Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Patent number: 10743412
    Abstract: The present invention provides the substrate comprises a fiber film base material comprising a sheet of a surface-treated fiber film or a plural number of sheets of the surface-treated fiber films being laminated, wherein the surface-treated fiber film has a value of a conventional flexural rigidity measured by a method according to JIS R 3420 of 3-fold to 100-fold to a value of a conventional flexural rigidity of an untreated fiber film. There can be provided a substrate having a uniform and homogeneous insulating layer which does not generate unfastening or twisting of a fiber, and in addition to heat resistance, dimensional stability and impact resistance, having further excellent in bendability and flexibility.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: August 11, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Saiko Akahane, Yoshihira Hamamoto, Toshio Shiobara
  • Patent number: 10738190
    Abstract: A resin composition includes: (a) a supported platinum catalyst having a structure shown by the following general formula (1) in which a platinum complex is supported on a surface of an inorganic oxide; and (b) a thermoplastic matrix resin. The resin composition is usable as an addition-reaction catalyst capable of imparting sufficient storability and quick curability to an addition-reaction curable composition. In the formula, L represents a ligand selected from carbon monoxide, an olefin compound, an amine compound, a phosphine compound, an N-heterocyclic carbene compound, a nitrile compound, and an isocyanide compound; and n represents the number of Ls and an integer from 0 to 2.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: August 11, 2020
    Assignees: SHIN-ETSU CHEMICAL CO., LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Masayuki Ikeno, Takeshi Miyao, Takeharu Toyoshima, Jun-chul Choi, Norihisa Fukaya, Hiroyuki Yasuda
  • Patent number: 10737966
    Abstract: Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: August 11, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoko Ishitsuka, Atsushi Watabe, Daijitsu Harada, Masaki Takeuchi
  • Patent number: 10736317
    Abstract: A composition containing a substance having sex pheromone activity on San Jose scale (SJS) after finding the substance. More specifically, there are provided a composition having sex pheromone activity on SJS, the composition containing 3,7-dimethyl-7-octenyl propionate as a substance having sex pheromone activity on SJS; an attractant for SJS, the attractant containing the composition and a support for supporting the composition in such a manner as to allow the substance to be released; a mating disruptant for SJS, the disruptant containing the composition and a container for storing the composition in such a manner as to allow the substance to be released; and a method for attracting SJS or disrupting mating of SJS, the method including a step of installing the attractant or the mating disruptant for SJS in a field to release the substance from the attractant or the mating disruptant into the field.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: August 11, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takeshi Kinsho, Tatsuya Fujii
  • Patent number: 10737999
    Abstract: A process to prepare (9E,11Z)-9,11-hexadecadienyl acetate with a good yield and high purity of the general formula (1): CH3—(CH2)3—CH?CH—CH?CH—(CH2)a—X.=The process includes a step of conducting a Wittig reaction between a haloalkenal of the general formula (2): OHC—CH?CH—(CH2)a—X, and a triarylphosphonium pentylide of the general formula (3): CH3—(CH2)3—CH?—P+Ar3, to obtain the 1-haloalkadiene, and the use of a (7E,9Z)-1-halo-7,9-tetradecadiene obtained by the process for a process of preparing (9E, 11Z)-9,11-hexadecadienyl acetate.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: August 11, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomohiro Watanabe, Yuki Miyake, Takeshi Kinsho
  • Patent number: 10737241
    Abstract: A photocatalyst/alloy fine-particle dispersion containing two kinds of fine particles dispersed in an aqueous dispersion medium, (i) photocatalyst fine particles and (ii) alloy fine particles containing an antibacterial/antifungal metal, easily forms a photocatalyst/alloy fine-particle thin film of high transparency that exhibits antibacterial/antifungal properties regardless of the presence or absence of light irradiation.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: August 11, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Manabu Furudate, Tomohiro Inoue
  • Publication number: 20200249571
    Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.
    Type: Application
    Filed: January 15, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Kenichi Oikawa, Masaki Ohashi, Tomohiro Kobayashi
  • Publication number: 20200247957
    Abstract: A cobalt complex represented by formula (1), which exhibits excellent catalytic activity in hydrosilylation reactions and is excellent in terms of handleability and solubility in silicones. {In formula (1), R1 to R3 each independently represent a hydrogen atom or a C1-30 monovalent organic group which may have been substituted by a halogen atom and may be separated by one or more atoms selected from among oxygen, nitrogen, and silicon atoms, and at least one pair among R1 to R3 may be bonded together to form a C1-30 bridged substituent which may be optionally separated by one or more atoms selected from among oxygen, nitrogen, and silicon atoms; the L moieties each independently represent an isocyanide ligand represented by the formula CN—R4 (2) (wherein R4 represents a C1-30 monovalent organic group which may have been substituted by a halogen atom and may be separated by one or more atoms selected from among oxygen, nitrogen, sulfur, and silicon atoms); and n is 4.
    Type: Application
    Filed: September 20, 2018
    Publication date: August 6, 2020
    Applicants: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hideo NAGASHIMA, Atsushi SANAGAWA, Daisuke NODA, Koji SAKUTA
  • Publication number: 20200249562
    Abstract: The present invention is to provide a pellicle frame in a frame shape, having an upper end face to arrange a pellicle film thereon and a lower end face to face a photomask, and which is characterized by being provided with a notched part from an outer side face toward an inner side face of the upper end face, and to provide a pellicle characterized by including the pellicle frame as a component.
    Type: Application
    Filed: January 6, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yu YANASE
  • Publication number: 20200247926
    Abstract: Polymerization reaction is performed using a polymerizable monomer shown by the following general formula (1) and at least one monomer selected from monomers each having a structure of a salt among a lithium salt, a sodium salt, a potassium salt, and a nitrogen compound salt of a fluorosulfonic acid or the like; then, the structure of the salt of the repeating unit of a polymer obtained by the polymerization reaction is changed to the fluorosulfonic acid or the like by ion exchange. Thus, the present invention provides a polymer compound for a conductive polymer and a method for producing the polymer compound which is suitably used as a dopant for a fuel cell and a conductive material, and which is a copolymer containing a repeating unit of styrene having a 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylisobutyl ether group, and a repeating unit having any of a fluorosulfonic acid, a fluorosulfonimide group, and a n-carbonyl-fluoro-sulfonamide group.
    Type: Application
    Filed: January 16, 2020
    Publication date: August 6, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Takayuki NAGASAWA, Koji HASEGAWA, Masayoshi SAGEHASHI, Masahiro FUKUSHIMA
  • Publication number: 20200246248
    Abstract: A cosmetic including an acryl silicone copolymer having a (meth)acrylic chain in the main chain and a structure containing at least a silicone macromonomer shown by the following general formula (1) as the monomer unit (the acryl silicone copolymer has a refractive index of 1.47 or more). A novel glossy cosmetic that is free from tautness or stiffness unlike previous silicone resin coatings, excellent in feeling of use, adherence, and flexibility, as well as good in effect for preventing color transfer.
    Type: Application
    Filed: February 9, 2018
    Publication date: August 6, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hiroyuki MORIYA
  • Publication number: 20200249561
    Abstract: During reactive sputtering using a silicon-containing target, an inert gas, and a nitrogen-containing reactive gas, a hysteresis curve is drawn by sweeping the flow rate of the reactive gas, and plotting the sputtering voltage or current during the sweep versus the flow rate of the reactive gas. In the step of sputtering in a region corresponding to a range from more than the lower limit of reactive gas flow rate providing the hysteresis to less than the upper limit, the target power, the inert gas flow rate and/or the reactive gas flow rate is increased or decreased continuously or stepwise. The halftone phase shift film including a layer containing transition metal, silicon and nitrogen is improved in in-plane uniformity of optical properties.
    Type: Application
    Filed: April 21, 2020
    Publication date: August 6, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takuro KOSAKA, Yukio INAZUKI, Hideo KANEKO
  • Publication number: 20200246246
    Abstract: A cosmetic including at least one cyclic silicone represented by formula (1), and having a boiling point of 205 to 255° C. and a viscosity of less than 5 mm2/s (25° C.). This cosmetic has a light touch, a good spread, and excellent water repellency, forms a uniform cosmetic film, can achieve a feeling of use without a strong oily feeling, and has stability over time and cosmetic persistence when a variety of oil such as a silicone, hydrocarbon oil, and ester, an organic ultraviolet absorber, or an oily component being solid at 25° C. is mixed. (Wherein R1 is a monovalent hydrocarbon group having 2 or 3 carbon atoms, R2, R3, R4, R5, and R6 are each independently a monovalent hydrocarbon group having 1 to 3 carbon atoms, “a” is a positive number satisfying 0<a<4, and “b” and “c” are each independently a number of 0 to 3, provided that (a+b+c) <4.
    Type: Application
    Filed: June 22, 2018
    Publication date: August 6, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masanao KAMEI, Tomoya KANAI, Takuya ABE, Ryuichi INABA, Tsuneo KIMURA
  • Patent number: 10730273
    Abstract: The present invention is a resin composition including: (A) an epoxy resin; (B) an epoxy compound shown by the following formula (1) and/or formula (2); (C) an epoxy compound shown by the following formula (3); (D) a phenolic curing agent; and (E) a curing accelerator, wherein “A” represents a single bond or a divalent organic group selected from the following formulae. This provides a resin composition with improved strength, reduced warpage, and excellent adhesion, a resin film with improved strength formed from the composition, a semiconductor laminate containing the cured material of the resin film and a method for manufacturing the same, as well as a semiconductor device into which the semiconductor laminate is diced and a method for manufacturing the same.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoichiro Ichioka, Naoyuki Kushihara, Kazunori Kondo, Kazuaki Sumita
  • Patent number: 10734132
    Abstract: The present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the bio-electrode is soaked in water or dried. The present invention is accomplished by a bio-electrode composition including an (A) ionic material and a (B) resin other than the component (A), in which the component (A) has both a repeating unit “a” of a sodium salt, a potassium salt, or an ammonium salt including a partial structure represented by the following general formula (1) and a repeating unit “b” having a silicon atom.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Osamu Watanabe, Takayuki Fujiwara, Motoaki Iwabuchi, Yasuyoshi Kuroda
  • Patent number: 10731007
    Abstract: Provided is an addition-curable silicone rubber composition that contains (A) an alkenyl group-containing organopolysiloxane, (B) an organohydrogenpolysiloxane, (C) a platinum catalyst and (D) a reinforcement filler material surface treated with a benzotriazole derivative represented by formula (I) (in the formula, R1 is a hydrogen atom or a monovalent hydrocarbon group and R2 is a monovalent organic group) and that is capable of lowering the compression set of a cured article and suppressing changes in hardness after heat degradation characteristic testing while suppressing reduced curability. Also provided are a cured article thereof and a manufacturing method for the addition-curable silicone rubber composition.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: August 4, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hidenori Mizushima, Shigeru Ubukata, Shigeki Shudo, Nobu Kato
  • Patent number: 10730817
    Abstract: The object of the present invention is to provide an industrial and economical process for preparing (E2,Z6)-2,6-nonadienal of the following formula (4): The present invention provides a process for preparing (E2,Z6)-2,6-nonadienal (4), comprising at least steps of: subjecting (Z3,Z6)-3,6-nonadien-1-ol of the following formula (1): to oxidation with a sulfoxide compound of the following formula (2): CH3(R1)S?O??(2) in which R1 represents a monovalent hydrocarbon group having from 1 to 12 carbon atoms, in the presence of a sulfur trioxide complex and an amine compound of the following formula (3): N(R2)(R3)(R4)??(3) in which R2, R3, and R4 each independently represent a monovalent hydrocarbon group having from 1 to 12 carbon atoms, or R3 and R4 may be bonded to each other to form a divalent hydrocarbon group having from 3 to 12 carbon atoms, R3-R4, to form the aforesaid (E2,Z6)-2,6-nonadienal (4).
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: August 4, 2020
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Miyoshi Yamashita, Yuki Miyake, Takeshi Kinsho
  • Publication number: 20200239641
    Abstract: A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, wherein R1 and R2 each independently represent a substituted or unsubstituted C1-C50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX2, or (NH)(3-r)/2—SiR1R2r (R1 and R2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX2 is denoted by p, p satisfies 0?p/(2n+4)?0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a?1, 0?b<1, and a+b=1.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masato Kawakami, Shotaro Aoki, Ayumu Kiyomori
  • Publication number: 20200239321
    Abstract: A reactor 200 according to the present invention includes a heater storage section serving as a space section capable of accommodating a carbon heater for initial heating of silicon core wires. A carbon heater 13 is loaded in a deposition reaction space 20 in the reactor 200 only when necessary for initial heating of silicon core wires 12. After initial heating of the silicon core wires 12 is finished, the carbon heater 13 is unloaded from the deposition reaction space to the heater storage section 30. As a result, the carbon heater 13 is not unduly damaged in the reactor any longer and its deterioration is reduced. In addition, because of reduction in reaction with hydrogen gas in the reactor, the generation of methane is reduced, and thus carbon contamination of polycrystalline silicon is reduced.
    Type: Application
    Filed: April 15, 2020
    Publication date: July 30, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yasushi Kurosawa, Shigeyoshi Netsu, Naruhiro Hoshino
  • Publication number: 20200241418
    Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Application
    Filed: January 28, 2020
    Publication date: July 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama