Abstract: The present invention is a composition for forming an organic film, containing: (A) a polymer having a repeating unit represented by the following general formula (1); (B) a resin for forming an organic film; and (C) a solvent, where R in the general formula (1) represents a saturated or unsaturated divalent organic group having 2 to 30 carbon atoms. This provides: a composition for forming an organic film which is excellent in film-formability (in-plane uniformity) on a substrate (wafer) and filling property and in which humps in an EBR process are suppressed; a method for forming an organic film, using the composition; and a patterning process.

Abstract: A chemically amplified negative resist composition comprising (A) a photoacid generator in the form of an onium salt of alkane sulfone type having a bulky substituent at ?-position of the sulfo group and a bulky aromatic ring structure in the anion and (B) a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with satisfactory LER and fidelity.

Abstract: A release film for pressure-sensitive silicone adhesives which comprises: any of various bases; a primer layer (first layer) disposed on at least one surface of the base, the primer layer having a specific thickness and comprising as a main component an organosilicon compound having a plurality of silanol groups in the molecule; and a release layer (second layer) disposed on the outer surface of the primer layer, the release layer having a specific thickness and comprising as a main component a cured object obtained from a hydrolyzable fluorinated compound. A release coating film having excellent releasing properties can be stably and easily imparted to various bases, and the primer layer and the release layer can be formed even by room-temperature (25° C.) application.

Abstract: A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

Abstract: A cleaning solution for temporary adhesive for substrates contains: tetrabutylammonium fluoride; dimethyl sulfoxide; and a liquid compound having a solubility parameter of 8.0 or more and 10.0 or less and having a heteroatom. The tetrabutylammonium fluoride is preferably contained at a content of 1 mass % or more and 15 mass % or less in 100 mass % of a total of the tetrabutylammonium fluoride, the dimethyl sulfoxide, and the liquid compound. The dimethyl sulfoxide is preferably contained at a content of 5 mass % or more and 30 mass % or less in 100 mass % of a total of the tetrabutylammonium fluoride, the dimethyl sulfoxide, and the liquid compound.

Abstract: A solar cell is provided with: a semiconductor substrate having a light-receiving surface and a non-light-receiving surface; a PN junction section formed on the semiconductor substrate; a passivation layer formed on the light-receiving surface and/or the non-light-receiving surface; and power extraction electrodes formed on the light-receiving surface and the non-light-receiving surface. The solar cell is characterized in that the passivation layer includes an aluminum oxide film having a thickness of 40 nm or less. As a result of forming a aluminum oxide film having a predetermined thickness on the surface of the substrate, it is possible to achieve excellent passivation performance and excellent electrical contact between silicon and the electrode by merely firing the conductive paste, which is conventional technology. Furthermore, an annealing step, which has been necessary to achieve the passivation effects of the aluminum oxide film in the past, can be eliminated, thus dramatically reducing costs.

Abstract: A polishing agent for a synthetic quartz glass substrate including at least: polishing particles; and water, wherein the polishing particles contain: composite oxide particles of cerium and yttrium; and composite amorphous particles of cerium and yttrium, and the composite oxide particles of cerium and yttrium have an average primary particle diameter of 30 nm or more and 80 nm or less, and the composite amorphous particles of cerium and yttrium have an average primary particle diameter of 100 nm or more and 300 nm or less.

Abstract: A patterning method of quantum dots, the method includes the steps of coating with a mixture containing quantum dots and a curable resin on a substrate to obtain a resin layer, ejecting a curing agent in a pattern shape on the resin layer by an inkjet method, performing a curing treatment to cure the portion of the resin layer where the curing agent was ejected, and removing an uncured portion of the resin layer with a solvent.

Abstract: The present invention is a pattern forming method includes steps of: forming a resist underlayer film by using a composition for forming a resist underlayer film on a substrate to be processed; forming a resist middle layer film on the resist underlayer film; forming a resist upper layer film on the resist middle layer film; forming a pattern in the resist upper layer film; transferring the pattern to the resist middle layer film; transferring the pattern to the resist underlayer film; forming the pattern in the substrate to be processed; trimming the resist underlayer film; and forming a staircase-shaped pattern in the substrate to be processed. The composition for forming a resist underlayer film contains a resin and an organic solvent. The resin represented by the following formula (1) is used.

Abstract: A chemically amplified positive resist composition is provided comprising a polymer comprising repeat units having a phenolic hydroxy group protected with a tertiary ether type acid labile group and an acid generator capable of generating a fluorinated aromatic sulfonic acid. A resist pattern with a high resolution, reduced LER, rectangularity, minimized influence of develop loading, and few development residue defects can be formed.

Abstract: Provided is a glass cloth fiber composite material having both an excellent electromagnetic wave shielding property and an excellent impact resistance, and is also superior in handling property since the material is a composite of a carbon nanotube unwoven cloth and a glass cloth, and employs no strongly acidic compound as being, for example, a protonating agent. The glass cloth composite material comprises one or more glass cloth layers and one or more carbon nanotube unwoven cloth layers, wherein at least one of the glass cloth and carbon nanotube unwoven cloth layers in the glass cloth composite material is impregnated with a heat-curable resin or has a heat-curable resin film laminated thereon.

Abstract: A release agent for plastic contains the following components (A) to (E) and has an average particle size of 200 nm or less: (A) 100 parts by mass of an organopolysiloxane having a viscosity at 25° C. of 100 to 100,000 mm2/s; (B) 0.1 to 15.0 parts by mass of one or more anionic surfactants; (C) 1.0 to 30.0 parts by mass of a polyoxyethylene alkyl ether; (D) 0.5 to 15.0 parts by mass of a polyoxyethylene sorbitan fatty acid ester; and (E) 50 to 100,000 parts by mass of water. The release agent is an organopolysiloxane emulsion having excellent dilution stability and mechanical stability and favorable wettability, and hardly cracking plastic.

Abstract: A method for producing a gallium precursor, including, a step of preparing a solvent comprising an aqueous solution containing an acid and/or an alkali, a step of immersing gallium in the solvent, a step of making the gallium immersed in the solvent fine, and a step of dissolving the fined gallium. This provides a method for producing a gallium precursor with high quality and highly productive.

Abstract: Provided is a solar cell that includes: a semiconductor substrate on which at least pn junctions are formed; a multiplicity of finger electrodes that are formed in a comb-like shape on at least one surface of the semiconductor substrate; and a plurality of bus bar electrodes that are arranged so as to be orthogonal to the lengthwise direction of the finger electrodes and are connected with the finger electrodes. This solar cell is configured so that the finger electrodes connected with one of the bus bar electrodes are separated from the finger electrodes connected with another bus bar electrode that is arranged so as to be parallel to this one of the bus bar electrodes, and ends in the lengthwise direction of adjacent two or more of the finger electrodes connected with each bus bar electrode are electrically connected with one another by auxiliary electrodes.

Abstract: A purpose of the present invention is to provide a siloxane suitable for preparing a medical material and a method for preparing the compound. The present invention provides a siloxane represented by the formula (1), wherein R1 is a hydrogen atom or a methyl group, R2 is a monovalent hydrocarbon group having 1 to 6 carbon atoms, L is a divalent hydrocarbon group which has 2 to 10 carbon atoms and may have one or more ether bonds, and A is a (poly)siloxane group represented by the formula (2) or (3), wherein n is an integer of 1 to 100, a is an integer of 0 to 10, b is an integer of 0 to 10, and c is an integer of 0 to 10, provided that a+b+c is 2 or more, and R is, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms. The present invention further provides a method for preparing the siloxane, a polymer comprising recurring units derived from the siloxane, and a medical material, particularly an ophthalmic device, comprising the aforesaid polymer.

Abstract: A transparent ceramic material is manufactured by molding a source powder into a compact, the source powder comprising a rare earth oxide consisting of at least 40 mol % of terbium oxide and the balance of another rare earth oxide, and a sintering aid, sintering the compact at a temperature T (1,300° C.?T?1,650° C.) by heating from room temperature to T1 (1200° C.?T1?T) at a rate of at least 100° C./h, and optionally heating from T1 at a rate of 1-95° C./h, and HIP treating the sintered compact at 1,300-1,650° C. The ceramic material has improved diffuse transmittance in the visible region and functions as a magneto-optical part in a broad visible to NIR region.

Abstract: Provided are a low-viscosity ultraviolet curable silicone composition capable of being used even in a surface exposure method and a lift-up method etc.; and a cured product superior in tensile strength and elongation at break.

Abstract: A method of fabricating a ceramic molded body for sintering, which includes molding a raw material powder containing a ceramic powder and a thermoplastic resin having a glass transition temperature higher than room temperature into a predetermined shape by isostatic pressing and in which a first-stage press-molded body is fabricated by subjecting a uniaxially press-molded body fabricated by uniaxially pressing the raw material powder into a predetermined shape or the raw material powder filled in a rubber die to a first-stage isostatic press molding at a temperature lower than a glass transition temperature of the thermoplastic resin and then a ceramic molded body is fabricated by heating this first-stage press-molded body to a temperature equal to or higher than the glass transition temperature of the thermoplastic resin and performing warm isostatic press molding as second-stage isostatic press molding.

Abstract: A reflective mask blank that is a material for a reflective mask used in EUV lithography using EUV light as exposure light, including a substrate, a multilayer reflection film that is formed on one main surface of the substrate and reflects the exposure light, and an absorber film containing tungsten, and another metal, a metalloid or a light element that is formed on the multilayer reflection film and absorbs the exposure light.

Abstract: A rubber composition which contains (A) an organosilicon compound represented by formula (1) and gives a cured object satisfying desired fuel (or power)-saving tire properties. (R1 represents an alkyl or aryl group, R2 represents an alkyl or aryl group, e, f, and g each indicate a number larger than 0 and satisfy g/(e+f+g)<0.05, and m is an integer of 1-3.