Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a fluorinated phenol exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.
Abstract: A low dielectric substrate for high-speed millimeter-wave communication includes a quartz glass cloth with a dielectric loss tangent of 0.0001 to 0.0015 and a dielectric constant of 3.0 to 3.8 at 10 GHz, and an organic resin with a dielectric loss tangent within 80% to 150% of the dielectric loss tangent of the quartz glass cloth at 10 GHz and a dielectric constant within 50% to 110% of the dielectric constant of the quartz glass cloth at 10 GHz. This provides a low dielectric substrate for high-speed millimeter-wave communication where the low dielectric substrate makes it possible to send signals that are stable and have excellent quality with no difference in propagation time between wirings even if the substrate has an uneven resin distribution and the quartz glass cloth above and below the wirings, and the difference in dielectric loss tangent between members has been reduced to lower transmission loss.
Abstract: A water repellent and oil repellent member which has a functional film layer serving as the first layer on at least one surface of a base material, while having a primer layer serving as the second layer on the outer surface of the functional film layer and additionally having a water repellent and oil repellent layer serving as the third layer on the outer surface of the primer layer, wherein: the primer layer is formed of a layer that has a film thickness of 10-500 nm, while being mainly composed of an organosilicon compound which has a plurality of silanol groups in each molecule; and the water repellent and oil repellent layer is formed of a layer that has a film thickness of 0.5-50 nm, while being mainly composed of a cured product of a hydrolyzable fluorine-containing compound. This water repellent and oil repellent member has excellent rubber eraser abrasion resistance, while exhibiting excellent antistatic properties.
Abstract: A positive resist composition comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by an acid labile group in the form of a tertiary hydrocarbon group containing a nitrogen atom and aromatic group exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.
Abstract: This dealcoholization room-temperature curable organopolysiloxane composition contains (A) a diorganopolysiloxane having a silicon atom-bonded hydroxy group and/or a hydrolyzable silyl group at both ends of the molecular chain, and has a coefficient of viscosity of 20-1,000,000 mPa·s, (B) an organopolysiloxane which is a partial (co-)hydrolysis-condensation product of a hydrolyzable organosilane compound having one or more silicon atom-bonded alkenyl groups and 1-3 silicon atom-bonded alkoxy groups, per molecule, (C) a hydrolyzable organosilane compound having one or more phenylene backbones and two or more amino groups, per molecule, and/or a partial hydrolysis-condensation product thereof.
Abstract: Provided is a composition that imparts an excellent flexibility to post-treatment fibers and textiles, provides a water-absorptive fiber surface and provides an excellent durability, and can maintain the water absorbency of the fiber surface even after a laundry treatment. Also provided is a fiber treatment agent that contains said composition as an effective component. The composition contains the following component (A) and component (B) wherein the content ratio on a mass basis represented by component (A)/[component (A)+component (B)] is 0.01-1. Component (A) is an organopolysiloxane represented by general formula (1) or a silane represented by general formula (2), and component (B) is water.
November 16, 2017
Date of Patent:
August 2, 2022
SHIN-ETSU CHEMICAL CO., LTD.
Takumi Fukamachi, Shunji Aoki, Yuta Hamajima
Abstract: A photosensitive resin composition comprising a silicone structure-containing polymer having crosslinking groups or crosslinking reaction-susceptible reactive sites in the molecule is coated onto a substrate to form a photosensitive resin coating which has improved substrate adhesion, a pattern forming ability, crack resistance, heat resistance, and reliability as protective film.
Abstract: A photomask blank has a first layer, a second layer, a third layer and a fourth layer. The first layer has a chromium content of 40 atomic % or less, an oxygen content of 38 atomic % or more, and a nitrogen content of 22 atomic % or less. The second layer has a chromium content of 38 atomic % or less, an oxygen content of 30 atomic % or more, a nitrogen content of 18 atomic % or less, and a carbon content of 14 atomic % or less. The third layer has a chromium content of 50 atomic % or less, an oxygen content of 30 atomic % or less, and a nitrogen content of 20 atomic % or more. The fourth layer has a chromium content of 44 atomic % or less, an oxygen content of 20 atomic % or more, a nitrogen content of 20 atomic % or less, and a carbon content of 16 atomic % or less.
Abstract: In an imprint mold-forming synthetic quartz glass substrate (1) of rectangular shape having dimensions L1 and L2 with L1?L2, a circular region is delineated on the substrate back surface by a circle of radius R with L2?2R?10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than ?(2R/100,000×1) ?m.
Abstract: The purpose of the present invention is to provide an addition-curable silicone rubber composition which gives a cured product having a controlled oil-bleeding property and releasability from a mold, without increasing an amount of a bleeding oil to be added. Thus, the present invention provides an addition-curable silicone rubber composition comprising the following components (A) to (D): (A) 100 parts by mass of an organopolysiloxane having at least two alkenyl groups each bonded to a silicon atom, (B) 0.
Abstract: The group III compound substrate manufacturing method of the present invention is a method for manufacturing a group III compound substrate by growing a group III compound crystal (1) by vapor phase epitaxy on a seed crystal (3) placed and fixed on a susceptor (2), the method comprising using a cleavable and separable material for at least one of the susceptor (2) and the seed crystal (3). A group III compound substrate manufactured by the group III compound substrate manufacturing method of the present invention is also provided. The present invention can provide the group III compound substrate manufacturing method which can manufacture a large-sized GaN crystal substrate of higher quality at a low cost while taking advantage of the high film forming rate of the vapor phase epitaxy method, and can provide a substrate manufactured by the method.
Abstract: A method for producing rare earth carbonate fine particles, including, forming a reaction solution in which an alkyldimethylamine oxide compound having a structure represented by the following formula (1) or a methylmorpholine oxide compound is added to an aqueous solution containing rare earth ion and an excess amount of urea with respect to the rare earth ion, such that the compound is added in an addition amount of 10 to 200 mol % relative to the rare earth ion, and subjecting the reaction solution to hydrothermal treatment to produce rare earth carbonate fine particles. This provides a method for producing rare earth carbonate fine particles of submicron or less and having excellent dispersibility. wherein R represents an alkyl group of C1 to C14.
Abstract: A release agent for plastic contains the following components (A) to (E) and has an average particle size of 200 nm or less: (A) 100 parts by mass of an organopolysiloxane having a viscosity at 25° C. of 100 to 100,000 mm2/s; (B) 0.1 to 15.0 parts by mass of one or more anionic surfactants; (C) 1.0 to 30.0 parts by mass of a polyoxyethylene alkyl ether; (D) 0.5 to 15.0 parts by mass of a polyoxyethylene sorbitan fatty acid ester; and (E) 50 to 100,000 parts by mass of water. The release agent is an organopolysiloxane emulsion having excellent dilution stability and mechanical stability and favorable wettability, and hardly cracking plastic.
Abstract: A sintering apparatus comprising: a furnace core tube containing a porous glass base material for optical fiber whose longitudinal direction is along the axial direction; and a multi-stage heater in which two or more heaters surround the furnace core tube and are arranged in the axial direction of the furnace core tube to form a heating area in the furnace core tube, is used. The sintering method includes a step in which the base material is heated in the heating area to perform a first dehydration process; and a step in which the base material is moved so that the position in the longitudinal direction of the base material where the dehydration was identified as the most insufficient, is at the position in the axial direction of the furnace core tube where the temperature is highest in the heating area, and then a second dehydration process is performed.
Abstract: Provided is a phase shift mask blank including a substrate, and a phase shift film thereon, the phase shift film composed of a material containing silicon and nitrogen and free of a transition metal, exposure light being KrF excimer laser, the phase shift film consisting of a single layer or a plurality of layers, the single layer or each of the plurality of layers having a refractive index n of at least 2.5 and an extinction coefficient k of 0.4 to 1, with respect to the exposure light, and the phase shift film having a phase shift of 170 to 190° and a transmittance of 4 to 8%, with respect to the exposure light, and a thickness of up to 85 nm.
Abstract: A method for producing a vinyl chloride type polymer is to produce the vinyl chloride type polymer by polymerizing a vinyl chloride monomer, or a mixture of a vinyl chloride monomer with a monomer copolymerizable with the vinyl chloride monomer in an aqueous medium by using a polymerization reactor. An aqueous solution of a copolymerized polyether having a weight-average molecular weight of 1,000 to 3,500 with a mole ratio of ethylene oxide to propylene oxide in the range of 10/90 to 60/40 and having an alkyl group or an aryl group at both the terminals thereof is charged into the polymerization reactor with an amount of 0.005 to 0.050 parts by weight as the copolymerized polyether relative to 100 parts by weight of the vinyl chloride monomer.
Abstract: A thermal conductive composite silicone rubber sheet includes a thermal conductive silicone rubber sheet and a thermosoftening silicone resin layer with a thickness of 0.5 to 10 ?m on one side of the thermal conductive silicone rubber sheet, the thermosoftening silicone resin layer having an viscosity at 70° C. of 700 Pa·s or lower, where the thermosoftening silicone resin layer has adhesion of 0.5 N/25 mm or higher at a normal temperature and the thermal conductive composite silicone rubber sheet has a thermal resistance lower than a value obtained by adding 0.3 cm2·K/W per one layer of one side of the thermosoftening silicone resin layer to a thermal resistance of the thermal conductive silicone rubber sheet. A thermal conductive composite silicone rubber sheet provided with an adhesive layer on one side of a thermal conductive silicone rubber sheet, makes it possible to impart adhesion without sacrificing thermal conductivity.
Abstract: Provided is a photosensitive resin composition comprising (A) a polymer including a silicone skeleton and (B) photo-acid generators, wherein the photo-acid generators (B) comprise (B1) a photo-acid generator which is an onium salt and (B2) a photo-acid generator which is not an onium salt.
Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and further containing at least one repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms with a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms without a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process of using it that show a particularly favorable mask dimension dependency and CDU in photolithography where a light source is a high-energy beam such as a KrF excimer laser beam, an electron beam, or an extreme ultraviolet ray.
Abstract: Provided are HPMCAS powder having high solubility when dissolved in a solvent and being capable of suppressing generation of undissolved materials; and a method for producing the powder. More specifically, provided is hypromellose acetate succinate powder having an average ratio of L to D of from 2.0 to 3.0, wherein L and D mean maximum and minimum diameters of each particle, respectively. Also provided is a method for producing a hypromellose acetate succinate, comprising the steps of: dissolving hypromellose powder in a solvent, esterifying the dissolved hypromellose with succinic anhydride and acetic anhydride in the presence of a catalyst to obtain a reaction mixture, and mixing the reaction mixture with water to precipitate hypromellose acetate succinate, wherein the reaction mixture just before being mixed with the water has a viscosity of from 100 to 200 Pa·s.