Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and an aromatic carboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.

Abstract: A resist underlayer film material contains: one or more compounds shown by the following general formula (1); and an organic solvent. W represents an organic group with a valency of “n” having 2 to 50 carbon atoms; X represents a terminal group structure shown by the following general formula (2) or (3); when a ratio of the structure of the following general formula (2) to that of (3) is “a” to “b”, “a” and “b” satisfy the relations 0.70?a?0.99 and 0.01?b?0.30. “n” represents an integer of 1 to 10. Z represents an aromatic group with a valency of (k+1) having 6 to 20 carbon atoms. “A” represents a single bond or —O—(CH2)p—. “k” represents an integer of 1 to 5. “p” represents an integer of 1 to 10. L represents a single bond or —(CH2)r—. “1” represents 2 or 3; and “r” represents an integer of 1 to 5.

Abstract: Provided is a resin composition that has a low melt viscosity, and is capable of being turned into a cured product having a high heat resistance, a high adhesion and a high glass-transition temperature, though having a low permittivity and a low dielectric tangent. The resin composition is a cyclic imide resin composition containing: (a) a cyclic imide compound represented by the following formula (1), (b) a cyclic imide compound represented by the following formula (2), and (c) a curing catalyst.

Abstract: Provided are an ultraviolet curable organopolysiloxane composition having a favorable ultraviolet curability; and a cured product thereof that has a favorable adhesiveness. The ultraviolet curable organopolysiloxane composition contains: (A) a compound represented by the following general formula (1) wherein R1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms or an alkoxy group having 1 to 3 carbon atoms, the multiple R1s may be identical to or different from each other, and each R2 independently represents a hydrogen atom, a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms or a triorganosilyl group; and an ultraviolet curable organopolysiloxane.

Abstract: A method for recycling a rare earth magnet is described. The rare earth magnet has a film containing Ni on the surface thereof, and the method involves immersing the rare earth magnet in a stripping solution containing a derivative of nitrobenzene, ethylenediamine, and ammonia. This strips the Ni on the surface of the rare earth magnet without deteriorating the characteristics of the rare earth magnet, thereby improving its product yield.

Abstract: This water-repellent, oil-repellent member is obtained via a method comprising: a step for wet-coating a substrate surface with a solution containing an organic silicon compound comprising multiple silanol groups and a solvent; a step for drying the solvent to form a primer layer; a step for wet-coating the primer layer with a solution containing a fluorine-containing compound and a solvent, followed by drying the solvent, or dry-coating with the fluorine-containing compound obtained by evaporating the solvent from the solution; and a step for curing the fluorine-containing compound to form a water-repellent, oil-repellent layer.

Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and a fluorocarboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.

Abstract: A chemically amplified negative resist composition is provided comprising (A) a polymer P having a predetermined structure and comprising repeat units adapted to generate an acid upon exposure, repeat units adapted to change its solubility in a developer by degrading under the action of an acid, and repeat units having phenolic hydroxy group, and (B) a crosslinker X in the form of a melamine compound, a glycoluril compound, a urea compound or an epoxy compound substituted with at least one selected from a methylol group, an alkoxymethyl group and an acyloxymethyl group.

Abstract: A negative electrode including negative electrode active material particles, wherein the negative electrode is charged and discharged at least once, the negative electrode active material particles contain silicon oxide particles coated with a carbon layer, and the silicon oxide particles contain Li2SiO3, and in an O1s bonding energy obtained by XPS analysis on a particle inside, an intensity of a peak A obtained near 529.5 eV and an intensity of a peak B obtained near 532.5 eV have a relationship of (intensity of peak A)?(intensity of peak B). Thus, a negative electrode can increase a battery capacity with improvement of initial efficiency and can achieve sufficient battery cycle characteristics.

Abstract: A microfluidic device includes: a microfluidic chip with a flow path formed inside; a cover and a base, each in contact with a surface of the microfluidic chip; a chip holder including a fixture for securing the microfluidic chip to the cover and the base; and a connector with one end in contact with a surface of the microfluidic chip and the other end serving as a fluid supply or discharge port. The flatness of the surfaces of the microfluidic chip is 50 ?m or less, and the planarity of the surfaces of the cover and base is 50 ?m or less. By this structure, the microfluidic chip is hardly deformed, and damage to the microfluidic chip is suppressed. In addition, liquid tightness at a connection portion with the flow path of the microfluidic chip is high, and liquid leakage hardly occurs.

Abstract: Provided are a composite material that has a high strength and is superior in both chemical resistance and solvent resistance; and a production method capable of relatively easily and industrially advantageously producing such composite material. The composite material includes a fiber base material; and a cured product of a curable liquid fluorine-containing composition that contains a curable liquid fluorine-containing compound, wherein the fiber base material and the cured product are integrally formed with each other. The production method includes a step of uniformly impregnating the fiber base material with the curable liquid fluorine-containing composition; a step of defoaming the fiber base material uniformly impregnated with the curable liquid fluorine-containing composition; and a step of curing the curable liquid fluorine-containing composition uniformly impregnating the defoamed fiber base material.

Abstract: A chemically amplified negative resist composition comprising (A) a quencher in the form of an onium salt containing an anion having a nitrogen-containing aliphatic heterocycle and a fluorocarboxylic acid structure and (B) a base polymer is provided. The resist composition forms a pattern of rectangular profile with improved LER, resolution, fidelity, and dose margin.

Abstract: The resist composition exhibits excellent sensitivity, resolution, and LWR when processed by photolithography using high-energy radiation, typically EB and EUV lithography, and a patterning process using the same. The resist composition comprises a specific tin compound and an organic solvent exhibits excellent sensitivity, resolution, and LWR when processed by photolithography using high-energy radiation.

Abstract: Provided is a siloxane-modified polyurethane composition comprising (A) a polysiloxane represented by formula (1), (B) a prescribed isocyanate compound, and (C) a prescribed organic compound that can react with an NCO group. (R13SiO1/2)k(R12SiO2/2)p(R1SiO3/2)q(SiO4/2)r ??(1) [Where R1 is, for example, a group selected from among formulas (2)-(5): —CH2—CH2—Y—OH etc. ??(2); —O—Y—CH?CH2 ??(3); —O—Y?—CH?CH—CH3 ??(4); and —O—Y—CH2—CH2—* ??(5) (where Y and Y? indicate a bivalent hydrocarbon group), and when the number of formulas (2)-(5) are respectively n2-n5, then n2>0, n3?0, n4?0, n5?0, n2+n3+n4+n5? 1, 0.97<n2/(n2+n3+n4+n5)?1.0; k>0, p?0, q?0, r?0, and k+p+q?2.] The siloxane-modified polyurethane composition has high tensile strength.

Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has improved lithography properties including sensitivity, acid diffusion control, MEF, and LWR when processed by photolithography using high-energy radiation. The resist composition having a high solvent solubility and a high sensitivity and being improved in lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV; and a pattern forming process using the resist composition.

Abstract: A platinum-phosphite ester complex-containing hydrosilylation catalyst has good storage stability and comprises: a platinum-phosphite ester complex composed of platinum and a phosphite ester compound having a specific structure; and a liquid alkenyl group-containing siloxane compound containing an organopolysiloxane compound having two or more adjacent alkenyl groups, the catalyst being free of a hydrocarbon-based organic solvent and being liquid at 23° C. By using the catalyst, a one-component (one-part) curable organopolysiloxane composition free of a hydrocarbon-based organic solvent can be easily obtained, and the resulting one-component curable organopolysiloxane composition has stable characteristics and physical properties even when exposed to ambient temperature for a long period of time.

Abstract: Provided is an oxygen-curable silicone composition that cures at room temperature, the reaction being triggered by oxygen in the atmosphere, without requiring heat or UV irradiation at the time of use, and exhibits good mechanical strength after curing. A composition including (A) an organopolysiloxane (1) (R1 represents an alkyl group or the like but has at least one acryloyloxy group or the like in the molecule, R2 represents an oxygen atom or the like, and m and n represent numbers that satisfy 1?m+n?1,000.), (B) a silicone resin including (a) a unit of formula (2), (b) an R13SiO1/2 unit, and (c) an SiO4/2 unit, the molar ratio of [(a)+(b)]/(c) being 0.4-1.2, and the silicone resin having 0.005 mol/100 g or more Si—OH groups (R1 and R2 are the same as above. R3 represents an acryloyloxyalkyl group or the like, p represents 0-10, and 1 represents a number that satisfies 1-3.), and (C) an organoborane complex (3) (R4-R6 represent hydrocarbon groups.).

Abstract: A silicone particle containing: a dialkylsiloxane unit represented by the following general formula (1), R42SiO2/2 (1), where, in the formula (1), R4s each independently represent a monovalent hydrocarbon group having 1 to 6 carbon atoms; and a poly(alkyleneoxyalkyl)methylsiloxane unit represented by the following general formula (2), where, in the formula (2), R1s each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms, R2s each independently represent a divalent aliphatic group having 1 to 6 carbon atoms, and “n” is a number that satisfies 1?n?20, where the silicone particle has an oxyalkylene group in a surface thereof. A silicone particle may be readily dispersed in an aqueous material without the use of a dispersant or a surfactant, the silicone particle having a hydrophilic group.

Abstract: A quantum dot has a fluorescent crystalline nanoparticle, wherein the quantum dot has a core-shell structure including a core particle containing a first metal element and a shell layer containing a second metal element, at an interface between the core particle and the shell layer, a third metal element different from the first metal element and the second metal element is present, and an amount of the third metal element with respect to an amount of the first metal element contained in the core particle is 10% or less in terms of molar ratio. As a result the quantum dot has excellent controllability of the emission wavelength and high luminous properties and luminous efficiency.

Abstract: A negative electrode active material containing negative electrode active material particles. The negative electrode active material particles include silicon compound particles each containing an oxygen-containing silicon compound. The silicon compound particle contains at least one of Li2SiO3 and Li2Si2O5. The silicon compound particle has, in a Si K-edge spectrum obtained from a XANES spectrum: a peak P derived from the Li silicate and located near 1847 eV; and a peak Q gentler than the peak P and located near 1851 to 1852 eV. This provides a negative electrode active material that is capable of stabilizing a slurry when the negative electrode active material is used for a secondary battery, and capable of increasing the battery capacity by improving the initial efficiency.