Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Publication number: 20240332362
    Abstract: A method for manufacturing a laminate substrate which includes a single crystal diamond (111) layer, includes heteroepitaxially growing an intermediate layer on an underlying substrate whose main surface has an off angle within a range, ?8.0° or more and ?0.5° or less, or +0.5° or more and +8.0° or less in a crystal axis [_1_1 2] direction or a threefold symmetry direction thereof relative to a crystal plane orientation of (111); forming diamond nuclei on a surface of the intermediate layer; and heteroepitaxially growing, on the intermediate layer surface on which the nuclei are formed, a single crystal diamond (111) layer which has an off angle within a range, more than ?10.5° and less than ?2.0°, or more than +2.0° and less than +10.5° in a crystal axis [_1_1 2] direction or a threefold symmetry direction thereof relative to a crystal plane orientation of (111).
    Type: Application
    Filed: June 13, 2024
    Publication date: October 3, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hitoshi NOGUCHI
  • Publication number: 20240329532
    Abstract: An acetal modifier affording a triple bond-bearing group serving as a protective group for an aliphatic or aromatic hydroxy group is provided as well as a polymer adapted to turn alkali soluble as a result of deprotection under the action of acid, the polymer comprising repeat units A1 having on side chain a structure including an aromatic hydroxy group protected with a triple bond-bearing group acid labile group. A chemically amplified positive resist composition comprising the polymer is also provided.
    Type: Application
    Filed: March 8, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Kenji Funatsu, Keiichi Masunaga, Masaaki Kotake, Yuta Matsuzawa
  • Publication number: 20240327578
    Abstract: Provided are a novel silicone-based polymer compound with excellent mechanical properties and a silicone-based polymer material containing the silicone-based polymer compound. The silicone-based polymer compound of the present invention is a silicone-based polymer compound (H) having a polysiloxane backbone as the main chain, wherein the polysiloxane backbone has at least one host group in a side chain, and the host group is a monovalent group formed by removing one hydrogen atom or one hydroxy group from a cyclodextrin or a cyclodextrin derivative.
    Type: Application
    Filed: July 21, 2022
    Publication date: October 3, 2024
    Applicants: OSAKA UNIVERSITY, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoshinori Takashima, Akira Harada, Motofumi Osaki, Junsu Park, Daichi Yoshida, Hideo Nakagawa, Minoru Igarashi, Nobu Kato, Masanao Kamei, Kentaro Ogura
  • Publication number: 20240329527
    Abstract: An onium salt monomer is provided as well as a resist composition comprising a polymer comprising repeat units derived from the onium salt monomer. When processed by lithography using high-energy radiation, the resist composition exhibits satisfactory sensitivity, contrast, exposure latitude, edge roughness, dimensional uniformity, and depth of focus as well as collapse resistance and etch resistance.
    Type: Application
    Filed: March 7, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Masahiro Fukushima
  • Publication number: 20240329529
    Abstract: The resist composition exhibits a higher resolution and smaller edge roughness than those of a conventional organic solvent development type negative resist composition. Provided is a resist composition comprising a base polymer containing a polymer including a repeat unit having a carboxy group substituted with an acid labile group and a repeat unit having a maleimide group in a side chain.
    Type: Application
    Filed: March 12, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Publication number: 20240329522
    Abstract: A chemically amplified negative resist composition comprising (A) a photoacid generator in the form of an onium salt of aromatic sulfonic acid whose anion has a ring structure fused to an aromatic ring having a sulfo group bonded thereto and another aromatic ring structure containing a bulky substituent and (B) a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER and fidelity.
    Type: Application
    Filed: March 20, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake, Yuta Matsuzawa
  • Publication number: 20240324929
    Abstract: The present invention is a bio-electrode composition includes, as the component (A), a resin which has a urethan bond in a main chain and at least one salt selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with sulfonamide in a side chain. This can provide: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, capable of preventing significant reduction in the electric conductivity even when wetted with water or dried, soft, and excellent in stretchability and strength; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Application
    Filed: March 18, 2024
    Publication date: October 3, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun HATAKEYAMA, Joe IKEDA, Shiori NONAKA, Motoaki IWABUCHI, Koji HASEGAWA
  • Patent number: 12105420
    Abstract: The present invention provides a coating-type composition for forming an organic film containing: a polymer having a structure shown by the following general formula (1) as a partial structure; and an organic solvent, where in the formula (1), ring structures Ar1 and Ar2 represent a benzene ring or a naphthalene ring optionally having a substituent, and W1 represents an aryl group having 6 to 30 carbon atoms and optionally having a substituent. This provides a coating-type composition for forming an organic film that can form an organic film having high pattern-curving resistance and high dry-etching resistance, the composition being excellent in solvent solubility and having a low generation of defects.
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: October 1, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keisuke Niida, Daisuke Kori, Yasuyuki Yamamoto, Takayoshi Nakahara, Tsutomu Ogihara
  • Patent number: 12104113
    Abstract: This thermally conductive silicone composition contains: (A) 100 parts by mass of a diorganopolysiloxane in which both terminals of a molecular chain are blocked with hydroxy groups; (B) 150-600 parts by mass of an organopolysiloxane with a particular structure having at least one hydrolyzable silyl group in one molecule; (C) 0.1-100 parts by mass of a crosslinking agent component; (D) 1,500-6,500 parts by mass of zinc oxide particles which have an average particle diameter of 0.1 ?m to 2 ?m, and in which the content ratio of a coarse powder having a particle diameter of 10 ?m or more in a laser diffraction-type particle size distribution is 1 vol % or less with respect to the total amount of component (D); and (E) 0.01-30 parts by mass of an adhesion promoter, wherein the content of component (D) is 45-70 vol % with respect to the total composition.
    Type: Grant
    Filed: September 7, 2020
    Date of Patent: October 1, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Takahiro Yamaguchi
  • Patent number: 12107031
    Abstract: Provided are a thermal conductive silicone composition having a favorable heat dissipation property; and a semiconductor device using such composition. The thermal conductive silicone composition contains: (A) an organopolysiloxane that has a kinetic viscosity of 10 to 100,000 mm2/s at 25° C., and is represented by the following average composition formula (1) R1aSiO(4-a)/2??(1) wherein R1 represents a hydrogen atom, a saturated or unsaturated monovalent hydrocarbon group having 1 to 18 carbon atoms or a hydroxy group, and a represents a number satisfying 1.8?a?2.2; (B) a silver powder having a tap density of not lower than 3.0 g/cm3, a specific surface area of not larger than 2.0 m2/g and an aspect ratio of 1 to 30; (C) an elemental gallium and/or gallium alloy having a melting point of 0 to 70° C. and being present at a mass ratio [Component (C)/{Component (B)+Component (C)}] of 0.001 to 0.1; and (D) a catalyst.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: October 1, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shota Akiba, Kunihiro Yamada, Kenichi Tsuji
  • Patent number: 12105018
    Abstract: Provided is a method capable of precisely, reproducibly and directly measuring, by an ellipsometry method, optical constants (refractive index n, extinction coefficient ?) of a fluorine-containing organosilicon compound thin film having a homogeneous surface with a small surface roughness and haze value. The method for measuring the optical constants of the thin film of the fluorine-containing organosilicon compound, includes: a step of forming the thin film of the fluorine-containing organosilicon compound on a base material, the thin film having, as surface roughnesses, an arithmetic mean roughness of smaller than 1.0 nm and a root mean square roughness of smaller than 2.0 nm, a haze value of smaller than 0.3 and a film thickness of 3 to 10 nm; and a step of measuring the optical constants of the thin film formed on the base material by the ellipsometry method.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: October 1, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Takashi Uchida
  • Publication number: 20240315950
    Abstract: Provided is an alkyl-glycerin co-modified branched organopolysiloxane (polyglycerin-modified silicone in which a silicone chain and an alkyl chain are branched at a silicone main chain) having long-chain alkyl groups, glycerin groups, and branched-chain silicone groups, wherein: the organopolysiloxane is an organosiloxane in which the proportions of siloxane units having long-chain alkyl groups, siloxane units having glycerin groups, and siloxane units having branched-chain silicone groups, the chain length of the organopolysiloxane, the ratio of siloxane units, the amount of long-chain alkyl groups, and the amount of glycerin groups are specified; when the organopolysiloxane is blended with a composition containing a powder, the dispersibility and dispersion stability are excellent; and when the organopolysiloxane is blended with a cosmetic, a cosmetic having excellent spreadability and blendability with the skin as well as exceptional stability over time is obtained even when the cosmetic contains an oil-so
    Type: Application
    Filed: February 2, 2022
    Publication date: September 26, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Taro IMAI, Masaru MIYAUCHI, Masayuki KONISHI
  • Publication number: 20240316910
    Abstract: The present invention provides: a thermally conductive sheet product wherein both surfaces of a fluorine rubber-based thermally conductive sheet are protected from foreign substances and the like, and excellent setting workability is achieved between a heat generation member and a heat dissipation member; and a method for producing this thermally conductive sheet product.
    Type: Application
    Filed: July 4, 2022
    Publication date: September 26, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hidenori KOSHIKAWA, Akihiro ENDO
  • Publication number: 20240321585
    Abstract: The present invention is a compound for forming a metal-containing film to be contained in a composition for forming a metal-containing film, where the compound for forming a metal-containing film includes at least one kind of metal atom selected from the group consisting of Ti, Zr, and Hf and one or more kinds of ligand derived from compounds represented by the following general formulae (1-A) to (1-D). This can provide: a metal compound having better dry etching resistance than conventional resist underlayer film materials and also having high filling and planarizing properties; a composition for forming a metal-containing film containing the compound; and a patterning process in which the composition is used.
    Type: Application
    Filed: February 19, 2024
    Publication date: September 26, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI, Kenta ISHIWATA
  • Publication number: 20240322162
    Abstract: A negative electrode active material for non-aqueous electrolyte secondary battery, the material including a negative electrode active material particle, wherein the particle contains a silicon compound particle containing a silicon compound containing oxygen, at least part of a surface of the compound particle is coated with carbon layer, the compound particle contains Li2SiO3 as a Li silicate, the Li2SiO3 is a material wherein at least a part of the Li2SiO3 is to change into Li4SiO4 by charging and discharging the particle once or more, and an abundance ratio of the Li2SiO3 is higher than that of the Li4SiO4 before charging and discharging the particle, and the abundance ratio of the Li4SiO4 is higher than that of the Li2SiO3 after charge and discharge at 100 times. Provided is a material that can achieve increase in battery capacity with improvement of initial efficiency, sufficient battery cycle characteristics, and input characteristics.
    Type: Application
    Filed: December 7, 2021
    Publication date: September 26, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takakazu HIROSE, Takumi MATSUNO, Yusuke OSAWA, Reiko SAKAI, Hiroyuki KOIDE
  • Publication number: 20240319598
    Abstract: The present invention is a composition for forming a silicon-containing resist underlayer film, containing a condensation reaction-type thermosetting silicon-containing material (Sx), being a polysiloxane resin, where the material has a non-condensation reactive organic group that reacts with a radical chemical species, the resin includes more than 0 and 70 mol % or less of one or more of a repeating unit represented by the following general formula (Sx-4) and a repeating unit represented by the general formula (Sx-5), and the organic group remains unreacted after a heat-curing reaction of the polysiloxane resin. This provides: a composition for forming a resist underlayer film containing a thermosetting silicon-containing material in photolithography using a high-energy beam, the material improving sensitivity, LWR, and resolution of an upper layer resist and further contributing to the prevention of pattern collapse; and a patterning process using the composition for forming a resist underlayer film.
    Type: Application
    Filed: March 4, 2024
    Publication date: September 26, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takehiro SATO, Shun Kikuchi, Ryo Mitsui, Seiichiro Tachibana
  • Patent number: 12097484
    Abstract: Provided are titanium oxide fine particles capable of enhancing the photocatalytic activity of a photocatalyst when mixed with such photocatalyst. There are provided titanium oxide fine particles with at least an iron component and a silicon component solid-dissolved therein, in which the iron and silicon components are each contained in an amount of 1 to 1,000 in terms of a molar ratio to titanium (Ti/Fe or Ti/Si); and a titanium oxide fine particle dispersion liquid in which these titanium oxide fine particles are dispersed in an aqueous dispersion medium.
    Type: Grant
    Filed: February 21, 2020
    Date of Patent: September 24, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Manabu Furudate, Tomohiro Inoue
  • Patent number: 12098279
    Abstract: Through the present invention, by undergoing a step in which a straight-chain diorganopolysiloxane having silanol groups at both terminal ends of the molecular chain thereof, a hydrolyzable silane and/or a partial hydrolysis condensate thereof having a hydrolyzable group capable of detaching a lactic acid ester, and an amino-group-containing hydrolyzable organosilane and/or a partial hydrolysis condensate thereof are pre-mixed/reacted in advance and silanol groups at both terminal ends of the molecular chain of a main agent (base polymer) are blocked by specific hydrolyzable silyl groups, it is possible to manufacture a lactic-acid-ester-type room-temperature-curable organopolysiloxane composition excellent in all characteristics including curability, adhesive properties, workability, and the like that were not attainable by the conventional lactic-acid-ester-type room-temperature curable (RTV) silicone rubber composition.
    Type: Grant
    Filed: October 21, 2022
    Date of Patent: September 24, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Akitsugu Fujiwara, Takafumi Sakamoto
  • Patent number: 12098290
    Abstract: The present invention is a low dielectric silica powder, which has an average particle size of 0.1 to 30 ?m and a dielectric loss tangent of 0.0005 or less at 10 GHz. An object is to provide: a silica powder with an extremely small dielectric loss tangent; a resin composition containing the same; and a method for manufacturing a silica powder with a low dielectric loss tangent and strong adhesion at the interface to resin.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: September 24, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshio Shiobara, Hajime Itokawa
  • Publication number: 20240307291
    Abstract: A paste-like silicone composition includes (A) crosslinked organopolysiloxane and (B) oil in a liquid state at 25° C. The component (A) includes a hydrosilylated reaction product of (A-1) organohydrogenpolysiloxane having at least two hydrogen atoms bonded to a silicon atom per molecule, and (A-2) alkenyl group-containing organopolysiloxane having at least two alkenyl groups having 2 to 10 carbon atoms and being bonded to a silicon atom per molecule. Octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, and dodecamethylcyclohexasiloxane contained in the paste-like silicone composition are each less than 2,000 ppm. It is therefore possible for a stable paste-like silicone composition that has small changes over time such as plasticization return and emit less uncomfortable odor.
    Type: Application
    Filed: May 30, 2022
    Publication date: September 19, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Emi AKABANE