Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Publication number: 20210222008
    Abstract: Provided is an organo-polysiloxane composition for use in release paper or release film, capable of forming a hardened coat having a low release force. The invention is an organo-polysiloxane composition for use in release paper or release film, containing the components (A) to (D). (A) An organo-polysiloxane having two or more silicon atom-bound alkenyl groups within one molecule: 100 parts by mass. (B) An organo-hydrogen polysiloxane having at least an average of two or more silicon atom-bound hydrogen atoms (Si—H groups) within one molecule: an amount such that the number of moles of the Si—H groups is equal to 1 to 5 times that of the number of moles of the alkenyl groups within the (A) component. (C) A compound having one or more (meth)acrylic groups within one molecule, and whereof the molecular weight is 72 to 1,000: 0.01 to 3 parts by mass with respect to 100 parts by mass of the (A) component.
    Type: Application
    Filed: June 21, 2019
    Publication date: July 22, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshiaki IHARA, Ataru KOBAYASHI, Takeharu TOYOSHIMA
  • Publication number: 20210226080
    Abstract: A solar cell including a semiconductor substrate having a first conductivity type an emitter region, having a second conductivity type opposite to the first conductivity type, on a first main surface of the semiconductor substrate an emitter electrode which is in contact with the emitter region a base region having the first conductivity type a base electrode which is in contact with the base region and an insulator film for preventing an electrical short-circuit between the emitter region and the base region, wherein the insulator film is made of a polyimide, and the insulator film has a C6H11O2 detection count number of 100 or less when the insulator film is irradiated with Bi5++ ions with an acceleration voltage of 30 kV and an ion current of 0.2 pA by a TOF-SIMS method. The solar cell can have excellent weather resistance and high photoelectric conversion characteristics.
    Type: Application
    Filed: April 5, 2021
    Publication date: July 22, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroshi HASHIGAMI, Shun MORIYAMA, Takenori WATABE, Hiroyuki OHTSUKA
  • Publication number: 20210223684
    Abstract: The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 ?m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.
    Type: Application
    Filed: April 6, 2021
    Publication date: July 22, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi HAMADA
  • Patent number: 11066427
    Abstract: The invention provides an organosilane compound having a more bulky substituent group than the existing organosilane compounds. The compound is represented by formula (1) wherein R1 is a C4-C10 tertiary hydrocarbon group, R2 is a C1-C10 alkyl group, and LG is halogen or trifluoromethanesulfonyloxy.
    Type: Grant
    Filed: June 4, 2020
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shotaro Aoki, Ayumu Kiyomori
  • Patent number: 11066757
    Abstract: A method for manufacturing a diamond substrate, including: a first step of preparing patterned diamond on a foundation surface, a second step of growing diamond from the patterned diamond prepared in the first step to form the diamond in a pattern gap of the patterned diamond prepared in the first step, a third step of removing the patterned diamond prepared in the first step to form a patterned diamond composed of the diamond formed in the second step, and a fourth step of growing diamond from the patterned diamond formed in the third step to form the diamond in a pattern gap of the patterned diamond formed in the third step. There can be provided a method for manufacturing a diamond substrate which can sufficiently suppress dislocation defects, a high-quality diamond substrate, and a freestanding diamond substrate.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: July 20, 2021
    Assignees: Shin-Etsu Chemical Co., Ltd., National Institute of Advanced Industrial Science and Technology, National University Corporation Kanazawa University
    Inventors: Hitoshi Noguchi, Shozo Shirai, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato, Hiroyuki Kawashima, Daisuke Kuwabara, Satoshi Yamasaki, Daisuke Takeuchi, Norio Tokuda, Takao Inokuma, Tsubasa Matsumoto
  • Patent number: 11066585
    Abstract: An organopolysiloxane composition obtained by dissolving in a solvent an organopolysiloxane crosslinked product obtained by repeating one or more times a process of again introducing an organopolysiloxane and an organohydrogenpolysiloxane to a product, obtained by conducting an addition reaction of an organopolysiloxane of a specific structure and an organohydrogenpolysiloxane of a specific structure using a platinum group metal-based compound in 10-50 times the total mass of these polysiloxanes, and conducting an addition reaction using a platinum group metal-based compound.
    Type: Grant
    Filed: October 3, 2019
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Toshiaki Ihara
  • Patent number: 11067835
    Abstract: A starting material powder, which contains a rare earth oxide that is composed of terbium oxide and at least one other rare earth oxide selected from among yttrium oxide, scandium oxide and oxides of lanthanide rare earth elements (excluding terbium) and a sintering assistant that is formed of an oxide of at least one element selected from among group 2 elements and group 4 elements, is produced by having (a) terbium ions, (b) ions of at least one other rare earth element selected from among yttrium ions, scandium ions and lanthanide rare earth ions (excluding terbium ions) and (c) ions of at least one element selected from among group 2 elements and group 4 elements coprecipitate in an aqueous solution containing the components (a)-(c), then filtering and separating the coprecipitate, and subjecting the separated coprecipitate to thermal dehydration.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shinji Makikawa, Shinji Aoki, Yoshihiro Nojima
  • Patent number: 11066430
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Patent number: 11069560
    Abstract: A method of transferring a device layer in a SOI wafer obtained by stacking a Si layer, an insulator layer, and the device layer to a transfer substrate, includes a step of temporarily bonding a surface on which the device layer is formed of the SOI wafer to a supporting substrate using an adhesive for temporary bonding, a step of removing the Si layer of the SOI wafer until the insulator layer is exposed and obtaining a thinned device wafer, a step of coating only the transfer substrate with an adhesive for transfer and then bonding the insulator layer in the thinned device wafer to the transfer substrate via the adhesive for transfer, a step of thermally curing the adhesive for transfer under a load at the same time as or after bonding, a step of peeling off the supporting substrate, and a step of removing the adhesive.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shigeru Konishi, Yoshihiro Kubota
  • Patent number: 11069557
    Abstract: A method for producing a thin wafer includes: separating the support body from the laminate by irradiating a wafer laminate, which includes a support body, an adhesive layer formed on the support body, and a wafer laminated with a surface thereof including a circuit plane facing the adhesive layer, with light from a side of the support body of the wafer laminate; and after separating, removing a resin layer remaining on the wafer from the wafer by peeling, wherein the adhesive layer includes only a resin layer A with a light-blocking property, and a resin layer B including a thermosetting silicone resin or a non-silicone thermoplastic resin in this order from the side of the support body.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Yasuda, Michihiro Sugo
  • Publication number: 20210215853
    Abstract: Provided is an antireflective member that has a water- and oil-repellent layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellent properties, and durability. The surface of the multi-layered antireflective layer on a base material has a root-mean-square surface roughness of 0.8 nm to 2.0 nm. The water- and oil-repellent layer has a thickness of 1 to 30 nm and is a cured product of water- and oil-repellents having as principal components a fluorooxyalkylene group-containing polymer modified organosilicon compound with the numerical average molecular weight of 4,500 to 10,000 of a fluoropolymer part and/or partial hydrolysis condensate thereof.
    Type: Application
    Filed: March 8, 2018
    Publication date: July 15, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuji YAMANE, Lisa KATAYAMA, Ryusuke SAKOH, Takashi MATSUDA
  • Patent number: 11061319
    Abstract: A photomask blank is processed into a transmissive photomask for use in photolithography for forming a pattern on a recipient using exposure light. The photomask blank comprises a transparent substrate, a first film of a material which is etchable by chlorine/oxygen-based dry etching, and a second film of a silicon-containing material. The second film includes a layer having a refractive index n of at least 1.6 or an extinction coefficient k of at least 0.3 with respect to the wavelength of inspection light which is longer than the exposure light.
    Type: Grant
    Filed: June 4, 2018
    Date of Patent: July 13, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takuro Kosaka, Tsuneo Terasawa, Shigeo Irie, Takahiro Kishita
  • Patent number: 11059973
    Abstract: Provided are a resin composition capable of yielding a cured product exhibiting a superior heat resistance over a long period of time, and a superior reflow resistance due to a low water absorption rate even at a high temperature; and a semiconductor device encapsulated by such cured product. The resin composition is a heat-curable resin composition containing: (A) an organopolysiloxane having, in one molecule, at least one cyclic imide group and at least one siloxane bond; (B) an inorganic filler; and (C) a radical polymerization initiator. The semiconductor device is encapsulated by the cured product of such heat-curable resin composition.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: July 13, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoshihiro Tsutsumi, Naoyuki Kushihara, Norifumi Kawamura, Yoshihira Hamamoto, Yuki Kudo
  • Patent number: 11059998
    Abstract: A waterproof sheet which is for application to a site to be waterproofed in order to prevent rainwater infiltration thereinto and retard deteriorations which proceed with time, the waterproof sheet comprising: a base layer that comprises a silicone rubber composition reinforced with reinforcing fibers and that has physical properties including high strength; and a pressure-sensitive silicone adhesive layer that has been formed on one surface of the base layer and that has a low hardness and is highly tacky. The waterproof sheet provided by the present invention less breaks than conventional waterproof sheets because of the reinforcement layer, and can conform to cracks or dislocations occurring in the surfaces to which the waterproof sheet has been applied, due to the pressure-sensitive adhesive layer formed on one surface.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: July 13, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takao Uno, Hisaharu Yamaguchi, Masahiro Yoda, Takeshi Nakajima
  • Patent number: 11059036
    Abstract: Provided are the following: a mixture of visible light-responsive photocatalytic titanium oxide fine particles which can conveniently produce a photocatalyst thin film that exhibits photocatalyst activity even with only visible light (400-800 nm) and that exhibits high transparency; a dispersion liquid of the fine particles; a method for producing the dispersion liquid; a photocatalyst thin film; and a member having the photocatalyst thin film on a surface thereof. The mixture of visible light-responsive photocatalytic titanium oxide fine particles is characterized by containing two kinds of titanium dioxide fine particles: first titanium oxide fine particles, in which a tin component and a transition metal component (excluding an iron group element component) that increases visible light response properties form a solid solution, and second titanium oxide fine particles, in which an iron group element component and a chromium group element component form a solid solution.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: July 13, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Manabu Furudate, Tomohiro Inoue
  • Publication number: 20210206924
    Abstract: This organopolysiloxane composition, when cured at room temperature by moisture in the atmosphere, provides a silicone rubber cured product having good self-adhesiveness to a magnesium alloy. The organopolysiloxane composition contains (A) an organopolysiloxane having a hydroxy group and/or a hydrolysable silyl group at both ends of the molecular chain, (B) an organic silicon compound other than (A) and (C), having at least three hydrolysable groups bonded to a silicon atom per molecule, and/or a partial hydrolysis-condensation product thereof, and (C) a silane coupling agent having a specific molecular structure having a carboxylic acid silyl ester bond. Furthermore, a novel compound, having an alkoxysilyl group and a carboxylic acid silyl ester group per molecule, can have improved adhesiveness/bonding properties with respect to a base material due to the effect of carboxylic acid after hydrolysis thereof.
    Type: Application
    Filed: October 9, 2018
    Publication date: July 8, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Akira UTA, Takafumi SAKAMOTO
  • Patent number: 11057014
    Abstract: An object of the present invention is to provide a bonded substrate which is excellent in temperature characteristics and suppresses unnecessary response due to reflection of an elastic wave at a bonding interface. [Means to Solve the Problems] The present invention is unique in that a bonded substrate is constructed by bonding a LiTaO3 substrate and a base plate wherein a Li concentration at a base plate-bonding face of the LiTaO3 substrate is higher than that at a LiTaO3 substrate-side end face of the bonded substrate, that the difference between the Li concentration at the base plate-bonding face of the LiTaO3 substrate and the Li concentration at the LiTaO3 substrate-side end face of the bonded substrate is 0.1 mol % or greater, that the Li concentration at the base plate-bonding face of the LiTaO3 substrate satisfies an equation Li/(Li+Ta)×100=(50+?) mol %, where ? is in the range of ?1.2<?<0.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: July 6, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayuki Tanno, Koji Kato, Yoshinori Kuwabara
  • Patent number: 11052511
    Abstract: An outer blade cutting wheel is provided comprising an annular thin disc base and a blade section of bonded abrasive grains on the periphery of the base. Provided that an imaginary range is delineated by two imaginary planes extending parallel to the planar surfaces of the base and tangent to widthwise side portions of the blade section and two imaginary circumferences defined about the rotational axis and extending tangent to inner and outer perimeters of the blade section, the blade section occupies 10-40% by volume of the imaginary range minus the region of the base, and the widthwise side portions of the blade section have a dented shape relative to the imaginary planes. The cutting wheel is capable of cutoff machining at a high feed speed while maintaining a high accuracy and a low cutting load.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: July 6, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Harukazu Maegawa
  • Patent number: 11054738
    Abstract: A pellicle characterized by having an amount of released aqueous gas of 1×10?3 Pa·L/s or less per pellicle, an amount of released hydrocarbon-based gas of 1×10?5 Pa·L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 4×10?7 Pa·L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23° C. and 1×10?3 Pa or less.
    Type: Grant
    Filed: December 2, 2019
    Date of Patent: July 6, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Yu Yanase
  • Patent number: 11053410
    Abstract: A fluorochemical coating composition is provided comprising (A) a hydrolyzable group-containing silane modified with a fluorooxyalkylene-containing polymer and (B) a fluorooxyalkylene-containing polymer having an average molecular weight not higher than the average molecular weight of component (A) in a weight ratio (A)/(B) of 40/60 to 95/5. The composition forms on a substrate a water/oil repellent layer which does not detract from the visibility of the substrate.
    Type: Grant
    Filed: March 18, 2015
    Date of Patent: July 6, 2021
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yamane, Shinichi Sato, Noriyuki Koike, Takashi Matsuda, Ryusuke Sakoh