Abstract: A monomer containing as a polymerizable group an acenaphthylene structure having an acid labile group of tertiary ester type attached thereto is provided as well as a polymer comprising repeat units derived from the monomer. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR and profile, collapse resistance during fine pattern formation, and etch resistance after development.

Abstract: An onium salt containing an aromatic sulfonic acid anion having an alkyl or fluoroalkyl group, iodized aromatic ring, and fluorinated substituent group generates an acid with controlled diffusion. A chemically amplified positive resist composition comprising the onium salt is also provided. The resist composition is capable of forming a pattern.

Abstract: The present disclosure provides an imprinting device and an imprinting method. The present disclosure also provides a stamp comprising a resin-made molding component.

Abstract: The purpose of the present invention is to provide: a cyclic organosiloxane which contains an imide bond and a polymerizable unsaturated bond, and which provides a cured product having excellent hardness and bending resistance; and a curable resin composition comprising the cyclic organosiloxane. The present invention provides: a cyclic organosiloxane which contains an imide bond and a polymerizable unsaturated bond and which is represented by general formula (1); and a curable resin composition comprising the cyclic organosiloxane.

Abstract: With respect to a reflective mask blank for a reflective mask used in EUV lithography using EUV light, the reflective mask blank including a substrate, a multilayer reflection film having a periodically laminated structure in which low-refractive index layers composed of a material containing molybdenum and high-refractive index layers are alternately laminated, a protection film, and an absorber film is provided. The low-refractive index layer consists of one or more of first low-refractive index sublayers, and one or more of second low-refractive index sublayers that have a different composition from a composition of the first low-refractive index sublayer.

Abstract: Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

Abstract: Provided is a glass particulate deposit manufacturing method for manufacturing a glass particulate deposit comprising mounting a fixing jig on an outer periphery of an outermost pipe of a burner; inserting a burner cover from a tip end of the outermost pipe of the burner; and sandwiching and compressing a part of the fixing jig between the burner cover and the outermost pipe of the burner to fix the burner cover to the burner, wherein an outer diameter of a part of the fixing jig that is not compressed is greater than an inner diameter of a part of the burner cover inserted to the tip end of the outermost pipe of the burner.

Abstract: Provided is a method for producing a cured product of a heat-curable maleimide resin composition, that causes no curing failure and no appearance failure associated therewith. The method is for producing a cured product of a heat-curable maleimide resin composition containing: (A) a maleimide compound having at least one dimer acid frame-derived hydrocarbon group per molecule; and (B) a radical polymerization initiator, wherein the method includes: a laminating step of obtaining a laminate by laminating a release sheet, a resin layer made of the heat-curable maleimide resin composition, and a base material, in such order; and a curing step of heating the laminate to a temperature at which the heat-curable maleimide resin composition of the resin layer cures, without removing the release sheet of the laminate.

Abstract: A bio-electrode composition contains particles having surfaces with an N-carbonyl sulfonamide salt shown by the following general formula (1). R1 represents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms and optionally having an aromatic group, ether group, or ester group, or an arylene group having 6 to 10 carbon atoms. Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 10 carbon atoms, and optionally has a fluorine atom. M+ represents an ion selected from the group consisting of lithium, sodium, potassium, and silver ions. This invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and prevents significant reduction in electric conductivity even when wetted with water or dried.

Abstract: A resist composition comprises an onium salt of aromatic sulfonic acid having a linkage of two iodized or brominated aromatic groups as the acid generator is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: PURPOSE: To provide a method capable of detecting a large oxygen deposit existing in a silicon single crystal obtained by a CZ method with good sensitivity. CONSTITUTION: A silicon single crystal is subjected to heat treatment for 30 to 300 minutes at 900 to 1050 deg.C in a dry O2 atmosphere, then, is subjected to heat treatment for 30 to 200 minutes at 1100 to 1200 deg.C in a wet O2 atmosphere. After this crystal is treated with a dilute hydrofluoric acid and an oxide film on the surface of the crystal is removed, the crystal is dipped in a seco solution for 1 to 30 minutes to etch selectively the face <100> and lastly, the number of pieces of OSFs, which appear on the silicon single crystal surface, is found by an optical microscope. Accordingly, by this two-stage heat treatment, as a large oxygen deposit in the crystal is turned into the selective OSFs and the OSFs appear on the crystal surface, an inspection of the quality of the silicon single crystal can be carried out with high sensitivity.

Abstract: The resist composition comprises an onium salt of sulfonic acid which has a linkage of two iodized or brominated aromatic groups as the acid generator. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.

Abstract: A silicone gel composition in which a crosslinking agent and a base polymer having a specific molecular structure are selectively used in combination, which contains micropowdered silica having a hydrophobized surface and a specific epoxy-group-containing siloxane oligomer, and which yields a silicone gel cured product having a degree of penetration of 10-100 as specified by JIS K6249 upon curing is liquid at room temperature (23° C.±15° C.) but spreads little during application and undergoes little change in shape before and after curing, and therefore is suitable for sealing electrical/electronic components such as photocouplers.

Abstract: A negative electrode active material for a non-aqueous electrolyte secondary battery containing negative electrode active material particles in which the negative electrode active material particles include particles of a silicon compound (SiOx: 0.5?x?1.6), in which the negative electrode active material particles are at least partially coated with carbon material, the negative electrode active material particles contain Li in which content of the Li relative to the negative electrode active material particles is 9.7 mass % or more or less than 13.2 mass %, at least part of the Li is present as Li2SiO3, and when the negative electrode active material particles are measured by X-ray diffraction using Cu-K? rays, an intensity Ia of a peak around 2?=47.5° attributable to Si obtained by the X-ray diffraction and a peak intensity Tb of a peak around 2?=18.7° attributable to Li2SiO3 obtained by the X-ray diffraction satisfy 1?Ib/Ia?18.

Abstract: The photosensitive resin composition can be used to form a fine size pattern. The photosensitive resin composition includes: (A) a silicone resin that has a silphenylene structure, a polysiloxane structure, and a fluorene structure at a main chain and has an acryloyl group or a methacryloyl group at a side chain; and (B) a photoradical generator.

Abstract: An absorption film of a reflective mask blank that is formed on a protection film and can be etched by ion beam etching or methanol etching is patterned by providing an etching prevention film contacted with both of the protection film and the absorption film, and a first hard mask film on the absorption film, and patterning the absorption film by ion beam etching or methanol etching with using a pattern of the first hard mask film as an etching mask.

Abstract: The present invention is a composition for forming an organic film, containing: (A) a polymer having a repeating unit represented by the following general formula (1); (B) a resin for forming an organic film; and (C) a solvent, where R1 represents a divalent organic group having 2 to 30 carbon atoms including an aliphatic moiety or an aromatic moiety, each R2 independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a hydroxy group, an alkoxy group having 1 to 6 carbon atoms, a halogen atom other than a fluorine atom, a cyano group, an amino group, or a nitro group, and “a” represents 0 or 1, “b” representing 1 to 4 and “c” representing 0 to 3 when “a” is 0, or “b” representing 1 to 6 and “c” representing 0 to 5 when “a” is 1. This can provide a composition for forming an organic film having excellent film-formability on a substrate and excellent filling property, and being excellent in hump-suppression at the time of an EBR process.

Abstract: Provided is a silicone gel composition which contains, as a base polymer, a silicon-bonded alkenyl group-containing straight-chain or branched-chain organopolysiloxane containing a specific amount of a diphenylsiloxane unit in the molecule, and contains a specific blending amount of a cross-linking agent having a specific molecular structure, a platinum-based curing catalyst, a hydrophobized fine silica powder, and an isocyanuric acid derivative having a specific molecular structure having at least two trialkoxysilyl-substituted alkyl groups in the molecule, wherein the curing of the silicone gel composition gives a silicone gel cured product having a penetration of 10-100 as specified in JIS K6249.

Abstract: An organic silicon compound having a ketimine structure having good storage stability can be obtained by a production method that produces an organic silicon compound having a ketimine structure indicated by formula (1) R1 and R2 each independently indicating a C1-10 alkyl group or a C6-10 aryl group, R3 and R4 each independently indicating a hydrogen atom, a C1-10 alkyl group, or a C6-10 aryl group, n indicating an integer of 1-3, and m indicating an integer of 1-12. The method includes steps (I) and (II) and has a chlorine atom content relative to the organic silicon compound indicated by formula (1) of less than 0.1 mass ppm. Step (I): an amino group-containing silicon compound indicated by formula (2) and a carbonyl compound indicated by formula (3) are caused to react. R1-R4, n, and m are as described above. Step (II): the chlorine atom content is reduced.

Abstract: A negative electrode active material for a non-aqueous electrolyte secondary battery containing a negative electrode active material particle which includes a silicon compound particle containing a silicon compound (SiOx: 0.5?x?1.6). The silicon compound particle contains a Li compound, at least a part of the silicon compound particle is coated with a carbon material, and at least a part of a surface of the silicon compound particle, a surface of the carbon material, or both of them is coated with a layer containing a compound having a silyl group.