication number: 20240059842Abstract: Provided are an organic titanium compound and curing catalyst capable of quickly curing a room temperature-curable organopolysiloxane composition when added thereto, and improving an adhesiveness of a cured product of such composition, especially an adhesiveness thereof after being dipped in warm water, while maintaining an unimpaired storage stability. The organic titanium compound is a reaction product of an organooxy group- and chelating ligand-containing organic titanium compound represented by an average composition formula (I) Ti(OR)4-a(X)a wherein R is a substituted or unsubstituted monovalent hydrocarbon group having 1 to 12 carbon atoms, X is a chelating ligand, a is a number of 0.1 to 3.5; and a fatty acid ester of a polyhydric alcohol.Type: ApplicationFiled: January 20, 2022Publication date: February 22, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Taiki KATAYAMA, Takafumi SAKAMOTO
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Patent number: 11905368Abstract: Provided is a water-repellent member in which a silica layer having a specific thickness and mainly composed of silica nanoparticles is provided on the outer surfaces of various substrates, and then a water- and oil-repellent layer having a specific thickness and containing a cured product of a fluorine-containing organosilicon compound as a main component is provided on the outer surface of the silica layer. The water-repellent member is obtained by a method comprising: a step for wet coating a dispersion containing silica nanoparticles and a solvent onto the outer surface of a substrate; a step for drying and removing the solvent from the dispersion; a step for wet coating a solution containing a fluorine-containing organosilicon compound and a solvent onto the outer surface of a silica layer formed by drying and removing the solvent; and a step for drying and removing the solvent from the solution to cure the fluorine-containing organosilicon compound.Type: GrantFiled: June 12, 2018Date of Patent: February 20, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Yuji Yamane, Lisa Katayama, Ryusuke Sakoh, Takashi Matsuda
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Patent number: 11904521Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.Type: GrantFiled: September 26, 2017Date of Patent: February 20, 2024Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
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Patent number: 11909038Abstract: A negative electrode active material containing a negative electrode active material particle; the negative electrode active material particle including a silicon compound shown by SiOx (0.5?x?1.6), and having a peak in a range of 539 to 541 eV in a XANES spectrum obtained by XANES measurement of the negative electrode active material particle. This provides a negative electrode active material that is capable of increasing battery capacity and improving cycle performance when it is used as a negative electrode active material for a secondary battery.Type: GrantFiled: August 23, 2017Date of Patent: February 20, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takakazu Hirose, Reiko Sakai
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Publication number: 20240052172Abstract: A resin-coated metal powder according to the present invention is obtained by covering at least a part of the surface of a metal powder with a hydrolyzable resin that has an average composition of general formula (1) and a number average molecular weight of from 500 to 100,000; and this resin-coated metal powder exhibits sufficient dispersibility in an aqueous solution, while being stable for a relatively long period of time even in the coexistence of water in an aqueous coating material.Type: ApplicationFiled: October 14, 2020Publication date: February 15, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Shotaro AOKI, Ayumu KIYOMORI
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Publication number: 20240053678Abstract: A resist composition comprising an acid compound, a photoacid generator of iodonium salt type and/or a photo-decomposable quencher of iodonium salt type, and a base polymer has a high sensitivity, reduced edge roughness or size variation, improved resolution and satisfactory storage stability.Type: ApplicationFiled: July 26, 2023Publication date: February 15, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yutaro Otomo, Tomohiro Kobayashi
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Publication number: 20240053675Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.Type: ApplicationFiled: October 26, 2023Publication date: February 15, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki YARITA, Daijitsu HARADA, Masaki TAKEUCHI
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Publication number: 20240051839Abstract: A sprayed article is disclosed including a substrate and a sprayed coating deposited thereon and containing a rare earth oxyfluoride as main phase. Provided is a slurry for suspension plasma spraying, which is a spray material used for suspension plasma spraying in an atmosphere including an oxygen-containing gas, contains 5-40 mass % of rare earth fluoride particles having a maximum particle diameter (D100) of 12 ?m or less, and contains one or more types of solvent selected from among water and organic solvents. A rare earth acid fluoride-containing sprayed film, in which process shift and particle generation hardly occur, can be stably formed on a base material by carrying out suspension plasma spraying in an atmosphere including an oxygen-containing gas. A spraying member provided with this sprayed film exhibits excellent corrosion resistance to halogen-based gas plasma.Type: ApplicationFiled: October 26, 2023Publication date: February 15, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yasushi Takai, Noriaki Hamaya
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Patent number: 11901475Abstract: The present invention is a method for manufacturing a substrate for a solar cell composed of a single crystal silicon, including the steps of: producing a silicon single crystal ingot; slicing a silicon substrate from the silicon single crystal ingot; and subjecting the silicon substrate to low temperature thermal treatment at a temperature of 800° C. or more and less than 1200° C., wherein the silicon single crystal ingot or the silicon substrate is subjected to high temperature thermal treatment at a temperature of 1200° C. or more for 30 seconds or more before the low temperature thermal treatment. As a result, it is possible to provide a method for manufacturing a substrate for a solar cell that can prevent decrease in the minority carrier lifetime of the substrate even when the substrate has higher oxygen concentration.Type: GrantFiled: November 25, 2015Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hiroyuki Otsuka, Shozo Shirai
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Patent number: 11897807Abstract: A porous glass base material manufacturing apparatus for an optical fiber includes: a liquid mass flow controller for controlling a flow rate of raw material liquid of an organic siloxane; a vaporizer for mixing raw material liquid and carrier gas to vaporize raw material liquid to form mixed gas; a raw material liquid nozzle for ejecting raw material liquid into the vaporizer; a carrier gas supply pipe for supplying carrier gas into the vaporizer; a raw material liquid pipe for introducing raw material liquid into the nozzle; a burner for combusting mixed gas with combustible gas and combustion supporting gas to produce SiO2 particles; a mixed gas pipe for supplying mixed gas to the burner; an open/close valve on a flow path of the raw material liquid pipe; and a purge gas supply pipe that joins the raw material liquid pipe between the valve and the raw material liquid nozzle.Type: GrantFiled: July 25, 2022Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoto Noda, Hitoshi Iinuma
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Patent number: 11896377Abstract: A bio-electrode, excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, and free from large lowering of the electric conductivity even though it is wetted with water or dried, includes an electro-conductive base material and a living body contact layer formed on the electro-conductive base material. The living body contact layer is a cured material of a bio-electrode composition including (A) an ionic material and (C) a metal powder, wherein the component (A) is a polymer compound containing a repeating unit-a having a structure selected from an ammonium salt, a sodium salt, a potassium salt, and a silver salt of any of fluorosulfonic acid, fluorosulfonimide, and fluorosulfonamide.Type: GrantFiled: July 20, 2021Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa, Motoaki Iwabuchi, Yasuyoshi Kuroda
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Patent number: 11901545Abstract: Methods for producing a negative electrode active material particle which includes a silicon compound particle containing a silicon compound that contains oxygen. The methods including preparing a silicon compound particle containing a silicon compound that contains oxygen; inserting Li into the silicon compound particle; and heating, while stirring, the Li-inserted silicon compound particle in a furnace to produce a negative electrode active material particle, wherein at least part of Si constituting the silicon compound particle is present in at least one state selected from oxide of Si2+ to Si3+ containing no Li, and compound containing Li and Si2+ to Si3+.Type: GrantFiled: February 2, 2022Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takakazu Hirose, Takumi Matsuno, Reiko Sakai, Kohta Takahashi, Hidekazu Awano
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Patent number: 11897773Abstract: A carbide-coated carbon material including a base material containing carbon as a main component and chlorine, and a carbide layer containing a carbide as a main component and chlorine, the carbide layer being disposed on the base material. The base material has, near an interface between the base material and the carbide layer, a base material buffer region where a chlorine concentration continuously changes in a direction toward the carbide layer. The carbide layer has, near the interface between the base material and the carbide layer, a carbide layer buffer region where the chlorine concentration continuously changes in a direction toward the base material. The carbide-coated carbon material has sufficient adhesion strength in the interface between the carbide layer and the base material containing carbon as a main component.Type: GrantFiled: June 7, 2021Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Akihiro Hirate, Waichi Yamamura
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Patent number: 11897989Abstract: A fluorine-containing curable composition which contains, as essential components, component (A) that is composed of a compound which is a linear polymer having a fluoropolyether in the main chain, while having a trifluoromethyl group at one end of the molecular chain and two or more (meth)acryl groups at the other end, component (B) that is composed of a compound which is a linear polymer having a fluoropolyether in the main chain, while having two or more (meth)acryl groups at each end of the molecular chain, and which has four to ten (meth)acryl groups in each molecule on average, and component (C) that is composed of a non-fluorinated acrylic compound which contains no fluoropolyether structure, while having two or more (meth)acryl groups in each molecule on average; the total blending amount of component (A) and component (B) relative to 100 parts by mass of component (C) is from 0.Type: GrantFiled: May 26, 2020Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventor: Yasunori Sakano
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Publication number: 20240047243Abstract: A microstructure-transfer stamp component including a substrate and a silicone-based rubber film formed on the substrate, wherein a surface of the silicone-based rubber film facing away from the substrate has one or more recesses each being closed except for a surface opening. This provides a microstructure-transfer stamp component that can optimize temporary adhesive strength of the surface of the silicone-based rubber film stamp in a short period of time.Type: ApplicationFiled: November 16, 2021Publication date: February 8, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hideo NAKAGAWA, Yoshinori OGAWA, Toshiyuki OZAI
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Publication number: 20240043983Abstract: An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 ?m thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.Type: ApplicationFiled: October 18, 2023Publication date: February 8, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yasushi Takai, Noriaki Hamaya
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Patent number: 11892773Abstract: A photosensitive resin composition, a patterning process performed using the photosensitive resin composition, a cured film formed by curing the pattern, and an electronic component having the cured film. The photosensitive resin composition includes a resin, a photosensitizer, a surfactant containing a structural unit represented by formula (1), and a solvent, where Y1 and Y2 each independently represent a hydrogen atom, a methyl group, a phenyl group, or a group represented by formula (2), at least one of Y1 and Y2 is a group represented by formula (2), R1 to R6 are monovalent hydrocarbon groups that may be the same or different and optionally contain a heteroatom, having 1 to 20 carbon atoms, “1” and “n” are each independently integers of 1 to 100, and “m” is an integer of 0 to 100.Type: GrantFiled: September 8, 2021Date of Patent: February 6, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hiroyuki Urano, Masashi Iio, Katsuya Takemura
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Patent number: 11891701Abstract: A spraying material comprising a rare earth (R), aluminum and oxygen, the spraying material being a powder and comprising a crystalline phase of a rare earth (R) aluminum monoclinic (R4Al2O9) and a crystalline phase of a rare earth oxide (R2O3), with respect to diffraction peaks detected within a diffraction angle 2? range from 10° to 70° by a X-ray diffraction method using the characteristic X-ray of Cu-K?, the spraying material having diffraction peaks attributed to the rare earth oxide (R2O3) and diffraction peaks attributed to the rare earth (R) aluminum monoclinic (R4Al2O9), and an intensity ratio I(R)/I(RAL) of an integral intensity I(R) of the maximum diffraction peak attributed to the rare earth oxide (R2O3) to an integral intensity I(RAL) of the maximum diffraction peak attributed to the rare earth aluminum monoclinic (R4Al2O9) being at least 1.Type: GrantFiled: April 8, 2020Date of Patent: February 6, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Ryo Iwasaki, Noriaki Hamaya, Toshihiko Tsukatani, Yugo Taniguchi