Abstract: An onium salt monomer containing an aromatic sulfonic acid anion having a vinyl-substituted aromatic ring is provided as well as a polymer comprising repeat units derived from the monomer. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR, CDU and DOF, collapse resistance during fine pattern formation, and etch resistance after development.

Abstract: Provided is a novel composition, in particular, a composition comprising an inorganic-organic hybrid compound. The composition comprises an inorganic-organic hybrid compound and a hydrophobic resin, wherein the inorganic-organic hybrid compound comprises a polyvinyl alcohol-based resin to which a metal oxide is chemically bonded.

Abstract: The present invention is a composition for forming a metal-containing film, containing: (A) a metal compound containing at least one kind of metal selected from the group consisting of Ti, Zr, and Hf; (B) a crosslinking agent containing, per molecule, 2 or more and 4 or fewer cyclic ether structures having 2 to 13 carbon atoms; and (C) a solvent. This can provide: a composition for forming a metal-containing film having better dry etching resistance than conventional organic underlayer film materials and also having high filling and planarizing properties; and a patterning process in which the composition is used.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at the position a or ? and linked to an aromatic group having an iodine atom or a bromine atom and a carboxylate anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: The fluorene skeleton-containing polymer can form a film more excellent in heat resistance than that obtained from a conventional fluorene skeleton-containing polymer containing a siloxane structure. The polymer has a silphenylene skeleton, a polysiloxane skeleton, and a fluorene skeleton in a main chain, and contains a polyhydric alcohol structure in a side chain.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ?- or ?-position and linked to an aromatic group having an iodine atom or a bromine atom and a carboxylate anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at ?- or ?-position and linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A thermally conductive silicone composition comprising (A) a crosslinked silicone gel, (B) a silicone oil containing neither an aliphatic unsaturated bond nor an SiH group, (C) a thermally conductive filler having an average particle diameter of 0.01-100 ?m, the amount of which is 10-2,000 parts by mass per 100 parts by mass of the sum of the (A) and (B) components, and (D) gallium or a gallium alloy having a melting point of ?20 to 100° C., the amount of which is 1,000-10,000 parts by mass per 100 parts by mass of the sum of the (A) and (B) components. The thermally conductive silicone composition has a high thermal conductivity and is excellent in terms of applicability and dislocation resistance.

Abstract: A resist composition comprising a bisonium salt containing a divalent anion having an arylsulfonate anion structure linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.

Abstract: A hydrophilic copolymer comprising a constituent unit (a) represented by formula (1) and a constituent unit (b) represented by formula (2) is used to impart a coating film excelling in hydrophilicity, antifogging, and water resistance. (In formula (1), R1 represents a hydrogen atom or methyl group, each R2 independently represents a hydrogen atom or C1-6 alkyl group, and X1 represents a divalent linking group. In formula (2), R3 represents a hydrogen atom or methyl group, R4 and R5 each independently represent a C1-10 alkyl group or C6-10 aryl group, X2 represents a bivalent linking group, n represents an integer from 1 to 3, and the asterisk (*) represents a bond to an adjacent constituent unit.

Abstract: Provided is a method for manufacturing an optical fiber preform includes supporting at least one end of an optical fiber preform with a gripping portion; and heating the optical fiber preform while rotating it to process the optical fiber preform, wherein the optical fiber preform is gripped by the gripping portion via a buffer material comprising the gripping portion; wherein the buffer material includes a surface side member in contact with the optical fiber preform, and a surface side member in contact with the gripping portion; wherein a composition of the surface side member in contact with the optical fiber preform and the surface side member in contact with the gripping portion are different; and the surface side member in contact with the optical fiber preform does not contain any of Ca, Mg, Al, K, Na, Mg, or Ba.

Abstract: A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.

Abstract: The invention provides an anisotropic rare earth sintered magnet having an Nd2Fe14B-type compound crystal as a main phase and containing Ce, and exhibiting good magnetic characteristics, and a method for producing the same. The anisotropic rare earth sintered magnet has a composition of a formula Rx(Fe1?aCoa)100?x?y?zByMz (where R is two or more kinds of elements selected from rare earth elements and indispensably including Nd and Ce), in which the main phase is formed of an Nd2Fe14B-type compound crystal, main phase grains such that the Ce/R? ratio in the center part of the grains (where R? is one or more kinds of elements selected from rare earth elements and indispensably including Nd) is lower than the Ce/R? ratio in the outer shell part thereof exist, and a Ce-containing R?-rich phase and a Ce-containing R?(Fe,Co)2 phase exist in the grain boundary part. The production method is for producing the anisotropic rare earth sintered magnet.

Abstract: The purpose of the present invention is to provide: a cyclic organosiloxane which contains an imide bond and a polymerizable unsaturated bond, and which provides a cured product having excellent hardness and bending resistance; and a curable resin composition comprising the cyclic organosiloxane. The present invention provides: a cyclic organosiloxane which contains an imide bond and a polymerizable unsaturated bond and which is represented by general formula (1); and a curable resin composition comprising the cyclic organosiloxane.

Abstract: A monomer containing as a polymerizable group an acenaphthylene structure having an acid labile group of tertiary ester type attached thereto is provided as well as a polymer comprising repeat units derived from the monomer. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR and profile, collapse resistance during fine pattern formation, and etch resistance after development.

Abstract: The present disclosure provides an imprinting device and an imprinting method. The present disclosure also provides a stamp comprising a resin-made molding component.

Abstract: An onium salt containing an aromatic sulfonic acid anion having an alkyl or fluoroalkyl group, iodized aromatic ring, and fluorinated substituent group generates an acid with controlled diffusion. A chemically amplified positive resist composition comprising the onium salt is also provided. The resist composition is capable of forming a pattern.

Abstract: A bio-electrode composition contains particles having surfaces with an N-carbonyl sulfonamide salt shown by the following general formula (1). R1 represents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms and optionally having an aromatic group, ether group, or ester group, or an arylene group having 6 to 10 carbon atoms. Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 10 carbon atoms, and optionally has a fluorine atom. M+ represents an ion selected from the group consisting of lithium, sodium, potassium, and silver ions. This invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and prevents significant reduction in electric conductivity even when wetted with water or dried.

Abstract: Provided is a glass particulate deposit manufacturing method for manufacturing a glass particulate deposit comprising mounting a fixing jig on an outer periphery of an outermost pipe of a burner; inserting a burner cover from a tip end of the outermost pipe of the burner; and sandwiching and compressing a part of the fixing jig between the burner cover and the outermost pipe of the burner to fix the burner cover to the burner, wherein an outer diameter of a part of the fixing jig that is not compressed is greater than an inner diameter of a part of the burner cover inserted to the tip end of the outermost pipe of the burner.

Abstract: With respect to a reflective mask blank for a reflective mask used in EUV lithography using EUV light, the reflective mask blank including a substrate, a multilayer reflection film having a periodically laminated structure in which low-refractive index layers composed of a material containing molybdenum and high-refractive index layers are alternately laminated, a protection film, and an absorber film is provided. The low-refractive index layer consists of one or more of first low-refractive index sublayers, and one or more of second low-refractive index sublayers that have a different composition from a composition of the first low-refractive index sublayer.