Abstract: A method for producing a light emitting diode supply substrate for transferring a plurality of light emitting diodes to a supply destination, including: a first mounting step of mounting a plurality of light emitting diodes on a supply substrate; a selective removal step of selectively removing defective light emitting diodes on the supply substrate, and a second mounting step of transferring a normal light emitting diode to a position where the defective light emitting diode has been arranged on the supply substrate. Thus, a method produces a light emitting diode supply substrate capable of producing a light emitting diode supply substrate capable of transferring a plurality of normal light emitting diodes to a supply destination.

Abstract: A carbon black dispersion composition for batteries contains carbon black, a dispersant, N-methyl-2-pyrrolidone, and from 0.0001 to 5 parts by weight of a hindered phenolic compound per 100 parts by weight of carbon black. The composition uses as the dispersing medium N-methyl-2-pyrrolidone, which increases the dispersibility of the carbon black, continues to maintain the dispersibility immediately after dispersion and provides an excellent shelf stability without expenditure of time and effort.

Abstract: This bile acid adsorbing agent composed of silica particles, to which an organosilicon compound represented by general formula (1) is bonded, has the advantage that water-absorption swelling does not occur. (In formula (1), R1, R2, and R3 each independently represent a hydrogen atom, a C1-C20 alkyl group, a vinyl group, a phenyl group, or a benzyl group, and R4 represents a group represented by general formula (2), provided that R1 and R3 may be bonded to each other to form a benzene ring.) (In formula (2), A represents a linear or branched divalent linking group which may contain a heteroatom, a urethane bond, a urea bond, a thiourethane bond, and/or a thiourea bond, R5,s each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, R6,s each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, and n represents an integer of 1-3.

Abstract: An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided. A resist composition comprising a polymer comprising repeat units derived from the onium salt has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a quencher containing a nitroxyl radical having an iodized aromatic ring is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: Provided is an ultraviolet curable silicone composition capable of being ejected via inkjet ejection. The composition of the invention is an ultraviolet curable silicone composition comprising: (A) an organopolysiloxane represented by the following general formula (1) wherein each R1 independently represents a group selected from a monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, an acryloyl group, a methacryloyl group, an alkyl acrylate group and an alkyl methacrylate group, while the component (A) has per molecule at least two groups selected from an acryloyl group, a methacryloyl group, an alkyl acrylate group and an alkyl methacrylate group; n represents a number satisfying 10?n?1,000; (B) a monofunctional (meth)acrylate compound having no siloxane structure; and/or (C) a multifunctional (meth)acrylate compound having no siloxane structure; and (D) a photopolymerization initiator.

Abstract: This perfluoropolyether-based adhesive composition contains: (A) a linear perfluoropolyether compound containing two or more alkenyl groups in one molecule and having a number average molecular weight of 2,000 or more and a weight loss ratio of 1% or less when heated at 150° C. for 1 hour; (B) a fluorine-containing organohydrogenpolysiloxane compound which contains at least one fluorine-containing organic group, and does not contain an epoxy group and a trialkoxysilyl group, and which has a number average molecular weight of 1,000-4,000 and a weight loss ratio of 20% or less when heated at 150° C.

Abstract: The present invention is a sulfonium-salt-type polymerizable monomer represented by the following formula (1), wherein “p” represents an integer of 1 to 3; R11 represents a C1-20 hydrocarbyl group; Rf represents a fluorine atom or a fluorine-atom-containing C1-6 group selected from alkyl, alkoxy, and sulfide; “q” represents an integer of 1 to 4; RALU represents an acid-labile group; “r” represents an integer of 1 to 4; R12 represents a C1-20 hydrocarbyl group; “s” represents an integer of 0 to 4; “t” represents an integer of 0 to 2; Rf and —O—RALU are bonded to adjacent carbon atoms; and A-X? represents a non-nucleophilic counterion having a polymerizable group A. This provides: a monomer to yield a polymer; the polymer contained in a resist composition; the composition having excellent solvent-solubility, sensitivity, contrast, and lithographic performance, and hardly causing pattern collapse even with fine patterning; and a patterning process using the composition.

Abstract: A voice coil motor yoke having a magnet bonding surface includes an annular groove inside a bonding region on the magnet bonding surface, the bonding region having substantially the same shape as a contour of a magnet to be bonded on the magnet bonding surface of the yoke. A region surrounded by the annular groove on the magnet bonding surface is an adhesive application region. A voice coil motor includes: a pair of the voice coil motor yokes; an adhesive applied to the adhesive application region of each of the pair of yokes; and a pair of rare earth magnets bonded via the adhesive to the bonding region of each of the pair of yokes.

Abstract: A resist composition comprising a base polymer and a quencher containing a compound having the formula (A) is provided.

Abstract: The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10, and R1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point.

Abstract: A resist composition comprising a base polymer and a quencher in the form of a heterocyclic amine compound having a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: This surface treatment agent using a compound represented by formula (1) or (2) can, even without having a hydrolyzable group, form a water repellent and oil repellent layer having excellent abrasion resistance under mild conditions such as at room temperature. [Rf represents a monovalent or divalent fluorooxyalkylene group-containing polymer residue, Y1 and Y2 each represent a single bond or a divalent hydrocarbon group, Q represents a group that has a Si-containing structure having a valence of 2-4, Si, or C, X represents an epoxy-containing group, k represents 0-2, m represents 1-5, n represents 1-3, Z represents H, —SiR3 (R represents an alkyl group or a phenyl group), or —W1-Q?-W2—X? (X? represents X or —SiR3, W1 and W2 each represent a single bond or a divalent hydrocarbon group, Q? represents a divalent group having a Si-containing structure), and ? represents 1 or 2].

Abstract: Provided are titanium oxide particles having a higher photocatalytic activity, particularly a higher visible light activity as compared to the conventional ones; a dispersion liquid thereof; a photocatalyst thin film formed using such dispersion liquid; a member having such photocatalyst thin film on its surface; and a method for producing the titanium oxide particle dispersion liquid. The titanium oxide particles are those with (1) a tin component and a visible light activity-enhancing transition metal component being solid-dissolved in the particles; and with (2) an iron component, a titanium component and a silicon component being adhered to the surfaces of the particles. The titanium oxide particle dispersion liquid is one with the titanium oxide particles being dispersed in an aqueous dispersion medium.

Abstract: A chemically amplified positive resist composition is provided comprising a polymer comprising units containing a phenolic hydroxy group and units containing a carboxy group protected with an acid labile group. A resist pattern with a high resolution, reduced LER, rectangularity, and minimized influence of develop loading can be formed.

Abstract: A photomask blank has a resist film which is obtained by coating a chemically amplified positive resist composition comprising a polymer comprising phenolic hydroxy-containing repeat units and repeat units having a carboxy group which is protected with an acid labile group in the form of a tertiary hydrocarbyl group having an electron attractive moiety and/or hydroxy-substituted phenyl moiety bonded to the tertiary carbon, and an organic solvent. The resist film is processed to form a pattern with a high resolution, reduced LER, improved rectangularity, and pattern fidelity.

Abstract: A method of manufacturing a display device capable of reducing tact time includes: a transfer step of arranging an anisotropic conductive adhesive layer provided on a base material that is transparent to laser light and a wiring board to face each other, and irradiating laser light from the base material side so that individual pieces of the anisotropic conductive adhesive layer are transferred to and arranged at predetermined positions on the wiring board; and a mounting step of mounting light-emitting elements on the individual pieces arranged at the predetermined positions on the wiring board. The individual pieces of the anisotropic conductive adhesive layer are able to be transferred and arranged with high precision and high efficiency by irradiation of laser light.

Abstract: Manufacturing methods for a composite substrate for surface acoustic wave devices with improved characteristics is provided. The composite substrate for a surface acoustic wave device is configured to include a piezoelectric single crystal substrate and a supporting substrate. An intervening layer is provided between the piezoelectric single crystal substrate and the supporting substrate, the amount of chemisorbed water in the intervening layer is 1×1020 molecules/cm3 or less. At the bonding interface between the piezoelectric single crystal substrate and the supporting substrate, at least one of the piezoelectric single crystal substrate and the supporting substrate may have an uneven structure. It is preferable that the ratio of the average length RSm of the element in the sectional curve of the uneven structure and the wavelength ? of the surface acoustic wave when used as a surface acoustic wave device is 0.2 or more and 7.0 or less.

Abstract: A reflective photomask blank includes a substrate, a multilayer reflection film that reflects exposure light being light in extreme ultraviolet range, a protection film, a light-absorbing film that absorbs the exposure light, and a hard mask film that is formed in contact with the light-absorbing film. The hard mask film is constituted by a multilayer including a first layer disposed at the side remotest from the substrate, and is composed of a material that is resistant to chlorine-based dry etching, and removable by fluorine-based dry etching, and a second layer composed of a material that is resistant to fluorine-based dry etching, and removable by chlorine-based dry etching. An etching clear time of the light-absorbing film on fluorine-based dry etching under one condition is longer than an etching clear time of the first layer on the fluorine-based dry etching under the same condition.

Abstract: A resist composition comprising a hypervalent iodine compound having at least two acyloxy groups, a carboxylic acid, and a solvent is provided. When processed by lithography using high-energy radiation, the resist composition exhibits a high sensitivity and resolution.